Determination of the Rate Constant for the Radical−Radical Reaction CN(X2Σ+) + OH(X2Π) at 292 K

Removal of NO in NO/N2, NO/N2/O2, NO/CH4/N2, and NO/CH4/O2/N2 Systems by Flowing Microwave Discharges

In this paper, continuing previous work, we report on experiments carried out to investigate the removal of NO from simulated flue gas in nonthermal plasmas. The plasma-induced decomposition of small concentrations of NO in N2 used as the carrier gas and O2 and CH4 as minority components has been studied in a surface wave discharge induced with a surfatron launcher. The reaction products and efficiency have been monitored by mass spectrometry as a function of the composition of the mixture. NO is effectively decomposed into N2 and O2 even in the presence of O2, provided always that enough CH4 is also present in the mixture. Other majority products of the plasma reactions under these conditions are NH3, CO, and H2. In the absence of O2, decomposition of NO also occurs, although in that case HCN accompanies the other reaction products as a majority component. The plasma for the different reaction mixtures has been characterized by optical emission spectroscopy. Intermediate excited species of NO*, C*, CN*, NH*, and CH* have been monitored depending on the gas mixture. The type of species detected and their evolution with the gas composition are in agreement with the reaction products detected in each case. The observations by mass spectrometry and optical emission spectroscopy are in agreement with the kinetic reaction models available in literature for simple plasma reactions in simple reaction mixtures.

Determination of the Rate Constant for the Radical−Radical Reaction NCO(X2Π) + CH3(X2A2‘ ‘) at 293 K and an Estimate of Possible Product Channels

The rate constant for the reaction of the cyanato radical, NCO(X2Pi), with the methyl radical, CH3(X2A2' '), has been measured to be (2.1 +/- 1.3(-0.80)) x 10(-10) cm3 molecule(-1) s(-1), where the uncertainty includes both random and systematic errors at the 68% confidence level. The measurements were conducted over a pressure range of 2.8-4.3 Torr of CH4 and at a temperature of 293 +/- 2 K. The radicals were generated by the 248-nm photolysis of ClNCO in a large excess of CH4. The subsequent rapid reaction, Cl + CH4, generated the CH3 radical. The rate constant for the Cl + CH4 reaction was measured to be (9.2 +/- 0.2) x 10(-14) cm3 molecule(-1) s(-1), where the uncertainty is the scatter of one standard deviation in the data. The progress of the reaction was followed by time-resolved infrared absorption spectroscopy on single rovibrational transitions from the ground vibrational level. Multiple species were detected in these experiments, including NCO, CH3, HCl, C2H6, HCN, HNC, NH, and HNCO. Temporal concentration profiles of the observed species were simulated using a kinetic model, and rate constants were determined by minimizing the sum of the squares of the residuals between experimental observations and model calculations. Both HCN and HNC seem to be minor products (<0.3% each) of the NCO + CH3 reaction. The peak concentrations of NH and HNCO were small, accounting for <1% of the initial NCO concentration; however, their temporal profiles could not be fit by the model kinetics. The observed C2H6 temporal profile always peaked at significantly higher concentrations than the model predictions, and several reaction models were constructed to help explain these observations. The most likely product channel seems to be the recombination channels, producing CH3NCO and CH3OCN.

Plasma Chemistry of NO in Complex Gas Mixtures Excited with a Surfatron Launcher

The plasma chemistry of NO has been investigated in gas mixtures with oxygen and/or hydrocarbon and Ar as carrier gas. Surface wave discharges operating at microwave frequencies have been used for this study. The different plasma reactions have been analyzed for a pressure range between 30 and 75 Torr. Differences in product concentration and/or reaction yields smaller than 10% were found as a function of this parameter. The following gas mixtures have been considered for investigation: Ar/NO, Ar/NO/O2, Ar/NO/CH4, Ar/CH4/O2, Ar/NO/CH4/O2. It is found that NO decomposes into N2 and O2, whereas other products such as CO, H2, and H2O are also formed when CH4 and O2 are present in the reaction mixture. Depending on the working conditions, other minority products such as HCN, CO2, and C2 or higher hydrocarbons have been also detected. The reaction of an Ar/NO plasma with deposits of solid carbon has also been studied. The experiments have provided useful information with respect to the possible removal of soot particles by this type of plasma. It has been shown that carbon deposits are progressively burned off by interaction with the plasma, and practically 100% decomposition of NO was found. Plasma intermediate species have been studied by optical emission spectroscopy (OES). Bands and/or peaks due to N2*, NO*, OH*, C2*, CN*, CH*, or H* were detected with different relative intensities depending on the gas mixture. From the analysis of both the reaction products and efficiency and the type of intermediate species detected by OES, different plasma reactions and processes are proposed to describe the plasma chemistry of NO in each particular mixture of gases. The results obtained provide interesting insights about the plasma removal of NO in real gas exhausts.