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Son S, Baek JY, Choi CM, Choi MC, Kim S. Enhancing ToF-SIMS OLED Data Analysis with Neural Networks and Mathematical Spectral Mixing. JOURNAL OF THE AMERICAN SOCIETY FOR MASS SPECTROMETRY 2024; 35:1390-1393. [PMID: 38820051 DOI: 10.1021/jasms.4c00158] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/02/2024]
Abstract
This study presents a method employing artificial neural networks (ANN) for automated interpretation and depth profiling of organic multilayers using a limited set of time-of-flight secondary ion mass spectrometry (ToF-SIMS) spectra. To overcome the challenges of acquiring massive data sets for OLEDs, training data was generated by combining existing ToF-SIMS data sets with mathematically generated spectra. The classification model achieved an impressive 99.9% accuracy in identifying the mixed layers of the OLED dyes. The study demonstrates the synergy of ToF-SIMS and ANN analysis for effective classification and depth profiling of the OLED layers, providing valuable insights for the development and optimization of organic electronic devices.
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Affiliation(s)
- Seungwoo Son
- Department of Chemistry, Kyungpook National University, Daegu 41566, Republic of Korea
| | - Ji Young Baek
- Center of Scientific Instrumentation, Korea Basic Science Institute, Ochang Center, Chungbuk 28119, Republic of Korea
| | - Chang Min Choi
- Center of Scientific Instrumentation, Korea Basic Science Institute, Ochang Center, Chungbuk 28119, Republic of Korea
| | - Myoung Choul Choi
- Center of Scientific Instrumentation, Korea Basic Science Institute, Ochang Center, Chungbuk 28119, Republic of Korea
| | - Sunghwan Kim
- Department of Chemistry, Kyungpook National University, Daegu 41566, Republic of Korea
- Mass Spectrometry Convergence Research Center and Green-Nano Materials Research Center, Daegu, 41566, Republic of Korea
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Trindade GF, Sul S, Kim J, Havelund R, Eyres A, Park S, Shin Y, Bae HJ, Sung YM, Matjacic L, Jung Y, Won J, Jeon WS, Choi H, Lee HS, Lee JC, Kim JH, Gilmore IS. Direct identification of interfacial degradation in blue OLEDs using nanoscale chemical depth profiling. Nat Commun 2023; 14:8066. [PMID: 38052834 DOI: 10.1038/s41467-023-43840-9] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 01/20/2022] [Accepted: 11/21/2023] [Indexed: 12/07/2023] Open
Abstract
Understanding the degradation mechanism of organic light-emitting diodes (OLED) is essential to improve device performance and stability. OLED failure, if not process-related, arises mostly from chemical instability. However, the challenges of sampling from nanoscale organic layers and interfaces with enough analytical information has hampered identification of degradation products and mechanisms. Here, we present a high-resolution diagnostic method of OLED degradation using an Orbitrap mass spectrometer equipped with a gas cluster ion beam to gently desorb nanometre levels of materials, providing unambiguous molecular information with 7-nm depth resolution. We chemically depth profile and analyse blue phosphorescent and thermally-activated delayed fluorescent (TADF) OLED devices at different degradation levels. For OLED devices with short operational lifetimes, dominant chemical degradation mainly relate to oxygen loss of molecules that occur at the interface between emission and electron transport layers (EML/ETL) where exciton distribution is maximised, confirmed by emission zone measurements. We also show approximately one order of magnitude increase in lifetime of devices with slightly modified host materials, which present minimal EML/ETL interfacial degradation and show the method can provide insight for future material and device architecture development.
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Affiliation(s)
| | - Soohwan Sul
- Samsung Advanced Institute of Technology, Samsung Electronics Co., Ltd., 130 Samsung-ro, Suwon, 16678, Republic of Korea
| | - Joonghyuk Kim
- Samsung Advanced Institute of Technology, Samsung Electronics Co., Ltd., 130 Samsung-ro, Suwon, 16678, Republic of Korea
| | - Rasmus Havelund
- National Physical Laboratory, NiCE-MSI, Teddington, TW11 0LW, UK
| | - Anya Eyres
- National Physical Laboratory, NiCE-MSI, Teddington, TW11 0LW, UK
| | - Sungjun Park
- Samsung Advanced Institute of Technology, Samsung Electronics Co., Ltd., 130 Samsung-ro, Suwon, 16678, Republic of Korea
| | - Youngsik Shin
- Samsung Advanced Institute of Technology, Samsung Electronics Co., Ltd., 130 Samsung-ro, Suwon, 16678, Republic of Korea
| | - Hye Jin Bae
- Samsung Advanced Institute of Technology, Samsung Electronics Co., Ltd., 130 Samsung-ro, Suwon, 16678, Republic of Korea
| | - Young Mo Sung
- Samsung Advanced Institute of Technology, Samsung Electronics Co., Ltd., 130 Samsung-ro, Suwon, 16678, Republic of Korea
| | - Lidija Matjacic
- National Physical Laboratory, NiCE-MSI, Teddington, TW11 0LW, UK
| | - Yongsik Jung
- Samsung Advanced Institute of Technology, Samsung Electronics Co., Ltd., 130 Samsung-ro, Suwon, 16678, Republic of Korea
| | - Jungyeon Won
- Samsung Advanced Institute of Technology, Samsung Electronics Co., Ltd., 130 Samsung-ro, Suwon, 16678, Republic of Korea
| | - Woo Sung Jeon
- Samsung Advanced Institute of Technology, Samsung Electronics Co., Ltd., 130 Samsung-ro, Suwon, 16678, Republic of Korea
| | - Hyeonho Choi
- Samsung Advanced Institute of Technology, Samsung Electronics Co., Ltd., 130 Samsung-ro, Suwon, 16678, Republic of Korea
| | - Hyo Sug Lee
- Samsung Advanced Institute of Technology, Samsung Electronics Co., Ltd., 130 Samsung-ro, Suwon, 16678, Republic of Korea
| | - Jae-Cheol Lee
- Samsung Advanced Institute of Technology, Samsung Electronics Co., Ltd., 130 Samsung-ro, Suwon, 16678, Republic of Korea
- Korea Research Institute of Material Property Analysis (KRIMPA), 712, Nongseo-dong 455, Yongin, 17111, Republic of Korea
| | - Jung-Hwa Kim
- Samsung Advanced Institute of Technology, Samsung Electronics Co., Ltd., 130 Samsung-ro, Suwon, 16678, Republic of Korea.
| | - Ian S Gilmore
- National Physical Laboratory, NiCE-MSI, Teddington, TW11 0LW, UK.
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