Ordered polymeric microhole array made by selective wetting and applications for electrochemical microelectrode array

Micro/Nano Electrode Array Sensors: Advances in Fabrication and Emerging Applications in Bioanalysis

Due to the rapid development of micro/nano manufacturing techniques and the greater understanding in electrochemical principles and methods, micro/nano electrode array sensing has received much attention in recent years, especially in bioanalysis. This review aims to explore recent progress in innovative techniques for the construction of micro/nano electrode array sensor and the unique applications of various types of micro/nano electrode array sensors in biochemical analysis. Moreover, the new area of smart sensing benefited from miniaturization of portable micro/nano electrode array sensors as well as wearable intelligent devices are further discussed.

Do-It-Yourself Pyramidal Mold for Nanotechnology

The handcrafted fabrication of a pyramidal mold on a silicon wafer for nanopatterning was investigated. This process started with the manual delivery of an aqueous glycerol solution onto the SiO₂/Si wafer using a micropipette and subsequent drying to form a hemisphere whose diameter is in the range of hundreds of micrometers. A coating of polystyrene (PS) onto this wafer generates a circular hole caused by dewetting. Subsequently, anisotropic wet-etching with the PS film as a mask produces a pyramidal trench, whose apex approaches hundreds of nanometers. Various elastomeric materials were casted into this pyramidal mold. A pyramidal tip mounted on a simple micropositioner was used for electrochemistry and patterning of a protein. First, an agarose hydrogel was cast with a hydrogel pen for the electrochemical reaction (HYPER). The redox reaction at the HYPER-electrode interface demonstrated the characteristics of an ultramicroelectrode or bulk electrode based on the contact area. Second, the pyramidal polydimethylsiloxane served as a polymer pen for the contact printing of silane on a glass substrate. After the successive immobilization of biotin and avidin with fluorescence labeling, the resulting fluorescence image demonstrated the successful patterning of the protein. This new process for the creation of a pyramidal mold, referred to as a "do-it-yourself" process, offers advantages to nonspecialists in nanotechnology compared to conventional lithography, specifically simplicity, rapidity, and low cost.

Control of Polymer Phase Separation by Roughness Transfer Printing for 2D Microlens Arrays

Great efforts have been devoted to the control of phase separation between blended polymers in terms of the advantages for engineering functional topologies. A simple and straightforward pathway through roughness transfer printing (RTP) is proposed to realize the control of polymer phase separation. The additional roughness difference, which is introduced by trace agarose transferred from a hydrogel stamp, offers a great effect on the rate of nucleation and coalescence orientation of polymethylmethacrylate (PMMA) protrusions grown from a polydimethylsiloxane (PDMS) network. Using a particular topography of agarose stamp and a proper growth time in toluene atmosphere, a 2D microlens array with high uniformity is obtained that shows great potential for optical applications. Moreover, the control of polymer phase separation was successfully extended to the collection and identification of fingerprints with a high degree of replication.

Pitch reduction lithography by pressure-assisted selective wetting and thermal reflow

We report on a new pitch reduction lithographic technique by utilizing pressure-assisted selective wetting and thermal reflow. The primary line-and-space pattern of low molecular weight polystyrene (PS) (Mw=17,300) was formed by solvent-assisted capillary force lithography (CFL), on which a diluted photoresist (PR) solution was selectively filled into the spaces by the application of a slight pressure (200 g cm(-2)). Subsequent removal of the PS pattern by toluene and ashing process led to a line pattern with approximately 50% pitch reduction. It was observed that the size reduction and space to width ratios were controllable by changing PR concentration and ashing time.