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Hendeniya N, Hillery K, Chang BS. Processive Pathways to Metastability in Block Copolymer Thin Films. Polymers (Basel) 2023; 15:polym15030498. [PMID: 36771799 PMCID: PMC9920306 DOI: 10.3390/polym15030498] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 12/08/2022] [Revised: 01/02/2023] [Accepted: 01/04/2023] [Indexed: 01/19/2023] Open
Abstract
Block copolymers (BCPs) self-assemble into intricate nanostructures that enhance a multitude of advanced applications in semiconductor processing, membrane science, nanopatterned coatings, nanocomposites, and battery research. Kinetics and thermodynamics of self-assembly are crucial considerations in controlling the nanostructure of BCP thin films. The equilibrium structure is governed by a molecular architecture and the chemistry of its repeat units. An enormous library of materials has been synthesized and they naturally produce a rich equilibrium phase diagram. Non-equilibrium phases could potentially broaden the structural diversity of BCPs and relax the synthetic burden of creating new molecules. Furthermore, the reliance on synthesis could be complicated by the scalability and the materials compatibility. Non-equilibrium phases in BCPs, however, are less explored, likely due to the challenges in stabilizing the metastable structures. Over the past few decades, a variety of processing techniques were introduced that influence the phase transformation of BCPs to achieve a wide range of morphologies. Nonetheless, there is a knowledge gap on how different processive pathways can induce and control the non-equilibrium phases in BCP thin films. In this review, we focus on different solvent-induced and thermally induced processive pathways, and their potential to control the non-equilibrium phases with regards to their unique aspects and advantages. Furthermore, we elucidate the limitations of these pathways and discuss the potential avenues for future investigations.
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2
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Pula P, Leniart A, Majewski PW. Solvent-assisted self-assembly of block copolymer thin films. SOFT MATTER 2022; 18:4042-4066. [PMID: 35608282 DOI: 10.1039/d2sm00439a] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/15/2023]
Abstract
Solvent-assisted block copolymer self-assembly is a compelling method for processing and advancing practical applications of these materials due to the exceptional level of the control of BCP morphology and significant acceleration of ordering kinetics. Despite substantial experimental and theoretical efforts devoted to understanding of solvent-assisted BCP film ordering, the development of a universal BCP patterning protocol remains elusive; possibly due to a multitude of factors which dictate the self-assembly scenario. The aim of this review is to aggregate both seminal reports and the latest progress in solvent-assisted directed self-assembly and to provide the reader with theoretical background, including the outline of BCP ordering thermodynamics and kinetics phenomena. We also indicate significant BCP research areas and emerging high-tech applications where solvent-assisted processing might play a dominant role.
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Affiliation(s)
- Przemyslaw Pula
- Department of Chemistry, University of Warsaw, Warsaw 02089, Poland.
| | - Arkadiusz Leniart
- Department of Chemistry, University of Warsaw, Warsaw 02089, Poland.
| | - Pawel W Majewski
- Department of Chemistry, University of Warsaw, Warsaw 02089, Poland.
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3
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Weak Polyelectrolytes as Nanoarchitectonic Design Tools for Functional Materials: A Review of Recent Achievements. MOLECULES (BASEL, SWITZERLAND) 2022; 27:molecules27103263. [PMID: 35630741 PMCID: PMC9145934 DOI: 10.3390/molecules27103263] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 04/29/2022] [Revised: 05/13/2022] [Accepted: 05/16/2022] [Indexed: 12/23/2022]
Abstract
The ionization degree, charge density, and conformation of weak polyelectrolytes can be adjusted through adjusting the pH and ionic strength stimuli. Such polymers thus offer a range of reversible interactions, including electrostatic complexation, H-bonding, and hydrophobic interactions, which position weak polyelectrolytes as key nano-units for the design of dynamic systems with precise structures, compositions, and responses to stimuli. The purpose of this review article is to discuss recent examples of nanoarchitectonic systems and applications that use weak polyelectrolytes as smart components. Surface platforms (electrodeposited films, brushes), multilayers (coatings and capsules), processed polyelectrolyte complexes (gels and membranes), and pharmaceutical vectors from both synthetic or natural-type weak polyelectrolytes are discussed. Finally, the increasing significance of block copolymers with weak polyion blocks is discussed with respect to the design of nanovectors by micellization and film/membrane nanopatterning via phase separation.
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4
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Neppalli SN, Collins TW, Gholamvand Z, Cummins C, Morris MA, Mokarian-Tabari P. Defining Swelling Kinetics in Block Copolymer Thin Films: The Critical Role of Temperature and Vapour Pressure Ramp. Polymers (Basel) 2021; 13:4238. [PMID: 34883741 PMCID: PMC8659708 DOI: 10.3390/polym13234238] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/15/2021] [Revised: 11/26/2021] [Accepted: 11/30/2021] [Indexed: 11/25/2022] Open
Abstract
We studied the kinetics of swelling in high-χ lamellar-forming poly(styrene)-block- poly(lactic acid) (PS-b-PLA) block copolymer (BCP) by varying the heating rate and monitoring the solvent vapour pressure and the substrate temperature in situ during solvo-thermal vapour annealing (STVA) in an oven, and analysing the resulting morphology. Our results demonstrate that there is not only a solvent vapour pressure threshold (120 kPa), but also that the rate of reaching this pressure threshold has a significant effect on the microphase separation and the resulting morphologies. To study the heating rate effect, identical films were annealed in a tetrahydrofuran (THF) vapour environment under three different ramp regimes, low (rT<1 °C/min), medium (2
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Affiliation(s)
- Sudhakara Naidu Neppalli
- School of Chemistry, The University of Dublin, Trinity College Dublin, D02 PN40 Dublin, Ireland; (S.N.N.); (Z.G.); (M.A.M.)
- Advance Material and BioEngineering Research (AMBER) Centre and CRANN, Trinity College Dublin, D02 PN40 Dublin, Ireland
| | - Timothy W. Collins
- Department of Chemistry, University College Cork, Tyndall National Institute, T12 K8AF Cork, Ireland;
| | - Zahra Gholamvand
- School of Chemistry, The University of Dublin, Trinity College Dublin, D02 PN40 Dublin, Ireland; (S.N.N.); (Z.G.); (M.A.M.)
- Advance Material and BioEngineering Research (AMBER) Centre and CRANN, Trinity College Dublin, D02 PN40 Dublin, Ireland
| | - Cian Cummins
- Centre de Recherche Paul Pascal (CRPP), The French National Centre for Scientific Research (CNRS), University of Bordeaux, UMR 5031, 115 Avenue Schweitzer, 33600 Pessac, France;
- Laboratoire de Chimie des Polymeres Organiques (LCPO), University of Bordeaux, CNRS, Bordeaux INP, 16 Avenue Pey-Berland, CEDEX, 33607 Pessac, France
| | - Michael A. Morris
- School of Chemistry, The University of Dublin, Trinity College Dublin, D02 PN40 Dublin, Ireland; (S.N.N.); (Z.G.); (M.A.M.)
- Department of Chemistry, University College Cork, Tyndall National Institute, T12 K8AF Cork, Ireland;
| | - Parvaneh Mokarian-Tabari
- School of Chemistry, The University of Dublin, Trinity College Dublin, D02 PN40 Dublin, Ireland; (S.N.N.); (Z.G.); (M.A.M.)
- Advance Material and BioEngineering Research (AMBER) Centre and CRANN, Trinity College Dublin, D02 PN40 Dublin, Ireland
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5
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Robertson M, Zhou Q, Ye C, Qiang Z. Developing Anisotropy in Self-Assembled Block Copolymers: Methods, Properties, and Applications. Macromol Rapid Commun 2021; 42:e2100300. [PMID: 34272778 DOI: 10.1002/marc.202100300] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/10/2021] [Revised: 06/23/2021] [Indexed: 01/03/2023]
Abstract
Block copolymers (BCPs) self-assembly has continually attracted interest as a means to provide bottom-up control over nanostructures. While various methods have been demonstrated for efficiently ordering BCP nanodomains, most of them do not generically afford control of nanostructural orientation. For many applications of BCPs, such as energy storage, microelectronics, and separation membranes, alignment of nanodomains is a key requirement for enabling their practical use or enhancing materials performance. This review focuses on summarizing research progress on the development of anisotropy in BCP systems, covering a variety of topics from established aligning techniques, resultant material properties, and the associated applications. Specifically, the significance of aligning nanostructures and the anisotropic properties of BCPs is discussed and highlighted by demonstrating a few promising applications. Finally, the challenges and outlook are presented to further implement aligned BCPs into practical nanotechnological applications, where exciting opportunities exist.
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Affiliation(s)
- Mark Robertson
- School of Polymer Science and Engineering, University of Southern Mississippi, Hattiesburg, MS, 39406, USA
| | - Qingya Zhou
- State Key Laboratory for Modification of Chemical Fibers and Polymer Materials, College of Materials Science and Engineering, Donghua University, Shanghai, 201620, China
| | - Changhuai Ye
- State Key Laboratory for Modification of Chemical Fibers and Polymer Materials, College of Materials Science and Engineering, Donghua University, Shanghai, 201620, China
| | - Zhe Qiang
- School of Polymer Science and Engineering, University of Southern Mississippi, Hattiesburg, MS, 39406, USA
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6
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Selkirk A, Prochukhan N, Lundy R, Cummins C, Gatensby R, Kilbride R, Parnell A, Baez Vasquez J, Morris M, Mokarian-Tabari P. Optimization and Control of Large Block Copolymer Self-Assembly via Precision Solvent Vapor Annealing. Macromolecules 2021; 54:1203-1215. [PMID: 34276069 PMCID: PMC8280752 DOI: 10.1021/acs.macromol.0c02543] [Citation(s) in RCA: 16] [Impact Index Per Article: 5.3] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/13/2020] [Revised: 01/07/2021] [Indexed: 01/08/2023]
Abstract
The self-assembly of ultra-high molecular weight (UHMW) block copolymers (BCPs) remains a complex and time-consuming endeavor owing to the high kinetic penalties associated with long polymer chain entanglement. In this work, we report a unique strategy of overcoming these kinetic barriers through precision solvent annealing of an UHMW polystyrene-block-poly(2-vinylpyridine) BCP system (M w: ∼800 kg/mol) by fast swelling to very high levels of solvent concentration (ϕs). Phase separation on timescales of ∼10 min is demonstrated once a thickness-dependent threshold ϕs value of ∼0.80-0.86 is achieved, resulting in lamellar feature spacings of over 190 nm. The threshold ϕs value was found to be greater for films with higher dry thickness (D 0) values. Tunability of the domain morphology is achieved through controlled variation of both D 0 and ϕs, with the kinetically unstable hexagonal perforated lamellar (HPL) phase observed at ϕs values of ∼0.67 and D 0 values of 59-110 nm. This HPL phase can be controllably induced into an order-order transition to a lamellar morphology upon further increase of ϕs to 0.80 or above. As confirmed by grazing-incidence small-angle X-ray scattering, the lateral ordering of the lamellar domains is shown to improve with increasing ϕs up to a maximum value at which the films transition to a disordered state. Thicker films are shown to possess a higher maximum ϕs value before transitioning to a disordered state. The swelling rate is shown to moderately influence the lateral ordering of the phase-separated structures, while the amount of hold time at a particular value of ϕs does not notably enhance the phase separation process. These large period self-assembled lamellar domains are then employed to facilitate pattern transfer using a liquid-phase infiltration method, followed by plasma etching, generating ordered, high aspect ratio Si nanowall structures with spacings of ∼190 nm and heights of up to ∼500 nm. This work underpins the feasibility of a room-temperature, solvent-based annealing approach for the reliable and scalable fabrication of sub-wavelength nanostructures via BCP lithography.
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Affiliation(s)
- Andrew Selkirk
- Advanced
Material and BioEngineering Research Centre (AMBER), Trinity College Dublin, The University of Dublin, Dublin 2, Ireland
- School
of Chemistry, Trinity College Dublin, The
University of Dublin, Dublin 2, Ireland
| | - Nadezda Prochukhan
- Advanced
Material and BioEngineering Research Centre (AMBER), Trinity College Dublin, The University of Dublin, Dublin 2, Ireland
- School
of Chemistry, Trinity College Dublin, The
University of Dublin, Dublin 2, Ireland
| | - Ross Lundy
- Advanced
Material and BioEngineering Research Centre (AMBER), Trinity College Dublin, The University of Dublin, Dublin 2, Ireland
- School
of Chemistry, Trinity College Dublin, The
University of Dublin, Dublin 2, Ireland
| | - Cian Cummins
- CNRS,
Bordeaux INP, LCPO, UMR 5629 and CNRS, Centre de Recherche Paul Pascal,
UMR 5031, Université de Bordeaux, Pessac F-33600, France
| | - Riley Gatensby
- Advanced
Material and BioEngineering Research Centre (AMBER), Trinity College Dublin, The University of Dublin, Dublin 2, Ireland
- School
of Chemistry, Trinity College Dublin, The
University of Dublin, Dublin 2, Ireland
| | - Rachel Kilbride
- Department
of Physics and Astronomy, University of
Sheffield, Sheffield S3 7RH, U.K.
| | - Andrew Parnell
- Department
of Physics and Astronomy, University of
Sheffield, Sheffield S3 7RH, U.K.
| | - Jhonattan Baez Vasquez
- Advanced
Material and BioEngineering Research Centre (AMBER), Trinity College Dublin, The University of Dublin, Dublin 2, Ireland
- School
of Chemistry, Trinity College Dublin, The
University of Dublin, Dublin 2, Ireland
| | - Michael Morris
- Advanced
Material and BioEngineering Research Centre (AMBER), Trinity College Dublin, The University of Dublin, Dublin 2, Ireland
- School
of Chemistry, Trinity College Dublin, The
University of Dublin, Dublin 2, Ireland
| | - Parvaneh Mokarian-Tabari
- Advanced
Material and BioEngineering Research Centre (AMBER), Trinity College Dublin, The University of Dublin, Dublin 2, Ireland
- School
of Chemistry, Trinity College Dublin, The
University of Dublin, Dublin 2, Ireland
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7
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Loudy CM, Chasvised S, Paybou C, Courrèges C, Allouche J, Martinez H, Bousquet A, Billon L. Revealing surface functionalities via microwave for the para-fluoro-Thiol click reaction. POLYMER 2020. [DOI: 10.1016/j.polymer.2020.122675] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/26/2022]
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8
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Liao Y, Liu K, Chen WC, Wei B, Borsali R. Robust Sub-10 nm Pattern of Standing Sugar Cylinders via Rapid “Microwave Cooking”. Macromolecules 2019. [DOI: 10.1021/acs.macromol.9b01513] [Citation(s) in RCA: 6] [Impact Index Per Article: 1.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
Affiliation(s)
- Yingjie Liao
- Key Laboratory of Advanced Display and System Application, Ministry of Education, Shanghai University, Shanghai 200072, China
- University Grenoble Alpes, CERMAV-CNRS, 38000 Grenoble, France
| | - Kangping Liu
- Key Laboratory of Advanced Display and System Application, Ministry of Education, Shanghai University, Shanghai 200072, China
| | - Wen-Chang Chen
- Department of Chemical Engineering, National Taiwan University, Taipei 10617, Taiwan
| | - Bin Wei
- Key Laboratory of Advanced Display and System Application, Ministry of Education, Shanghai University, Shanghai 200072, China
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9
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Han J, Kim JS, Shin JM, Yun H, Kim Y, Park H, Kim BJ. Rapid solvo-microwave annealing for optimizing ordered nanostructures and crystallization of regioregular polythiophene-based block copolymers. Polym Chem 2019. [DOI: 10.1039/c9py00871c] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/23/2022]
Abstract
Solvo-microwave annealing is an effective method for producing thin films of polythiophene-based block copolymers with ordered structures and high crystallinity in a very short processing time (∼3 min).
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Affiliation(s)
- Junghun Han
- Department of Chemical and Biomolecular Engineering
- Korea Advanced Institute of Science and Technology (KAIST)
- Daejeon 34141
- Republic of Korea
| | - Jin-Seong Kim
- Department of Chemical and Biomolecular Engineering
- Korea Advanced Institute of Science and Technology (KAIST)
- Daejeon 34141
- Republic of Korea
| | - Jae Man Shin
- Department of Chemical and Biomolecular Engineering
- Korea Advanced Institute of Science and Technology (KAIST)
- Daejeon 34141
- Republic of Korea
| | - Hongseok Yun
- Department of Chemical and Biomolecular Engineering
- Korea Advanced Institute of Science and Technology (KAIST)
- Daejeon 34141
- Republic of Korea
| | - Youngkwon Kim
- Department of Chemical and Biomolecular Engineering
- Korea Advanced Institute of Science and Technology (KAIST)
- Daejeon 34141
- Republic of Korea
| | - Hyeonjung Park
- Department of Chemical and Biomolecular Engineering
- Korea Advanced Institute of Science and Technology (KAIST)
- Daejeon 34141
- Republic of Korea
| | - Bumjoon J. Kim
- Department of Chemical and Biomolecular Engineering
- Korea Advanced Institute of Science and Technology (KAIST)
- Daejeon 34141
- Republic of Korea
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10
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Xiong S, Li D, Hur SM, Craig GSW, Arges CG, Qu XP, Nealey PF. The Solvent Distribution Effect on the Self-Assembly of Symmetric Triblock Copolymers during Solvent Vapor Annealing. Macromolecules 2018. [DOI: 10.1021/acs.macromol.8b01275] [Citation(s) in RCA: 13] [Impact Index Per Article: 2.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/27/2023]
Affiliation(s)
| | | | - Su-Mi Hur
- School of Polymer Science and Engineering, Chonnam National University, Gwangju, 61186 Korea
| | - Gordon S. W. Craig
- Institute for Molecular Engineering, University of Chicago, Chicago, Illinois 60637, United States
| | - Christopher G. Arges
- Cain Department of Chemical Engineering, Louisiana State University, Baton Rouge, Louisiana 70803, United States
| | | | - Paul F. Nealey
- Institute for Molecular Engineering, University of Chicago, Chicago, Illinois 60637, United States
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11
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Benoot N, Marcasuzaa P, Pessoni L, Chasvised S, Reynaud S, Bousquet A, Billon L. Hierarchically organized honeycomb films through block copolymer directed self-assembly in "breath figure" templating and soft microwave-triggered annealing. SOFT MATTER 2018; 14:4874-4880. [PMID: 29850760 DOI: 10.1039/c8sm00137e] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
Hierarchically organized polymer films are produced with a high level of order from the combination of block copolymer nanophase segregation, "breath figure" methodology and microwave irradiation. A block copolymer based on poly(methyl methacrylate) and poly(n-butylacrylate) featuring cylindrical nanopatterns is involved in the "breath figure" process to create a microporous honeycomb structure. These films are submitted to microwave annealing to enhance the degree of ordering of the nano-segregation without the destruction of the honeycomb microstructure, which is not possible by classical thermal or solvent annealing. Ellipsometry, optical and atomic force microscopy are used to study three key parameters; the substrate nature, the film thickness and the microwave irradiation power. The silicon wafer is the substrate of choice to efficiently act as the heating transfer element and 60 seconds at 10 watts are enough to nicely order the 1 μm thick copolymer films. These conditions are eventually applied on hierarchically organized polymer films to obtain a hexagonal array of 100 nm deep holes within a matrix of perpendicularly aligned nano-cylinders.
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Affiliation(s)
- Nicolas Benoot
- Univ Pau & Pays Adour, CNRS UMR 5254, IPREM, Equipe Physique & Chimie des Polymères, 2 avenue Angot, 64053, Pau, France.
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12
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Liao Y, Chen WC, Borsali R. Carbohydrate-Based Block Copolymer Thin Films: Ultrafast Nano-Organization with 7 nm Resolution Using Microwave Energy. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2017; 29. [PMID: 28681944 DOI: 10.1002/adma.201701645] [Citation(s) in RCA: 21] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/23/2017] [Revised: 05/11/2017] [Indexed: 05/12/2023]
Abstract
Block copolymers (BCP) can self-assemble into nanoscale patterns with a wide variety of applications in the semiconductor industry. The self-assembly of BCPs is commonly accomplished by solvent vapor or thermal annealing, but generally these methods require long time (few hours) to obtain nanostructured thin films. In this contribution, a new and ultrafast method (using microwaves) is proposed-high temperature solvent vapor annealing (HTSVA), combining solvent vapor annealing with thermal annealing, to achieve fast and controllable self-assembly of amphiphilic BCP thin films. A promising carbohydrate-based BCP capable of forming cylindrical patterns with some of the smallest feature sizes is used for demonstrating how to obtain a highly ordered vertical cylindrical pattern with sub-10 nm feature sizes in few seconds by HTSVA. HTSVA provides not only a simple way to achieve BCP fast self-assembly in practical applications but also a tool to study the self-assembly behavior of BCPs under extreme conditions.
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Affiliation(s)
- Yingjie Liao
- CERMAV, CNRS, 38041, Grenoble, France
- CERMAV, Grenoble Alpes University, 38041, Grenoble, France
| | - Wen-Chang Chen
- Department of Chemical Engineering, National Taiwan University, Taipei, 10617, Taiwan
| | - Redouane Borsali
- CERMAV, CNRS, 38041, Grenoble, France
- CERMAV, Grenoble Alpes University, 38041, Grenoble, France
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13
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Mokarian-Tabari P, Senthamaraikannan R, Glynn C, Collins TW, Cummins C, Nugent D, O'Dwyer C, Morris MA. Large Block Copolymer Self-Assembly for Fabrication of Subwavelength Nanostructures for Applications in Optics. NANO LETTERS 2017; 17:2973-2978. [PMID: 28379701 DOI: 10.1021/acs.nanolett.7b00226] [Citation(s) in RCA: 22] [Impact Index Per Article: 3.1] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
Nanostructured surfaces are common in nature and exhibit properties such as antireflectivity (moth eyes), self-cleaning (lotus leaf), iridescent colors (butterfly wings), and water harvesting (desert beetles). We now understand such properties and can mimic some of these natural structures in the laboratory. However, these synthetic structures are limited since they are not easily mass produced over large areas due to the limited scalability of current technologies such as UV-lithography, the high cost of infrastructure, and the difficulty in nonplanar surfaces. Here, we report a solution process based on block copolymer (BCP) self-assembly to fabricate subwavelength structures on large areas of optical and curved surfaces with feature sizes and spacings designed to efficiently scatter visible light. Si nanopillars (SiNPs) with diameters of ∼115 ± 19 nm, periodicity of 180 ± 18 nm, and aspect ratio of 2-15 show a reduction in reflectivity by a factor of 100, <0.16% between 400 and 900 nm at an angle of incidence of 30°. Significantly, the reflectivity remains below 1.75% up to incident angles of 75°. Modeling the efficiency of a SiNP PV suggests a 24.6% increase in efficiency, representing a 3.52% (absolute) or 16.7% (relative) increase in electrical energy output from the PV system compared to AR-coated device.
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Affiliation(s)
- Parvaneh Mokarian-Tabari
- Advanced Materials and BioEngineering Research Centre (AMBER) & CRANN, Trinity College Dublin, The University of Dublin , Dublin 2, Ireland
- Department of Chemistry, University College Cork , Cork, T12 YN60, Ireland
| | - Ramsankar Senthamaraikannan
- Advanced Materials and BioEngineering Research Centre (AMBER) & CRANN, Trinity College Dublin, The University of Dublin , Dublin 2, Ireland
- Department of Chemistry, University College Cork , Cork, T12 YN60, Ireland
| | - Colm Glynn
- Department of Chemistry, University College Cork , Cork, T12 YN60, Ireland
| | - Timothy W Collins
- Department of Chemistry, University College Cork , Cork, T12 YN60, Ireland
| | - Cian Cummins
- Advanced Materials and BioEngineering Research Centre (AMBER) & CRANN, Trinity College Dublin, The University of Dublin , Dublin 2, Ireland
| | - David Nugent
- Elucidare Limited , Unit 9 Caxton House, Great Cambourne, CB23 6JN, U.K
| | - Colm O'Dwyer
- Department of Chemistry, University College Cork , Cork, T12 YN60, Ireland
- Micro-Nano Systems Centre, Tyndall National Institute , Lee Maltings, Cork, T12 R5CP, Ireland
| | - Michael A Morris
- Advanced Materials and BioEngineering Research Centre (AMBER) & CRANN, Trinity College Dublin, The University of Dublin , Dublin 2, Ireland
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14
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Toolan DTW, Adlington K, Isakova A, Kalamiotis A, Mokarian-Tabari P, Dimitrakis G, Dodds C, Arnold T, Terrill NJ, Bras W, Hermida Merino D, Topham PD, Irvine DJ, Howse JR. Selective molecular annealing: in situ small angle X-ray scattering study of microwave-assisted annealing of block copolymers. Phys Chem Chem Phys 2017; 19:20412-20419. [DOI: 10.1039/c7cp03578k] [Citation(s) in RCA: 9] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/08/2023]
Abstract
A new experimental set-up facilitating in situ SAXS during microwave annealing of polymers.
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15
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Majewski PW, Yager KG. Rapid ordering of block copolymer thin films. JOURNAL OF PHYSICS. CONDENSED MATTER : AN INSTITUTE OF PHYSICS JOURNAL 2016; 28:403002. [PMID: 27537062 DOI: 10.1088/0953-8984/28/40/403002] [Citation(s) in RCA: 58] [Impact Index Per Article: 7.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/23/2023]
Abstract
Block-copolymers self-assemble into diverse morphologies, where nanoscale order can be finely tuned via block architecture and processing conditions. However, the ultimate usage of these materials in real-world applications may be hampered by the extremely long thermal annealing times-hours or days-required to achieve good order. Here, we provide an overview of the fundamentals of block-copolymer self-assembly kinetics, and review the techniques that have been demonstrated to influence, and enhance, these ordering kinetics. We discuss the inherent tradeoffs between oven annealing, solvent annealing, microwave annealing, zone annealing, and other directed self-assembly methods; including an assessment of spatial and temporal characteristics. We also review both real-space and reciprocal-space analysis techniques for quantifying order in these systems.
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Affiliation(s)
- Pawel W Majewski
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, NY, USA. Department of Chemistry, University of Warsaw, Warsaw, Poland
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16
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Cummins C, Ghoshal T, Holmes JD, Morris MA. Strategies for Inorganic Incorporation using Neat Block Copolymer Thin Films for Etch Mask Function and Nanotechnological Application. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2016; 28:5586-618. [PMID: 26749571 DOI: 10.1002/adma.201503432] [Citation(s) in RCA: 41] [Impact Index Per Article: 5.1] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/16/2015] [Revised: 10/07/2015] [Indexed: 05/12/2023]
Abstract
Block copolymers (BCPs) and their directed self-assembly (DSA) has emerged as a realizable complementary tool to aid optical patterning of device elements for future integrated circuit advancements. Methods to enhance BCP etch contrast for DSA application and further potential applications of inorganic nanomaterial features (e.g., semiconductor, dielectric, metal and metal oxide) are examined. Strategies to modify, infiltrate and controllably deposit inorganic materials by utilizing neat self-assembled BCP thin films open a rich design space to fabricate functional features in the nanoscale regime. An understanding and overview on innovative ways for the selective inclusion/infiltration or deposition of inorganic moieties in microphase separated BCP nanopatterns is provided. Early initial inclusion methods in the field and exciting contemporary reports to further augment etch contrast in BCPs for pattern transfer application are described. Specifically, the use of evaporation and sputtering methods, atomic layer deposition, sequential infiltration synthesis, metal-salt inclusion and aqueous metal reduction methodologies forming isolated nanofeatures are highlighted in di-BCP systems. Functionalities and newly reported uses for electronic and non-electronic technologies based on the inherent properties of incorporated inorganic nanostructures using di-BCP templates are highlighted. We outline the potential for extension of incorporation methods to triblock copolymer features for more diverse applications. Challenges and emerging areas of interest for inorganic infiltration of BCPs are also discussed.
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Affiliation(s)
- Cian Cummins
- Materials Research Group, Department of Chemistry and Tyndall National Institute, University College Cork, Cork, Ireland
- AMBER@CRANN, Trinity College Dublin, Dublin, Ireland
| | - Tandra Ghoshal
- Materials Research Group, Department of Chemistry and Tyndall National Institute, University College Cork, Cork, Ireland
- AMBER@CRANN, Trinity College Dublin, Dublin, Ireland
| | - Justin D Holmes
- AMBER@CRANN, Trinity College Dublin, Dublin, Ireland
- Materials Chemistry and Analysis Group, Department of Chemistry and Tyndall National Institute, University College Cork, Cork, Ireland
| | - Michael A Morris
- Materials Research Group, Department of Chemistry and Tyndall National Institute, University College Cork, Cork, Ireland
- AMBER@CRANN, Trinity College Dublin, Dublin, Ireland
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17
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Qiang Z, Ye C, Lin K, Becker ML, Cavicchi KA, Vogt BD. Evolution in surface morphology during rapid microwave annealing of
PS
‐
b
‐
PMMA
thin films. ACTA ACUST UNITED AC 2016. [DOI: 10.1002/polb.24043] [Citation(s) in RCA: 11] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/20/2022]
Affiliation(s)
- Zhe Qiang
- Department of Polymer Engineeringthe University of Akron250 S Forge StAkron Ohio44325
| | - Changhuai Ye
- Department of Polymer Engineeringthe University of Akron250 S Forge StAkron Ohio44325
| | - Kehua Lin
- Department of Polymer Engineeringthe University of Akron250 S Forge StAkron Ohio44325
| | - Matthew L. Becker
- Department of Polymer ScienceGoodyear Polymer Center, the University of Akron170 University CircleAkron Ohio44325
| | - Kevin A. Cavicchi
- Department of Polymer Engineeringthe University of Akron250 S Forge StAkron Ohio44325
| | - Bryan D. Vogt
- Department of Polymer Engineeringthe University of Akron250 S Forge StAkron Ohio44325
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18
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Abstract
Nanomanufacturing, the commercially scalable and economically sustainable mass production of nanoscale materials and devices, represents the tangible outcome of the nanotechnology revolution. In contrast to those used in nanofabrication for research purposes, nanomanufacturing processes must satisfy the additional constraints of cost, throughput, and time to market. Taking silicon integrated circuit manufacturing as a baseline, we consider the factors involved in matching processes with products, examining the characteristics and potential of top-down and bottom-up processes, and their combination. We also discuss how a careful assessment of the way in which function can be made to follow form can enable high-volume manufacturing of nanoscale structures with the desired useful, and exciting, properties.
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Affiliation(s)
- J. Alexander Liddle
- Center for Nanoscale Science and Technology, National Institute of Standards and Technology, 100 Bureau Drive, Gaithersburg, MD 20899
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19
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Cummins C, Mokarian-Tabari P, Andreazza P, Sinturel C, Morris MA. Solvothermal Vapor Annealing of Lamellar Poly(styrene)-block-poly(d,l-lactide) Block Copolymer Thin Films for Directed Self-Assembly Application. ACS APPLIED MATERIALS & INTERFACES 2016; 8:8295-8304. [PMID: 26950246 DOI: 10.1021/acsami.6b00765] [Citation(s) in RCA: 12] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/05/2023]
Abstract
Solvothermal vapor annealing (STVA) was employed to induce microphase separation in a lamellar forming block copolymer (BCP) thin film containing a readily degradable block. Directed self-assembly of poly(styrene)-block-poly(d,l-lactide) (PS-b-PLA) BCP films using topographically patterned silicon nitride was demonstrated with alignment over macroscopic areas. Interestingly, we observed lamellar patterns aligned parallel as well as perpendicular (perpendicular microdomains to substrate in both cases) to the topography of the graphoepitaxial guiding patterns. PS-b-PLA BCP microphase separated with a high degree of order in an atmosphere of tetrahydrofuran (THF) at an elevated vapor pressure (at approximately 40-60 °C). Grazing incidence small-angle X-ray scattering (GISAXS) measurements of PS-b-PLA films reveal the through-film uniformity of perpendicular microdomains after STVA. Perpendicular lamellar orientation was observed on both hydrophilic and relatively hydrophobic surfaces with a domain spacing (L0) of ∼32.5 nm. The rapid removal of the PLA microdomains is demonstrated using a mild basic solution for the development of a well-defined PS mask template. GISAXS data reveal the through-film uniformity is retained following wet etching. The experimental results in this article demonstrate highly oriented PS-b-PLA microdomains after a short annealing period and facile PLA removal to form porous on-chip etch masks for nanolithography application.
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Affiliation(s)
- Cian Cummins
- Materials Research Group, Department of Chemistry and Tyndall National Institute, University College Cork , T12 YN60 Cork, Ireland
- AMBER, CRANN, Trinity College Dublin, Dublin 2, Ireland
| | - Parvaneh Mokarian-Tabari
- Materials Research Group, Department of Chemistry and Tyndall National Institute, University College Cork , T12 YN60 Cork, Ireland
- AMBER, CRANN, Trinity College Dublin, Dublin 2, Ireland
| | - Pascal Andreazza
- Interfaces, Confinement, Matériaux et Nanostructures, ICMN, UMR 7374, CNRS/Université d'Orléans, 1b Rue de la Férollerie, 45071 Orléans, France
| | - Christophe Sinturel
- Interfaces, Confinement, Matériaux et Nanostructures, ICMN, UMR 7374, CNRS/Université d'Orléans, 1b Rue de la Férollerie, 45071 Orléans, France
| | - Michael A Morris
- Materials Research Group, Department of Chemistry and Tyndall National Institute, University College Cork , T12 YN60 Cork, Ireland
- AMBER, CRANN, Trinity College Dublin, Dublin 2, Ireland
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20
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Hannon AF, Bai W, Alexander-Katz A, Ross CA. Simulation methods for solvent vapor annealing of block copolymer thin films. SOFT MATTER 2015; 11:3794-3805. [PMID: 25850069 DOI: 10.1039/c5sm00324e] [Citation(s) in RCA: 19] [Impact Index Per Article: 2.1] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/04/2023]
Abstract
Recent progress in modelling the solvent vapor annealing of thin film block copolymers is examined in the context of a self-consistent field theory framework. Key control variables in determining the final microdomain morphologies include swelling ratio or swollen film solvent volume fraction, swollen film thickness, substrate and vapor atmosphere surface energies, effective volume fraction, and effective Flory-Huggins interaction parameter. The regime of solvent vapor annealing studied is where the block copolymer has a high enough Flory-Huggins parameter that ordered structures form during swelling and are then trapped in the system through quenching. Both implicit and explicit consideration of the solvent vapor is considered to distinguish the cases in which solvent vapor leads to a non-bulk morphology. Block-selective solvents are considered based on the experimental systems of polystyrene-b-polydimethylsiloxane annealed with toluene and heptane. The results of these simulations are compared with these experiments.
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Affiliation(s)
- A F Hannon
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, Massachusetts 02139, USA.
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21
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Cummins C, Gangnaik A, Kelly RA, Borah D, O'Connell J, Petkov N, Georgiev YM, Holmes JD, Morris MA. Aligned silicon nanofins via the directed self-assembly of PS-b-P4VP block copolymer and metal oxide enhanced pattern transfer. NANOSCALE 2015; 7:6712-6721. [PMID: 25798892 DOI: 10.1039/c4nr07679f] [Citation(s) in RCA: 30] [Impact Index Per Article: 3.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/04/2023]
Abstract
'Directing' block copolymer (BCP) patterns is a possible option for future semiconductor device patterning, but pattern transfer of BCP masks is somewhat hindered by the inherently low etch contrast between blocks. Here, we demonstrate a 'fab' friendly methodology for forming well-registered and aligned silicon (Si) nanofins following pattern transfer of robust metal oxide nanowire masks through the directed self-assembly (DSA) of BCPs. A cylindrical forming poly(styrene)-block-poly(4-vinyl-pyridine) (PS-b-P4VP) BCP was employed producing 'fingerprint' line patterns over macroscopic areas following solvent vapor annealing treatment. The directed assembly of PS-b-P4VP line patterns was enabled by electron-beam lithographically defined hydrogen silsequioxane (HSQ) gratings. We developed metal oxide nanowire features using PS-b-P4VP structures which facilitated high quality pattern transfer to the underlying Si substrate. This work highlights the precision at which long range ordered ∼10 nm Si nanofin features with 32 nm pitch can be defined using a cylindrical BCP system for nanolithography application. The results show promise for future nanocircuitry fabrication to access sub-16 nm critical dimensions using cylindrical systems as surface interfaces are easier to tailor than lamellar systems. Additionally, the work helps to demonstrate the extension of these methods to a 'high χ' BCP beyond the size limitations of the more well-studied PS-b-poly(methyl methylacrylate) (PS-b-PMMA) system.
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Affiliation(s)
- Cian Cummins
- Materials Research Group, Department of Chemistry and Tyndall National Institute, University College Cork, Cork, Ireland.
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22
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Chang CW, Chi MH, Chu CW, Ko HW, Tu YH, Tsai CC, Chen JT. Microwave-annealing-induced nanowetting: a rapid and facile method for fabrication of one-dimensional polymer nanomaterials. RSC Adv 2015. [DOI: 10.1039/c5ra03037d] [Citation(s) in RCA: 27] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/15/2023] Open
Abstract
One-dimensional polymer nanomaterials are prepared by a microwave-annealing-induced nanowetting (MAIN) method using anodic aluminum oxide templates.
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Affiliation(s)
- Chun-Wei Chang
- Department of Applied Chemistry
- National Chiao Tung University
- Hsinchu
- Taiwan 30050
| | - Mu-Huan Chi
- Department of Applied Chemistry
- National Chiao Tung University
- Hsinchu
- Taiwan 30050
| | - Chien-Wei Chu
- Department of Applied Chemistry
- National Chiao Tung University
- Hsinchu
- Taiwan 30050
| | - Hao-Wen Ko
- Department of Applied Chemistry
- National Chiao Tung University
- Hsinchu
- Taiwan 30050
| | - Yi-Hsuan Tu
- Department of Applied Chemistry
- National Chiao Tung University
- Hsinchu
- Taiwan 30050
| | - Chia-Chan Tsai
- Department of Applied Chemistry
- National Chiao Tung University
- Hsinchu
- Taiwan 30050
| | - Jiun-Tai Chen
- Department of Applied Chemistry
- National Chiao Tung University
- Hsinchu
- Taiwan 30050
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