Direct C−C Bond Breaking in the Reaction of O(3P) with Flouropolymers in Low Earth Orbit

Hyperthermal atomic oxygen durable transparent silicon-reinforced polyimide

A clear poly(amic acid) was reinforced by a trisilanolphenyl polyhedral oligomeric silsesquioxane (POSS) by direct dissolution, and transparent silicon-reinforced polyimide (Si-RPI) films with different POSS loadings were obtained after curing, showing high transmittance of >90% within 380–800 nm. The Si-RPI films were exposed to a ground hyperthermal atomic oxygen (AO) beam. The erosion depths and derived erosion yields of the materials decreased with POSS loadings. At a 20 wt% POSS loading, the Si-RPI showed an erosion yield of 0.13 × 10−24 cm3 atom−1 at a fluence of 2.79 × 1020 O atoms cm−2. Surface morphology and element composition characterization on Si-RPI indicated that SiOx-based passivating layers were formed on surfaces upon the hyperthermal AO attack. This study suggests a facile way of reinforcing Si into transparent polyimide for a promising candidate of spacecraft coating material operating in low Earth orbit.

Vacuum Ultraviolet Radiation in Sources of Hyperthermal Atomic Oxygen. Photodestruction of Polytetrafluoroethylene (PTFE) and Teflon FEP for hdication of this Radiation

Most facilities for testing the stability of spacecraft materials under attack by fast atomic oxygen (AO) are based on the generation of hypersonic beams of AO in nozzle sources with the use of continuous electrical discharges or in laser pulse-induced breakdown of the gaseous oxygen. In both cases, the sources of fast AO are simultaneously quite intense sources of vacuum ultraviolet (VUV) radiation. In the present study the intensity of VUV radiation with wavelengths > 115 nm from fast AO source were directly measured in the Central Aerohydrodynamic Institute facility VAT- 103. The intensity of this VUV radiation at the nozzle exit was shown to be almost equal to the intensity of the commercial lamp XeR-2 emitting at 147.0 nm (at its window). This VUV radiation can take part in destruction and erosion of polymer materials simulating the oxydative effects of fast AO. Its contribution to observed mass losses is greatly dependent on the material under test. For polymers consisting of carbon, hydrogen, oxygen and nitrogen the main role in erosion is played by fast AO. The decisive role of VUV radiation is shown in the erosion of fully fluorinated polymers. The mass losses of Teflon and Teflon FEP films in facilities for generation of fast AO are suggested as a means of measuring the VUV radiation dose in these facilities. The main features of mass losses that depend on duration of VUV irradiation are formulated. They are based on the previously proposed model of mass losses from these polymers during VUV photodestruction. The key feature of this model is the limited rate of photofragment evaporation (sublimation) into vacuum.

Theoretical investigation of atomic oxygen erosion mechanisms of 1,3-didecyl cyclopentane, 1,3-dioctyldodecyl cyclopentane and alkylated cyclopentane

Atomic oxygen erosion mechanisms of 1,3-didecyl cyclopentane, 1,3-dioctyldodecyl cyclopentane and alkylated cyclopentane.

Atomic oxygen effects on POSS polyimides in low earth orbit

Kapton polyimde is extensively used in solar arrays, spacecraft thermal blankets, and space inflatable structures. Upon exposure to atomic oxygen in low Earth orbit (LEO), Kapton is severely eroded. An effective approach to prevent this erosion is to incorporate polyhedral oligomeric silsesquioxane (POSS) into the polyimide matrix by copolymerizing POSS monomers with the polyimide precursor. The copolymerization of POSS provides Si and O in the polymer matrix on the nano level. During exposure of POSS polyimide to atomic oxygen, organic material is degraded, and a silica passivation layer is formed. This silica layer protects the underlying polymer from further degradation. Laboratory and space-flight experiments have shown that POSS polyimides are highly resistant to atomic-oxygen attack, with erosion yields that may be as little as 1% those of Kapton. The results of all the studies indicate that POSS polyimide would be a space-survivable replacement for Kapton on spacecraft that operate in the LEO environment.

Erosion of FEP Teflon and PMMA by VUV radiation and hyperthermal O or Ar atoms

A combination of beam-surface-scattering, quartz-crystal-microbalance, and surface-recession experiments was conducted to study the effects of various combinations of O atoms [in the O((3)P) ground state], Ar atoms, and vacuum ultraviolet (VUV) light on fluorinated ethylene-propylene copolymer (FEP) Teflon and poly(methyl methacrylate) (PMMA). A laser-breakdown source was used to create hyperthermal beams containing O and O(2) or Ar. A D(2) lamp provided a source of VUV light. O atoms with 4 eV of translational energy or less did not react with a pristine FEP Teflon surface. Volatile O-containing reaction products were observed when the O-atom energy was higher than 4.5 eV, and the signal increased with the O-atom energy. Significant erosion of FEP Teflon ( approximately 20% of Kapton H) was observed when it was exposed to the hyperthermal O/O(2) beam with an average O-atom energy of 5.4 eV. FEP Teflon and PMMA that were exposed to VUV light alone exhibited much less mass loss. Collision-induced dissociation by hyperthermal Ar atoms also caused mass loss, similar in magnitude to that caused by VUV light. There were no observed synergistic effects when VUV light or Ar bombardment was combined with O/O(2) exposure. For both FEP Teflon and PMMA, the erosion yields caused by simultaneous exposure to O/O(2) and either VUV light or Ar atoms could be approximately predicted by adding the erosion yield caused by O/O(2), acting individually, to the erosion yield caused by the individual action of either VUV light or Ar atoms.

Beam-surface scattering studies of the individual and combined effects of VUV radiation and hyperthermal O, O2, or Ar on FEP Teflon surfaces

Beam-surface scattering experiments were used to probe products that scattered from FEP Teflon surfaces during bombardment by various combinations of atomic and molecular oxygen, Ar atoms, and vacuum ultraviolet (VUV) light. A laser-breakdown source was used to create hyperthermal (translational energies in the range 4-13 eV) beams of argon and atomic/molecular oxygen. The average incidence energy of these beams was tunable and was controlled precisely with a synchronized chopper wheel. A filtered deuterium lamp provided a source of VUV light in a narrow-wavelength range centered at 161 nm. Volatile products that exited the surfaces were monitored with a rotatable mass spectrometer detector. Hyperthermal O atoms with average translational energies above approximately 4 eV may react directly with a pristine FEP Teflon surface, and the reactivity appears to increase with the translational energy of the incident O atoms. VUV light or highly energetic collisions of O2 or Ar may break chemical bonds and lead to the ejection of volatile products; the ejection of volatile products is enhanced when the surface is subjected to VUV light and energetic collisions simultaneously. Exposure to VUV light or to hyperthermal O2 or Ar may increase the reactivity of an FEP Teflon surface to O atoms.

Surface Reactions of Molecular and Atomic Oxygen with Carbon Phosphide Films

The surface reactions of atomic and molecular oxygen with carbon phosphide films have been studied using X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). Carbon phosphide films were produced by ion implantation of trimethylphosphine into polyethylene. Atmospheric oxidation of carbon phosphide films was dominated by phosphorus oxidation and generated a carbon-containing phosphate surface film. This oxidized surface layer acted as an effective diffusion barrier, limiting the depth of phosphorus oxidation within the carbon phosphide film to < 3 nm. The effect of atomic oxygen (AO) exposure on this oxidized carbon phosphide layer was subsequently probed in situ using XPS. Initially AO exposure resulted in a loss of carbon atoms from the surface, but increased the surface concentration of phosphorus atoms as well as the degree of phosphorus oxidation. For more prolonged AO exposures, a highly oxidized phosphate surface layer formed that appeared to be inert toward further AO-mediated erosion. By utilizing phosphorus-containing hydrocarbon thin films, the phosphorus oxides produced during exposure to AO were found to desorb at temperatures >500 K under vacuum conditions. Results from this study suggest that carbon phosphide films can be used as AO-resistant surface coatings on polymers.

Atomic oxygen reactions with semifluorinated and n-alkanethiolate self-assembled monolayers

The interaction of atomic oxygen (O(3P)) with semifluorinated self-assembled monolayers (CF-SAMs), two different n-alkanethiolate self-assembled monolayers, and a carbonaceous overlayer derived from an x-ray modified n-alkanethiolate SAM have been studied using in situ x-ray photoelectron spectroscopy. For short atomic oxygen exposures, CF-SAMs remain intact, an effect ascribed to the inertness of C-F and C-C bonds toward atomic oxygen and the well-ordered structure of the CF-SAMs. Following this initial induction period, atomic oxygen permeates through the CF3(CF2)7 overlayer and initiates reactions at the film/substrate interface, evidenced by the formation of sulfonate (RSO3) species and Au2O3. These reactions lead to the desorption of intact adsorbate chains, evidenced by the loss of carbon and fluorine from the film while the C(1s) spectral envelope and the C(1s)/F(1s) ratio remain virtually constant. In contrast, the reactivity of atomic oxygen with alkanethiolate SAMs is initiated at the vacuum/film interface, producing oxygen-containing carbon functional groups. Subsequent reactions of these new species with atomic oxygen lead to erosion of the hydrocarbon film. Experiments on the different hydrocarbon-based films reveal that the atomic oxygen-induced kinetics are influenced by the thickness as well as the structural and chemical characteristics of the hydrocarbon overlayer. Results from this investigation are also discussed in the context of material erosion by AO in low Earth orbit.