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Cheng K, Huang Z, Wang P, Sun L, Ghasemi H, Ardebili H, Karim A. Antibacterial flexible triboelectric nanogenerator via capillary force lithography. J Colloid Interface Sci 2023; 630:611-622. [DOI: 10.1016/j.jcis.2022.10.129] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 07/19/2022] [Revised: 10/03/2022] [Accepted: 10/25/2022] [Indexed: 11/06/2022]
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Murmu K, Pandey A, Roy P, Deb A, Gooh Pattader PS. Janus micro‐thread to micro‐nanodroplets using dynamic contact line lithography. J Appl Polym Sci 2022. [DOI: 10.1002/app.52490] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/12/2022]
Affiliation(s)
- Kaniska Murmu
- Department of Chemical Engineering Indian Institute of Technology Guwahati Guwahati India
| | - Ankur Pandey
- Department of Chemical Engineering Indian Institute of Technology Guwahati Guwahati India
| | - Pritam Roy
- Centre for Nanotechnology Indian Institute of Technology Guwahati Guwahati India
| | - Aniruddha Deb
- Department of Chemical Engineering Indian Institute of Technology Guwahati Guwahati India
| | - Partho Sarathi Gooh Pattader
- Department of Chemical Engineering Indian Institute of Technology Guwahati Guwahati India
- Centre for Nanotechnology Indian Institute of Technology Guwahati Guwahati India
- School of Health Science and Technology Indian Institute of Technology Guwahati Guwahati India
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Dhara P, Mukherjee R. Phase separation and dewetting of polymer dispersed liquid crystal (PDLC) thin films on flat and patterned substrates. J Mol Liq 2021. [DOI: 10.1016/j.molliq.2021.117360] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/20/2022]
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Pandey A, Murmu K, Gooh Pattader PS. Non-equilibrium thermal annealing of a polymer blend in bilayer settings for complex micro/nano-patterning. RSC Adv 2021; 11:10183-10193. [PMID: 35423522 PMCID: PMC8695700 DOI: 10.1039/d1ra00017a] [Citation(s) in RCA: 3] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 01/02/2021] [Accepted: 02/26/2021] [Indexed: 01/30/2023] Open
Abstract
Micro phase separation in a thin film of a polymer blend leads to interesting patterns on different substrates. A plethora of studies in this field discussed the effect of the surface energy of the underlying tethered polymer brush or substrate on the final morphology of the polymer blend. The conventional process toward the final morphology is rather slow. Here, aiming fast lithography, we induce the kinetically driven morphological evolution by rapid thermal annealing (RTA) of the polymer blend of polystyrene (PS) and polymethylmethacrylate (PMMA) in bilayer settings at a very high temperature. The underlying film consists of untethered constituent homopolymers or their blend or random-co-polymer (RCP). Apart from the phase inversion of the blend on the PS homopolymer, a rich morphology of the blend on the RCP underlayer is uncovered with systematic investigation of the film using sequential washing with selective solvents. The dissolution characteristics and the thermal stability of the constituent polymers corroborated the observation. Based on the understanding of the morphological evolution, fabrication of a complex shaped micro/nano-pattern with multiple length scales is demonstrated using this blend/RCP system. This study shows a novel methodology for easy fabrication of hierarchical small length scale complex structures.
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Affiliation(s)
- Ankur Pandey
- Department of Chemical Engineering, Indian Institute of Technology Guwahati 781039 India
| | - Kaniska Murmu
- Department of Chemical Engineering, Indian Institute of Technology Guwahati 781039 India
| | - Partho Sarathi Gooh Pattader
- Department of Chemical Engineering, Indian Institute of Technology Guwahati 781039 India
- Center for Nanotechnology, Indian Institute of Technology Guwahati 781039 India
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Su Y, Geng Z, Fang W, Lv X, Wang S, Ma Z, Pei W. Route to Cost-Effective Fabrication of Wafer-Scale Nanostructure through Self-Priming Nanoimprint. MICROMACHINES 2021; 12:121. [PMID: 33498873 PMCID: PMC7911382 DOI: 10.3390/mi12020121] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 12/14/2020] [Revised: 01/17/2021] [Accepted: 01/21/2021] [Indexed: 11/17/2022]
Abstract
Nanoimprint technology is powerful for fabricating nanostructures in a large area. However, expensive equipment, high cost, and complex process conditions hinder the application of nano-imprinting technology. Therefore, double-layer self-priming nanoimprint technology was proposed to fabricate ordered metal nanostructures uniformly on 4-inch soft and hard substrates without the aid of expensive instruments. Different nanostructure (gratings, nanoholes and nanoparticles) and different materials (metal and MoS2) were patterned, which shows wide application of double-layer self-priming nanoimprint technology. Moreover, by a double-layer system, the width and the height of metal can be adjusted through the photoresist thickness and developing condition, which provide a programmable way to fabricate different nanostructures using a single mold. The double-layer self-priming nanoimprint method can be applied in poor condition without equipment and be programmable in nanostructure parameters using a single mold, which reduces the cost of instruments and molds.
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Affiliation(s)
- Yue Su
- State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China; (Y.S.); (W.F.); (X.L.); (Z.M.); (W.P.)
- College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Zhaoxin Geng
- School of Information Engineering, Minzu University of China, Beijing 100081, China
| | - Weihao Fang
- State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China; (Y.S.); (W.F.); (X.L.); (Z.M.); (W.P.)
- College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Xiaoqing Lv
- State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China; (Y.S.); (W.F.); (X.L.); (Z.M.); (W.P.)
| | - Shicai Wang
- State Key Laboratory of Crystal Materials, Shandong University, Jinan 250100, China;
| | - Zhengtai Ma
- State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China; (Y.S.); (W.F.); (X.L.); (Z.M.); (W.P.)
- College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Weihua Pei
- State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China; (Y.S.); (W.F.); (X.L.); (Z.M.); (W.P.)
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Das A, Dey AB, Chattopadhyay S, De G, Sanyal MK, Mukherjee R. Nanoparticle Induced Morphology Modulation in Spin Coated PS/PMMA Blend Thin Films. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2020; 36:15270-15282. [PMID: 33296208 DOI: 10.1021/acs.langmuir.0c02584] [Citation(s) in RCA: 9] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/12/2023]
Abstract
The influence of adding nanoparticles on the ascast morphology of spin coated immiscible polystyrene/poly(methyl methacrylate) (PS/PMMA) thin films of different thickness (hE) and composition (RB, volume ratio of PS to PMMA) has been explored in this article. To understand the precise effect of nanoparticle addition, the morphology of PS/PMMA thin blend films spin cast from toluene on a native oxide covered silicon wafer substrate was first investigated. It is seen that in particle free films, the generic morphology of the films remains nearly unaltered with increase in hE, for RB = 3:1 and 1:3. In contrast, strong hE dependent morphology transformation is observed in films with RB = 1:1. Subsequently, thiol-capped gold nanoparticles (AuNP) containing films with different particle concentrations (CNP) were cast from the same solvent along with the polymer mixture. We observe that addition of AuNPs barely alters the generic morphology of the films with RB = 3:1. In contrast, the presence of the particles significantly influences the morphology of the films with RB = 1:1 and 1:3, particularly at higher CNP (≈10.0%). X-ray photoelectron spectroscopy and X-ray reflectivity of some samples reveal that the AuNPs tend to migrate to the free surface through the PS phase, thereby stabilizing this layer partially or fully (depending on CNP) against dewetting over a surface of adsorbed PMMA layer and influencing the ascast morphology as a function of CNP. The work is fundamentally important in understanding largely overlooked implications of nanoparticle addition on the morphology of PS/PMMA blend thin films which forms the fundamental basis for future interesting studies involving dynamics of nanoparticles within the blend thin films.
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Affiliation(s)
- Anuja Das
- Instability and Soft Patterning Laboratory, Department of Chemical Engineering, Indian Institute of Technology Kharagpur, Kharagpur 721302, India
| | - Arka Bikash Dey
- Saha Institute of Nuclear Physics, Sector 1, AF Block, Bidhan Nagar, Kolkata, West Bengal 700064, India
| | - Shreyasi Chattopadhyay
- CSIR-Central Glass and Ceramic Research Institute, 196, Raja Subodh Chandra Mallick Rd, Jadavpur, Kolkata, West Bengal 700032, India
| | - Goutam De
- S. N. Bose National Centre for Basic Sciences, JD Block, Sector III, Salt Lake, Kolkata 700106, India
| | - Milan K Sanyal
- Saha Institute of Nuclear Physics, Sector 1, AF Block, Bidhan Nagar, Kolkata, West Bengal 700064, India
| | - Rabibrata Mukherjee
- Instability and Soft Patterning Laboratory, Department of Chemical Engineering, Indian Institute of Technology Kharagpur, Kharagpur 721302, India
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Meng Z, Li G, Yiu S, Zhu N, Yu Z, Leung C, Manners I, Wong W. Nanoimprint Lithography‐Directed Self‐Assembly of Bimetallic Iron–M (M=Palladium, Platinum) Complexes for Magnetic Patterning. Angew Chem Int Ed Engl 2020. [DOI: 10.1002/ange.202002685] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/07/2022]
Affiliation(s)
- Zhengong Meng
- Department of Chemistry Hong Kong Baptist University Waterloo Road Kowloon Tong Hong Kong P. R. China
- College of Chemistry and Environmental Engineering Low-dimensional Materials Genome Initiative Shenzhen University Xueyuan Road Shenzhen Guangdong P. R. China
| | - Guijun Li
- State Key Laboratory of Ultra-Precision Machining Technology and Department of Industrial and Systems Engineering The Hong Kong Polytechnic University Hung Hom Hong Kong P. R. China
| | - Sze‐Chun Yiu
- Department of Chemistry Hong Kong Baptist University Waterloo Road Kowloon Tong Hong Kong P. R. China
- Department of Applied Biology and Chemical Technology The Hong Kong Polytechnic University (PolyU) Hung Hom Hong Kong P. R. China
- PolyU Shenzhen Research Institute Shenzhen 518057 P. R. China
| | - Nianyong Zhu
- Department of Chemistry Hong Kong Baptist University Waterloo Road Kowloon Tong Hong Kong P. R. China
| | - Zhen‐Qiang Yu
- College of Chemistry and Environmental Engineering Low-dimensional Materials Genome Initiative Shenzhen University Xueyuan Road Shenzhen Guangdong P. R. China
| | - Chi‐Wah Leung
- Department of Applied Physics The Hong Kong Polytechnic University Hung Hom Hong Kong P. R. China
| | - Ian Manners
- Department of Chemistry University of Victoria Victoria BC V8P 5C2 Canada
| | - Wai‐Yeung Wong
- Department of Chemistry Hong Kong Baptist University Waterloo Road Kowloon Tong Hong Kong P. R. China
- Department of Applied Biology and Chemical Technology The Hong Kong Polytechnic University (PolyU) Hung Hom Hong Kong P. R. China
- PolyU Shenzhen Research Institute Shenzhen 518057 P. R. China
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Meng Z, Li G, Yiu SC, Zhu N, Yu ZQ, Leung CW, Manners I, Wong WY. Nanoimprint Lithography-Directed Self-Assembly of Bimetallic Iron-M (M=Palladium, Platinum) Complexes for Magnetic Patterning. Angew Chem Int Ed Engl 2020; 59:11521-11526. [PMID: 32243037 DOI: 10.1002/anie.202002685] [Citation(s) in RCA: 20] [Impact Index Per Article: 5.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 02/20/2020] [Indexed: 01/10/2023]
Abstract
Self-assembly of d8 metal polypyridine systems is a well-established approach for the creation of 1D organometallic assemblies but there are still challenges for the large-scale construction of nanostructured patterns from these building blocks. We describe herein the use of high-throughput nanoimprint lithography (NIL) to direct the self-assembly of the bimetallic complexes [4'-ferrocenyl-(2,2':6',2''-terpyridine)M(OAc)]+ (OAc)- (M=Pd or Pt; OAc=acetate). Uniform nanorods are fabricated from the molecular self-organization and evidenced by morphological characterization. More importantly, when top-down NIL is coupled with the bottom-up self-assembly of the organometallic building blocks, regular arrays of nanorods can be accessed and the patterns can be controlled by changing the lithographic stamp, where the mold imposes a confinement effect on the nanorod growth. In addition, patterns consisting of the products formed after pyrolysis are studied. The resulting arrays of ferromagnetic FeM alloy nanorods suggest promising potential for the scalable production of ordered magnetic arrays and fabrication of magnetic bit-patterned media.
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Affiliation(s)
- Zhengong Meng
- Department of Chemistry, Hong Kong Baptist University, Waterloo Road, Kowloon Tong, Hong Kong, P. R. China.,College of Chemistry and Environmental Engineering, Low-dimensional Materials Genome Initiative, Shenzhen University, Xueyuan Road, Shenzhen, Guangdong, P. R. China
| | - Guijun Li
- State Key Laboratory of Ultra-Precision Machining Technology and Department of Industrial and Systems Engineering, The Hong Kong Polytechnic University, Hung Hom, Hong Kong, P. R. China
| | - Sze-Chun Yiu
- Department of Chemistry, Hong Kong Baptist University, Waterloo Road, Kowloon Tong, Hong Kong, P. R. China.,Department of Applied Biology and Chemical Technology, The Hong Kong Polytechnic University (PolyU), Hung Hom, Hong Kong, P. R. China.,PolyU Shenzhen Research Institute, Shenzhen, 518057, P. R. China
| | - Nianyong Zhu
- Department of Chemistry, Hong Kong Baptist University, Waterloo Road, Kowloon Tong, Hong Kong, P. R. China
| | - Zhen-Qiang Yu
- College of Chemistry and Environmental Engineering, Low-dimensional Materials Genome Initiative, Shenzhen University, Xueyuan Road, Shenzhen, Guangdong, P. R. China
| | - Chi-Wah Leung
- Department of Applied Physics, The Hong Kong Polytechnic University, Hung Hom, Hong Kong, P. R. China
| | - Ian Manners
- Department of Chemistry, University of Victoria, Victoria, BC, V8P 5C2, Canada
| | - Wai-Yeung Wong
- Department of Chemistry, Hong Kong Baptist University, Waterloo Road, Kowloon Tong, Hong Kong, P. R. China.,Department of Applied Biology and Chemical Technology, The Hong Kong Polytechnic University (PolyU), Hung Hom, Hong Kong, P. R. China.,PolyU Shenzhen Research Institute, Shenzhen, 518057, P. R. China
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9
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Sun C, You H, Gao N, Chang J, Gao Q, Xie Y, Xie Y, Xu RX. Design and fabrication of a microfluidic chip to detect tumor markers. RSC Adv 2020; 10:39779-39785. [PMID: 35515361 PMCID: PMC9057392 DOI: 10.1039/d0ra06693a] [Citation(s) in RCA: 6] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/03/2020] [Revised: 01/22/2021] [Accepted: 10/21/2020] [Indexed: 12/21/2022] Open
Abstract
A microfluidic chip based on capillary infiltration was designed to detect tumor markers. Serum samples flowed along a microchannel that used capillary force to drive sample injection, biochemical reactions and waste liquid collection. This permitted us to realize rapid qualitative detection of tumor markers and other biological molecules. The chip integrated a number of microfluidic functions including blood plasma separation, microvalve operation, and antibody immobilization. Using antigen–antibody reaction principles, the chip provided highly selective and sensitive detection of markers. Combining a microfluidic chip with immunoassays not only improved the antigen–antibody reaction speed, but also reduced the consumption of samples and reagents. The experimental results showed that the chip can achieve separation of trace whole blood, control of sample flow rate, and detection of alpha fetoprotein, thus providing preliminary verification of its feasibility and potential for clinical use. In summary, in this paper a cheap, mass-produced, and portable microfluidic chip for cancer detection, which has good prospects for practical use during disease diagnosis and screening is reported. A microfluidic chip for detecting tumor markers integrated functions including blood plasma separation, microvalve operation, and antibody immobilization.![]()
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Affiliation(s)
- Cuimin Sun
- Department of Mechanical Engineering and Precision Machinery
- University of Science and Technology of China
- Hefei
- PR China
- XingJian College of Science and Liberal Arts of Guangxi University
| | - Hui You
- Department of Mechanical Engineering
- Guangxi University
- Nanning
- PR China
| | - Nailong Gao
- Department of Mechanical Engineering and Precision Machinery
- University of Science and Technology of China
- Hefei
- PR China
| | - Jianguo Chang
- Department of Mechanical Engineering and Precision Machinery
- University of Science and Technology of China
- Hefei
- PR China
| | - Qingxue Gao
- Department of Mechanical Engineering and Precision Machinery
- University of Science and Technology of China
- Hefei
- PR China
| | - Yang Xie
- Department of Mechanical Engineering and Precision Machinery
- University of Science and Technology of China
- Hefei
- PR China
| | - Yao Xie
- Department of Mechanical Engineering and Precision Machinery
- University of Science and Technology of China
- Hefei
- PR China
| | - Ronald X. Xu
- Department of Mechanical Engineering and Precision Machinery
- University of Science and Technology of China
- Hefei
- PR China
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