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Thermal and Bulk Properties of Triblock Terpolymers and Modified Derivatives towards Novel Polymer Brushes. Polymers (Basel) 2023; 15:polym15040848. [PMID: 36850132 PMCID: PMC9965776 DOI: 10.3390/polym15040848] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 01/16/2023] [Revised: 01/27/2023] [Accepted: 02/06/2023] [Indexed: 02/11/2023] Open
Abstract
We report the synthesis of three (3) linear triblock terpolymers, two (2) of the ABC type and one (1) of the BAC type, where A, B and C correspond to three chemically incompatible blocks such as polystyrene (PS), poly(butadiene) of exclusively (~100% vinyl-type) -1,2 microstructure (PB1,2) and poly(dimethylsiloxane) (PDMS) respectively. Living anionic polymerization enabled the synthesis of narrowly dispersed terpolymers with low average molecular weights and different composition ratios, as verified by multiple molecular characterization techniques. To evaluate their self-assembly behavior, transmission electron microscopy and small-angle X-ray scattering experiments were conducted, indicating the effect of asymmetric compositions and interactions as well as inversed segment sequence on the adopted morphologies. Furthermore, post-polymerization chemical modification reactions such as hydroboration and oxidation were carried out on the extremely low molecular weight PB1,2 in all three terpolymer samples. To justify the successful incorporation of -OH groups in the polydiene segments and the preparation of polymeric brushes, various molecular, thermal, and surface analysis measurements were carried out. The synthesis and chemical modification reactions on such triblock terpolymers are performed for the first time to the best of our knowledge and constitute a promising route to design polymers for nanotechnology applications.
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2
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Kang YH, Lee S, Choi Y, Seong WK, Han KH, Kim JH, Kim HM, Hong S, Lee SH, Ruoff RS, Kim KB, Kim SO. Large-Area Uniform 1-nm-Level Amorphous Carbon Layers from 3D Conformal Polymer Brushes. A "Next-Generation" Cu Diffusion Barrier? ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2022; 34:e2110454. [PMID: 35085406 DOI: 10.1002/adma.202110454] [Citation(s) in RCA: 5] [Impact Index Per Article: 2.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/23/2021] [Revised: 01/17/2022] [Indexed: 06/14/2023]
Abstract
A reliable method for preparing a conformal amorphous carbon (a-C) layer with a thickness of 1-nm-level, is tested as a possible Cu diffusion barrier layer for next-generation ultrahigh-density semiconductor device miniaturization. A polystyrene brush of uniform thickness is grafted onto 4-inch SiO2 /Si wafer substrates with "self-limiting" chemistry favoring such a uniform layer. UV crosslinking and subsequent carbonization transforms this polymer film into an ultrathin a-C layer without pinholes or hillocks. The uniform coating of nonplanar regions or surfaces is also possible. The Cu diffusion "blocking ability" is evaluated by time-dependent dielectric breakdown (TDDB) tests using a metal-oxide-semiconductor (MOS) capacitor structure. A 0.82 nm-thick a-C barrier gives TDDB lifetimes 3.3× longer than that obtained using the conventional 1.0 nm-thick TaNx diffusion barrier. In addition, this exceptionally uniform ultrathin polymer and a-C film layers hold promise for selective ion permeable membranes, electrically and thermally insulating films in electronics, slits of angstrom-scale thickness, and, when appropriately functionalized, as a robust ultrathin coating with many other potential applications.
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Affiliation(s)
- Yun-Ho Kang
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, Korea Advance Institute of Science and Technology (KAIST), Daejeon, 34141, Korea
| | - Sangbong Lee
- Research Institute of Advanced Materials, Department of Materials Science and Engineering, Seoul National University, Seoul, 08826, Korea
| | - Youngwoo Choi
- Department of Materials Science and Engineering, Korea Advance Institute of Science and Technology (KAIST), Daejeon, 34141, Korea
| | - Won Kyung Seong
- Center for Multidimensional Carbon Materials (CMCM), Institute for Basic Science (IBS), Ulsan, 44919, Korea
| | - Kyu Hyo Han
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, Korea Advance Institute of Science and Technology (KAIST), Daejeon, 34141, Korea
| | - Jang Hwan Kim
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, Korea Advance Institute of Science and Technology (KAIST), Daejeon, 34141, Korea
| | - Hyun-Mi Kim
- Korea Electronics Technology Institute (KETI), Gyeonggi, 13509, Korea
| | - Seungbum Hong
- Department of Materials Science and Engineering, Korea Advance Institute of Science and Technology (KAIST), Daejeon, 34141, Korea
| | - Sun Hwa Lee
- Center for Multidimensional Carbon Materials (CMCM), Institute for Basic Science (IBS), Ulsan, 44919, Korea
| | - Rodney S Ruoff
- Center for Multidimensional Carbon Materials (CMCM), Institute for Basic Science (IBS), Ulsan, 44919, Korea
- Department of Chemistry, Ulsan National Institute of Science and Technology (UNIST), Ulsan, 44919, Korea
- Department of Materials Science and Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan, 44919, Korea
- School of Energy and Chemical Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan, 44919, Korea
| | - Ki-Bum Kim
- Research Institute of Advanced Materials, Department of Materials Science and Engineering, Seoul National University, Seoul, 08826, Korea
| | - Sang Ouk Kim
- National Creative Research Initiative Center for Multi-Dimensional Directed Nanoscale Assembly, Department of Materials Science and Engineering, Korea Advance Institute of Science and Technology (KAIST), Daejeon, 34141, Korea
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3
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Shi LY, Yin C, Zhou B, Xia W, Weng L, Ross CA. Annealing Process Dependence of the Self-Assembly of Rod–Coil Block Copolymer Thin Films. Macromolecules 2021. [DOI: 10.1021/acs.macromol.0c02712] [Citation(s) in RCA: 6] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Affiliation(s)
- Ling-Ying Shi
- College of Polymer Science and Engineering, State Key Laboratory of Polymer Materials Engineering, Sichuan University, Chengdu 610065, China
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, United States
| | - Chengxiao Yin
- College of Polymer Science and Engineering, State Key Laboratory of Polymer Materials Engineering, Sichuan University, Chengdu 610065, China
| | - Bo Zhou
- College of Polymer Science and Engineering, State Key Laboratory of Polymer Materials Engineering, Sichuan University, Chengdu 610065, China
| | - Wei Xia
- College of Polymer Science and Engineering, State Key Laboratory of Polymer Materials Engineering, Sichuan University, Chengdu 610065, China
| | - Lin Weng
- College of Polymer Science and Engineering, State Key Laboratory of Polymer Materials Engineering, Sichuan University, Chengdu 610065, China
| | - Caroline A. Ross
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, United States
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4
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Prochukhan N, Selkirk A, Lundy R, Giraud EC, Ghoshal T, Downing C, Morris MA. Large-Area Fabrication of Vertical Silicon Nanotube Arrays via Toroidal Micelle Self-Assembly. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2021; 37:1932-1940. [PMID: 33507754 PMCID: PMC8280740 DOI: 10.1021/acs.langmuir.0c03431] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 11/30/2020] [Revised: 01/12/2021] [Indexed: 06/12/2023]
Abstract
We present a highly scalable, room-temperature strategy for fabricating vertical silicon nanotube arrays derived from a toroidal micelle pattern via a water vapor-induced block copolymer (BCP) self-assembly mechanism. A polystyrene-b-poly(ethylene oxide) (PS-b-PEO) BCP system can be self-assembled into toroidal micelle structures (diameter: 400-600 nm) on a PS-OH-modified substrate in a facile manner contrasting with other complex processes described in the literature. It was found that a minimum PS-b-PEO thickness of ∼86 nm is required for the toroidal self-assembly. Furthermore, a water vapor annealing treatment at room conditions (∼25 °C, 60 min) is shown to vastly enhance the ordering of micellar structures. A liquid-phase infiltration process was used to generate arrays of iron and nickel oxide nanorings. These oxide structures were used as templates for pattern transfer into the underlying silicon substrate via plasma etching, resulting in large-area 3D silicon nanotube arrays. The overall simplicity of this technique, as well as the wide potential versatility of the resulting metal structures, proves that such room-temperature synthesis routes are a viable pathway for complex nanostructure fabrication, with potential applicability in fields such as optics or catalysis.
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Affiliation(s)
- Nadezda Prochukhan
- School
of Chemistry, CRANN and AMBER Research Centres, Trinity College Dublin, College Green, Dublin 2, Ireland
- BiOrbic—Bioeconomy
SFI Research Centre, University College
Dublin, Belfield, Dublin 4, Ireland
| | - Andrew Selkirk
- School
of Chemistry, CRANN and AMBER Research Centres, Trinity College Dublin, College Green, Dublin 2, Ireland
| | - Ross Lundy
- School
of Chemistry, CRANN and AMBER Research Centres, Trinity College Dublin, College Green, Dublin 2, Ireland
| | - Elsa C. Giraud
- School
of Chemistry, CRANN and AMBER Research Centres, Trinity College Dublin, College Green, Dublin 2, Ireland
| | - Tandra Ghoshal
- School
of Chemistry, CRANN and AMBER Research Centres, Trinity College Dublin, College Green, Dublin 2, Ireland
| | - Clive Downing
- School
of Chemistry, CRANN and AMBER Research Centres, Trinity College Dublin, College Green, Dublin 2, Ireland
| | - Michael A. Morris
- School
of Chemistry, CRANN and AMBER Research Centres, Trinity College Dublin, College Green, Dublin 2, Ireland
- BiOrbic—Bioeconomy
SFI Research Centre, University College
Dublin, Belfield, Dublin 4, Ireland
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5
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Shi LY, Lan J, Lee S, Cheng LC, Yager KG, Ross CA. Vertical Lamellae Formed by Two-Step Annealing of a Rod-Coil Liquid Crystalline Block Copolymer Thin Film. ACS NANO 2020; 14:4289-4297. [PMID: 32182037 PMCID: PMC7309319 DOI: 10.1021/acsnano.9b09702] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/10/2019] [Accepted: 03/17/2020] [Indexed: 05/05/2023]
Abstract
Silicon-containing block copolymer thin films with high interaction parameter and etch contrast are ideal candidates to generate robust nanotemplates for advanced nanofabrication, but they typically form in-plane oriented microdomains as a result of the dissimilar surface energies of the blocks. Here, we describe a two-step annealing method to produce vertically aligned lamellar structures in thin film of a silicon-containing rod-coil thermotropic liquid crystalline block copolymer. The rod-coil block copolymer with the volume fraction of the Si-containing block of 0.22 presents an asymmetrical lamellar structure in which the rod block forms a hexatic columnar nematic liquid crystalline phase. A solvent vapor annealing step first produces well-ordered in-plane cylinders of the Si-containing block, then a subsequent thermal annealing promotes the phase transition from in-plane cylinders to vertical lamellae. The pathways of the order-order transition were examined by microscopy and in situ using grazing incidence small-angle X-ray scattering and wide-angle X-ray scattering.
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Affiliation(s)
- Ling-Ying Shi
- College
of Polymer Science and Engineering, State Key Laboratory of Polymer
Materials Engineering, Sichuan University, Chengdu 610065, China
- Department
of Materials Science and Engineering, Massachusetts
Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, United States
| | - Ji Lan
- College
of Polymer Science and Engineering, State Key Laboratory of Polymer
Materials Engineering, Sichuan University, Chengdu 610065, China
| | - Sangho Lee
- Department
of Materials Science and Engineering, Massachusetts
Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, United States
| | - Li-Chen Cheng
- Department
of Materials Science and Engineering, Massachusetts
Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, United States
| | - Kevin G. Yager
- Center
for Functional Nanomaterials, Brookhaven
National Laboratory, Upton, New York 11973, United States
| | - Caroline A. Ross
- Department
of Materials Science and Engineering, Massachusetts
Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, United States
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Lee YAL, Pryamitsyn V, Rhee D, de la Cruz MO, Odom TW. Strain-Dependent Nanowrinkle Confinement of Block Copolymers. NANO LETTERS 2020; 20:1433-1439. [PMID: 31927935 DOI: 10.1021/acs.nanolett.9b05189] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
This paper describes an all-soft, templated assembly of block copolymers (BCPs) with programmable alignment. Using polymeric nanowrinkles as a confining scaffold, poly(styrene)-block-poly(dimethylsiloxane) (PS-b-PDMS) BCPs were assembled to be parallel or perpendicular to the wrinkle orientation by manipulating the substrate strain. Self-consistent field theory modeling revealed that wrinkle curvature and surface affinity govern the BCP structural formation. Furthermore, control of BCP alignment was demonstrated for complex wrinkle geometries, various copolymer molecular weights, and functional wrinkle skin layers. This integration of BCP patterning with flexible 3D architectures offers a promising nanolithography approach for next-generation soft electronics.
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7
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Zhang W, Pan H, Lyu X, Gu K, Xiao A, Shen Z, Fan XH. 5 nm Ordered Structures Self-Assembled by C 2 -Symmetric Hybrids with Polyhedral Oligomeric Silsesquioxane and Hexa-peri-Hexabenzocoronene. Chemphyschem 2019; 20:1759-1764. [PMID: 31077530 DOI: 10.1002/cphc.201900196] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Revised: 05/09/2019] [Indexed: 11/09/2022]
Abstract
Hybrids consisting of polyhedral oligomeric silsesquioxane (POSS) and hexa-peri-hexabenzocoronene (HBC) with a dumbbell topology and C2 symmetry were designed and synthesized. They self-assemble into 5 nm ordered structures. In particular, the increased steric effect with increasing POSS units stabilizes a square columnar phase (Colsqu ) which is important in nanotemplating. These hybrids containing discotic liquid crystal HBC and POSS units have an excellent etching contrast and present an approach to obtain 5 nm nanopatterns.
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Affiliation(s)
- Wei Zhang
- Beijing National Laboratory for Molecular Sciences Key Laboratory of Polymer Chemistry and Physics of Ministry of Education, Center for Soft Matter Science and Engineering, and College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, China
| | - Hongbing Pan
- Beijing National Laboratory for Molecular Sciences Key Laboratory of Polymer Chemistry and Physics of Ministry of Education, Center for Soft Matter Science and Engineering, and College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, China
| | - Xiaolin Lyu
- Beijing National Laboratory for Molecular Sciences Key Laboratory of Polymer Chemistry and Physics of Ministry of Education, Center for Soft Matter Science and Engineering, and College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, China
| | - Kehua Gu
- Beijing National Laboratory for Molecular Sciences Key Laboratory of Polymer Chemistry and Physics of Ministry of Education, Center for Soft Matter Science and Engineering, and College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, China
| | - Anqi Xiao
- Beijing National Laboratory for Molecular Sciences Key Laboratory of Polymer Chemistry and Physics of Ministry of Education, Center for Soft Matter Science and Engineering, and College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, China
| | - Zhihao Shen
- Beijing National Laboratory for Molecular Sciences Key Laboratory of Polymer Chemistry and Physics of Ministry of Education, Center for Soft Matter Science and Engineering, and College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, China
| | - Xing-He Fan
- Beijing National Laboratory for Molecular Sciences Key Laboratory of Polymer Chemistry and Physics of Ministry of Education, Center for Soft Matter Science and Engineering, and College of Chemistry and Molecular Engineering, Peking University, Beijing, 100871, China
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8
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Shi LY, Lee S, Cheng LC, Huang H, Liao F, Ran R, Yager KG, Ross CA. Thin Film Self-Assembly of a Silicon-Containing Rod–Coil Liquid Crystalline Block Copolymer. Macromolecules 2019. [DOI: 10.1021/acs.macromol.8b01938] [Citation(s) in RCA: 23] [Impact Index Per Article: 4.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/14/2022]
Affiliation(s)
- Ling-Ying Shi
- College of Polymer Science and Engineering, State Key Laboratory of Polymer Materials Engineering, Sichuan University, Chengdu 610065, China
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, United States
| | - Sangho Lee
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, United States
| | - Li-Chen Cheng
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, United States
| | - Hejin Huang
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, United States
| | - Fen Liao
- College of Polymer Science and Engineering, State Key Laboratory of Polymer Materials Engineering, Sichuan University, Chengdu 610065, China
| | - Rong Ran
- College of Polymer Science and Engineering, State Key Laboratory of Polymer Materials Engineering, Sichuan University, Chengdu 610065, China
| | - Kevin G. Yager
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, United States
| | - Caroline A. Ross
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, United States
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9
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Wei Z, Piantavigna S, Holt SA, Nelson A, Spicer PT, Prescott SW. Comparing Surfactant Structures at "Soft" and "Hard" Hydrophobic Materials: Not All Interfaces Are Equivalent. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2018; 34:9141-9152. [PMID: 29999320 DOI: 10.1021/acs.langmuir.8b01686] [Citation(s) in RCA: 6] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
The interfacial structures of a range of amphiphilic molecules are studied with both "soft" and "hard" hydrophobic substrates. Neutron reflection and quartz crystal microbalance with dissipation measurements highlight the differences between the adsorbed structures adopted by sodium dodecyl sulfate (SDS), cetyltrimethylammonium bromide (C16TAB), and the "AM1" surface active peptide. At the soft siloxane/water interface, small molecular surfactants form loosely packed layers, with the hydrophobic tails penetrating into the oily layer, and an area per surfactant molecule that is significantly less than previously reported for the air/water interface. Neutron reflection measurements, supported by quartz crystal microbalance studies, indicate that for C16TAB, approximately 30 ± 8% of the alkyl tail penetrates into the poly(dimethylsiloxane) (PDMS) layer, whereas 20 ± 5% of the alkyl tail of SDS is located in the PDMS. For the engineered peptide surfactant AM1 (21 residues), it was found that one face of the α helix penetrated into the PDMS film. In contrast, penetration of the surfactant tails was not observed against hard solidlike hydrophobic surfaces made from octadecyltrichlorosilane (OTS) for any of the molecular species studied. At the OTS/water interface, C16TAB and SDS were seen to adsorb as larger aggregates and not as monolayers. Amphiphilic adsorption (amount, structural conformation) at the PDMS/water interface is shown to be different from that at both the air/water interface and the hard OTS/water interface, illustrating that interfacial structures cannot be predicted by the surfactant packing parameter alone. The bound PDMS layer is shown to be a useful proxy for the oil/water interface in surface and stabilization studies, with hydrophobic components of the molecules able to penetrate into the oily PDMS.
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Affiliation(s)
- Zengyi Wei
- School of Chemical Engineering , UNSW Sydney , Sydney , NSW 2052 , Australia
| | - Stefania Piantavigna
- Australian Nuclear Science and Technology Organisation , Lucas Heights , NSW 2234 , Australia
| | - Stephen A Holt
- Australian Nuclear Science and Technology Organisation , Lucas Heights , NSW 2234 , Australia
| | - Andrew Nelson
- Australian Nuclear Science and Technology Organisation , Lucas Heights , NSW 2234 , Australia
| | - Patrick T Spicer
- School of Chemical Engineering , UNSW Sydney , Sydney , NSW 2052 , Australia
| | - Stuart W Prescott
- School of Chemical Engineering , UNSW Sydney , Sydney , NSW 2052 , Australia
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10
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Borah D, Cummins C, Rasappa S, Senthamaraikannan R, Salaun M, Zelsmann M, Liontos G, Ntetsikas K, Avgeropoulos A, Morris MA. Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography. NANOMATERIALS (BASEL, SWITZERLAND) 2018; 8:E32. [PMID: 29315245 PMCID: PMC5791119 DOI: 10.3390/nano8010032] [Citation(s) in RCA: 14] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 12/08/2017] [Revised: 12/28/2017] [Accepted: 01/02/2018] [Indexed: 01/17/2023]
Abstract
The self-assembly of a lamellar-forming polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) diblock copolymer (DBCP) was studied herein for surface nanopatterning. The DBCP was synthesized by sequential living anionic polymerization of styrene and hexamethylcyclotrisiloxane (D₃). The number average molecular weight (Mn), polydispersity index (Mw/Mn) and PS volume fraction (φps) of the DBCP were MnPS = 23.0 kg mol-1, MnPDMS = 15.0 kg mol-1, Mw/Mn = 1.06 and φps = 0.6. Thin films of the DBCP were cast and solvent annealed on topographically patterned polyhedral oligomeric silsesquioxane (POSS) substrates. The lamellae repeat distance or pitch (λL) and the width of the PDMS features (dL) are ~35 nm and ~17 nm, respectively, as determined by SEM. The chemistry of the POSS substrates was tuned, and the effects on the self-assembly of the DBCP noted. The PDMS nanopatterns were used as etching mask in order to transfer the DBCP pattern to underlying silicon substrate by a complex plasma etch process yielding sub-15 nm silicon features.
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Affiliation(s)
- Dipu Borah
- AMBER Centre & CRANN, Trinity College Dublin, College Green, Dublin, Ireland.
| | - Cian Cummins
- AMBER Centre & CRANN, Trinity College Dublin, College Green, Dublin, Ireland.
| | - Sozaraj Rasappa
- AMBER Centre & CRANN, Trinity College Dublin, College Green, Dublin, Ireland.
| | | | - Mathieu Salaun
- Laboratoire des Technologies de la Microelectronique (CNRS), 38054 Grenoble, France.
| | - Marc Zelsmann
- Laboratoire des Technologies de la Microelectronique (CNRS), 38054 Grenoble, France.
| | - George Liontos
- Department of Materials Science Engineering, University of Ioannina, University Campus-Dourouti, 45110 Ioannina, Greece.
| | - Konstantinos Ntetsikas
- Department of Materials Science Engineering, University of Ioannina, University Campus-Dourouti, 45110 Ioannina, Greece.
| | - Apostolos Avgeropoulos
- Department of Materials Science Engineering, University of Ioannina, University Campus-Dourouti, 45110 Ioannina, Greece.
| | - Michael A Morris
- AMBER Centre & CRANN, Trinity College Dublin, College Green, Dublin, Ireland.
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Nickmans K, Schenning APHJ. Directed Self-Assembly of Liquid-Crystalline Molecular Building Blocks for Sub-5 nm Nanopatterning. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2018; 30:1703713. [PMID: 29052916 DOI: 10.1002/adma.201703713] [Citation(s) in RCA: 34] [Impact Index Per Article: 5.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/04/2017] [Revised: 07/26/2017] [Indexed: 06/07/2023]
Abstract
The thin-film directed self-assembly of molecular building blocks into oriented nanostructure arrays enables next-generation lithography at the sub-5 nm scale. Currently, the fabrication of inorganic arrays from molecular building blocks is restricted by the limited long-range order and orientation of the materials, as well as suitable methodologies for creating lithographic templates at sub-5 nm dimensions. In recent years, higher-order liquid crystals have emerged as functional thin films for organic electronics, nanoporous membranes, and templated synthesis, which provide opportunities for their use as lithographic templates. By choosing examples from these fields, recent progress toward the design of molecular building blocks is highlighted, with an emphasis on liquid crystals, to access sub-5 nm features, their directed self-assembly into oriented thin films, and, importantly, the fabrication of inorganic arrays. Finally, future challenges regarding sub-5 nm patterning with liquid crystals are discussed.
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Affiliation(s)
- Koen Nickmans
- Laboratory of Functional Organic Materials and Devices, Department of Chemical Engineering and Chemistry, Eindhoven University of Technology, P.O. Box 513, 5600, MB, Eindhoven, The Netherlands
| | - Albert P H J Schenning
- Laboratory of Functional Organic Materials and Devices, Department of Chemical Engineering and Chemistry, Eindhoven University of Technology, P.O. Box 513, 5600, MB, Eindhoven, The Netherlands
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12
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Bas SZ, Cummins C, Borah D, Ozmen M, Morris MA. Electrochemical Sensing of Hydrogen Peroxide Using Block Copolymer Templated Iron Oxide Nanopatterns. Anal Chem 2017; 90:1122-1128. [PMID: 29227090 DOI: 10.1021/acs.analchem.7b03244] [Citation(s) in RCA: 23] [Impact Index Per Article: 3.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/06/2023]
Abstract
A new enzyme-free sensor based on iron oxide (Fe3O4) nanodots fabricated on an indium tin oxide (ITO) substrate via a block copolymer template was developed for highly sensitive and selective detection of hydrogen peroxide (H2O2). The self-assembly-based process described here for Fe3O4 formation is a simple, cost-effective, and reproducible process. The H2O2 response of the fabricated electrodes was linear from 2.5 × 10-3 to 6.5 mM with a sensitivity of 191.6 μA mM-1cm-2 and a detection limit of 1.1 × 10-3 mM. The electrocatalytic activity of Fe3O4 nanodots toward the electroreduction of H2O2 was described by cyclic voltammetric and amperometric techniques. The sensor described here has a strong anti-interference ability to a variety of common biological and inorganic substances.
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Affiliation(s)
- Salih Z Bas
- Department of Chemistry, Selcuk University , 42075 Konya, Turkey
| | - Cian Cummins
- AMBER Centre and CRANN, Trinity College Dublin , Dublin 2, Ireland
| | - Dipu Borah
- AMBER Centre and CRANN, Trinity College Dublin , Dublin 2, Ireland
| | - Mustafa Ozmen
- Department of Chemistry, Selcuk University , 42075 Konya, Turkey
| | - Michael A Morris
- AMBER Centre and CRANN, Trinity College Dublin , Dublin 2, Ireland
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13
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Cheng LC, Bai W, Fernandez Martin E, Tu KH, Ntetsikas K, Liontos G, Avgeropoulos A, Ross CA. Morphology, directed self-assembly and pattern transfer from a high molecular weight polystyrene-block-poly(dimethylsiloxane) block copolymer film. NANOTECHNOLOGY 2017; 28:145301. [PMID: 28221161 DOI: 10.1088/1361-6528/aa61c9] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
The self-assembly of block copolymers with large feature sizes is inherently challenging as the large kinetic barrier arising from chain entanglement of high molecular weight (MW) polymers limits the extent over which long-range ordered microdomains can be achieved. Here, we illustrate the evolution of thin film morphology from a diblock copolymer of polystyrene-block-poly(dimethylsiloxane) exhibiting total number average MW of 123 kg mol-1, and demonstrate the formation of layers of well-ordered cylindrical microdomains under appropriate conditions of binary solvent mix ratio, commensurate film thickness, and solvent vapor annealing time. Directed self-assembly of the block copolymer within lithographically patterned trenches occurs with alignment of cylinders parallel to the sidewalls. Fabrication of ordered cobalt nanowire arrays by pattern transfer was also implemented, and their magnetic properties and domain wall behavior were characterized.
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Affiliation(s)
- Li-Chen Cheng
- Department of Materials Science and Engineering, MIT, Cambridge MA 02139, United States of America
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14
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Borah D, Cummins C, Rasappa S, Watson SMD, Pike AR, Horrocks BR, Fulton DA, Houlton A, Liontos G, Ntetsikas K, Avgeropoulos A, Morris MA. Nanoscale silicon substrate patterns from self-assembly of cylinder forming poly(styrene)-block-poly(dimethylsiloxane) block copolymer on silane functionalized surfaces. NANOTECHNOLOGY 2017; 28:044001. [PMID: 27981945 DOI: 10.1088/1361-6528/28/4/044001] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
Poly(styrene)-block-poly(dimethylsiloxane) (PS-b-PDMS) is an excellent block copolymer (BCP) system for self-assembly and inorganic template fabrication because of its high Flory-Huggins parameter (χ ∼ 0.26) at room temperature in comparison to other BCPs, and high selective etch contrast between PS and PDMS block for nanopatterning. In this work, self-assembly in PS-b-PDMS BCP is achieved by combining hydroxyl-terminated poly(dimethylsiloxane) (PDMS-OH) brush surfaces with solvent vapor annealing. As an alternative to standard brush chemistry, we report a simple method based on the use of surfaces functionalized with silane-based self-assembled monolayers (SAMs). A solution-based approach to SAM formation was adopted in this investigation. The influence of the SAM-modified surfaces upon BCP films was compared with polymer brush-based surfaces. The cylinder forming PS-b-PDMS BCP and PDMS-OH polymer brush were synthesized by sequential living anionic polymerization. It was observed that silane SAMs provided the appropriate surface chemistry which, when combined with solvent annealing, led to microphase segregation in the BCP. It was also demonstrated that orientation of the PDMS cylinders may be controlled by judicious choice of the appropriate silane. The PDMS patterns were successfully used as an on-chip etch mask to transfer the BCP pattern to underlying silicon substrate with sub-25 nm silicon nanoscale features. This alternative SAM/BCP approach to nanopattern formation shows promising results, pertinent in the field of nanotechnology, and with much potential for application, such as in the fabrication of nanoimprint lithography stamps, nanofluidic devices or in narrow and multilevel interconnected lines.
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Affiliation(s)
- Dipu Borah
- Department of Chemistry, University College Cork, Cork, Ireland. Tyndall National Institute, Lee Maltings, Prospect Row, Cork, Ireland. AMBER, Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin 2, Ireland
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15
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Kim KS, Gunari N, MacNeil D, Finlay J, Callow M, Callow J, Walker GC. Aqueous-Based Fabrication of Low-VOC Nanostructured Block Copolymer Films as Potential Marine Antifouling Coatings. ACS APPLIED MATERIALS & INTERFACES 2016; 8:20342-20351. [PMID: 27388921 DOI: 10.1021/acsami.6b04629] [Citation(s) in RCA: 6] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
The ability to fabricate nanostructured films by exploiting the phenomenon of microphase separation has made block copolymers an invaluable tool for a wide array of coating applications. Standard approaches to engineering nanodomains commonly involve the application of organic solvents, either through dissolution or annealing protocols, resulting in the release of volatile organic compounds (VOCs). In this paper, an aqueous-based method of fabricating low-VOC nanostructured block copolymer films is presented. The reported procedure allows for the phase transfer of water insoluble triblock copolymer, poly(styrene-block-2 vinylpyridine-block-ethylene oxide) (PS-b-P2VP-b-PEO), from a water immiscible phase to an aqueous environment with the assistance of a diblock copolymeric phase transfer agent, poly(styrene-block-ethylene oxide) (PS-b-PEO). Phase transfer into the aqueous phase results in self-assembly of PS-b-P2VP-b-PEO into core-shell-corona micelles, which are characterized by dynamic light scattering techniques. The films that result from coating the micellar solution onto Si/SiO2 surfaces exhibit nanoscale features that disrupt the ability of a model foulant, a zoospore of Ulva linza, to settle. The multilayered architecture consists of a pH-responsive P2VP-"shell" which can be stimulated to control the size of these features. The ability of these nanostructured thin films to resist protein adsorption and serve as potential marine antifouling coatings is supported through atomic force microscopy (AFM) and analysis of the settlement of Ulva linza zoospore. Field trials of the surfaces in a natural environment show the inhibition of macrofoulants for 1 month.
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Affiliation(s)
- Kris S Kim
- Department of Chemistry, University of Toronto , Toronto, Ontario M5S 3H4, Canada
| | - Nikhil Gunari
- Department of Chemistry, University of Toronto , Toronto, Ontario M5S 3H4, Canada
| | - Drew MacNeil
- Department of Chemistry, University of Toronto , Toronto, Ontario M5S 3H4, Canada
| | - John Finlay
- School of Biosciences, University of Birmingham , Edgbaston, Birmingham B15 2TT, United Kingdom
| | - Maureen Callow
- School of Biosciences, University of Birmingham , Edgbaston, Birmingham B15 2TT, United Kingdom
| | - James Callow
- School of Biosciences, University of Birmingham , Edgbaston, Birmingham B15 2TT, United Kingdom
| | - Gilbert C Walker
- Department of Chemistry, University of Toronto , Toronto, Ontario M5S 3H4, Canada
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16
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Ghoshal T, Chaudhari A, Cummins C, Shaw MT, Holmes JD, Morris MA. Morphological evolution of lamellar forming polystyrene-block-poly(4-vinylpyridine) copolymers under solvent annealing. SOFT MATTER 2016; 12:5429-5437. [PMID: 27240904 DOI: 10.1039/c6sm00815a] [Citation(s) in RCA: 11] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/05/2023]
Abstract
In this work, we are reporting a very simple and efficient method to form lamellar structures of symmetric polystyrene-block-poly(4-vinylpyridine) (PS-b-P4VP) copolymer thin films with vertically (to the surface plane) orientated lamellae using a solvent annealing approach. The methodology does not require any brush chemistry to engineer a neutral surface and it is the block neutral nature of the film-solvent vapour interface that defines the orientation of the lamellae. The microphase separated structure of two different molecular weight lamellar forming PS-block-P4VP copolymers formed under solvent vapour annealing was monitored using atomic force microscopy (AFM) so as to understand the morphological changes of the films upon different solvent exposure. In particular, the morphology changes from micellar structures to well-defined microphase separated arrangements. The choice of solvent/s (single and dual solvent exposure) and the solvent annealing conditions (temperature, time etc.) has important effects on structural transitions of the films and it was found that a block neutral solvent was required to realize vertically aligned P4VP lamellae. The results of the structural variation of the phase separated nanostructured films through the exposure to ethanol are also described.
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Affiliation(s)
- Tandra Ghoshal
- Department of Chemistry and Tyndall National Institute, University College Cork, Cork, Ireland.
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17
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Choi JW, Li Z, Black CT, Sweat DP, Wang X, Gopalan P. Patterning at the 10 nanometer length scale using a strongly segregating block copolymer thin film and vapor phase infiltration of inorganic precursors. NANOSCALE 2016; 8:11595-601. [PMID: 27216015 DOI: 10.1039/c6nr01409g] [Citation(s) in RCA: 10] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/12/2023]
Abstract
In this work, we demonstrate the use of self-assembled thin films of the cylinder-forming block copolymer poly(4-tert-butylstyrene-block-2-vinylpyridine) to pattern high density features at the 10 nm length scale. This material's large interaction parameter facilitates pattern formation in single-digit nanometer dimensions. This block copolymer's accessible order-disorder transition temperature allows thermal annealing to drive the assembly of ordered 2-vinylpyridine cylinders that can be selectively complexed with the organometallic precursor trimethylaluminum. This unique chemistry converts organic 2-vinylpyridine cylinders into alumina nanowires with diameters ranging from 8 to 11 nm, depending on the copolymer molecular weight. Graphoepitaxy of this block copolymer aligns and registers sub-12 nm diameter nanowires to larger-scale rectangular, curved, and circular features patterned by optical lithography. The alumina nanowires function as a robust hard mask to withstand the conditions required for patterning the underlying silicon by plasma etching. We conclude with a discussion of some of the challenges that arise with using block copolymers for patterning at sub-10 nm feature sizes.
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Affiliation(s)
- Jonathan W Choi
- Department of Materials Science and Engineering, University of Wisconsin-Madison, Wisconsin 53706, USA.
| | - Zhaodong Li
- Department of Materials Science and Engineering, University of Wisconsin-Madison, Wisconsin 53706, USA.
| | - Charles T Black
- Center for Functional Nanomaterials, Brookhaven National Laboratory, New York 11973, USA
| | - Daniel P Sweat
- Department of Chemistry, University of Wisconsin-Madison, Wisconsin 53706, USA
| | - Xudong Wang
- Department of Materials Science and Engineering, University of Wisconsin-Madison, Wisconsin 53706, USA.
| | - Padma Gopalan
- Department of Materials Science and Engineering, University of Wisconsin-Madison, Wisconsin 53706, USA.
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18
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Giammaria TJ, Ferrarese Lupi F, Seguini G, Perego M, Vita F, Francescangeli O, Wenning B, Ober CK, Sparnacci K, Antonioli D, Gianotti V, Laus M. Micrometer-Scale Ordering of Silicon-Containing Block Copolymer Thin Films via High-Temperature Thermal Treatments. ACS APPLIED MATERIALS & INTERFACES 2016; 8:9897-9908. [PMID: 27020526 DOI: 10.1021/acsami.6b02300] [Citation(s) in RCA: 12] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/05/2023]
Abstract
Block copolymer (BCP) self-assembly is expected to complement conventional optical lithography for the fabrication of next-generation microelectronic devices. In this regard, silicon-containing BCPs with a high Flory-Huggins interaction parameter (χ) are extremely appealing because they form high-resolution nanostructures with characteristic dimensions below 10 nm. However, due to their slow self-assembly kinetics and low thermal stability, these silicon-containing high-χ BCPs are usually processed by solvent vapor annealing or in solvent-rich ambient at a low annealing temperature, significantly increasing the complexity of the facilities and of the procedures. In this work, the self-assembly of cylinder-forming polystyrene-block-poly(dimethylsiloxane-random-vinylmethylsiloxane) (PS-b-P(DMS-r-VMS)) BCP on flat substrates is promoted by means of a simple thermal treatment at high temperatures. Homogeneous PS-b-P(DMS-r-VMS) thin films covering the entire sample surface are obtained without any evidence of dewetting phenomena. The BCP arranges in a single layer of cylindrical P(DMS-r-VMS) nanostructures parallel-oriented with respect to the substrate. By properly adjusting the surface functionalization, the heating rate, the annealing temperature, and the processing time, one can obtain correlation length values larger than 1 μm in a time scale fully compatible with the stringent requirements of the microelectronic industry.
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Affiliation(s)
- Tommaso Jacopo Giammaria
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, 20864 Agrate Brianza, Italy
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Universitá del Piemonte Orientale "A. Avogadro" , Viale T. Michel 11, 15121 Alessandria, Italy
| | | | - Gabriele Seguini
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, 20864 Agrate Brianza, Italy
| | - Michele Perego
- Laboratorio MDM, IMM-CNR , Via C. Olivetti 2, 20864 Agrate Brianza, Italy
| | - Francesco Vita
- Dipartimento di Scienze e Ingegneria della Materia, dell'Ambiente ed Urbanistica and CNISM, Universitá Politecnica delle Marche , Via Brecce Bianche, 60131 Ancona, Italy
| | - Oriano Francescangeli
- Dipartimento di Scienze e Ingegneria della Materia, dell'Ambiente ed Urbanistica and CNISM, Universitá Politecnica delle Marche , Via Brecce Bianche, 60131 Ancona, Italy
| | - Brandon Wenning
- Department of Materials Science and Engineering, Cornell University , Bard Hall, Ithaca, New York 14853, United States
| | - Christopher K Ober
- Department of Materials Science and Engineering, Cornell University , Bard Hall, Ithaca, New York 14853, United States
| | - Katia Sparnacci
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Universitá del Piemonte Orientale "A. Avogadro" , Viale T. Michel 11, 15121 Alessandria, Italy
| | - Diego Antonioli
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Universitá del Piemonte Orientale "A. Avogadro" , Viale T. Michel 11, 15121 Alessandria, Italy
| | - Valentina Gianotti
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Universitá del Piemonte Orientale "A. Avogadro" , Viale T. Michel 11, 15121 Alessandria, Italy
| | - Michele Laus
- Dipartimento di Scienze e Innovazione Tecnologica (DISIT), Universitá del Piemonte Orientale "A. Avogadro" , Viale T. Michel 11, 15121 Alessandria, Italy
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19
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Frascaroli J, Seguini G, Spiga S, Perego M, Boarino L. Fabrication of periodic arrays of metallic nanoparticles by block copolymer templates on HfO2 substrates. NANOTECHNOLOGY 2015; 26:215301. [PMID: 25948389 DOI: 10.1088/0957-4484/26/21/215301] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/04/2023]
Abstract
Block copolymer-based templates can be exploited for the fabrication of ordered arrays of metal nanoparticles (NPs) with a diameter down to a few nanometers. In order to develop this technique on metal oxide substrates, we studied the self-assembly of polymeric templates directly on the HfO₂ surface. Using a random copolymer neutralization layer, we obtained an effective HfO₂ surface neutralization, while the effects of surface cleaning and annealing temperature were carefully examined. Varying the block copolymer molecular weight, we produced regular nanoporous templates with feature size variable between 10 and 30 nm and a density up to 1.5 × 10¹¹ cm⁻². With the adoption of a pattern transfer process, we produced ordered arrays of Pt and Pt/Ti NPs with diameters of 12, 21 and 29 nm and a constant size dispersion (σ) of 2.5 nm. For the smallest template adopted, the NP diameter is significantly lower than the original template dimension. In this specific configuration, the granularity of the deposited film probably influences the pattern transfer process and very small NPs of 12 nm were achieved without a significant broadening of the size distribution.
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Affiliation(s)
- Jacopo Frascaroli
- Laboratorio MDM, IMM-CNR, Via C. Olivetti 2, I-20864 Agrate Brianza (MB), Italy. NanoFacility, Divisione elettromagnetismo, INRiM, Strada delle Cacce 91, I-10135 Torino, Italy. Dipartimento di fisica, Università degli studi di Milano, Via Celoria 16, I-20133 Milano, Italy
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20
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Cummins C, Gangnaik A, Kelly RA, Borah D, O'Connell J, Petkov N, Georgiev YM, Holmes JD, Morris MA. Aligned silicon nanofins via the directed self-assembly of PS-b-P4VP block copolymer and metal oxide enhanced pattern transfer. NANOSCALE 2015; 7:6712-6721. [PMID: 25798892 DOI: 10.1039/c4nr07679f] [Citation(s) in RCA: 30] [Impact Index Per Article: 3.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/04/2023]
Abstract
'Directing' block copolymer (BCP) patterns is a possible option for future semiconductor device patterning, but pattern transfer of BCP masks is somewhat hindered by the inherently low etch contrast between blocks. Here, we demonstrate a 'fab' friendly methodology for forming well-registered and aligned silicon (Si) nanofins following pattern transfer of robust metal oxide nanowire masks through the directed self-assembly (DSA) of BCPs. A cylindrical forming poly(styrene)-block-poly(4-vinyl-pyridine) (PS-b-P4VP) BCP was employed producing 'fingerprint' line patterns over macroscopic areas following solvent vapor annealing treatment. The directed assembly of PS-b-P4VP line patterns was enabled by electron-beam lithographically defined hydrogen silsequioxane (HSQ) gratings. We developed metal oxide nanowire features using PS-b-P4VP structures which facilitated high quality pattern transfer to the underlying Si substrate. This work highlights the precision at which long range ordered ∼10 nm Si nanofin features with 32 nm pitch can be defined using a cylindrical BCP system for nanolithography application. The results show promise for future nanocircuitry fabrication to access sub-16 nm critical dimensions using cylindrical systems as surface interfaces are easier to tailor than lamellar systems. Additionally, the work helps to demonstrate the extension of these methods to a 'high χ' BCP beyond the size limitations of the more well-studied PS-b-poly(methyl methylacrylate) (PS-b-PMMA) system.
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Affiliation(s)
- Cian Cummins
- Materials Research Group, Department of Chemistry and Tyndall National Institute, University College Cork, Cork, Ireland.
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21
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Block Co-Polymers for Nanolithography: Rapid Microwave Annealing for Pattern Formation on Substrates. Polymers (Basel) 2015. [DOI: 10.3390/polym7040592] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/02/2023] Open
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22
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Microphase Separation of a PS- b-PFS Block Copolymer viaSolvent Annealing: Effect of Solvent, Substrate, and Exposure Time on Morphology. INT J POLYM SCI 2015. [DOI: 10.1155/2015/270891] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/17/2022] Open
Abstract
Block copolymer (BCP) lithography makes use of the microphase separation properties of BCPs to pattern ordered nanoscale features over large areas. This work presents the microphase separation of an asymmetric polystyrene-block-poly(ferrocenyl dimethylsilane) (PS-b-PFS) BCP that allows ordered arrays of nanostructures to be formed by spin casting PS-b-PFS on substrates and subsequent solvent annealing. The effects of the solvent annealing conditions on self-assembly and structural stability are discussed.
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23
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Cummins C, Mokarian-Tabari P, Holmes JD, Morris MA. Selective etching of polylactic acid in poly(styrene)-block-poly(d,l)lactide diblock copolymer for nanoscale patterning. J Appl Polym Sci 2014. [DOI: 10.1002/app.40798] [Citation(s) in RCA: 18] [Impact Index Per Article: 1.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 02/06/2023]
Affiliation(s)
- Cian Cummins
- Materials Research Group; Department of Chemistry and Tyndall National Institute; University College Cork; Cork Ireland
| | - Parvaneh Mokarian-Tabari
- Materials Research Group; Department of Chemistry and Tyndall National Institute; University College Cork; Cork Ireland
- Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN); Trinity College Dublin; Dublin Ireland
| | - Justin D. Holmes
- Materials Research Group; Department of Chemistry and Tyndall National Institute; University College Cork; Cork Ireland
- Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN); Trinity College Dublin; Dublin Ireland
| | - Michael A. Morris
- Materials Research Group; Department of Chemistry and Tyndall National Institute; University College Cork; Cork Ireland
- Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN); Trinity College Dublin; Dublin Ireland
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24
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Kim SY, Gwyther J, Manners I, Chaikin PM, Register RA. Metal-containing block copolymer thin films yield wire grid polarizers with high aspect ratio. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2014; 26:791-5. [PMID: 24123385 DOI: 10.1002/adma.201303452] [Citation(s) in RCA: 25] [Impact Index Per Article: 2.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/24/2013] [Indexed: 05/20/2023]
Abstract
Highly selective etch masks are formed by thin films of a polystyrene-b-poly(ferrocenylisopropylmethylsilane) diblock copolymer, PS-PFiPMS, containing hemicylindrical domains of PFiPMS. These domains, with a period of 35 nm, are readily aligned through mechanical shear. Aligned PS-PFiPMS templates are employed to fabricate high-aspect-ratio nanowire grids from amorphous silicon, which can polarize deep ultraviolet radiation, including 193 nm, at >90% efficiency.
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Affiliation(s)
- So Youn Kim
- Department of Chemical and Biological Engineering, Princeton University, Princeton, NJ, 08544, USA
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25
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Borah D, Simao CD, Senthamaraikannan R, Rasappa S, Francone A, Lorret O, Salaun M, Kosmala B, Kehagias N, Zelsmann M, Sotomayor-Torres CM, Morris MA. Soft-graphoepitaxy using nanoimprinted polyhedral oligomeric silsesquioxane substrates for the directed self-assembly of PS-b-PDMS. Eur Polym J 2013. [DOI: 10.1016/j.eurpolymj.2013.08.011] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/26/2022]
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26
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Sinturel C, Vayer M, Morris M, Hillmyer MA. Solvent Vapor Annealing of Block Polymer Thin Films. Macromolecules 2013. [DOI: 10.1021/ma400735a] [Citation(s) in RCA: 422] [Impact Index Per Article: 38.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/30/2022]
Affiliation(s)
- Christophe Sinturel
- Centre de Recherche sur la Matière Divisée, CNRS-Université d’Orléans, 1 B
rue de la Férollerie, 45071 Orléans Cedex 2, France
| | - Marylène Vayer
- Centre de Recherche sur la Matière Divisée, CNRS-Université d’Orléans, 1 B
rue de la Férollerie, 45071 Orléans Cedex 2, France
| | - Michael Morris
- Department of Chemistry, University College Cork, Cork, Ireland
| | - Marc A. Hillmyer
- Department of Chemistry, 207 Pleasant
St. SE, University of Minnesota, Minneapolis,
Minnesota 55455, United States
- LE STUDIUM Institute for Advanced Studies, 3D avenue de la recherche scientifique, 45071 Orléans Cedex
2, France
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27
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Minegishi S, Naruoka T, Nagai T. Directed Self Assembly Materials for Semiconductor Lithography. J PHOTOPOLYM SCI TEC 2013. [DOI: 10.2494/photopolymer.26.793] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
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