Dewetting of thin polystyrene films under confinement

Polymer dewetting in solvent-non-solvent environment- new insights on dynamics and lithography-free patterning

HYPOTHESIS

We show that one may employ polymer dewetting in solvent-non-solvent environment to obtain lithography-free fabrication of well-defined nano- to micro- scale polymer droplets arrays from pre-patterned polymer films. The polymer droplet pattern may be converted to a series of hybrid organic-inorganic and inorganic well-defined nano-patterns by using sequential infiltration synthesis (SIS). In particular, we scrutinize the physical parameters which govern the dewetting of flat and striped polymer thin films, which is the key to obtaining our objective of lithography-free ordered nano-patterns.

EXPERIMENTS

We immerse polystyrene (PS) and polymethyl methacrylate (PMMA) thin films in water in the presence of chloroform vapors. We study the ensuing polymer dewetting dynamics and the pattern formation of nanospheres by employing in-situ light microscopy and scanning electron microscopy. We then investigate pattern formation by dewetting of polymer stripes, fabricated by directed solvent evaporation, and SIS of AlO_x from vapor phase precursors, trimethyl aluminum (TMA) and H₂O, within the nanosphere patterns.

FINDINGS

We find that solvent- non-solvent environments render film dewetting rates, which are an order of magnitude faster than solvent vapor dewetting, and supports the formation of small solid polymer droplets, down to sub-100 nm droplet size, of large contact angles with the solid substrate. Pre-patterned polymer film stripes support the formation of highly ordered structures of polymer droplets, which are easily transformed to hybrid polymer-AlO_x nanosphere patterns and templated AlO_x nanosphere via SIS.

Large-area fabrication of microlens arrays by using self-pinning effects during the thermal reflow process

Generally, the fabrication of curved structures such as microlens arrays has been regarded as an expensive and complicated process. Here, we propose a facile method to form a microlens array with controlled lens curvature by combining residue-free nanoimprint lithography (NIL) with V-shaped molds and the successive thermal reflow procedure of the printed polymeric structures. The V-shaped molds used in this study enable the bottom substrate to be exposed after the NIL process when the initial thickness is controlled. Then, we use the thermal reflow to realize hemi-cylindrical curved lenses by applying heat. The polymers are self-pinned on the exposed substrate, which is strong enough to fix the boundary to not dewet or be flattened in the broad temperature range of the reflow process, which is essential for a large-area fabrication. Furthermore, we demonstrate the modulation of the focal lengths of the lenses by controlling the initial polymer thickness coated on a substrate.

Infrared microlenses and gratings of chalcogenide: confined self-organization in solution processed thin liquid films

This work demonstrates the fabrication of chalcogenide microstructures such as gratings, lenses and needles using a lithographically directed, evaporative self-organization of chalcogenide thin liquid films for the first time. Using a two-step annealing protocol, excess solvent of freshly coated ChG films is eliminated and then the liquid films are patterned using elastomeric masters with continuous or disconnected features during solvent evaporation. Although microcontact printing or capillary flow lithography has been proven to be useful to create continuous gratings and waveguide like structures in solid films, our method overcomes the limitation of structural continuity of the generated pattern and uses self-organization of solute ChG within the master's confinement to produce isolated microstructures. Fabrication of disjointed arrays of microlenses of various dimensions as well as conical shaped needles in ChG thin films has been demonstrated for relevant optical IR applications. This methodology establishes evaporative self-organization of ChG thin films as a viable alternative to creating microstructures in bulk ChG with hot-embossing, bypassing the need for ultra high temperature processing.

Directed self-organization of a glassy material is demonstrated to generate ultra smooth, optically useful micro structures such as lens arrays and gratings. Liquid thin films of chalcogenide re-organize within the confinement provided by the mould.

Hierarchical Order in Dewetted Block Copolymer Thin Films on Chemically Patterned Surfaces

We investigated the dewetting process on flat and chemically patterned surfaces of ultrathin films (thickness between 2 and 15 nm) of a cylinder forming polystyrene- block-poly(methyl methacrylate) (PS- b-PMMA) spin coated on poly(styrene- r-methyl methacrylate) random copolymers (RCPs). When the PS- b-PMMA film dewets on a 2 nm-thick RCP layer, the ordering of the hexagonally packed PMMA cylinders in the dewetted structures extends over distances far exceeding the correlation length obtained in continuous block copolymer (BCP) films. As a result, micrometer-sized circular droplets featuring defectless single grains of self-assembled PS- b-PMMA with PMMA cylinders perpendicularly oriented with respect to the substrate are generated and randomly distributed on the substrate. Additionally, alignment of the droplets along micrometric lines was achieved by performing the dewetting process on large-scale chemically patterned stripes of 2 nm thick RCP films by laser lithography. By properly adjusting the periodicity of the chemical pattern, it was possible to tune and select the geometrical characteristics of the dewetted droplets in terms of maximum thickness, contact angle and diameter while maintaining the defectless single grain perpendicular cylinder morphology of the circular droplets.

Electric-Field-Induced Nanoscale Surface Patterning in Mexylaminotriazine-Functionalized Molecular Glass Derivatives

Nanoscale surface patterns were observed in thin films of mexylaminotriazine-functionalized glasses containing polar groups upon the application of an electric field at temperatures over their glass transition temperatures (Tg). This phenomenon occurred due to the surface deformation process initiated by external electric field instabilities on the films. The minimal surface deformation temperature (Tdewet) relative to Tg was found to increase as a function of the polarity of the substituents and the surface pattern roughness was observed to increase linearly with temperature for a fixed electric field and exposure time. Reversal of the electrical field polarity and the use of both hydrophilic and hydrophobic substrates did not significantly change the surface deformation behavior of the films, which is due to the deposition of charges at the free interface. The application of a mask between the electric field electrodes allowed to selectively pattern areas that are exposed. Furthermore, it was observed that this surface deformation behavior was reversible, since heating the films to a temperature above Tg in the absence of an electric field caused the erasure of all surface patterns.

Instability, self-organization and pattern formation in thin soft films

The free surface of a thin soft polymer film is often found to become unstable and self-organizes into various meso-scale structures. In this article we classify the instability of a thin polymer film into three broad categories, which are: category 1: instability of an ultra-thin (<100 nm) viscous film engendered by amplification of thermally excited surface capillary waves due to interfacial dispersive van der Waals forces; category 2: instability arising from the attractive inter-surface interactions between the free surface of a soft film exhibiting room temperature elasticity and another rigid surface in its contact proximity; and category 3: instability caused by an externally applied field such as an electric field or a thermal gradient, observed in both viscous and elastic films. We review the salient features of each instability class and highlight how characteristic length scales, feature morphologies, evolution pathways, etc. depend on initial properties such as film thickness, visco-elasticity (rheology), residual stress, and film preparation conditions. We emphasize various possible strategies for aligning and ordering of the otherwise isotropic structures by combining the essential concepts of bottom-up and top-down approaches. A perspective, including a possible future direction of research, novelty and limitations of the methods, particularly in comparison to the existing patterning techniques, is also presented for each setting.

Nanopatterning of thin polymer films by controlled dewetting on a topographic pre-pattern

We develop a non-lithographic method for fabricating ordered micro/nanostructures of polymer thin films based on controlled dewetting of the films on topographically pre-patterned substrates with a large area. An ordered nanopattern of polystyrene (PS) is accomplished by thermal treatment of a thin PS film above its Tg spin coated on a topographically patterned substrate. We investigate the influence of pattern geometry on the final morphology of the dewetted polymer films using both mesa and indent patterned substrates. The controlled dewetting, initiated preferentially at the edges of individual pre-patterned mesas, in particular gives rise to spherical cap domains located at the center of the mesas. The domains are much smaller than the individual mesas as a consequence of the significant pattern reduction to nearly 300%. The arrays of 70 nm PS nano-sphere caps are obtained from arrays of 200 nm square pre-patterned mesas. Our method is also applicable for other polymers such as a poly(4-vinyl pyridine) (P4VP) containing Rhodamine 6G (Rh6G) dye on a pre-patterned PS substrate and successfully produced highly fluorescent stable nanopatterned films.