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Chen JY, Huang KT, Yau S, Huang CJ. Rationale Design for Anchoring Pendant Groups of Zwitterionic Polymeric Medical Coatings. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2024. [PMID: 38864376 DOI: 10.1021/acs.langmuir.4c01395] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/13/2024]
Abstract
A biocompatible and antifouling polymeric medical coating was developed through rational design for anchoring pendant groups for the modification of stainless steel. Zwitterionic 2-methacryloyloxyethyl phosphorylcholine (MPC) was copolymerized individually with three anchoring monomers of carboxyl acrylamides with different alkyl spacers, including acryloylglycine (2-AE), 6-acrylamidohexanoic acid (6-AH), and 11-acrylamidoundecanoic acid (11-AU). The carboxylic acid groups are responsible for the stable grafting of copolymers onto stainless steel via a coordinative interaction with metal oxides. Due to hydrophobic interaction and hydrogen bonding, the anchoring monomers enable the formation of self-assembling structures in solution and at a metallic interface, which can play an important role in the thin film formation and functionality of the coatings. Therefore, surface characterizations of anchoring monomers on stainless steel were conducted to analyze the packing density and strength of the intermolecular hydrogen bonds. The corresponding copolymers were synthesized, and their aggregate structures were assessed, showing micelle aggregation for copolymers with higher hydrophobic compositions. The synergistic effects of inter/intramolecular interactions and hydrophobicity of the anchoring monomers result in the diversity of the thickness, surface coverage, wettability, and friction of the polymeric coatings on stainless steel. More importantly, the antifouling properties of the coatings against bacteria and proteins were strongly correlated to thin film formation. Ultimately, the key lies in deciphering the molecular structure of the anchoring pendants in thin film formation and assessing the effectiveness of the coatings, which led to the development of medical coatings through the graft-onto approach.
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Affiliation(s)
- Jia-Yin Chen
- Department of Chemical & Materials Engineering, National Central University, Jhong-Li, Taoyuan 320, Taiwan
- R&D Center for Membrane Technology, Chung Yuan Christian University, 200 Chung Pei Rd., Chung-Li City 32023, Taiwan
| | - Kang-Ting Huang
- Department of Chemical & Materials Engineering, National Central University, Jhong-Li, Taoyuan 320, Taiwan
- R&D Center for Membrane Technology, Chung Yuan Christian University, 200 Chung Pei Rd., Chung-Li City 32023, Taiwan
| | - Shuehlin Yau
- Department of Chemistry, National Central University, Jhong-Li, Taoyuan 320, Taiwan
| | - Chun-Jen Huang
- Department of Chemical & Materials Engineering, National Central University, Jhong-Li, Taoyuan 320, Taiwan
- R&D Center for Membrane Technology, Chung Yuan Christian University, 200 Chung Pei Rd., Chung-Li City 32023, Taiwan
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Rouvière L, Al-Hajj N, Hunel J, Aupetit C, Buffeteau T, Vellutini L, Genin E. Silane-Based SAMs Deposited by Spin Coating as a Versatile Alternative Process to Solution Immersion. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2022; 38:6464-6471. [PMID: 35544953 DOI: 10.1021/acs.langmuir.2c00668] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/15/2023]
Abstract
Functionalization of silica surfaces with silane-based self-assembled monolayers (SAMs) is widely used in material sciences to tune surface properties and introduce terminal functional groups enabling subsequent chemical surface reactions and immobilization of (bio)molecules. Here, we report on the synthesis of four organotrimethoxysilanes with various molecular structures and we compare their grafting by spin coating with the one performed by the conventional solution immersion method. Strikingly, this study clearly demonstrates that the spin coating technique is a versatile, fast, and more convenient alternative process to prepare robust, smooth, and homogeneous SAMs with similar properties and quality as those deposited via immersion. SAMs were characterized by PM-IRRAS, AFM, and wettability measurements. SAMs can undergo several chemical surface modifications, and the reactivity of amine-terminated SAM was confirmed by PM-IRRAS and fluorescence measurements.
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Affiliation(s)
- Lisa Rouvière
- Université Bordeaux, CNRS, Bordeaux INP, ISM, UMR 5255, F-33400 Talence, France
| | - Nisreen Al-Hajj
- Université Bordeaux, CNRS, Bordeaux INP, ISM, UMR 5255, F-33400 Talence, France
- Department of Chemistry, Faculty of Science, An-Najah National University, P.O. Box 7, 400 Nablus, Palestine
| | - Julien Hunel
- Université Bordeaux, CNRS, Bordeaux INP, ISM, UMR 5255, F-33400 Talence, France
| | - Christian Aupetit
- Université Bordeaux, CNRS, Bordeaux INP, ISM, UMR 5255, F-33400 Talence, France
| | - Thierry Buffeteau
- Université Bordeaux, CNRS, Bordeaux INP, ISM, UMR 5255, F-33400 Talence, France
| | - Luc Vellutini
- Université Bordeaux, CNRS, Bordeaux INP, ISM, UMR 5255, F-33400 Talence, France
| | - Emilie Genin
- Université Bordeaux, CNRS, Bordeaux INP, ISM, UMR 5255, F-33400 Talence, France
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Attard T, He L. Linking Nanoscale Chemical Changes to Bulk Material Properties in IEPM Polymer Composites Subject to Impact Dynamics. ACS APPLIED MATERIALS & INTERFACES 2019; 11:20404-20416. [PMID: 31070883 DOI: 10.1021/acsami.9b04741] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
A synthesizable interfacial epoxy-polyurea-hybridized matrix (IEPM), composed of chemical bonded nanostructures across an interface width ranging between 2 and 50 μm, is a candidate for dialing-in molecular vibrational properties and providing high-impact dynamics resistance to conventional fiber(x)-reinforced epoxy (F/E), engendering an x-hybrid polymeric matrix composite system (x-IEPM- tc). Atomic force microscopy and scanning electron microscopy elucidate the interfacial nanoscale morphology and chemical structure via reaction kinetics of curing epoxy (as a function of time, tc) and fast-reacting (prepolymerized) polyurea. Nano-infrared spectroscopy (nano-IR) spectra, per non-negative matrix factorization analysis, reveal that simultaneous presence of characteristic epoxy and polyurea vibrational modes, within a nanoscale region, along with unique IEPM characteristics and properties following thermomechanical analysis and dynamic mechanical analysis (DMA), indicate chemical bonding, enabling IEPM reaction kinetics, as a function of tc, to control natural bond vibrations and type/distribution of interfacial chemical bonds and physical mixtures, likely due to the bond mechanism between -NCO in polyurea and epoxide and -NH2 in epoxy hardener (corresponding to characteristic absorption peaks in nano-IR results), leading to enhanced IEPM quality (fewer defects/voids). Test results of ballistic-resistant panels, integrated with thin intermediate layers of x-IEPM-b- tc, confirm that lower tc significantly enhances loss modulus (∝ material damping and per DMA) in impact dynamics environments.
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Affiliation(s)
- Thomas Attard
- Department of Civil, Construction, and Environmental Engineering , University of Alabama at Birmingham , Birmingham , Alabama 35294 , United States
| | - Li He
- Department of Civil, Construction, and Environmental Engineering , University of Alabama at Birmingham , Birmingham , Alabama 35294 , United States
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Wojtecki R, Mettry M, Fine Nathel NF, Friz A, De Silva A, Arellano N, Shobha H. Fifteen Nanometer Resolved Patterns in Selective Area Atomic Layer Deposition-Defectivity Reduction by Monolayer Design. ACS APPLIED MATERIALS & INTERFACES 2018; 10:38630-38637. [PMID: 30335930 DOI: 10.1021/acsami.8b13896] [Citation(s) in RCA: 12] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
Selective area atomic layer deposition (SA-ALD) offers the potential to replace a lithography step and provide a significant advantage to mitigate pattern errors and relax design rules in semiconductor fabrication. One class of materials that shows promise to enable this selective deposition process are self-assembled monolayers (SAMs). In an effort to more completely understand the ability of these materials to function as barriers for ALD processes and their failure mechanism, a series of SAM derivatives were synthesized and their structure-property relationship explored. These materials incorporate different side group functionalities and were evaluated in the deposition of a sacrificial etch mask. Monolayers with weak supramolecular interactions between components (for example, van der Waals) were found to direct a selective deposition, though they exhibit significant defectivity at and below 100 nm feature sizes. The incorporation of stronger noncovalent supramolecular interacting groups in the monolayer design, such as hydrogen bonding units or pi-pi interactions, did not produce an added benefit over the weaker interacting components. Incorporation of reactive moieties in the monolayer component that enabled the polymerization of an SAM surface, however, provided a more effective barrier, greatly reducing the number and types of defects observed in the selectively deposited ALD film. These reactive monolayers enabled the selective deposition of a film with critical dimensions as low as 15 nm. It was also found that the selectively deposited film functioned as an effective barrier for isotropic etch chemistries, allowing the selective removal of a metal without affecting the surrounding surface. This work enables selective area ALD as a technology through (1) the development of a material that dramatically reduces defectivity and (2) the demonstrated use of the selectively deposited film as an etch mask and its subsequent removal under mild conditions.
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Affiliation(s)
- Rudy Wojtecki
- International Business Machines-Almaden Research Center , 650 Harry Rd. , San Jose , California 95110 , United States
| | - Magi Mettry
- International Business Machines-Almaden Research Center , 650 Harry Rd. , San Jose , California 95110 , United States
| | - Noah F Fine Nathel
- International Business Machines-Almaden Research Center , 650 Harry Rd. , San Jose , California 95110 , United States
| | - Alexander Friz
- International Business Machines-Almaden Research Center , 650 Harry Rd. , San Jose , California 95110 , United States
| | - Anuja De Silva
- International Business Machines-Semiconductor Technology Research , 257 Fuller Rd. , Albany , New York 12203 , United States
| | - Noel Arellano
- International Business Machines-Almaden Research Center , 650 Harry Rd. , San Jose , California 95110 , United States
| | - Hosadurga Shobha
- International Business Machines-Semiconductor Technology Research , 257 Fuller Rd. , Albany , New York 12203 , United States
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Meillan M, Buffeteau T, Le Bourdon G, Thomas L, Degueil M, Heuzé K, Bennetau B, Vellutini L. Mixed Self-Assembled Monolayers with Internal Urea Group on Silica Surface. ChemistrySelect 2017. [DOI: 10.1002/slct.201702434] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
Affiliation(s)
- Matthieu Meillan
- University of Bordeaux, ISM, UMR 5255; F-33400 Talence France
- CNRS; ISM, UMR 5255; F-33400 Talence France
| | - Thierry Buffeteau
- University of Bordeaux, ISM, UMR 5255; F-33400 Talence France
- CNRS; ISM, UMR 5255; F-33400 Talence France
| | - Gwenaëlle Le Bourdon
- University of Bordeaux, ISM, UMR 5255; F-33400 Talence France
- CNRS; ISM, UMR 5255; F-33400 Talence France
| | - Laurent Thomas
- University of Bordeaux, ISM, UMR 5255; F-33400 Talence France
- CNRS; ISM, UMR 5255; F-33400 Talence France
| | - Marie Degueil
- University of Bordeaux, ISM, UMR 5255; F-33400 Talence France
- CNRS; ISM, UMR 5255; F-33400 Talence France
| | - Karine Heuzé
- University of Bordeaux, ISM, UMR 5255; F-33400 Talence France
- CNRS; ISM, UMR 5255; F-33400 Talence France
| | - Bernard Bennetau
- University of Bordeaux, ISM, UMR 5255; F-33400 Talence France
- CNRS; ISM, UMR 5255; F-33400 Talence France
| | - Luc Vellutini
- University of Bordeaux, ISM, UMR 5255; F-33400 Talence France
- CNRS; ISM, UMR 5255; F-33400 Talence France
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6
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Godon C, Teulon JM, Odorico M, Basset C, Meillan M, Vellutini L, Chen SWW, Pellequer JL. Conditions to minimize soft single biomolecule deformation when imaging with atomic force microscopy. J Struct Biol 2016; 197:322-329. [PMID: 28017791 DOI: 10.1016/j.jsb.2016.12.011] [Citation(s) in RCA: 11] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/27/2016] [Revised: 12/06/2016] [Accepted: 12/21/2016] [Indexed: 11/24/2022]
Abstract
A recurrent interrogation when imaging soft biomolecules using atomic force microscopy (AFM) is the putative deformation of molecules leading to a bias in recording true topographical surfaces. Deformation of biomolecules comes from three sources: sample instability, adsorption to the imaging substrate, and crushing under tip pressure. To disentangle these causes, we measured the maximum height of a well-known biomolecule, the tobacco mosaic virus (TMV), under eight different experimental conditions positing that the maximum height value is a specific indicator of sample deformations. Six basic AFM experimental factors were tested: imaging in air (AIR) versus in liquid (LIQ), imaging with flat minerals (MICA) versus flat organic surfaces (self-assembled monolayers, SAM), and imaging forces with oscillating tapping mode (TAP) versus PeakForce tapping (PFT). The results show that the most critical parameter in accurately measuring the height of TMV in air is the substrate. In a liquid environment, regardless of the substrate, the most critical parameter is the imaging mode. Most importantly, the expected TMV height values were obtained with both imaging with the PeakForce tapping mode either in liquid or in air at the condition of using self-assembled monolayers as substrate. This study unambiguously explains previous poor results of imaging biomolecules on mica in air and suggests alternative methodologies for depositing soft biomolecules on well organized self-assembled monolayers.
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Affiliation(s)
| | - Jean-Marie Teulon
- Univ. Grenoble Alpes, IBS, F-38044 Grenoble, France; CNRS, IBS, F-38044 Grenoble, France; CEA, IBS, F-38044 Grenoble, France
| | - Michael Odorico
- ICSM-UMR5257 CEA/CNRS/UM2/ENSCM, F-30207 Bagnols sur Cèze, France
| | | | - Matthieu Meillan
- Univ. Bordeaux, ISM, UMR 5255, F-33400 Talence, France; CNRS, ISM, UMR 5255, F-33400 Talence, France
| | - Luc Vellutini
- Univ. Bordeaux, ISM, UMR 5255, F-33400 Talence, France; CNRS, ISM, UMR 5255, F-33400 Talence, France
| | | | - Jean-Luc Pellequer
- Univ. Grenoble Alpes, IBS, F-38044 Grenoble, France; CNRS, IBS, F-38044 Grenoble, France; CEA, IBS, F-38044 Grenoble, France.
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7
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Dietrich PM, Streeck C, Glamsch S, Ehlert C, Lippitz A, Nutsch A, Kulak N, Beckhoff B, Unger WES. Quantification of Silane Molecules on Oxidized Silicon: Are there Options for a Traceable and Absolute Determination? Anal Chem 2015; 87:10117-24. [DOI: 10.1021/acs.analchem.5b02846] [Citation(s) in RCA: 50] [Impact Index Per Article: 5.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/10/2023]
Affiliation(s)
- P. M. Dietrich
- Bundesanstalt für Materialforschung und -prüfung (BAM), Unter den Eichen 87, 12205 Berlin, Germany
| | - C. Streeck
- Physikalisch-Technische Bundesanstalt (PTB), Abbestr. 2-12, 10587 Berlin, Germany
| | - S. Glamsch
- Bundesanstalt für Materialforschung und -prüfung (BAM), Unter den Eichen 87, 12205 Berlin, Germany
- Institut
für Chemie und Biochemie, Freie Universität Berlin, Fabeckstr. 34/36, 14195 Berlin, Germany
| | - C. Ehlert
- Bundesanstalt für Materialforschung und -prüfung (BAM), Unter den Eichen 87, 12205 Berlin, Germany
- Institut
für Chemie, Universität Potsdam, Karl-Liebknecht-Straße 24-25, 14476 Potsdam, Germany
| | - A. Lippitz
- Bundesanstalt für Materialforschung und -prüfung (BAM), Unter den Eichen 87, 12205 Berlin, Germany
| | - A. Nutsch
- Physikalisch-Technische Bundesanstalt (PTB), Abbestr. 2-12, 10587 Berlin, Germany
| | - N. Kulak
- Institut
für Chemie und Biochemie, Freie Universität Berlin, Fabeckstr. 34/36, 14195 Berlin, Germany
| | - B. Beckhoff
- Physikalisch-Technische Bundesanstalt (PTB), Abbestr. 2-12, 10587 Berlin, Germany
| | - W. E. S. Unger
- Bundesanstalt für Materialforschung und -prüfung (BAM), Unter den Eichen 87, 12205 Berlin, Germany
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