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Okamoto K, Muroya Y, Kozawa T. Dynamics of ionized poly(4-hydroxystyrene)-type resist polymers with tert-butoxycarbonyl-protecting group. Sci Rep 2024; 14:16729. [PMID: 39030395 PMCID: PMC11271537 DOI: 10.1038/s41598-024-67794-0] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/17/2024] [Accepted: 07/16/2024] [Indexed: 07/21/2024] Open
Abstract
The imaging reactions of resist materials used for nano-patterning have become radiation-chemical reactions, with the shortening of wavelengths of the exposure light sources in lithography systems. The most widely used patterning materials in industrial lithography are chemically amplified resists (CAR). Understanding the deprotonation mechanism of ionized polymers (radical cations) is important for acid generation in CARs. In this study, the dynamics of radical cations in poly(4-hydroxystyrene) (PHS)-type resist polymers, partially and totally protected by tert-butoxycarbonyl (t-BOC) groups, are investigated using a combination of electron pulse radiolysis experiments, acid yield measurements, and quantum chemical calculations. The t-BOC(oxy) group exhibits π-electron-donating behavior in the monomer cation but changes to electron-accepting behavior in the polymer cation, owing to the interaction between substituents. The destabilization of radical cations due to decreased intramolecular charge resonance may contribute to the high deprotonation efficiency of t-BOC-capped PHS polymers.
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Affiliation(s)
- Kazumasa Okamoto
- SANKEN (The Institute of Scientific and Industrial Research), Osaka University, Ibaraki, Osaka, 567-0047, Japan.
- Artificial Intelligence Research Center, SANKEN (AIRC-SANKEN), Osaka University, Ibaraki, Osaka, 567-0047, Japan.
| | - Yusa Muroya
- SANKEN (The Institute of Scientific and Industrial Research), Osaka University, Ibaraki, Osaka, 567-0047, Japan
| | - Takahiro Kozawa
- SANKEN (The Institute of Scientific and Industrial Research), Osaka University, Ibaraki, Osaka, 567-0047, Japan
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Okamoto K, Kawai S, Kozawa T. Formation of intramolecular dimer radical ions of diphenyl sulfones. Sci Rep 2020; 10:19823. [PMID: 33188267 PMCID: PMC7666127 DOI: 10.1038/s41598-020-76907-4] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 09/12/2020] [Accepted: 11/04/2020] [Indexed: 11/16/2022] Open
Abstract
Dimer radical ions of aromatic molecules in which excess charge is localized in a pair of rings have been extensively investigated. While dimer radical cations of aromatics have been previously produced in the condensed phase, the number of molecules that form dimer anions is very limited. In this study, we report the formation of intramolecular dimer radical ions (cations and anions) of diphenyl sulfone derivatives (DPs) by electron beam pulse radiolysis in the liquid phase at room temperature. The density functional theory (DFT) calculations also showed the formation of the dimer radical ions. The torsion barrier of the phenyl ring of DPs was also calculated. It was found that the dimer radical ions show the larger barrier than the neutral state. Finally, stability of the dimer radical anion is dependent on not only the inductive effect of the sulfonyl group but the conjugation involving the d-orbital of the S atom and the phenyl rings.
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Affiliation(s)
- Kazumasa Okamoto
- The Institute of Scientific Research (ISIR), Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka, 567-0047, Japan. .,Artificial Intelligence Research Center (AIRC-ISIR), ISIR, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka, 567-0047, Japan.
| | - Shunpei Kawai
- Faculty of Engineering, Hokkaido University, Sapporo, Hokkaido, 060-0005, Japan
| | - Takahiro Kozawa
- The Institute of Scientific Research (ISIR), Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka, 567-0047, Japan
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Kim M, Moon J, Choi J, Park S, Lee B, Cho M. Multiscale Simulation Approach on Sub-10 nm Extreme Ultraviolet Photoresist Patterning: Insights from Nanoscale Heterogeneity of Polymer. Macromolecules 2018. [DOI: 10.1021/acs.macromol.8b01290] [Citation(s) in RCA: 16] [Impact Index Per Article: 2.7] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/27/2023]
Affiliation(s)
| | | | | | | | - Byunghoon Lee
- Mask Development Team, Samsung Electronics Co., Ltd., Suwon, Gyeonggi-do, Republic of Korea
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Okamoto K, Nomura N, Fujiyoshi R, Umegaki K, Yamamoto H, Kobayashi K, Kozawa T. Dynamics of Radical Ions of Hydroxyhexafluoroisopropyl-Substituted Benzenes. J Phys Chem A 2017; 121:9458-9465. [PMID: 29171952 DOI: 10.1021/acs.jpca.7b09842] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
Abstract
Fluorination of resist materials is an effective method used to enhance the energy deposition of extreme ultraviolet (EUV) light in the fabrication of next-generation semiconductor devices. The dynamics of radical ions are important to understand when considering the radiation-chemistry of the resist materials using EUV and electron beam lithography. Here, the dynamics of the radical anions and cations of benzenes with one or two 2-hydroxyhexafluoroisopropyl groups (HFABs) were studied using radiolysis techniques. The formation of dimer radical cations was observed only in the monosubstituted benzene solutions of 1,2-dichloroethane. If the compound contained more than two substituents, it was found to hinder the necessary π-π overlapping. Pulse radiolysis of HFABs in tetrahydrofuran showed a characteristic spectral shift of the radical anion within the region of several hundred nanoseconds. From the results of low-temperature spectroscopy and density functional calculations, it is suggested that excess electrons of the 2-hydroxyhexafluoroisopropyl group of the radical anions cause dissociation into neutral radicals.
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Affiliation(s)
- Kazumasa Okamoto
- Division of Quantum Science and Engineering, Faculty/Graduate School of Engineering, Hokkaido University , Sapporo 060-8628, Japan.,The Institute of Scientific and Industrial Research, Osaka University , Ibaraki, Osaka 567-0047, Japan
| | - Naoya Nomura
- Division of Quantum Science and Engineering, Faculty/Graduate School of Engineering, Hokkaido University , Sapporo 060-8628, Japan
| | - Ryoko Fujiyoshi
- Division of Quantum Science and Engineering, Faculty/Graduate School of Engineering, Hokkaido University , Sapporo 060-8628, Japan
| | - Kikuo Umegaki
- Division of Quantum Science and Engineering, Faculty/Graduate School of Engineering, Hokkaido University , Sapporo 060-8628, Japan
| | - Hiroki Yamamoto
- The Institute of Scientific and Industrial Research, Osaka University , Ibaraki, Osaka 567-0047, Japan
| | - Kazuo Kobayashi
- The Institute of Scientific and Industrial Research, Osaka University , Ibaraki, Osaka 567-0047, Japan
| | - Takahiro Kozawa
- The Institute of Scientific and Industrial Research, Osaka University , Ibaraki, Osaka 567-0047, Japan
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Okamoto K, Ishida T, Yamamoto H, Kozawa T, Fujiyoshi R, Umegaki K. Dynamics of radical cations of poly(4-hydroxystyrene) in the presence and absence of triphenylsulfonium triflate as determined by pulse radiolysis of its highly concentrated solution. Chem Phys Lett 2016. [DOI: 10.1016/j.cplett.2016.05.058] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/21/2022]
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Torok J, Re RD, Herbol H, Das S, Bocharova I, Paolucci A, Ocola LE, Ventrice Jr. C, Lifshin E, Denbeaux G, Brainard RL. Secondary Electrons in EUV Lithography. J PHOTOPOLYM SCI TEC 2013. [DOI: 10.2494/photopolymer.26.625] [Citation(s) in RCA: 40] [Impact Index Per Article: 3.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
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Wu W, Nuzhdin K, Vyushkova M, Janik I, Bartels D. Comparison of Acid Generation in EUV Lithography Films of Poly(4-hydroxystyrene) (PHS) and Noria Adamantyl Ester (Noria-AD50). J Phys Chem B 2012; 116:6215-24. [DOI: 10.1021/jp300677q] [Citation(s) in RCA: 9] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Affiliation(s)
- Weiqiang Wu
- Radiation Laboratory, University of Notre Dame, Notre Dame, Indiana 46556, United States
| | - Kirill Nuzhdin
- Radiation Laboratory, University of Notre Dame, Notre Dame, Indiana 46556, United States
| | - Mariya Vyushkova
- Radiation Laboratory, University of Notre Dame, Notre Dame, Indiana 46556, United States
| | - Ireneusz Janik
- Radiation Laboratory, University of Notre Dame, Notre Dame, Indiana 46556, United States
| | - David Bartels
- Radiation Laboratory, University of Notre Dame, Notre Dame, Indiana 46556, United States
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Kobayashi K. Evidence of formation of adenine dimer cation radical in DNA: the importance of adenine base stacking. J Phys Chem B 2010; 114:5600-4. [PMID: 20369809 DOI: 10.1021/jp100589w] [Citation(s) in RCA: 37] [Impact Index Per Article: 2.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Abstract
Deprotonation of the adenine (A) base in both mononucleotide and oligonucleotide (ODN) was measured by nanosecond pulse radiolysis. The cation radical (A(+*)) of deoxyadenosine (dA), produced by oxidation with SO(4)(-*), rapidly deprotonated to form the neutral A radical (A(- H)(*)) with a rate constant of 2.0 x 10(7) s(-1) and a pK(a) value of 4.2, as determined by transient spectroscopy. A similar process was observed in experiments performed on a variety of double-stranded ODNs containing adenine x thymine (A x T) base pairs. The transient spectrum of A(+)(*) in an ODN composed of alternating A x T pairs was essentially identical to that of free dA and differed from the spectra of ODNs containing AA and AAA. In contrast, the spectra of A(- H)(*) were not affected by the sequence. These results suggest that the positive charge on A(+)(*) in ODNs is delocalized as the dimer is stabilized by pi-orbital stacking between adjacent A's. The rate constants for deprotonation of A(+)(*) in ODNs containing AA and AAA (0.9-1.1 x 10(7) s(-1)) were a factor of 2 smaller than the rate constants for deprotonation of A(+)(*) in ODNs containing alternating A x T and dA (2.0 x 10(7) s(-1)). This suggests that the formation of a charge resonance stabilized dimer AA(+)(*) in DNA produced a significant barrier to deprotonation.
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Affiliation(s)
- Kazuo Kobayashi
- The Institute of Scientific and Industrial Research, Osaka University, Mihogaoka 8-1, Ibaraki Osaka 567-0047, Japan.
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