Physical structure of standing-up aromatic SAMs revealed by scanning tunneling microscopy

Spontaneous assembly of silylethane-thiol derivatives on Au(111): a chemically robust thiol protecting group as the precursor for the direct formation of aromatic gold thiolate monolayers

Self-assembled monolayers (SAMs) on gold were obtained by the direct absorption of a fully conjugated phenylenethienylene derivative () presenting robust silylethane-thiol protecting groups as anchoring agents. The thiol deprotection and SAM formation have been evidenced by quartz crystal microbalance (QCM) measurements and X-ray photoelectron spectroscopy (XPS), and have been compared to the SAM obtained from its thioacetate analog (5). The chemically robust silylethane-thiol protecting group appeared as a surprisingly effective anchoring agent for the preparation of aromatic SAMs on Au(111), suitable for subsequent post-functionalization.

Rapid formation of a dense sulfur layer on gold through use of triphenylmethane sulfenyl chloride as a precursor

The use of triphenylmethane sulfenyl chloride as a new precursor leads to the efficient deposition of sulfur on polycrystalline gold and Au(111) substrates. The modified surfaces are characterized using X-ray photoelectron spectroscopy (XPS), electrochemistry and scanning tunneling microscopy (STM). The XPS data shows the rapid deposition of polymeric sulfur within very short times. Electrochemical stripping cyclic voltammetry (CV) confirms the rapid deposition and shows that high coverage values are achieved. STM imaging shows the formation of a wide range sulfur layer and production of the well-known etch pits. High-resolution STM images confirm the high density of the sulfur layers and show formation of a long-range phase consisting of rhombus structures close to the previously described rectangular structures along with other parallelograms and partial parallelograms. The present results do not show the initial formation of any organic self-assembled monolayer (SAM) indicating that the formation of polymeric sulfur does not result from the decomposition of an initial SAM as previously observed with alkyl and aryl thiolate-based SAMs. The suggested mechanism involves an initial reductive process similar to the one reported for thiocyanates and sulfenyl chlorides. This is followed by the dissociation of the Ph(3)C-S bond, leaving only sulfur on the surface, through a process leading to the recombination of the remaining fragments to yield triphenylmethyl chloride.

Nitro-substituted arene sulfenyl chlorides as precursors to the formation of aromatic SAMs

The formation of aromatic SAMs on Au(111) using three nitro-substituted arene sulfenyl chlorides (4-nitrophenyl sulfenyl chloride (1), 2-nitrophenyl sulfenyl chloride (2), and 2,4-dinitrophenyl sulfenyl chloride (3)) is studied. The formation of SAMs and their quality are investigated as a function of the position of the nitro substituent(s) on the aromatic ring. The modified surfaces are characterized by X-ray photoelectron spectroscopy (XPS), scanning tunneling microscopy (STM), polarization modulation infrared reflection absorption spectroscopy (PMIRRAS), and cyclic voltammetry (CV). The results show that all three compounds are deposited on Au within very short times. The corresponding coverages are determined using CV. However, only compound 1 forms stable, long-range, well-ordered SAMs. The 4-nitrophenyl thiolate is adsorbed nearly vertically on the Au surface. Compounds 2 and 3 both form lower-quality SAMs where the adsorbed nitro-phenyl thiolates are more tilted. These SAMs are less stable than the ones obtained with the 4-nitrosubsituted precursor and decompose with time, leaving only sulfur on the gold surface.