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2
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Chen W, Tu Q, Wu H, Zhao C, Yao X, Fan W, Zhang S, Ni J, Zhang X. Study on morphology evolution of anodic tantalum oxide films in different using stages of H 2 SO 4 /HF electrolyte. Electrochim Acta 2017. [DOI: 10.1016/j.electacta.2017.03.024] [Citation(s) in RCA: 11] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/19/2022]
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3
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Kolasinski KW. The mechanism of galvanic/metal-assisted etching of silicon. NANOSCALE RESEARCH LETTERS 2014; 9:432. [PMID: 25221459 PMCID: PMC4149979 DOI: 10.1186/1556-276x-9-432] [Citation(s) in RCA: 11] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/16/2014] [Accepted: 07/29/2014] [Indexed: 05/04/2023]
Abstract
Metal-assisted etching is initiated by hole injection from an oxidant catalyzed by a metal nanoparticle or film on a Si surface. It is shown that the electronic structure of the metal/Si interface, i.e., band bending, is not conducive to diffusion of the injected hole away from the metal in the case of Ag or away from the metal/Si interface in the cases of Au, Pd, and Pt. Since holes do not diffuse away from the metals, the electric field resulting from charging of the metal after hole injection must instead be the cause of metal-assisted etching.
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Affiliation(s)
- Kurt W Kolasinski
- Department of Chemistry, West Chester University, West Chester, PA 19383-2115, USA
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4
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Schönleber K, Krischer K. High-Amplitude versus Low-Amplitude Current Oscillations during the Anodic Oxidation of p-Type Silicon in Fluoride Containing Electrolytes. Chemphyschem 2012; 13:2989-96. [DOI: 10.1002/cphc.201200230] [Citation(s) in RCA: 15] [Impact Index Per Article: 1.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 03/16/2012] [Indexed: 11/11/2022]
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7
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Lewerenz H, Aggour M, Stempel T, Lublow M, Grzanna J, Skorupska K. Photoactive nanostructure device by electrochemical processing of silicon. J Electroanal Chem (Lausanne) 2008. [DOI: 10.1016/j.jelechem.2008.04.005] [Citation(s) in RCA: 10] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
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8
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Baruffaldi C, Bertoncello R, Cattarin S, Guerriero P, Musiani M. Nb electrodissolution in aqueous alkali: dependence on the alkali metal. J Electroanal Chem (Lausanne) 2003. [DOI: 10.1016/s0022-0728(03)00108-6] [Citation(s) in RCA: 7] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/24/2022]
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9
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Böhm S, Peter L, Schlichthörl G, Greef R. Ellipsometric and microwave reflectivity studies of current oscillations during anodic dissolution of p-Si in fluoride solutions. J Electroanal Chem (Lausanne) 2001. [DOI: 10.1016/s0022-0728(00)00397-1] [Citation(s) in RCA: 10] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/18/2022]
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10
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Erné BH, Ozanam F, Stchakovsky M, Vanmaekelbergh D, Chazalviel JN. GaAs/H2O2 Electrochemical Interface Studied In Situ by Infrared Spectroscopy and Ultraviolet−Visible Ellipsometry Part II: Chemical Origin of Cathodic Oscillations. J Phys Chem B 2000. [DOI: 10.1021/jp000390b] [Citation(s) in RCA: 9] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/30/2022]
Affiliation(s)
- B. H. Erné
- Laboratoire de Physique de la Matière Condensée (U.M.R. 7643 du C.N.R.S.), École Polytechnique, 91128 Palaiseau, France, I. S. A. Jobin−Yvon−Spex, Groupe Instruments S. A., 7 route d’Egly, 91290 Arpajon, France, and Debye Institute, Utrecht University, P.O. Box 80000, 3508 TA Utrecht, The Netherlands
| | - F. Ozanam
- Laboratoire de Physique de la Matière Condensée (U.M.R. 7643 du C.N.R.S.), École Polytechnique, 91128 Palaiseau, France, I. S. A. Jobin−Yvon−Spex, Groupe Instruments S. A., 7 route d’Egly, 91290 Arpajon, France, and Debye Institute, Utrecht University, P.O. Box 80000, 3508 TA Utrecht, The Netherlands
| | - M. Stchakovsky
- Laboratoire de Physique de la Matière Condensée (U.M.R. 7643 du C.N.R.S.), École Polytechnique, 91128 Palaiseau, France, I. S. A. Jobin−Yvon−Spex, Groupe Instruments S. A., 7 route d’Egly, 91290 Arpajon, France, and Debye Institute, Utrecht University, P.O. Box 80000, 3508 TA Utrecht, The Netherlands
| | - D. Vanmaekelbergh
- Laboratoire de Physique de la Matière Condensée (U.M.R. 7643 du C.N.R.S.), École Polytechnique, 91128 Palaiseau, France, I. S. A. Jobin−Yvon−Spex, Groupe Instruments S. A., 7 route d’Egly, 91290 Arpajon, France, and Debye Institute, Utrecht University, P.O. Box 80000, 3508 TA Utrecht, The Netherlands
| | - J.-N. Chazalviel
- Laboratoire de Physique de la Matière Condensée (U.M.R. 7643 du C.N.R.S.), École Polytechnique, 91128 Palaiseau, France, I. S. A. Jobin−Yvon−Spex, Groupe Instruments S. A., 7 route d’Egly, 91290 Arpajon, France, and Debye Institute, Utrecht University, P.O. Box 80000, 3508 TA Utrecht, The Netherlands
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11
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Grzanna J, Jungblut H, Lewerenz H. A model for electrochemical oscillations at the Si∣electrolyte contact. J Electroanal Chem (Lausanne) 2000. [DOI: 10.1016/s0022-0728(00)00141-8] [Citation(s) in RCA: 28] [Impact Index Per Article: 1.1] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/18/2022]
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13
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Cattarin S, Decker F, Dini D, Margesin B. In-situ detection of stress in oxide films during Si electrodissolution in acidic fluoride electrolytes. J Electroanal Chem (Lausanne) 1999. [DOI: 10.1016/s0022-0728(99)00348-4] [Citation(s) in RCA: 21] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/24/2022]
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14
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Cattarin S, Decker F, Dini D. Anodic Silicon Dissolution in Acidic Fluoride Electrolyte. A Probe Beam Deflection Investigation. J Phys Chem B 1998. [DOI: 10.1021/jp980896i] [Citation(s) in RCA: 11] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Affiliation(s)
- Sandro Cattarin
- IPELP−C.N.R., Corso Stati Uniti 4, 35100 Padova, Italy, and Dipartimento di Chimica, Università “La Sapienza”, 00185 Roma, Italy
| | - Franco Decker
- IPELP−C.N.R., Corso Stati Uniti 4, 35100 Padova, Italy, and Dipartimento di Chimica, Università “La Sapienza”, 00185 Roma, Italy
| | - Danilo Dini
- IPELP−C.N.R., Corso Stati Uniti 4, 35100 Padova, Italy, and Dipartimento di Chimica, Università “La Sapienza”, 00185 Roma, Italy
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