Non-lift-off block copolymer lithography of 25 nm magnetic nanodot arrays

Tetragonally Packed Inverted Cylindrical Microdomains from Binary Block Copolymer Blends with Enhanced Hydrogen Bonding

Hexagonally packed (HEX) cylindrical microdomains can be obtained through the self-assembly of block copolymers (BCPs) with a moderately asymmetric volume fraction of one block (f), resulting in the formation of minor cylinders. However, for next-generation lithography and high-density memory devices, it is desirable to obtain densely and tetragonally packed inverted cylindrical microdomains, which are composed of the major block in the minor matrix. The inverted cylinders differ from conventional HEX cylinders, which consist of the minor block in the matrix of the major block. In this study, we achieved this objective by utilizing a binary blend of a polystyrene-b-poly(4-vinylpyridine) copolymer (S4VP) and polystyrene-b-poly(4-hydroxystyrene) copolymer (SHS), where the P4VP block exhibited a strong hydrogen bonding interaction with the PHS block. By carefully controlling the molecular weight ratio of S4VP and SHS as well as the blend composition, we successfully observed tetragonally packed inverted PS cylinders with a square cross-section at a volume fraction of PS of 0.69.

Metal nanoparticle arrays via a water-based lift-off scheme using a block copolymer template

Metalnanoparticles(NPs) can exhibit unique electronic, magnetic, optical, and catalytic properties. Highly ordered, dense arrays of non-close-packed, surface-supported metal NPs are thus of potential use in a wide range of applications. Implementing such arrays over large surfaces can, however, be both technologically challenging and prohibitively expensive using conventional top-down nanofabrication techniques. Moreover, many existing patterning methods are too harsh for sensitive substrate surfaces and their applications. To address this, we here investigate a fabrication protocol involving a water-based lift-off scheme in which the template pattern generation is rapidly and inexpensively achieved throughblock copolymer(BCP) self-assembly. A three-layer lift-off stack consisting of, from top to bottom, a poly(styrene-block-2-vinyl pyridine) template, a SiO_xintermediate hardmask, and a water-soluble poly(vinyl alcohol) sacrificial layer is employed in this endeavor.Solvent-induced surface reconstruction(SISR) is used to generate an initial surface topography in the BCP template which is subsequently transferred to the layers beneath in a sequence of reactive ion etching steps. Through judicious selection of stack materials and dry etch chemistries, a layered, high-aspect-ratio, nanoporous mask is thus implemented. After metal deposition, the mask and excess material are simply removed in a lift-off step by dissolving the bottommost sacrificial layer in water. The incorporation of an intermediate hardmask and a water-soluble sacrificial layer obviates the need for harmful and/or corrosive lift-off solvents and decouples the BCP self-assembly process from the influence of substrate properties. We demonstrate the generation of well-ordered arrays of Au NPs capable of supporting sharp, localized surface plasmon resonances. We also investigate improvements to large-scale uniformity, as this is found sensitive to the SISR termination step in the original protocol. Extensions of the technique to other BCP morphologies and materials deposited ought to be straightforward.

Highly asymmetric lamellar nanostructures from nanoparticle-linear hybrid block copolymers

The highly asymmetric lamellar (A-LAM) nanostructure is one of the most important template geometries for block copolymer (BCP) lithography. However, A-LAM is unattainable from conventional BCPs, and there is no general molecular design strategy for A-LAM-forming BCP. Herein, a nanoparticle-linear hybrid BCP system is reported, which is designed based on the intramolecular crosslinking technique, as a remarkably effective platform to obtain the A-LAM morphology. The hybrid BCPs consisting of polystyrene single-chain nanoparticles and linear polylactide segments show a remarkable capability to form the A-LAM morphology in bulk, where a maximum width ratio of 4.1 between the two domains is obtained. This unusual phase behavior is attributed to the bulky and rigid characteristics of the nanoparticle block. Furthermore, the thin films of these hybrid BCPs show perpendicularly oriented A-LAM morphology on a chemically modified Si substrate, allowing promising application in the fabrication of asymmetric line-and-space nanopatterns.

Imparting Superhydrophobicity with a Hierarchical Block Copolymer Coating

A robust and transparent silica-like coating that imparts superhydrophobicity to a surface through its hierarchical multilevel self-assembled structure is demonstrated. This approach involves iterative steps of spin-coating, annealing, and etching of polystyrene-block-polydimethylsiloxane block copolymer thin films to form a tailored multilayer nanoscale topographic pattern with a water contact angle up to 155°. A model based on the hierarchical topography is developed to calculate the wetting angle and optimize the superhydrophobicity, in agreement with the experimental trends, and explaining superhydrophobicity arising through the combination of roughness at different lengthscales. Additionally, the mechanical robustness and optically passive properties of the resulting hydrophobic surfaces are demonstrated.

Dual Nanopatterns Consisting of Both Nanodots and Nanoholes on a Single Substrate

Block copolymers (BCPs) with various nanostructures such as spheres, cylinders, gyroid, and lamellae, have received great attention for their application in nanolithography through nanopattern transfer to substrates. However, the fabrication of diverse geometries, shapes and sizes of nanostructure on a single substrate at the desired position could not be achieved because the nanostructure based on BCPs is mainly determined by the volume fraction of one block. Here, we synthesize polystyrene-hv-poly(methyl methacrylate) copolymer (PS-hv-PMMA), which contains a photocleavable linker at the junction point between PS and PMMA blocks. After vertically oriented PMMA cylindrical nanodomains in a thin film on a substrate were obtained, dual nanopatterns composed of high-density array of nanodots and nanoholes were successfully fabricated at the desired area on a single substrate using selective irradiation with a mask. The dual nanopatterns could be used to prepare metal (or metal oxide) nanostructure arrays consisting of both nanodots and nanoholes, which are utilized for smart sensors capable of simultaneously detecting two independent molecules on nanodots and nanoholes.

Downsizing feature of microphase-separated structures via intramolecular crosslinking of block copolymers

A novel strategy for downsizing the feature of microphase-separated structures was developed via the intramolecular crosslinking reaction of block copolymers (BCPs) without changing the molecular weight. A series of BCPs consisting of poly[styrene-st-(p-3-butenyl styrene)] and poly(rac-lactide) (SBS-LA) was subjected to Ru-catalyzed olefin metathesis under highly diluted conditions to produce intramolecularly crosslinked BCPs (SBS(cl)-LAs). Small-angle X-ray scattering measurement and transmission electron microscopy observation of the SBS(cl)-LAs revealed feature size reduction in lamellar (LAM) and hexagonally close-packed cylinder (HEX) structures in the bulk state, which was surely due to the restricted chain dimensions of the intramolecularly crosslinked SBS block. Notably, the degree of size reduction was controllable by varying the crosslink density, with a maximum decrease of 22% in the LAM spacing. In addition, we successfully observed the downsizing of the HEX structure in the thin film state using atomic force microscopy, indicating the applicability of the present methodology to next-generation lithography technology.

The effect of chain architecture on the phase behavior of A4B4 miktoarm block copolymers

Well-defined miktoarm (polystyrene)₄-(polylactic acid)₄ ((PS)₄-(PLA)₄) block copolymers were synthesized and their phase behaviors were compared with linear PS-b-PLA block copolymers, in which the miktoarm architecture enhanced the phase segregation.

High-Precision Solvent Vapor Annealing for Block Copolymer Thin Films

Despite its efficacy in producing well-ordered, periodic nanostructures, the intricate role multiple parameters play in solvent vapor annealing has not been fully established. In solvent vapor annealing a thin polymer film is exposed to a vapor of solvent(s) thus forming a swollen and mobile layer to direct the self-assembly process at the nanoscale. Recent developments in both theory and experiments have directly identified critical parameters that govern this process, but controlling them in any systematic way has proven non-trivial. These identified parameters include vapor pressure, solvent concentration in the film, and the solvent evaporation rate. To explore their role, a purpose-built solvent vapor annealing chamber was designed and constructed. The all-metal chamber is designed to be inert to solvent exposure. Computer-controlled, pneumatically actuated valves allow for precision timing in the introduction and withdrawal of solvent vapor from the film. The mass flow controller-regulated inlet, chamber pressure gauges, in situ spectral reflectance-based thickness monitoring, and low flow micrometer relief valve give real-time monitoring and control during the annealing and evaporation phases with unprecedented precision and accuracy. The reliable and repeatable alignment of polylactide cylinders formed from polystyrene-b-polylactide, where cylinders stand perpendicular to the substrate and span the thickness of the film, provides one illustrative example.

Magnetization switching in high-density magnetic nanodots by a fine-tune sputtering process on a large-area diblock copolymer mask

Ordered magnetic nanodot arrays with extremely high density provide unique properties to the growing field of nanotechnology. To overcome the size limitations of conventional lithography, a fine-tuned sputtering deposition process on mesoporous polymeric template fabricated by diblock copolymer self-assembly is herein proposed to fabricate uniform and densely spaced nanometer-scale magnetic dot arrays. This process was successfully exploited to pattern, over a large area, sputtered Ni₈₀Fe₂₀ and Co thin films with thicknesses of 10 and 13 nm, respectively. Carefully tuned sputter-etching at a suitable glancing angle was performed to selectively remove the magnetic material deposited on top of the polymeric template, producing nanodot arrays (dot diameter about 17 nm). A detailed study of magnetization reversal at room temperature as a function of sputter-etching time, together with morphology investigations, was performed to confirm the synthesis of long-range ordered arrays displaying functional magnetic properties. Magnetic hysteresis loops of the obtained nanodot arrays were measured at different temperatures and interpreted via micromagnetic simulations to explore the role of dipole-dipole magnetostatic interactions between dots and the effect of magnetocrystalline anisotropy. The agreement between measurements and numerical modelling results indicates the use of the proposed synthesis technique as an innovative process in the design of large-area nanoscale arrays of functional magnetic elements.

Nanoscale silicon substrate patterns from self-assembly of cylinder forming poly(styrene)-block-poly(dimethylsiloxane) block copolymer on silane functionalized surfaces

Poly(styrene)-block-poly(dimethylsiloxane) (PS-b-PDMS) is an excellent block copolymer (BCP) system for self-assembly and inorganic template fabrication because of its high Flory-Huggins parameter (χ ∼ 0.26) at room temperature in comparison to other BCPs, and high selective etch contrast between PS and PDMS block for nanopatterning. In this work, self-assembly in PS-b-PDMS BCP is achieved by combining hydroxyl-terminated poly(dimethylsiloxane) (PDMS-OH) brush surfaces with solvent vapor annealing. As an alternative to standard brush chemistry, we report a simple method based on the use of surfaces functionalized with silane-based self-assembled monolayers (SAMs). A solution-based approach to SAM formation was adopted in this investigation. The influence of the SAM-modified surfaces upon BCP films was compared with polymer brush-based surfaces. The cylinder forming PS-b-PDMS BCP and PDMS-OH polymer brush were synthesized by sequential living anionic polymerization. It was observed that silane SAMs provided the appropriate surface chemistry which, when combined with solvent annealing, led to microphase segregation in the BCP. It was also demonstrated that orientation of the PDMS cylinders may be controlled by judicious choice of the appropriate silane. The PDMS patterns were successfully used as an on-chip etch mask to transfer the BCP pattern to underlying silicon substrate with sub-25 nm silicon nanoscale features. This alternative SAM/BCP approach to nanopattern formation shows promising results, pertinent in the field of nanotechnology, and with much potential for application, such as in the fabrication of nanoimprint lithography stamps, nanofluidic devices or in narrow and multilevel interconnected lines.

Rapid ordering of block copolymer thin films

Block-copolymers self-assemble into diverse morphologies, where nanoscale order can be finely tuned via block architecture and processing conditions. However, the ultimate usage of these materials in real-world applications may be hampered by the extremely long thermal annealing times-hours or days-required to achieve good order. Here, we provide an overview of the fundamentals of block-copolymer self-assembly kinetics, and review the techniques that have been demonstrated to influence, and enhance, these ordering kinetics. We discuss the inherent tradeoffs between oven annealing, solvent annealing, microwave annealing, zone annealing, and other directed self-assembly methods; including an assessment of spatial and temporal characteristics. We also review both real-space and reciprocal-space analysis techniques for quantifying order in these systems.

Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application

Block copolymers (BCPs) and their directed self-assembly (DSA) has emerged as a realizable complementary tool to aid optical patterning of device elements for future integrated circuit advancements. Methods to enhance BCP etch contrast for DSA application and further potential applications of inorganic nanomaterial features (e.g., semiconductor, dielectric, metal and metal oxide) are examined. Strategies to modify, infiltrate and controllably deposit inorganic materials by utilizing neat self-assembled BCP thin films open a rich design space to fabricate functional features in the nanoscale regime. An understanding and overview on innovative ways for the selective inclusion/infiltration or deposition of inorganic moieties in microphase separated BCP nanopatterns is provided. Early initial inclusion methods in the field and exciting contemporary reports to further augment etch contrast in BCPs for pattern transfer application are described. Specifically, the use of evaporation and sputtering methods, atomic layer deposition, sequential infiltration synthesis, metal-salt inclusion and aqueous metal reduction methodologies forming isolated nanofeatures are highlighted in di-BCP systems. Functionalities and newly reported uses for electronic and non-electronic technologies based on the inherent properties of incorporated inorganic nanostructures using di-BCP templates are highlighted. We outline the potential for extension of incorporation methods to triblock copolymer features for more diverse applications. Challenges and emerging areas of interest for inorganic infiltration of BCPs are also discussed.

Poly(cyclohexylethylene)-block-Poly(lactide) Oligomers for Ultrasmall Nanopatterning Using Atomic Layer Deposition

Poly(cyclohexylethylene)-block-poly(lactide) (PCHE-PLA) block polymers were synthesized through a combination of anionic polymerization, heterogeneous catalytic hydrogenation and controlled ring-opening polymerization. Ordered thin films of PCHE-PLA with ultrasmall hexagonally packed cylinders oriented perpendicularly to the substrate surface were prepared by spin-coating and subsequent solvent vapor annealing for use in two distinct templating strategies. In one approach, selective hydrolytic degradation of the PLA domains generated nanoporous PCHE templates with an average pore diameter of 5 ± 1 nm corroborated by atomic force microscopy and grazing incidence small-angle X-ray scattering. Alternatively, sequential infiltration synthesis (SIS) was employed to deposit Al2O3 selectively into the PLA domains of PCHE-PLA thin films. A combination of argon ion milling and O2 reactive ion etching (RIE) enabled the replication of the Al2O3 nanoarray from the PCHE-PLA template on diverse substrates including silicon and gold with feature diameters less than 10 nm.

Solvothermal Vapor Annealing of Lamellar Poly(styrene)-block-poly(d,l-lactide) Block Copolymer Thin Films for Directed Self-Assembly Application

Solvothermal vapor annealing (STVA) was employed to induce microphase separation in a lamellar forming block copolymer (BCP) thin film containing a readily degradable block. Directed self-assembly of poly(styrene)-block-poly(d,l-lactide) (PS-b-PLA) BCP films using topographically patterned silicon nitride was demonstrated with alignment over macroscopic areas. Interestingly, we observed lamellar patterns aligned parallel as well as perpendicular (perpendicular microdomains to substrate in both cases) to the topography of the graphoepitaxial guiding patterns. PS-b-PLA BCP microphase separated with a high degree of order in an atmosphere of tetrahydrofuran (THF) at an elevated vapor pressure (at approximately 40-60 °C). Grazing incidence small-angle X-ray scattering (GISAXS) measurements of PS-b-PLA films reveal the through-film uniformity of perpendicular microdomains after STVA. Perpendicular lamellar orientation was observed on both hydrophilic and relatively hydrophobic surfaces with a domain spacing (L0) of ∼32.5 nm. The rapid removal of the PLA microdomains is demonstrated using a mild basic solution for the development of a well-defined PS mask template. GISAXS data reveal the through-film uniformity is retained following wet etching. The experimental results in this article demonstrate highly oriented PS-b-PLA microdomains after a short annealing period and facile PLA removal to form porous on-chip etch masks for nanolithography application.

Multilayer block copolymer meshes by orthogonal self-assembly

Continued scaling-down of lithographic-pattern feature sizes has brought templated self-assembly of block copolymers (BCPs) into the forefront of nanofabrication research. Technologies now exist that facilitate significant control over otherwise unorganized assembly of BCP microdomains to form both long-range and locally complex monolayer patterns. In contrast, the extension of this control into multilayers or 3D structures of BCP microdomains remains limited, despite the possible technological applications in next-generation devices. Here, we develop and analyse an orthogonal self-assembly method in which multiple layers of distinct-molecular-weight BCPs naturally produce nanomesh structures of cylindrical microdomains without requiring layer-by-layer alignment or high-resolution lithographic templating. The mechanisms for orthogonal self-assembly are investigated with both experiment and simulation, and we determine that the control over height and chemical preference of templates are critical process parameters. The method is employed to produce nanomeshes with the shapes of circles and Y-intersections, and is extended to produce three layers of orthogonally oriented cylinders.

Well-Ordered Nanoporous ABA Copolymer Thin Films via Solvent Vapor Annealing, Homopolymer Blending, and Selective Etching of ABAC Tetrablock Terpolymers

Solvent vapor annealing treatments are used to control the orientation of nanostructures produced in thin films of a poly(styrene)-block-poly(isoprene)-block-poly(styrene)-block-poly((±)-lactide) (PS-PI-PS-PLA) and its blends with PLA homopolymer. The PS-PI-PS-PLA tetrablock terpolymer, previously determined to adopt a core(PLA)-shell(PS) cylindrical morphology in the bulk, gave perpendicular alignment of PLA cylinders over a limited range of thicknesses using a mixed solvent environment of tetrahydrofuran and acetone. On the other hand, perpendicular alignment was achieved regardless of film thickness by inclusion of 5 wt % homopolymer PLA in the PS-PI-PS-PLA tetrablock. Tapping mode atomic force microscopy (AFM) was used to visualize film surface morphologies. Subsequent reactive ion etching (RIE) and basic hydrolysis of PLA produced 15 nm pores in a PS-PI-PS triblock thin film matrix. Nanoporosity was confirmed by scanning electron microscopy (SEM) images and the vertical continuity of pores was confirmed by cross-sectional SEM analysis.

Universal pattern transfer methods for metal nanostructures by block copolymer lithography

A universal block copolymer pattern transfer method was demonstrated to produce Co nanostructures consisting of arrays of lines or dots from a polystyrene-block-polydimethylsiloxane (PS-b-PDMS) diblock copolymer. Three processes were used: liftoff, a damascene process, and ion beam etching using a hard mask of tungsten, including a sacrificial poly(methyl methacrylate) layer under the PS-b-PDMS for the etch and liftoff processes. The ion beam etch process produced the most uniform magnetic arrays. A structural and magnetic comparison in terms of uniformity, edge roughness and switching field distribution has been reported.

Poly(cyclohexylethylene)-block-poly(ethylene oxide) Block Polymers for Metal Oxide Templating

A series of poly(cyclohexylethylene)-block-poly(ethylene oxide) (CEO) diblock copolymers were synthesized through tandem anionic polymerizations and heterogeneous catalytic hydrogenation. Solvent-annealed CEO diblock films were used to template dense arrays of inorganic oxide nanodots via simple spin coating of an inorganic precursor solution atop the ordered film. The substantial chemical dissimilarity of the two blocks enables (i) selective inclusion of the inorganic precursor within the PEO domain and (ii) the formation of exceptionally small feature sizes due to a relatively large interaction parameter estimated from mean-field analysis of the order-disorder transition temperatures of compositionally symmetric samples. UV/ozone treatment following incorporation produces an ordered arrangement of oxide nanodots and simultaneously removes the block polymer template. Herein, we report the smallest particles (6 ± 1 nm) templated from a selective precursor insertion method to date using a block polymer scaffold.

Size-tuned ZnO nanocrucible arrays for magnetic nanodot synthesis via atomic layer deposition-assisted block polymer lithography

Low-temperature atomic layer deposition of conformal ZnO on a self-assembled block polymer lithographic template comprising well-ordered, vertically aligned cylindrical pores within a poly(styrene) (PS) matrix was used to produce nanocrucible templates with pore diameters tunable via ZnO thickness. Starting from a PS template with a hexagonal array of 30 nm diameter pores on a 45 nm pitch, the ZnO thickness was progressively increased to narrow the pore diameter to as low as 14 nm. Upon removal of the PS by heat treatment in air at 500 °C to form an array of size-tunable ZnO nanocrucibles, permalloy (Ni80Fe20) was evaporated at normal incidence, filling the pores and creating an overlayer. Argon ion beam milling was then used to etch back the overlayer (a Damascene-type process), leaving a well-ordered array of isolated ZnO nanocrucibles filled with permalloy nanodots. Microscopy and temperature-dependent magnetometry verified the diameter reduction with increasing ZnO thickness. The largest diameter (30 nm) dots exhibit a ferromagnetic multidomain/vortex state at 300 K, with relatively weakly temperature-dependent coercivity. Reducing the diameter leads to a crossover to a single-domain state and eventually superparamagnetism at sufficiently high temperature, in quantitative agreement with expectations. We argue that this approach could render this form of block polymer lithography compatible with high-temperature processing (as required for technologically important high perpendicular anisotropy ordered alloys, for instance), in addition to enabling separation-dependent studies to probe interdot magnetostatic interactions.

Study of the kinetics and mechanism of rapid self-assembly in block copolymer thin films during solvo-microwave annealing

Microwave annealing is an emerging technique for achieving ordered patterns of block copolymer films on substrates. Little is understood about the mechanisms of microphase separation during the microwave annealing process and how it promotes the microphase separation of the blocks. Here, we use controlled power microwave irradiation in the presence of tetrahydrofuran (THF) solvent, to achieve lateral microphase separation in high-χ lamellar-forming poly(styrene-b-lactic acid) PS-b-PLA. A highly ordered line pattern was formed within seconds on silicon, germanium and silicon on insulator (SOI) substrates. In-situ temperature measurement of the silicon substrate coupled to condition changes during "solvo-microwave" annealing allowed understanding of the processes to be attained. Our results suggest that the substrate has little effect on the ordering process and is essentially microwave transparent but rather, it is direct heating of the polar THF molecules that causes microphase separation. It is postulated that the rapid interaction of THF with microwaves and the resultant temperature increase to 55 °C within seconds causes an increase of the vapor pressure of the solvent from 19.8 to 70 kPa. This enriched vapor environment increases the plasticity of both PS and PLA chains and leads to the fast self-assembly kinetics. Comparing the patterns formed on silicon, germanium and silicon on insulator (SOI) and also an in situ temperature measurement of silicon in the oven confirms the significance of the solvent over the role of substrate heating during "solvo-microwave" annealing. Besides the short annealing time which has technological importance, the coherence length is on a micron scale and dewetting is not observed after annealing. The etched pattern (PLA was removed by an Ar/O2 reactive ion etch) was transferred to the underlying silicon substrate fabricating sub-20 nm silicon nanowires over large areas demonstrating that the morphology is consistent both across and through the film.

Optimization of long-range order in solvent vapor annealed poly(styrene)-block-poly(lactide) thin films for nanolithography

Detailed experiments designed to optimize and understand the solvent vapor annealing of cylinder-forming poly(styrene)-block-poly(lactide) thin films for nanolithographic applications are reported. By combining climate-controlled solvent vapor annealing (including in situ probes of solvent concentration) with comparative small-angle X-ray scattering studies of solvent-swollen bulk polymers of identical composition, it is concluded that a narrow window of optimal solvent concentration occurs just on the ordered side of the order-disorder transition. In this window, the lateral correlation length of the hexagonally close-packed ordering, the defect density, and the cylinder orientation are simultaneously optimized, resulting in single-crystal-like ordering over 10 μm scales. The influences of polymer synthesis method, composition, molar mass, solvent vapor pressure, evaporation rate, and film thickness have all been assessed, confirming the generality of this behavior. Analogies to thermal annealing of elemental solids, in combination with an understanding of the effects of process parameters on annealing conditions, enable qualitative understanding of many of the key results and underscore the likely generality of the main conclusions. Pattern transfer via a Damascene-type approach verified the applicability for high-fidelity nanolithography, yielding large-area metal nanodot arrays with center-to-center spacing of 38 nm (diameter 19 nm). Finally, the predictive power of our findings was demonstrated by using small-angle X-ray scattering to predict optimal solvent annealing conditions for poly(styrene)-block-poly(lactide) films of low molar mass (18 kg mol(-1)). High-quality templates with cylinder center-to-center spacing of only 18 nm (diameter of 10 nm) were obtained. These comprehensive results have clear and important implications for optimization of pattern transfer templates and significantly advance the understanding of self-assembly in block copolymer thin films.

Transfer of pre-assembled block copolymer thin film to nanopattern unconventional substrates

In this work, we demonstrate that a preassembled block copolymer (BCP) thin film can be floated, transferred, and utilized to effectively nanopattern unconventional substrates. As target substrates, we chose Cu foil and graphene/Cu foil since they cannot be nanopatterned via conventional processes due to the high surface roughness and susceptibility to harsh processing chemicals and etchants. Perpendicular hexagonal PMMA cylinder arrays in diblock copolymer poly(styrene-block-methyl methacrylate) [P(S-b-MMA)] thin films were preassembled on sacrificial SiO2/Si substrates. The BCP thin film was floated at the air/water interface off of a SiO2/Si substrate and then collected with the target substrate, leading to well-defined nanoporous PS templates on these uneven surfaces. We further show that the nanoporous template can be used for a subtractive process to fabricate nanoperforated graphene on Cu foil in sub-20 nm dimension, and for an additive process to create aluminum oxide nanodot arrays without any polymeric residues or use of harsh chemicals and etchants.

Magnetic microrheology of block copolymer solutions

The viscosity of poly(styrene)-b-poly(lactide) [PS-b-PLA] solutions in a neutral solvent was characterized by magnetic microrheology. The effect of polymer concentration on the viscosity of the block polymer solutions was compared with that of the PS and PLA homopolymers in the same solvent. The viscosity of PS-b-PLA solution, unlike the homopolymer solutions, showed a steep increase over a narrow concentration range. The steep rise was concomitant with microphase separation into an ordered cylindrical microstructure as determined by small-angle X-ray scattering. Hence microrheology proved effective as a means of characterizing the order-disorder transition concentration. During an in situ drying experiment, changes in local viscosity through the depth of a block copolymer solution were characterized as a function of drying time. Early in the drying process, the viscosity rose steadily and was uniform through the depth, a result consistent with steadily increasing and uniform polymer concentration. However, later in the drying process as the overall polymer concentration approached that required for microphase separation, the viscosity of the polymer solution near the free surface became an order of magnitude higher than that near the bottom of the container. The zone of high viscosity moved downward as drying proceeded, consistent with a microphase separation front.

Pattern transfer using block copolymers

To meet the increasing demand for patterning smaller feature sizes, a lithography technique is required with the ability to pattern sub-20 nm features. While top-down photolithography is approaching its limit in the continued drive to meet Moore's law, the use of directed self-assembly (DSA) of block copolymers (BCPs) offers a promising route to meet this challenge in achieving nanometre feature sizes. Recent developments in BCP lithography and in the DSA of BCPs are reviewed. While tremendous advances have been made in this field, there are still hurdles that need to be overcome to realize the full potential of BCPs and their actual use.