Collisions of Silylium Cations with Hydroxyl-Terminated and Other Self-Assembled Monolayer Surfaces: Reactions, Dissociation, and Surface Characterization

Soft- and reactive landing of ions onto surfaces: Concepts and applications

Soft- and reactive landing of mass-selected ions is gaining attention as a promising approach for the precisely-controlled preparation of materials on surfaces that are not amenable to deposition using conventional methods. A broad range of ionization sources and mass filters are available that make ion soft-landing a versatile tool for surface modification using beams of hyperthermal (<100 eV) ions. The ability to select the mass-to-charge ratio of the ion, its kinetic energy and charge state, along with precise control of the size, shape, and position of the ion beam on the deposition target distinguishes ion soft landing from other surface modification techniques. Soft- and reactive landing have been used to prepare interfaces for practical applications as well as precisely-defined model surfaces for fundamental investigations in chemistry, physics, and materials science. For instance, soft- and reactive landing have been applied to study the surface chemistry of ions isolated in the gas-phase, prepare arrays of proteins for high-throughput biological screening, produce novel carbon-based and polymer materials, enrich the secondary structure of peptides and the chirality of organic molecules, immobilize electrochemically-active proteins and organometallics on electrodes, create thin films of complex molecules, and immobilize catalytically active organometallics as well as ligated metal clusters. In addition, soft landing has enabled investigation of the size-dependent behavior of bare metal clusters in the critical subnanometer size regime where chemical and physical properties do not scale predictably with size. The morphology, aggregation, and immobilization of larger bare metal nanoparticles, which are directly relevant to the design of catalysts as well as improved memory and electronic devices, have also been studied using ion soft landing. This review article begins in section 1 with a brief introduction to the existing applications of ion soft- and reactive landing. Section 2 provides an overview of the ionization sources and mass filters that have been used to date for soft landing of mass-selected ions. A discussion of the competing processes that occur during ion deposition as well as the types of ions and surfaces that have been investigated follows in section 3. Section 4 discusses the physical phenomena that occur during and after ion soft landing, including retention and reduction of ionic charge along with factors that impact the efficiency of ion deposition. The influence of soft landing on the secondary structure and biological activity of complex ions is addressed in section 5. Lastly, an overview of the structure and mobility as well as the catalytic, optical, magnetic, and redox properties of bare ionic clusters and nanoparticles deposited onto surfaces is presented in section 6.

A supersonic molecular beam study of the reaction of tetrakis(dimethylamido)titanium with self-assembled alkyltrichlorosilane monolayers

The reaction of a transition metal coordination complex, Ti[N(CH(3))(2)](4), with self-assembled monolayers (SAMs) possessing-OH, -NH(2), and -CH(3) terminations has been examined using supersonic molecular beam techniques. The emphasis here is on how the reaction probability varies with incident kinetic energy (E(i)=0.4-2.07 eV) and angle of incidence (theta(i)=0 degrees -60 degrees ). The most reactive surface is the substrate underlying the SAMs-SiO(2) with a high density of -OH(a) (>5 x 10(14) cm(-2)), "chemical oxide." On chemical oxide, the dynamics of adsorption are well described by trapping, precursor-mediated adsorption, and the initial probability of adsorption depends only weakly on E(i) and theta(i). The dependence of the reaction probability on substrate temperature is well described by a model involving an intrinsic precursor state, where the barrier for dissociation is approximately 0.2-0.5 eV below the vacuum level. Reaction with the SAMs is more complicated. On the SAM with the unreactive, -CH(3), termination, reactivity decreases continuously with increasing E(i) while increasing with increasing theta(i). The data are best interpreted by a model where the Ti[N(CH(3))(2)](4) must first be trapped on the surface, followed by diffusion through the SAM and reaction at the SAMSiO(2) interface with residual -OH(a). This process is not activated by E(i) and most likely occurs in defective areas of the SAM. On the SAMs with reactive end groups, the situation is quite different. On both the-OH and -NH(2) SAMs, the reaction with the Ti[N(CH(3))(2)](4) as a function of E(i) passes through a minimum near E(i) approximately 1.0 eV. Two explanations for this intriguing finding are made-one involves the participation of a direct dissociation channel at sufficiently high E(i). A second explanation involves a new mechanism for trapping, which could be termed penetration facilitated trapping, where the Ti[N(CH(3))(2)](4) penetrates the near surface layers, a process that is activated as the molecules in the SAM must be displaced from their equilibrium positions.

Reaction of 5−40 eV Ions with Self-Assembled Monolayers

The reaction of 5-40 eV O(+) and Ne(+) ions with alkanethiolate and semifluorinated alkanethiolate self-assembled monolayers (SAMs) is studied under ultrahigh vacuum (UHV) conditions. Whereas Ne(+) simply sputters fragments from the surface, O(+) can also abstract surface atoms and break C-C bonds in both the hydrocarbon and fluorocarbon SAM chains. Isotopic labeling experiments reveal that O(+) initially abstracts hydrogen atoms from the outermost two carbon atoms on an alkanethiolate SAM chain. However, the position of the isotopic label quickly becomes scrambled along the chain as the SAM is damaged through continuous ion bombardment. Scanning tunneling microscopy (STM) monitors changes in the SAM conformational structure at various stages during 5 eV ion bombardment. STM images indicate that O(+) reacts less efficiently with dodecanethiolate molecules packed internally within a structural domain than it does with molecules adsorbed at domain boundaries or near defect sites. STM images recorded after Ne(+) bombardment suggest that Ne(+) attacks the SAM exclusively near the domain boundaries. Taken collectively, these experiments advance our understanding of the degradation pathways suffered by polymeric satellite materials in the low-earth orbit (LEO) space environment.

Reactive collisions of hyperthermal energy molecular ions with solid surfaces

Recent experimental advances have uncovered many of the diverse reaction pathways following an energetic collision between a molecular ion and a solid surface. Hyperthermal translational energies (5-500 eV) are sufficient to activate a number of chemical transformations in the near-surface region, including charge transfer, dissociation, abstraction, and deposition. State-of-the-art scattering studies probe the consumption and disposal of energy and the effects of approach geometry and surface electronic structure on the operative reaction mechanisms. These fundamental investigations provide insight relevant to the fabrication of microelectronics devices, the interaction of space vehicles with the earth's atmosphere, and the development of analytical techniques in mass spectrometry.

Silylation of an OH-terminated self-assembled monolayer surface through low-energy collisions of ions: a novel route to synthesis and patterning of surfaces

Using a multi-sector ion-surface scattering mass spectrometer, reagent ions of the general form SiR(3) (+) were mass and energy selected and then made to collide with a hydroxy-terminated self-assembled monolayer (HO-SAM) surface at energies of approximately 15 eV. These ion-surface interactions result in covalent transformation of the terminal hydroxy groups at the surface into the corresponding silyl ethers due to Si--O bond formation. The modified surface was characterized in situ by chemical sputtering, a low-energy ion-surface scattering experiment. These data indicate that the ion-surface reactions have high yields (i.e. surface reactants converted to products). Surface reactions with Si(OCH(3))(3) (+), followed by chemical sputtering using CF(3) (+), yielded the reagent ion, Si(OCH(3))(3) (+), and several of its fragments. Other sputtered ions, namely SiH(OCH(3))(2)OH(2) (+) and SiH(2)(OCH(3))OH(2) (+), contain the newly formed Si--O bond and provide direct evidence for the covalent modification reaction. Chemical sputtering of modified surfaces, performed using CF(3) (+), was evaluated over a range of collision energies. The results showed that the energy transferred to the sputtered ions, as measured by their extent of fragmentation in the scattered ion mass spectra, was essentially independent of the collision energy of the projectile, thus pointing to the occurrence of reactive sputtering.A set of silyl cations, including SiBr(3) (+), Si(C(2)H(3))(3) (+) and Si(CH(3))(2)F(+), were similarly used to modify the HO-SAM surface at low collision energies. A reaction mechanism consisting of direct electrophilic attack by the cationic projectiles is supported by evidence of increased reactivity for these reagent ions with increases in the calculated positive charge at the electron-deficient silicon atom of each of these cations. In a sequential set of reactions, 12 eV deuterated trimethylsilyl cations, Si(CD(3))(3) (+), were used first as the reagent ions to modify covalently a HO-SAM surface. Subsequently, 70 eV SiCl(3) (+) ions were used to modify the surface further. In addition to yielding sputtered ions of the modified surface, SiCl(3) (+) reacted with both modified and unmodified groups on the surface, giving rise not only to such scattered product ions as SiCl(2)OH(+) and SiCl(2)H(+), but also to SiCl(2)CD(3) (+) and SiCl(2)D(+). This result demonstrates that selective, multi-step reactions can be performed at a surface through low-energy ionic collisions. Such processes are potentially useful for the construction of novel surfaces from a monolayer substrate and for chemical patterning of surfaces with functional groups.