Side-chain-grafted random copolymer brushes as neutral surfaces for controlling the orientation of block copolymer microdomains in thin films

Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assembly

While block copolymer (BCP) lithography is theoretically capable of printing features smaller than 10 nm, developing practical BCPs for this purpose remains challenging. Herein, we report the creation of a chemically tailored, highly reliable, and practically applicable block copolymer and sub-10-nm line patterns by directed self-assembly. Polystyrene-block-[poly(glycidyl methacrylate)-random-poly(methyl methacrylate)] (PS-b-(PGMA-r-PMMA) or PS-b-PGM), which is based on PS-b-PMMA with an appropriate amount of introduced PGMA (10-33 mol%) is quantitatively post-functionalized with thiols. The use of 2,2,2-trifluoroethanethiol leads to polymers (PS-b-PGFMs) with Flory-Huggins interaction parameters (χ) that are 3.5-4.6-times higher than that of PS-b-PMMA and well-defined higher-order structures with domain spacings of less than 20 nm. This study leads to the smallest perpendicular lamellar domain size of 12.3 nm. Furthermore, thin-film lamellar domain alignment and vertical orientation are highly reliably and reproducibly obtained by directed self-assembly to yield line patterns that correspond to a 7.6 nm half-pitch size.

Substrate Neutrality for Obtaining Block Copolymer Vertical Orientation

Nanopatterning methods utilizing block copolymer (BCP) self-assembly are attractive for semiconductor fabrication due to their molecular precision and high resolution. Grafted polymer brushes play a crucial role in providing a neutral surface conducive for the orientational control of BCPs. These brushes create a non-preferential substrate, allowing wetting of the distinct chemistries from each block of the BCP. This vertically aligns the BCP self-assembled lattice to create patterns that are useful for semiconductor nanofabrication. In this review, we aim to explore various methods used to tune the substrate and BCP interface toward a neutral template. This review takes a historical perspective on the polymer brush methods developed to achieve substrate neutrality. We divide the approaches into copolymer and blended homopolymer methods. Early attempts to obtain neutral substrates utilized end-grafted random copolymers that consisted of monomers from each block. This evolved into side-group-grafted chains, cross-linked mats, and block cooligomer brushes. Amidst the augmentation of the chain architecture, homopolymer blends were developed as a facile method where polymer chains with each chemistry were mixed and grafted onto the substrate. This was largely believed to be challenging due to the macrophase separation of the chemically incompatible chains. However, innovative methods such as sequential grafting and BCP compatibilizers were utilized to circumvent this problem. The advantages and challenges of each method are discussed in the context of neutrality and feasibility.

Epitaxial Growth of Surface Perforations on Parallel Cylinders in Terraced Films of Block Copolymer/Homopolymer Blends

Due to incommensurability between initial thickness and interdomain distance, thermal annealing inevitably produces relief surface terraces (islands and holes) of various morphologies in thin films of block copolymers. We have demonstrated three kinds of surface terraces in blend films: polygrain terraces with diffuse edges, polygrain terraces with step edges, and pseudo-monograin terraces with island coarsening. The three morphologies were obtained by three different thermal histories, respectively. The thermal histories were imposed on blend films, which were prepared by mixing a homopolystyrene (hPS, 6.1 kg/mol) with a weakly segregated, symmetry polystyrene-block poly(methyl methacrylate) (PS-b-PMMA, 42 kg/mol) followed by spin coating. At a given weight-fraction ratio of PS-b-PMMA/hPS = 75/25, the interior of the blend films forms parallel cylinders. Nevertheless, the surface of the blend films is always dominated by a skin layer of perforations, which epitaxially grow on top of parallel cylinders. By oxygen plasma etching at various time intervals to probe interior nanodomains, the epitaxial relationship between surface perforations and parallel cylinders has been identified by a scanning electron microscope.

Interface Manipulations Using Cross-Linked Underlayers and Surface-Active Diblock Copolymers to Extend Morphological Diversity in High-χ Diblock Copolymer Thin Films

Top and bottom interfaces of high-χ cylinder-forming polystyrene-block-maltoheptaose (PS-b-MH) diblock copolymer (BCP) thin films are manipulated using cross-linked copolymer underlayers and a fluorinated phase-preferential surface-active polymer (SAP) additive to direct the self-assembly (both morphology and orientation) of BCP microdomains into sub-10 nm patterns. A series of four photo-cross-linkable statistical copolymers with various contents of styrene, a 4-vinylbenzyl azide cross-linker, and a carbohydrate-based acrylamide are processed into 15 nm-thick cross-linked passivation layers on silicon substrates. A partially fluorinated analogue of the PS-b-MH phase-preferential SAP additive is designed to tune the surface energy of the top interface. The self-assembly of PS-b-MH thin films on top of different cross-linked underlayers and including 0-20 wt % of SAP additive is investigated by atomic force microscopy and synchrotron grazing incidence small-angle X-ray scattering analysis. The precise manipulation of the interfaces of ca. 30 nm thick PS-b-MH films not only allows the control of the in-plane/out-of-plane orientation of hexagonally packed (HEX) cylinders but also promotes epitaxial order-order transitions from HEX cylinders to either face-centered orthorhombic or body-centered cubic spheres without modifying the volume fraction of both blocks. This general approach paves the way for the controlled self-assembly of other high-χ BCP systems.

Distributions of Deuterated Polystyrene Chains in Perforated Layers of Blend Films of a Symmetric Polystyrene-block-poly(methyl methacrylate)

We have examined the spatial distributions of polymer chains in blend films of weakly segregated polystyrene-block-poly(methyl methacrylate) [P(S-b-MMA)] and deuterated polystyrene (dPS). By fine-tuning the composition (ϕ_PS+dPS = 63.8 vol %) of the total PS/dPS component and annealing temperature (230 and 270 °C), P(S-b-MMA)/dPS blend films mainly form perforated layers with a parallel orientation (hereafter PLs^//). The distributions of dPS in PLs^// were probed by grazing-incidence small-angle neutron scattering (GISANS) and time-of-flight neutron reflectivity (ToF-NR). GISANS and ToF-NR results offer evidence that dPS chains preferentially locate at the free surface and within the PS layers for blend films that were annealed at 230 °C. Upon annealing at 270 °C, dPS chains distribute within PS layers and perforated PMMA layers. Nevertheless, dPS chains still retain a surface preference for thin films. In contrast, such surface segregation of dPS chains is prohibited for thick films when annealed at 270 °C.

Developing Anisotropy in Self-Assembled Block Copolymers: Methods, Properties, and Applications

Block copolymers (BCPs) self-assembly has continually attracted interest as a means to provide bottom-up control over nanostructures. While various methods have been demonstrated for efficiently ordering BCP nanodomains, most of them do not generically afford control of nanostructural orientation. For many applications of BCPs, such as energy storage, microelectronics, and separation membranes, alignment of nanodomains is a key requirement for enabling their practical use or enhancing materials performance. This review focuses on summarizing research progress on the development of anisotropy in BCP systems, covering a variety of topics from established aligning techniques, resultant material properties, and the associated applications. Specifically, the significance of aligning nanostructures and the anisotropic properties of BCPs is discussed and highlighted by demonstrating a few promising applications. Finally, the challenges and outlook are presented to further implement aligned BCPs into practical nanotechnological applications, where exciting opportunities exist.

Reproducible and Bendable SERS Substrates with Tailored Wettability Using Block Copolymers and Anodic Aluminum Oxide Templates

Surface properties are essential for substrates exhibiting high sensitivity in surface-enhanced Raman scattering (SERS) applications. In this work, novel SERS hybrid substrates using polystyrene-block-poly(methyl methacrylate) and anodic aluminum oxide templates is presented. The hybrid substrates not only possess hierarchical porous nanostructures but also exhibit superhydrophilic surface properties with the water contact angle ≈0°. Such surfaces play an important role in providing uniform enhanced intensities over large areas (relative standard deviation ≈10%); moreover, these substrates are found to be highly sensitive (limit of detection ≈10^-12 m for rhodamine 6G (R6G)). The results show that the hybrid SERS substrates can achieve the simultaneous detection of multicomponent mixtures of different target molecules, such as R6G, crystal violet, and methylene blue. Furthermore, the bending experiments show that about 70% of the SERS intensities are maintained after bending from ≈30° to 150°.

High-Fidelity, Sub-5 nm Patterns from High-χ Block Copolymer Films with Vapor-Deposited Ultrathin, Cross-Linked Surface-Modification Layers

Despite their capability, sub-10 nm periodic nano-patterns formed by strongly segregating block copolymer (BCP) thin films cannot be easily oriented perpendicular to the substrate due to the huge surface energy differences of the constituent blocks. To produce perpendicular nano-patterns, the interfacial energies of both the substrate and free interfaces should be controlled precisely to induce non-preferential wetting. Unfortunately, high-performance surface modification layers are challenging to design, and different kinds of surface modification methods must be devised respectively for each neutral layer and top coat. Furthermore, conventional approaches, largely based on spin-coating processes, are highly prone to defect formation and may readily cause dewetting at sub-10 nm thickness. To date, these obstacles have hampered the development of high-fidelity, sub-5 nm BCP patterns. Herein, an all-vapor phase deposition approach initiated chemical vapor deposition is demonstrated to form 9-nm-thick, uniform neutral bottom layer and top coat with exquisite control of composition and thickness. These layers are employed in BCP films to produce perpendicular cylinders with a diameter of ≈4 nm that propagate throughout a BCP thickness of up to ≈60 nm, corresponding to five natural domain spacings of the BCP. Such a robust approach will serve as an advancement for the reliable generation of sub-10 nm nano-patterns.

Effects of the Density of Chemical Cross-links and Physical Entanglements of Ultraviolet-Irradiated Polystyrene Chains on Domain Orientation and Spatial Order of Polystyrene-block-Poly(methyl methacrylate) Nano-Domains

Ultraviolet irradiation (UVI) of varied duration caused cross-linking and neutralization of polystyrene (PS) homopolymers of molar mass (M_n) from 6 to 290 kg mol^-1 on a silicon-oxide surface. An optimal neutral skin layer on the surface of the PS was obtained via brief UVI in air (UVIA), by which the PS had no preferential interaction with either block in the copolymer. UVI in an inert environment (gaseous dinitrogen) (UVIN) stabilized the PS layers via cross-linking and enabled the PS networks to have an effective adhesive contact with the underlying substrate. Thorough examination of domain orientations and spatial orders of a series of block copolymer, polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA), thin films deposited on these UVI-treated PS support layers yielded clear evidence that a dense layer of neutralized PS chains was required for the perpendicular orientation of PS-b-PMMA nanodomains. In particular, in addition to neutralization, two factors-the densities of physical entanglements and of chemical crosslinks-both in UVI-treated PS should be considered for the perpendicular orientation of nanolamellae and nanocylinders in symmetric and asymmetric PS-b-PMMA thin films. The density of physical entanglement in PS depends intrinsically on M_n of the PS, whereas the density of chemical cross-links was controlled with a varied duration of UVIN. Sufficiently large densities of physical entanglements and chemical cross-links can prevent PS-b-PMMA chains from penetrating through the neutral skin layer. The total density of physical entanglements and chemical cross-links required for the perpendicular orientation is correlated with the dimensions of the PS-b-PMMA chains.

Block copolymers containing stable radical and fluorinated blocks with long-range ordered morphologies prepared by anionic polymerization

We report a facile synthetic approach to create stable radical block copolymers containing a secondary fluorinated block via anionic polymerization using a bulky, sterically hindered countercation composed of a sodium ion and di-benzo-18-crown-6 complex. The synthetic conditions described in this report allowed for controlled molecular weights and dispersity (<1.3) of both homopolymers: poly(2,2,6,6-tetramethyl-1-piperidinyloxy-methacrylate) (PTMA) and poly(2,2,2-trifluoroethyl methacrylate) (PTFEMA) as well as their block copolymers (PTMA-b-PTFEMA). The stable radical concentration of the polymers was determined by electron spin resonance (ESR) and showed radical content above 70%. An analysis of the microphase morphologies in PTMA-b-PTFEMA thin films via atomic force microscopy (AFM) and grazing incidence small angle X-ray scattering (GISAXS) showed clear evidence of long-range ordering of lamellar and cylindrical morphologies with 32 and 36 nm spacing, respectively. The long-range ordering of the morphologies was developed with the aid of two separate neutral layers: PTMA-ran-PTFEMA-ran-poly(hydroxyl ethyl methacrylate) (PHEMA) and poly(isobutyl methacrylate) (PiBMA)-ran-PTFEMA-ran-PHEMA, which helped us corroborate, along with the Zisman method, the surface energy estimation of PTMA to be 30.1 mJ/m2.

Chemically tailored high-χ block copolymers for perpendicular lamellae via thermal annealing

A chemically tailored high-χ block copolymer (BCP), polystyrene-block-poly[2-hydroxy-3-(2,2,2-trifluoroethylsulfanyl)propyl methacrylate] (PS-b-PHFMA), was designed to incorporate tailored surface affinities and chemical incompatibilities for engineering perpendicular lamellae using thermal annealing. PS-b-PHFMA was synthesized via the sequential anionic polymerization of styrene and glycidyl methacrylate and the post-polymerization functionalization of the glycidyl moieties with 2,2,2-trifluoroethanethiol. The bulk studies revealed lamellae with a minimum domain spacing of 9.6 nm and a large effective Flory-Huggins interaction parameter (χeff) of 0.191 at 25 °C. Furthermore, atomic force microscopy and scanning electron microscopy showed perpendicular lamellae of the PS-b-PHFMA prepared on thermally-annealed thin films. The introduction of hydrophobic trifluoroethyl moieties onto the hydrophilic glycidyl moieties successfully balanced the surface affinity of the PHFMA block relative to PS, while simultaneously increasing the strength of segregation. Thus, χeff of the chemically tailored BCP increased, and a perpendicular orientation was facilitated on the thin films using thermal annealing.

Spatial control of the topography of photo-sensitive block copolymer thin films

Spatially controlling self-assembly of block copolymer thin films through photoinduced molecular interactions that significantly impact on the glass transition temperature.

Thermal Approaches to Perpendicular Block Copolymer Microdomains in Thin Films: A Review and Appraisal

Block copolymer thin films are highly versatile and accessible materials capable of producing nanofeatures in the size regime of a few to hundreds of nanometers by a simple spin-coating-and-anneal process. Unfortunately, this simple protocol usually leads to parallel microdomains, which limits the applicability of such nanofeatures. A great deal of effort has been put into achieving perpendicular microdomains, but those that incorporate thermal annealing are arguably the most practical and reproducible in the lab and industry. This review discusses the recent ongoing efforts on various thermal approaches to achieving perpendicular microdomains in order to provide the readers with a toolbox to work with.

Ionic Liquids as Additives to Polystyrene- Block-Poly(Methyl Methacrylate) Enabling Directed Self-Assembly of Patterns with Sub-10 nm Features

Polystyrene- block-poly(methyl methacrylate) (PS- b-PMMA) is one of the prototypical block copolymers in directed self-assembly (DSA) research and development, with standardized protocols in place for processing on industrially relevant 300 mm wafers. Scaling of DSA patterns to pitches below 20 nm using PS- b-PMMA, however, is hindered by the relatively low Flory-Huggins interaction parameter, χ. Here, we investigate the approach of adding small amounts of ionic liquids (ILs) into PS- b-PMMA, which selectively segregates into the PMMA domain and effectively increases the χ parameter and thus the pattern resolution. The amount of IL additive is small enough to result in limited changes in PS- b-PMMA's surface and interfacial properties, thus maintaining industry-friendly processing by thermal annealing with a free surface. Three different ILs are studied comparatively regarding their compositional process window, capability of increasing χ, and thermal stability. By adding ∼3.1 vol % of the champion IL into a low-molecular-weight PS- b-PMMA ( M_n = 10.3k- b-9.5k), we demonstrated DSA on chemically patterned substrates of lamellar structures with feature sizes <8.5 nm. Compatibility of the PS- b-PMMMA/IL blends with the standardized processes that have been previously developed suggests that such blend materials could provide a drop-in solution for sub-10 nm lithography with the processing advantages of PS- b-PMMA.

Phosphorene-directed self-assembly of asymmetric PS-b-PMMA block copolymer for perpendicularly-oriented sub-10 nm PS nanopore arrays

Few-layer black phosphorus, also known as phosphorene, is a new two-dimensional material which is of enormous interest for applications, mainly in electronics and optoelectronics. Herein, we for the first time employ phosphorene for directing the self-assembly of asymmetric polystyrene-block-polymethylmethacrylate (PS-b-PMMA) block copolymer (BCP) thin film to form the perpendicular orientation of sub-10 nm PS nanopore arrays in a hexagonal fashion normal to the interface. We experimentally demonstrate that none of the PS and PMMA blocks exhibit preferential affinity to the phosphorene-modified surface. Furthermore, the perpendicularly-oriented PS nanostructures almost stay unchanged with the variation of number of layers of few-layer phosphorene nanoflakes between 15-30 layers. Differing from the neutral polymer brushes which are widely used for chemical modification of the silicon substrate, phosphorene provides a novel physical way to control the interfacial interactions between the asymmetric PS-b-PMMA BCP thin film and the silicon substrate. Based on our results, it is possible to build a new scheme for producing sub-10 nm PS nanopore arrays oriented perpendicularly to the few-layer phosphorene nanoflakes. Furthermore, the nanostructural microdomains could serve as a promising nanolithography template for surface patterning of phosphorene nanoflakes.

Self-assembly of gradient copolymers synthesized in semi-batch mode by nitroxide mediated polymerization

The effect of diffuse compositional interfaces on copolymer self-assembly was studied via gradient copolymers (GCP). Poly(methyl methacrylate)-grad-(styrene) (PMMA-grad-PSt) copolymers were synthesized in semi-batch mode using nitroxide-mediated polymerization (NMP) with varied monomer injection protocols to produce varied diffuse interfaces (number average molecular weights (M_n) ranged from 62 000 g mol^-1 to 94 000 g mol^-1 with dispersities (Đ) between 1.35 and 1.59). The GCPs were spun into thin films on substrates made neutral by (St-ran-MMA-ran-hydroxyethyl methacrylate) terpolymers and annealed at elevated temperature to produce vertically oriented microphase-separated domains. The GCPs were found to have domain spacing larger than equivalent monodisperse BCPs, due to their polydisperse nature. This effect was partially offset by the decrease in χ due to the gradient. GCPs synthesized with a single-injection protocol (i.e. less diffuse interfaces) were found to self-assemble into ordered domains. However, GCPs synthesized with long injection times (i.e. more diffuse interfaces) exhibited poor self-assembly attributed to their predicted statistical-copolymer-like middle sequence, which caused a reduction of the effective enthalpic interaction parameter.

A surface interaction model for self-assembly of block copolymers under soft confinement

The surface interaction between substrates and block copolymers is one of the most important factors that control the alignment of self-assembled domains under thin film confinement. Most previous studies simply modeled substrates modified by grafting polymers as a hard wall with a specified surface energy, leading to an incomplete understanding of the role of grafted polymers. In this study, we propose a general model of surface interactions where the role of grafted polymers is decomposed into two independent contributions: the surface preference and the surface softness. Based on this model, we perform a numerical analysis of the stability competition between perpendicular and parallel lamellae of symmetric diblock copolymers on substrates modified by homopolymers using self-consistent field theory. The effects of the surface preference and the surface softness on the alignment of lamellar domains are carefully examined. A phase diagram of the alignment in the plane of the surface preference parameter and the surface softness parameter is constructed, which reveals a considerable parameter window for preparing stable perpendicular lamellae even on highly preferential substrates.

Tuning polymer-surface chemistries and interfacial interactions with UV irradiated polystyrene chains to control domain orientations in thin films of PS-b-PMMA

We demonstrate a simple, rapid, cost-effective and robust approach to modify the surface of a solid substrate, based on a UV-irradiated film of a general plastic polymer. Thin films of homopolymer polystyrene (PS) of controlled thickness were spin-coated on diverse metal, semiconductor and polymeric surfaces. Specific surface chemistry was tuned with UV irradiation in air (UVIA); interactions at the PS/substrate interface were enhanced with UV irradiation in nitrogen (UVIN). Oxidized and cross-linked PS served as a neutral surface on various metal, quartz, semiconductor and polymeric substrates to induce perpendicularly oriented cylinders or lamellae in a self-assembled block copolymer.

Morphological dependence on the addition of a soft middle block segment to rigid POSS-containing triblock copolymers for forming cylindrical nanostructures

A series of novel polyhedral oligomelic silsesquioxane (POSS)-containing triblock copolymers that self-assemble into hexagonally-packed cylinders of the POSS domain in a polystyrene (PS) matrix was developed in this study.

Neutral wetting brush layers for block copolymer thin films using homopolymer blends processed at high temperatures

Binary homopolymer blends of two hydroxyl-terminated polystyrene (PS-OH) and polymethylmethacrylate (PMMA-OH) homopolymers (Mn ∼ 16000 g mol(-1)) were grafted on SiO2 substrates by high-temperature (T > 150 °C), short-time (t < 600 s) thermal treatments. The resulting brush layer was tested to screen preferential interactions of the SiO2 substrate with the different symmetric and asymmetric PS-b-PMMA block copolymers deposited on top of the grafted molecules. By properly adjusting the blend composition and the processing parameters, an efficient surface neutralization path was identified, enabling the formation, in the block copolymer film, of homogeneous textures of lamellae or cylinders perpendicularly oriented with respect to the substrate. A critical interplay between the phase segregation of the homopolymer blends and their grafting process on the SiO2 was observed. In fact, the polar SiO2 is preferential for the PMMA-rich phase that forms a homogeneous layer on the substrate, while the PS-rich phase is located at the polymer-air interface. During the thermal treatment, phase segregation and grafting proceed simultaneously. Complete wetting of the PS rich phase on the PMMA rich phase leads to the formation of a PS/PMMA bilayer. In this case, the progressive diffusion of PS chains toward the polymer-SiO2 interface during the thermal treatment allows tuning of the brush layer composition.

Automated Defect and Correlation Length Analysis of Block Copolymer Thin Film Nanopatterns

Line patterns produced by lamellae- and cylinder-forming block copolymer (BCP) thin films are of widespread interest for their potential to enable nanoscale patterning over large areas. In order for such patterning methods to effectively integrate with current technologies, the resulting patterns need to have low defect densities, and be produced in a short timescale. To understand whether a given polymer or annealing method might potentially meet such challenges, it is necessary to examine the evolution of defects. Unfortunately, few tools are readily available to researchers, particularly those engaged in the synthesis and design of new polymeric systems with the potential for patterning, to measure defects in such line patterns. To this end, we present an image analysis tool, which we have developed and made available, to measure the characteristics of such patterns in an automated fashion. Additionally we apply the tool to six cylinder-forming polystyrene-block-poly(2-vinylpyridine) polymers thermally annealed to explore the relationship between the size of each polymer and measured characteristics including line period, line-width, defect density, line-edge roughness (LER), line-width roughness (LWR), and correlation length. Finally, we explore the line-edge roughness, line-width roughness, defect density, and correlation length as a function of the image area sampled to determine each in a more rigorous fashion.

Ultrathin random copolymer-grafted layers for block copolymer self-assembly

Hydroxyl-terminated P(S-r-MMA) random copolymers (RCPs) with molecular weights (Mn) from 1700 to 69000 and a styrene unit fraction of approximately 61% were grafted onto a silicon oxide surface and subsequently used to study the orientation of nanodomains with respect to the substrate, in cylinder-forming PS-b-PMMA block copolymer (BCP) thin films. When the thickness (H) of the grafted layer is greater than 5-6 nm, a perpendicular orientation is always observed because of the efficient decoupling of the BCP film from the polar SiO2 surface. Conversely, if H is less than 5 nm, the critical thickness of the grafted layer, which allows the neutralization of the substrate and promotion of the perpendicular orientation of the nanodomains in the BCP film, is found to depend on the Mn of the RCP. In particular, when Mn = 1700, a 2.0 nm thick grafted layer is sufficient to promote the perpendicular orientation of the PMMA cylinders in the PS-b-PMMA BCP film. A proximity shielding mechanism of the BCP molecules from the polar substrate surface, driven by chain stretching of the grafted RCP molecules, is proposed.

Thermal stability of functional P(S-r-MMA) random copolymers for nanolithographic applications

Two strategies are envisioned to improve the thermal stability of the grafted layer and to allow the processing of the random copolymer/block copolymer (RCP/BCP) system at high temperature. From one side, a high-temperature thermal treatment of a commercial α-hydroxyl ω-2,2,6,6-tetramethylpiperidinyloxy functional RCP, namely, TR58, leads to the formation of a stabilized layer able to induce the perpendicular orientation of a symmetric BCP to temperatures higher than 310 °C. On the other side, an α-hydroxyl ω-Br functional RCP, namely, BrR58, with the same molar mass and composition of TR58, was prepared by activator regenerated by electron transfer atom transfer radical polymerization. The resulting brush layer can sustain the self-assembly of the symmetric BCP for processing temperatures as high as 330 °C. In both systems, the disruption of the BCP film, deposited on the grafted RCP layer, occurs because of the formation of bubbles, due to a low-temperature evolution of monomers from the RCP layer. The extent of the low-temperature monomer evolution is higher for TR58 than it is for BrR58 and starts at lower temperatures. For both copolymers, the thermal treatment offsets the low-temperature monomer evolution while still maintaining surface characteristics suitable to induce the perpendicular orientation of the BCPs, thus ultimately extending the range of processing temperatures of the BCP film and consequently speeding the self-organization process.

Nanoscale topography influences polymer surface diffusion

Using high-throughput single-molecule tracking, we studied the diffusion of poly(ethylene glycol) chains at the interface between water and a hydrophobic surface patterned with an array of hexagonally arranged nanopillars. Polymer molecules displayed anomalous diffusion; in particular, they exhibited intermittent motion (i.e., immobilization and "hopping") suggestive of continuous-time random walk (CTRW) behavior associated with desorption-mediated surface diffusion. The statistics of the molecular trajectories changed systematically on surfaces with pillars of increasing height, exhibiting motion that was increasingly subdiffusive and with longer waiting times between diffusive steps. The trajectories were well-described by kinetic Monte Carlo simulations of CTRW motion in the presence of randomly distributed permeable obstacles, where the permeability (the main undetermined parameter) was conceptually related to the obstacle height. These findings provide new insights into the mechanisms of interfacial transport in the presence of obstacles and on nanotopographically patterned surfaces.

Directed self-assembly of silicon-containing block copolymer thin films

The directed self-assembly (DSA) of lamella-forming poly(styrene-block-trimethylsilylstyrene) (PS-PTMSS, L0=22 nm) was achieved using a combination of tailored top interfaces and lithographically defined patterned substrates. Chemo- and grapho-epitaxy, using hydrogen silsesquioxane (HSQ) based prepatterns, achieved density multiplications up to 6× and trench space subdivisions up to 7×, respectively. These results establish the compatibility of DSA techniques with a high etch contrast, Si-containing BCP that requires a top coat neutral layer to enable orientation.

Microphase Separation of a PS-b-PFS Block CopolymerviaSolvent Annealing: Effect of Solvent, Substrate, and Exposure Time on Morphology

Block copolymer (BCP) lithography makes use of the microphase separation properties of BCPs to pattern ordered nanoscale features over large areas. This work presents the microphase separation of an asymmetric polystyrene-block-poly(ferrocenyl dimethylsilane) (PS-b-PFS) BCP that allows ordered arrays of nanostructures to be formed by spin casting PS-b-PFS on substrates and subsequent solvent annealing. The effects of the solvent annealing conditions on self-assembly and structural stability are discussed.

Tailoring pigment dispersants with polyisobutylene twin-tail structures for electrowetting display application

We have designed a class of highly hydrophobic dispersants for finely dispersing carbon black and organic pigment nanoparticles in apolar mediums. The synthesis involved the use of polyisobutylene-g-succinic anhydride (PIB-SA) and judiciously selected amines by amidation and imidation. The structures were characterized by infrared spectroscopy for anhydride functionalities in the starting materials and amide/imide linkages in the products. These polymeric forms of dispersants were structurally varied with respects to their PIB molecular weight, twin-tails, and linkages. Their relative performance for dispersing six different pigments in decane was evaluated against solution homogeneity, viscosity, stability, and particle size. The fine dispersion was achieved at particle sizes of ca. 100 nm, with the viscosity as low as 2-3 cP. The measurement of zeta potentials, which varied from -39.8 to -5.1 mV with pigment addition, revealed a strong surface-charge interaction between pigment and PIB dispersant molecules. Examination by TEM (transmission electronic microscope) showed the homogeneous dispersion of the primary structures of pigment particles at ca. 20 nm in diameter. The polymeric dispersants with different PIB tails and imide functionalities could be tailored for pigment stability in the oil phase, which is potentially suitable for the electrowetting devices.

Directed self-assembly of block copolymers: a tutorial review of strategies for enabling nanotechnology with soft matter

Self-assembly of soft materials is broadly considered an attractive means of generating nanoscale structures and patterns over large areas. However, the spontaneous formation of equilibrium nanostructures in response to temperature and concentration changes, for example, must be guided to yield the long-range order and orientation required for utility in a given scenario. In this review we examine directed self-assembly (DSA) of block copolymers (BCPs) as canonical examples of nanostructured soft matter systems which are additionally compelling for creating functional materials and devices. We survey well established and newly emerging DSA methods from a tutorial perspective. Special emphasis is given to exploring underlying physical phenomena, identifying prototypical BCPs that are compatible with different DSA techniques, describing experimental methods and highlighting the attractive functional properties of block copolymers overall. Finally we offer a brief perspective on some unresolved issues and future opportunities in this field.

A dual functional layer for block copolymer self-assembly and the growth of nanopatterned polymer brushes

We present a versatile method for fabricating nanopatterned polymer brushes using a cross-linked thin film made from a random copolymer consisting of an inimer (p-(2-bromoisobutyloylmethyl)styrene), styrene, and glycidyl methacrylate (GMA). The amount of inimer was held constant at 20 or 30% while the relative amount of styrene to GMA was varied to induce perpendicular domain orientation in an overlying P(S-b-MMA) block copolymer (BCP) film for lamellar and cylindrical morphologies. A cylinder forming BCP blend with PMMA homopolymer was assembled to create a perpendicular hexagonal array of cylinders, which allowed access to a nanoporous template without the loss of initiator functionality. Surface-initiated ATRP of 2-hydroxyethyl methacrylate was conducted through the pores to generate a dense array of nanopatterned brushes. Alternatively, gold was deposited into the nanopores, and brushes were grown around the dots after removal of the template. This is the first example of combining the chemistry of nonpreferential surfaces with surface-initiated growth of polymer chains.