Chemical nucleation for CVD diamond growth

Ultrathin Diamond Nanofilms-Development, Challenges, and Applications

Diamond is a highly attractive material for ample applications in material science, engineering, chemistry, and biology because of its favorable properties. The advent of conductive diamond coatings and the steady demand for miniaturization in a plethora of economic and scientific fields resulted in the impetus for interdisciplinary research to develop intricate deposition techniques for thin (≤1000 nm) and ultra-thin (≤100 nm) diamond films on non-diamond substrates. By virtue of the lowered thickness, diamond coatings feature high optical transparency in UV-IR range. Combined with their semi-conductivity and mechanical robustness, they are promising candidates for solar cells, optical devices, transparent electrodes, and photochemical applications. In this review, the difficulty of (ultra-thin) diamond film development and production, introduction of important stepping stones for thin diamond synthesis, and summarization of the main nucleation procedures for diamond film synthesis are elucidated. Thereafter, applications of thin diamond coatings are highlighted with a focus on applications relying on ultrathin diamond coatings, and the excellent properties of the diamond exploited in said applications are discussed, thus guiding the reader and enabling the reader to quickly get acquainted with the research field of ultrathin diamond coatings.

Nucleation of diamond films on heterogeneous substrates: a review

Diamond thin films are known to have properties similar to bulk diamond and have applications in both industry and fundamental studies in academia. The high surface energy of diamond makes it extremely difficult to grow diamond films on foreign substrates. Hence, to grow diamond films on non-diamond substrates, a nucleation step is needed. In this review various techniques used for diamond nucleation/seeding will be discussed. At present electrostatic seeding by diamond nanoparticles is the most commonly used seeding technique for nanocrystalline growth. In this technique the substrate is dipped in a nanodiamond solution to form a mono layer of diamond seeds. These seeds when exposed to appropriate conditions grow to form diamond layers. This technique is suitable for most substrates. For heteroepitaxial growth, bias enhanced nucleation is the primary technique. In this technique the substrate is biased to form diamond nuclei in the initial stages of growth. This technique can be used for any conducting flat surface. For growth on ceramics, polishing by diamond grit or electrostatic seeding can be used. Polishing the ceramics with diamond powder leaves small diamond particles embedded in the substrate. These small particles then act as seeds for subsequent diamond growth. Apart from these techniques, chemical nucleation, interlayer driven nucleation and mixed techniques have been discussed. The advantages and disadvantages of individual techniques have also been discussed.

Growth of diamond film on heterogeneous substrates assisted by nucleation/seeding.

Chemical Nucleation of Diamond Films

With the large differences in surface energy between film and substrate in combination with the low sticking coefficient of hydrocarbon radicals, nanocrystalline diamond growth on foreign substrates typically results in poor nucleation densities. A seeding technique is therefore required to realize pinhole-free and thin coalesced films. In this work, a chemical nucleation method for growth of diamond on nondiamond substrates based on 2,2-divinyladamantane is shown. After treating with the carbon-containing DVA, the chemically treated wafers were exposed to low-power-density plasma, known as the incubation phase, to facilitate the formation of diamond nucleation sites followed by a high-power-density growth regime to produce coalesced films. The resulting films demonstrate high crystallinity, whereas the Raman spectra suggest high-quality diamond with low sp² content.