Plasma polymer tailoring of the topography and chemistry of surfaces at the nanoscale

Monitoring Photochemical Reactions Using Marangoni Flows

We evaluated the sensitivity and time resolution of a technique for photochemical reaction monitoring based on the interferometric detection of the deformation of liquid films. The reaction products change the local surface tension and induce Marangoni flow in the liquid film. As a model system, we consider the irradiation of the aliphatic hydrocarbon squalane with broadband deep-UV light. We developed a numerical model that quantitatively reproduces the flow patterns observed in the experiments. Moreover, we present self-similarity solutions that elucidate the mechanisms governing different stages of the dynamics and their parametric dependence. Surface tension changes as small as Δγ = 10-6 N/m can be detected, and time resolutions of <1 s can be achieved.

UV-Induced Micropatterning of Complex Functional Surfaces by Photopolymerization Controlled by Alkoxyamines

We report on the use of an alkoxyamine (AA) for fabrication of functional micropatterns with complex structures by UV mask lithography. The living character of the polymer surface and the vertical spatial control of the repolymerization reaction from few tens of nanometers to few micrometers were demonstrated. The impact of the main parameters governing the controlled polymerization and the reinitiation process activated by light or heat was investigated. Micropatterning is shown to be a powerful method to investigate the physicochemical molecular phenomena. It is possible to control the polymer microstructure thickness from few tens of nanometers to few micrometers. In the last section, some applications are provided showing the potential of the AA for generating covalently bonded hydrophilic/hydrophobic micropatterns or luminescent surfaces. This demonstrates the high versatility and interest of this route.

Direct nanopatterning of 100 nm metal oxide periodic structures by Deep-UV immersion lithography

Deep-UV lithography using high-efficiency phase mask has been developed to print 100 nm period grating on sol-gel based thin layer. High efficiency phase mask has been designed to produce a high-contrast interferogram (periodic fringes) under water immersion conditions for 244 nm laser. The demonstration has been applied to a new developed immersion-compatible sol-gel layer. A sol-gel photoresist prepared from zirconium alkoxides caped with methacrylic acids was developed to achieve 50 nm resolution in a single step exposure. The nanostructures can be thermally annealed into ZrO(2). Such route considerably simplifies the process for elaborating nanopatterned surfaces of transition metal oxides, and opens new routes for integrating materials of interest for applications in the field of photocatalysis, photovoltaic, optics, photonics or microelectronics.