Unusual dewetting of thin polymer films in liquid media containing a poor solvent and a nonsolvent

Roles of aqueous nonsolvents influencing the dynamic stability of poly-(n-butyl methacrylate) thin films at biologically relevant temperatures

Poly-(n-butyl methacrylate) (PnBMA) is an important polymer in biomedical applications. Here we study the stability of PnBMA thin films prepared on top of slippery silicon substrates and exposed to nonsolvent aqueous incubation media like water and phosphate-buffered saline (PBS) at temperatures relevant to biological applications (37 °C, 25 °C and 4 °C). Dewetting hole growth experiments allowed us to probe the instability in PnBMA films upon incubation followed by thermal annealing. From the early stage of dewetting hole growth dynamics, we inferred that the stability of the thin PnBMA films decreases as a function of the duration and temperature of incubation, even though the films were found not to readily dewet at room temperature after incubation. It is also observed that water incubation makes films more unstable than incubation in PBS. We explained our observations as a combined effect of (i) an increase in surface energy of the PnBMA film due to incubation, (ii) an increased destabilizing effect due to the dominant polar interactions between the incubation medium and the PnBMA film and (iii) the plasticization effect of PnBMA films by the incubation media. Plasticization resulted in a decrease in the modulus of PnBMA thin films as a function of incubation time. The viscosity of PnBMA films upon incubation was found to be coupled to the decreasing modulus. Thus we infer that incubation in common aqueous nonsolvents can detrimentally affect the stability of polymers limiting their specific usages through a complex interplay of multiple molecular level phenomena.

Enhanced Removal of Photoresist Films through Swelling and Dewetting Using Pluronic Surfactants

Organic photoresist coatings, primarily composed of resins, are commonly used in the electronics industry to protect inorganic underlayers. Conventional photoresist strippers, such as amine-type agents, have shown high removal performance but led to environmental impact and substrate corrosiveness. Therefore, this trade-off must be addressed. In this study, we characterized the removal mechanism of a photoresist film using a nonionic triblock Pluronic surfactant [poly(ethylene oxide)-poly(propylene oxide)-poly(ethylene oxide)] in a ternary mixture of ethylene carbonate (EC), propylene carbonate (PC), and water. In particular, the removal dynamics determined by using a quartz crystal microbalance with dissipation monitoring was compared with those determined by performing confocal laser scanning microscopy and visual observation to analyze the morphology, adsorption mass, and viscoelasticity of the photoresist film. In the absence of the Pluronic surfactant, the photoresist film in the ternary solvent exhibited a three-step process: (i) film swelling caused by the penetration of a good solvent (EC and PC), (ii) formation of photoresist particles through dewetting, and (iii) particle aggregation on the substrate. This result was correlated to the Hansen solubility parameters. The addition of the Pluronic surfactant not only prevented photoresist aggregation in the third step but also promoted desorption from the substrate. This effect was dependent on the concentration of the Pluronic surfactant, which influenced diffusion to the interface between the photoresist and the bulk solution. Finally, we proposed a novel photoresist stripping mechanism based on the synergy between dewetting driven by an EC/PC-to-water mixture and adsorption by the Pluronic surfactant.

Polymer dewetting in solvent-non-solvent environment- new insights on dynamics and lithography-free patterning

HYPOTHESIS

We show that one may employ polymer dewetting in solvent-non-solvent environment to obtain lithography-free fabrication of well-defined nano- to micro- scale polymer droplets arrays from pre-patterned polymer films. The polymer droplet pattern may be converted to a series of hybrid organic-inorganic and inorganic well-defined nano-patterns by using sequential infiltration synthesis (SIS). In particular, we scrutinize the physical parameters which govern the dewetting of flat and striped polymer thin films, which is the key to obtaining our objective of lithography-free ordered nano-patterns.

EXPERIMENTS

We immerse polystyrene (PS) and polymethyl methacrylate (PMMA) thin films in water in the presence of chloroform vapors. We study the ensuing polymer dewetting dynamics and the pattern formation of nanospheres by employing in-situ light microscopy and scanning electron microscopy. We then investigate pattern formation by dewetting of polymer stripes, fabricated by directed solvent evaporation, and SIS of AlO_x from vapor phase precursors, trimethyl aluminum (TMA) and H₂O, within the nanosphere patterns.

FINDINGS

We find that solvent- non-solvent environments render film dewetting rates, which are an order of magnitude faster than solvent vapor dewetting, and supports the formation of small solid polymer droplets, down to sub-100 nm droplet size, of large contact angles with the solid substrate. Pre-patterned polymer film stripes support the formation of highly ordered structures of polymer droplets, which are easily transformed to hybrid polymer-AlO_x nanosphere patterns and templated AlO_x nanosphere via SIS.

Stability of Fluid Ultrathin Polymer Films in Contact with Solvent-Loaded Gels for Cultural Heritage

The removal of ultrathin amorphous polymer films in contact with an aqueous gelled solution containing small amounts of good solvent is addressed by means of specular and off-specular neutron reflectometry. The distribution of heavy water and benzyl alcohol is revealed inside Laropal A81, often employed as a protective varnish layer for Culture Heritage in the restoration of easel paintings. The swelling kinetics, interface roughness, and film morphologies were recorded as a function of temperature and increasing benzyl alcohol concentration in the dispersion of Pemulen TR-2, a hydrophobically modified acrylic acid copolymer. The addition of small amounts of good solvent results in the appearance of water-filled cavities inside the varnish, which grow with time. It is shown that while increasing the solvent concentration greatly enhances the hole growth kinetics, an increase in temperature above the glass transition temperature does not have such a big effect on the kinetics.

Swelling, dewetting and breakup in thin polymer films for cultural heritage

The removal of ultrathin amorphous polymer films in contact with nonsolvent/solvent binary mixtures is addressed by means of neutron reflectometry and atomic force microscopy. The high resolution of neutron scattering makes it possible to resolve the distribution profiles of heavy water and benzyl alcohol inside Laropal®A81, often employed as a protective varnish layer for Culture Heritage in restoration of easel paintings. The swelling kinetics and distribution profiles were recorded as a function of time and increasing benzyl alcohol concentration in water. The varnish film swells by penetration of the good solvent. At higher concentrations water-filled cavities appear inside the varnish and grow with time. Contrary to homogeneous dissolution dewetting is observed at late stages of exposure to the liquid which leads to the Breakup of the film. The high resolution measurements are compared to bulk behaviour characterized by the ternary phase diagram and the Flory-Huggins interaction parameters are calculated and used to predict the swelling and solvent partition in the films. Distinct differences of the thin film to bulk behaviour are found. The expectations made previously for the behaviour of solvent/non-solvent mixtures on the removal of thin layers in the restoration of easel paintings should be revised in view of surface interactions.

Fabrication of local micro-contacts to silicon solar cells by dewetting of ultrathin polymer films

A local contact patterning process based on dewetting of 50 nm-thick polystyrene (PS) films has been developed for fabrication of silicon PERC (Passivated Emitter and Rear Cell) solar cells. Holey PS films with a random pattern of holes were prepared on dielectric passivated silicon wafers through the dewetting process, and then served as etch masks for selective plasma etching of dielectric passivation layers, in doing so metal contact patterns could be generated. The impact of local back contact formation on cell performance was studied as a function of the metallization fraction. This chemical-based patterning process, which broadens the applications of dewetting of polymer films, offers an interesting alternative to laser-based approaches as it may avoid silicon surface damage and lower the manufacturing costs. The application of this patterning technique to PERC fabrication could result in a preliminary efficiency of 13.5% with a V _oc = 655 mV and a J _sc = 38.4 mA cm^-2. An apparent gain in conversion efficiency of 0.6% could be achieved compared to the full-area aluminum back surface field reference cell.

Influence of film structure on the dewetting kinetics of thin polymer films in the solvent annealing process

On a non-wetting solid substrate, the solvent annealing process of a thin polymer film includes the swelling process and the dewetting process. Owing to difficulties in the in situ analysis of the two processes simultaneously, a quantitative study on the solvent annealing process of thin polymer films on the non-wetting solid substrate is extremely rare. In this paper, we design an experimental method by combining spectroscopic ellipsometry with optical microscopy to achieve the simultaneous in situ study. Using this method, we investigate the influence of the structure of swollen film on its dewetting kinetics during the solvent annealing process. The results show that for a thin PS film with low Mw (Mw = 4.1 kg mol(-1)), acetone molecules can form an ultrathin enriched layer between the PS film and the solid substrate during the swelling process. The presence of the acetone enriched layer accounts for the exponential kinetic behavior in the case of a thin PS film with low Mw. However, the acetone enriched layer is not observed in the case of a thin PS film with high Mw (Mw = 400 kg mol(-1)) and the slippage effect of polymer chains is valid during the dewetting process.

Influence of physical ageing on rim instability during solvent-induced dewetting of a thin polymer film

Combining experiments with molecular dynamic simulation to examine the influence of physical ageing on rim instability during solvent-induced dewetting.