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For: Okamoto K, Kozawa T, Natsuda K, Seki S, Tagawa S. Formation of intramolecular poly(4-hydroxystyrene) dimer radical cation. J Phys Chem B 2008;112:9275-80. [PMID: 18630855 DOI: 10.1021/jp801949s] [Citation(s) in RCA: 28] [Impact Index Per Article: 1.8] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/30/2022]
Number Cited by Other Article(s)
1
Okamoto K, Muroya Y, Kozawa T. Dynamics of ionized poly(4-hydroxystyrene)-type resist polymers with tert-butoxycarbonyl-protecting group. Sci Rep 2024;14:16729. [PMID: 39030395 PMCID: PMC11271537 DOI: 10.1038/s41598-024-67794-0] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/17/2024] [Accepted: 07/16/2024] [Indexed: 07/21/2024]  Open
2
Okamoto K, Kawai S, Kozawa T. Formation of intramolecular dimer radical ions of diphenyl sulfones. Sci Rep 2020;10:19823. [PMID: 33188267 PMCID: PMC7666127 DOI: 10.1038/s41598-020-76907-4] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 09/12/2020] [Accepted: 11/04/2020] [Indexed: 11/16/2022]  Open
3
Kim M, Moon J, Choi J, Park S, Lee B, Cho M. Multiscale Simulation Approach on Sub-10 nm Extreme Ultraviolet Photoresist Patterning: Insights from Nanoscale Heterogeneity of Polymer. Macromolecules 2018. [DOI: 10.1021/acs.macromol.8b01290] [Citation(s) in RCA: 16] [Impact Index Per Article: 2.7] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/27/2023]
4
Okamoto K, Nomura N, Fujiyoshi R, Umegaki K, Yamamoto H, Kobayashi K, Kozawa T. Dynamics of Radical Ions of Hydroxyhexafluoroisopropyl-Substituted Benzenes. J Phys Chem A 2017;121:9458-9465. [PMID: 29171952 DOI: 10.1021/acs.jpca.7b09842] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
5
Okamoto K, Ishida T, Yamamoto H, Kozawa T, Fujiyoshi R, Umegaki K. Dynamics of radical cations of poly(4-hydroxystyrene) in the presence and absence of triphenylsulfonium triflate as determined by pulse radiolysis of its highly concentrated solution. Chem Phys Lett 2016. [DOI: 10.1016/j.cplett.2016.05.058] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/21/2022]
6
Torok J, Re RD, Herbol H, Das S, Bocharova I, Paolucci A, Ocola LE, Ventrice Jr. C, Lifshin E, Denbeaux G, Brainard RL. Secondary Electrons in EUV Lithography. J PHOTOPOLYM SCI TEC 2013. [DOI: 10.2494/photopolymer.26.625] [Citation(s) in RCA: 40] [Impact Index Per Article: 3.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
7
Wu W, Nuzhdin K, Vyushkova M, Janik I, Bartels D. Comparison of Acid Generation in EUV Lithography Films of Poly(4-hydroxystyrene) (PHS) and Noria Adamantyl Ester (Noria-AD50). J Phys Chem B 2012;116:6215-24. [DOI: 10.1021/jp300677q] [Citation(s) in RCA: 9] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
8
Kobayashi K. Evidence of formation of adenine dimer cation radical in DNA: the importance of adenine base stacking. J Phys Chem B 2010;114:5600-4. [PMID: 20369809 DOI: 10.1021/jp100589w] [Citation(s) in RCA: 37] [Impact Index Per Article: 2.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
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