Investigation of fluorinated (Meth)acrylate monomers and macromonomers suitable for a hydroxy-containing acrylate monomer in UV nanoimprinting

The Preparation of Acryloxyl Group Functionalized Siloxane Polymers and the Study of Their Ultra Violet Curing Properties

Polysiloxane with multiple acryloxyl groups at the terminal site of the polymer chain was synthesized by the condensation reaction between hydroxyl-terminated polysiloxane and acryloyl chloride and used to improve the cross-linking density of UV-curable silicone materials initiated from dual acryloxy-terminated symmetric polysiloxane or single acryloxy-terminated asymmetric polysiloxane with the mixture of Irgacure 1173 and Irgacure 184 at a mass ratio of 1:1 as the photoinitiator. The effects of factors such as initiator composition, UV irradiation time, structure, and molecular weight of linear dual acryloxy-terminated or single acryloxy-terminated asymmetric siloxane oligomers on the gelation yield, thermal properties, water absorption, and water contact angle of UV-cured film were investigated. The synthesized cross-linking density modifier can be copolymerized with acryloxy-functionalized linear polysiloxanes under the action of a photoinitiator to increase the cross-link density of UV-cured products effectively. Both linear dual acryloxy-terminated or single acryloxy-terminated asymmetric siloxane oligomers can be copolymerized with cross-link density modifiers within 20 s of UV irradiation. The gelation yields of the UV-cured products obtained from the dual acryloxy-terminated siloxane oligomers were greater than 85%, and their surface water contact angles increased from 72.8° to 95.9° as the molecular weight of the oligomers increased. The gelation yields of UV-cured products obtained from single acryloxy-terminated asymmetric siloxane oligomers were less than 80%, and their thermal stabilities were inferior to those obtained from the dual acryloxy-terminated siloxane oligomers. However, the water contact angles of UV-cured products obtained from these single acryloxy-terminated asymmetric siloxane oligomers were all greater than 90°.

Plastic deformation of synthetic quartz nanopillars by nanoindentation for multi-scale and multi-level security artefact metrics

Individual authentication using artefact metrics has received increasing attention, as greater importance has been placed on the security of individual information. These artefact metrics must satisfy the requirements of individuality, measurement stability, durability, and clone resistance, in addition to possessing unique physical features. In this study, we proposed that nanostructures of synthetic quartz (SQ) deposited on an SQ plate may provide sophisticated artefact metrics if morphological changes could be intentionally introduced into the SQ nanostructures at certain positions. We fabricated SQ nanopillars using a mass-production method (ultraviolet nanoimprint lithography) and investigated their mechanical deformation using nanoindentation with a spheroid diamond tip through a loading and unloading cycle. The SQ nanopillars with an aspect ratio of 1 (i.e., diameters D of 100 and 200 nm with corresponding heights H of 100 and 200 nm, respectively) could be plastically deformed without collapsing within a specified pillar-array format at programmed positions. The plastically deformed SQ nanopillar arrays demonstrated multi-scale (sub-millimetre, micrometre, and nanometre) and multi-level (shape, area, diameter, and height) individuality authentication and clone resistance. Because SQ is physically and chemically stable and durable, individuality authentication can be a highly reliable tool on Earth and in space.

Selection of Diacrylate Monomers for Sub-15 nm Ultraviolet Nanoimprinting by Resonance Shear Measurement

In UV nanoimprinting, the selection of monomers suitable for sub-15 nm patterning is difficult because the filling behavior of resin at this scale still remains scientifically unclear. We demonstrate sub-15 nm patterning by UV nanoimprinting using silica molds with 20, 15, and 7 nm diameter holes; however, the 7 nm diameter pillar patterns were not fabricated using hydroxy-containing monomers. The filling behavior into silica holes of around 10 nm depended on the chemical structure of the monomers. Resonance shear measurements revealed the following: (1) The viscosities of hydroxy-containing monomers confined between chlorodimethyl(3,3,3-trifluoropropyl)silane (FAS3-Cl)-modified surfaces began to increase at distances shorter than those of the monomers between unmodified surfaces. (2) The monomers confined between tridecafluoro-1,1,2,2-tetrahydrooctyltrimethoxysilane-modified surfaces were squeezed out when the surface-surface distance decreased at less than 7 nm. The measured viscosities between the FAS3-Cl-modified silica surfaces were correlated with the insufficient filling behavior into the silica holes of around 10 nm in UV nanoimprinting. Contact angle measurements provided an additional insight that a higher wettability of the monomers onto the antisticking chemisorbed monolayers resulted in imprinted patterns with higher aspect ratios. Considering the increase in the monomer viscosity in the nanospace and the wettability of monomers onto chemisorbed monolayers, we concluded that the monomer showing low viscosity under confinement and high wettability onto the mold surface was suitable for single-digit nanometer UV nanoimprinting.

Nanometer-Resolved Fluidity of an Oleophilic Monomer between Silica Surfaces Modified with Fluorinated Monolayers for Nanoimprinting

Ultraviolet (UV) nanoimprinting has the potential to fabricate sub-15 nm resin patterns, but the interfacial fluidity of organic monomers near monomer liquid/mold solid interfaces related to filling nanoscale mold recesses with UV-curable resins still remains unclear. In this study, we demonstrated that surface forces and resonance shear measurements were helpful to select a surface modifier appropriate for silica mold surfaces for UV nanoimprinting with the low-viscosity monomer 1,10-decanediol diacrylate. Surface forces between silica surfaces mediated with the diacrylate monomer and fluidities of the monomer were investigated with nanometer resolution. Chemical vapor surface modification of silica surfaces with chlorodimethyl(3,3,3-trifluoropropyl)silane (FAS3-Cl) and tridecafluoro-1,1,2,2-tetrahydrooctyltrimethoxysilane (FAS13) gave fluorinated silica surfaces with root-mean-square roughness of less than 0.24 nm suitable for the measurements. When the distance D between two silica surfaces was decreased stepwise in the range of 0-30 nm, monomer viscosity between cleaned silica surfaces increased markedly at D < 6 nm. Surface modification with FAS3-Cl suppressed this increase of interfacial monomer viscosity. In contrast, FAS13-modified silica surfaces caused a jump-in phenomenon at approximately D = 7-9 nm, suddenly decreasing to D = 1 nm as the monomer fluid layer was squeezed out. We concluded that FAS3-Cl was appropriate as a fluorinated surface modifier for silica molds used in UV nanoimprinting with an oleophilic low-viscosity monomer, because the chemisorbed monolayer maintained low monomer viscosity near the surface/monomer interface, in addition to its low surface free energy and short CF₃CH₂CH₂- group.

Perfluorocyclobutyl Aryl Ether-Based ABC Amphiphilic Triblock Copolymer

A series of fluorine-containing amphiphilic ABC triblock copolymers comprising hydrophilic poly(ethylene glycol) (PEG) and poly(methacrylic acid) (PMAA), and hydrophobic poly(p-(2-(4-biphenyl)perfluorocyclobutoxy)phenyl methacrylate) (PBPFCBPMA) segments were synthesized by successive atom transfer radical polymerization (ATRP). First, PEG-Br macroinitiators bearing one terminal ATRP initiating group were prepared by chain-end modification of monohydroxy-terminated PEG via esterification reaction. PEG-b-PBPFCBPMA-Br diblock copolymers were then synthesized via ATRP of BPFCBPMA monomer initiated by PEG-Br macroinitiator. ATRP polymerization of tert-butyl methacrylate (tBMA) was directly initiated by PEG-b-PBPFCBPMA-Br to provide PEG-b-PBPFCBPMA-b-PtBMA triblock copolymers with relatively narrow molecular weight distributions (M_w/M_n ≤ 1.43). The pendant tert-butyoxycarbonyls were hydrolyzed to carboxyls in acidic environment without affecting other functional groups for affording PEG-b-PBPFCBPMA-b-PMAA amphiphilic triblock copolymers. The critical micelle concentrations (cmc) were determined by fluorescence spectroscopy using N-phenyl-1-naphthylamine as probe and the self-assembly behavior in aqueous media were investigated by transmission electron microscopy. Large compound micelles and bowl-shaped micelles were formed in neutral aqueous solution. Interestingly, large compound micelles formed by triblock copolymers can separately or simultaneously encapsulate hydrophilic Rhodamine 6G and hydrophobic pyrene agents.

Diazoketo-functionalized POSS resists for high performance replica molds of ultraviolet-nanoimprint lithography

Novel polyhedral oligomeric silsesquioxane (POSS) resists, which are based on a new photo-crosslinking system via Wolff rearrangement, are developed as ideal replica mold materials for ultraviolet-nanoimprint lithography. These POSS resist materials are synthesized by incorporating diazoketo and hydroxyl groups into the POSS core. The resist materials have exhibited a variety of desirable properties as replica molds, such as high modulus, low shrinkage ratio, high transparency, low surface energy, and resistance to organic solvents. The resultant replica molds exhibit a high resolution patterning capacity. These economic fabrication methods of replica molds with high mechanical durability and good releasing properties are potentially useful for versatile applications in the area of mold-based lithography.

Microphase Structure, Crystallization Behavior, and Wettability Properties of Novel Fluorinated Copolymers Poly(perfluoroalkyl acrylate-co-stearyl acrylate) Containing Short Perfluorohexyl Chains

Novel fluorinated copolymers of stearyl acrylate (SA) and (perfluorohexyl)ethyl acrylate (C6A), (perfluorohexyl)ethyl methacrylate (C6MA), 2-[[[[2-(perfluorohexyl)]-sulfonyl]methyl] amino]ethyl acrylate (C6SA), and methacrylate (C6SMA) were synthesized via miniemulsion copolymerization. The extremely hydrophobic monomers perfluoroalkyl acrylate (FA) and SA acted as the reactive costabilizer in the miniemulsion system. The microstructure and surface wetting properties of the copolymers were characterized by (1)H NMR, FT-IR, and dynamic contact angle test. The crystallization behaviors and fine surface structures of the copolymer films were determined by differential scanning calorimetry (DSC) and wide-angle X-ray diffraction (WAXD) analysis. The self-assembled aggregation and roughness of the copolymer films were investigated by atomic force microscopy (AFM). The results showed that the fluorinated side chains interrupted and impeded the crystallizable side chains of SA from forming complete crystals. And the Tm and ΔHf of the copolymers were decreased as a consequence of this effect. The fluorinated side chains in P(C6A/SA) and P(C6MA/SA) arranged between the crystallizable hydrocarbon side chains of SA, while the crystallization structure of fluorinated and nonfluorinated pendant groups existed all at once in copolymers P(C6SA/SA) and P(C6SMA/SA). The four copolymers exhibited very low surface free energy and excellent dynamic water repellency attributed to the restriction of perfluoroalkyl groups combined with crystallization of stearyl pendant groups.

Preparation and hydrophobicity failure behavior of two kinds of fluorine-containing acrylic polyurethane coatings

Two kinds of fluorine-containing acrylic copolymers, prepared following an in situ radical polymerization fluorine modification method and a post-polymerization fluorine modification route, respectively, achieved different failure behaviors and hydrophobicities.

Synthesis of fluorinated monomer and formation of hydrophobic surface therefrom

A novel route was developed to prepare fluorine-containing copolymers with long side chains of perfluoroalkyl group.