UV photooxidation and photopatterning of alkanethiolate self-assembled monolayers (SAMs) on GaAs (001)

Visible light driven plasmonic photochemistry on nano-textured silver

Plasmon assisted generation of silver sulfate from dodecanethiol is demonstrated on a nano-textured silver substrate with a strong surface plasmon resonance in the visible range. The observed photo-physical processes are attributed to hot charge carriers that are generated from the excitation of surface plasmon resonances using 532 nm laser light. Excited charge carriers are responsible for cleaving the alkane chain, and for generating reactive oxygen species which rapidly photooxidize the exposed sulfur atoms. The ability to drive photochemical reactions with photon energies in the visible range rather than in the UV, on nano-textured silver surfaces, will enable researchers to study photochemical transformations for a wide variety of applications. The strong optical absorbance across the visible range, combined with the fact that the substrates can be fabricated over large areas, naturally makes them candidates for solar driven photochemical applications, and for large scale plasmonic reactors.

Photochemical CVD of Ru on functionalized self-assembled monolayers from organometallic precursors

Chemical vapor deposition (CVD) is an attractive technique for the metallization of organic thin films because it is selective and the thickness of the deposited film can easily be controlled. However, thermal CVD processes often require high temperatures which are generally incompatible with organic films. In this paper, we perform proof-of-concept studies of photochemical CVD to metallize organic thin films. In this method, a precursor undergoes photolytic decomposition to generate thermally labile intermediates prior to adsorption on the sample. Three readily available Ru precursors, CpRu(CO)₂Me, (η³-allyl)Ru(CO)₃Br, and (COT)Ru(CO)₃, were employed to investigate the role of precursor quantum yield, ligand chemistry, and the Ru oxidation state on the deposition. To investigate the role of the substrate chemistry on deposition, carboxylic acid-, hydroxyl-, and methyl-terminated self-assembled monolayers were used. The data indicate that moderate quantum yields for ligand loss (φ ≥ 0.4) are required for ruthenium deposition, and the deposition is wavelength dependent. Second, anionic polyhapto ligands such as cyclopentadienyl and allyl are more difficult to remove than carbonyls, halides, and alkyls. Third, in contrast to the atomic layer deposition, acid-base reactions between the precursor and the substrate are more effective for deposition than nucleophilic reactions. Finally, the data suggest that selective deposition can be achieved on organic thin films by judicious choice of precursor and functional groups present on the substrate. These studies thus provide guidelines for the rational design of new precursors specifically for selective photochemical CVD on organic substrates.

From Nanowires to Nanopores: A Versatile Method for Electroless Deposition of Nanostructures on Micropatterned Organic Substrates

We demonstrate a fast, flexible, parallel, and highly controllable method by which to synthesize a variety of nanoscale and mesoscale structures. This method addresses one of the most significant challenges in nanoscience: the in situ parallel placement and synthesis of nano-objects over the mesoscale. The method is based on electroless nanowire deposition on micropatterned substrates (ENDOM). In ENDOM nanostructures are produced at the boundary between two unlike materials if two conditions are met: (a) deposition is kinetically preferred on one of the materials while (b) transport of reactants is favored on the other. In this study, copper structures were deposited on patterned -OH/-CH3-terminated alkanethiolate self-assembled monolayers (SAMs) by exploiting the different reaction rates of electroless deposition on these using the reducing agent dimethylamine borane (DMAB). We demonstrate production of nanowires (width < 100 nm), mesowires (100 nm < width < ∼3000 nm), nanorings, nanopores, and nanochannels. We show that a variety of experimental conditions can be employed, making this method compatible with many substrates. We have also studied the nucleation and growth kinetics of the ENDOM process. The width of the deposit grows exponentially with deposition time and can be modeled using classical nucleation theory. Although the deposit width increases, the height and grain size of the copper deposit is constant (to within experimental uncertainty) with deposition time. These observations indicate that the minimum deposit width is controlled by the nanoparticle dimensions and so can be controlled using the reaction conditions.

Influence of a Thiolate Chemical Layer on GaAs (100) Biofunctionalization: An Original Approach Coupling Atomic Force Microscopy and Mass Spectrometry Methods

Widely used in microelectronics and optoelectronics; Gallium Arsenide (GaAs) is a III-V crystal with several interesting properties for microsystem and biosensor applications. Among these; its piezoelectric properties and the ability to directly biofunctionalize the bare surface, offer an opportunity to combine a highly sensitive transducer with a specific bio-interface; which are the two essential parts of a biosensor. To optimize the biorecognition part; it is necessary to control protein coverage and the binding affinity of the protein layer on the GaAs surface. In this paper; we investigate the potential of a specific chemical interface composed of thiolate molecules with different chain lengths; possessing hydroxyl (MUDO; for 11-mercapto-1-undecanol (HS(CH₂)₁₁OH)) or carboxyl (MHDA; for mercaptohexadecanoic acid (HS(CH₂)₁₅CO₂H)) end groups; to reconstitute a dense and homogeneous albumin (Rat Serum Albumin; RSA) protein layer on the GaAs (100) surface. The protein monolayer formation and the covalent binding existing between RSA proteins and carboxyl end groups were characterized by atomic force microscopy (AFM) analysis. Characterization in terms of topography; protein layer thickness and stability lead us to propose the 10% MHDA/MUDO interface as the optimal chemical layer to efficiently graft proteins. This analysis was coupled with insitu MALDI-TOF mass spectrometry measurements; which proved the presence of a dense and uniform grafted protein layer on the 10% MHDA/MUDO interface. We show in this study that a critical number of carboxylic docking sites (10%) is required to obtain homogeneous and dense protein coverage on GaAs. Such a protein bio-interface is of fundamental importance to ensure a highly specific and sensitive biosensor.

UV photoactivated room temperature CVD of aluminum on functionalized self-assembled monolayers adsorbed on Au

We have investigated the selective photoactivated room temperature chemical vapor deposition (CVD) of aluminum (Al) on functionalized self-assembled monolayers adsorbed on Au. The CVD precursor employed is trimethyl aluminum (TMA). Using a deuterium arc lamp we demonstrate that the rate of the Al film growth is approximately twice that observed for nonphotoactivated Al chemical vapor deposition (CVD) using TMA. At the wavelengths employed, the photolysis of TMA leads to the dissociation of the TMA dimer to its monomer followed by successive release of methyl groups to form (CH(3))(3-x)Al. The photogenerated (CH(3))(3-x)Al species react with -OH- and -COOH-terminated SAMs but not -CH(3)-terminated SAMs. Using these reactions we demonstrate that aluminum can be selectively deposited on -CH(3)/-COOH-patterned SAMs. The possible reaction mechanisms involved in the Al film growth are discussed. These results indicate that photoactivated CVD (laser CVD) processes are suitable for the deposition of stable films of metals and other materials on organic films.

Building robust and reliable molecular constructs: patterning, metallic contacts, and layer-by-layer assembly

We describe recent progress in our laboratories to build stable complex two- and three-dimensional molecular constructs. We have introduced a simple and robust method for constructing complex molecular devices using top-down and bottom-up techniques based on self-assembled monolayers (SAMs), lithography, and site-selective reactions. It has significant advantages over other methods; it is easily scaled up, affords precise nanoscale placement, and is extensible to many different materials. Several recent developments are discussed including the UV photopatterning and electron beam lithography of SAMs adsorbed on semiconductors, the site-selective deposition of metals using electroless deposition and low-temperature chemical vapor deposition, and layer-by-layer assembly using covalent coupling. Optimization and further development of these techniques requires a detailed understanding of the reaction pathways involved in the lithography of SAMs and of the interaction of SAMs with metals, organometallic compounds, ions, and other compounds.

Formation of multilayer ultrathin assemblies using chemical lithography

Ultrathin complex multilayer structures have many potential applications in molecular and organic electronics, sensing, biotechnology and other areas. Reported here is a method by which to construct multifunctional, multilayer, patterned structures, using alkanethiolate SAMs adsorbed on Au, UV photopatterning, and chemoselective covalent bond formation. We demonstrate that amide coupling is efficient for producing multilayer structures on -COOH-terminated SAMs, while oxime coupling is efficient for producing multilayer structures on -CHO-terminated SAMs. Reaction yields obtained are approximately 67% and approximately 84% for the coupling of the first layer (bilayer formation) for amide and oxime coupling, respectively. Subsequent adlayer formation occurs with approximately 100% yield in both cases. The resulting adlayers are chemically robust and are suitable for subsequent chemical processing. Finally, both chemistries are used to produce a complex multilayer structure atop a UV photopatterned SAM. The resulting construct is well-defined and has the same lateral resolution as the photopatterned SAM substrate. The method demonstrated here is synthetically flexible and allows for the assembly of functionally complex surfaces and, in principle, the incorporation of biomolecules and metals.

Comparison of chemical lithography using alkanethiolate self-assembled monolayers on GaAs (001) and Au

We have investigated the efficiency of bifunctional pattern formation in alkanethiolate self-assembled monolayers (SAMs) adsorbed on GaAs (001) and Au, using time-of-flight secondary ion mass spectrometry. Two patterning techniques were employed: electron beam lithography and UV photopatterning. Previous work has always assumed that complete degradation of the SAM was necessary for the formation of well-defined multifunctional patterned surfaces, requiring large electron doses or long UV irradiation times. We demonstrate that well-defined multifunctional patterned surfaces can be produced on GaAs (001) with only partial degradation of the SAM, allowing greatly reduced electron beam doses and UV irradiation times to be used. Using electron beam lithography we observe that sharp well-defined patterns can form after an electron dose as low as 450 microC cm(-2). We also demonstrate that only 50% of the monolayer must be photooxidized in UV photopatterning, reducing the exposure time needed by a factor of 3. In contrast, patterning of alkanethiolate SAMs adsorbed on Au requires much higher electron doses (> or = 1250 microC cm(-2)) and photooxidation times (2 h). The substantial differences observed on these two substrates appear to arise from differences in the SAM structure on GaAs and Au. These results suggest that alkanethiolate SAM resists may be a suitable technology for nanometer scale lithography of GaAs and possibly other semiconductors.

TiO2-catalyzed photodegradation of porphyrins: mechanistic studies and application in monolayer photolithography

Patterned mixed monolayers of porphyrins on nanocrystalline TiO(2) films were fabricated by substrate-catalyzed monolayer photolithography. Tin(IV) protoporphyrin IX (SnPP), zinc(II) protoporphyrin IX (ZnPP), and iron(III) meso-tetra(4-carboxyphenyl)porphine (FeTCP) were adsorbed to TiO(2) through the carboxyl groups, yielding saturation surface amounts per projected area of approximately 10(-7) mol/cm(2). Illumination of SnPP- and ZnPP-functionalized TiO(2) films with 355 nm light caused the desorption of the porphyrins, most likely through oxidative decarboxylation. SnPP was removed more rapidly than ZnPP. The faster kinetics was due, in part, to the contribution of other photochemical pathways including TiO(2)-catalyzed photoreduction and direct photodegradation reactions. Patterned binary monolayers were prepared by the photoinduced desorption of a protoporphyrin, followed by the adsorption of FeTCP to previously illuminated regions of the surface.

Making nanoflowerbeds: reaction pathways involved in the selective chemical bath deposition of ZnS on functionalized alkanethiolate self-assembled monolayers

We have investigated the chemical bath deposition (CBD) of ZnS on functionalized alkanethiolate self-assembled monolayers (SAMs) using time-of-flight secondary ion mass spectrometry and scanning electron microscopy. The reaction mechanism involves both cluster-by-cluster and ion-by-ion growth. The dominant reaction pathway is dependent on both the SAM terminal group and the experimental conditions. On -COOH-terminated SAMs, two types of crystallites are observed: approximately 500 nm nanoflowers formed by ion-by-ion growth, and larger approximately 2 mum crystallites formed by cluster-by-cluster deposition. The nanoflowers nucleate at Zn(2+)- carboxylate surface complexes. On -OH- and -CH(3)-terminated SAMs, only the larger crystallites are formed. These do not adhere strongly to the SAM surface and can be easily removed. Finally, we demonstrate that under appropriate experimental conditions ZnS selectively deposits on the -COOH-terminated SAM regions of -COOH/-CH(3)-patterned SAM surfaces, forming nanoscale "flowerbeds".

Selective electroless metallization of patterned polymeric films for lithography applications

The fabrication of electrical interconnects to provide power for and communication with computers as their component complementary metal oxide semiconductor (CMOS) devices continue to shrink in size presents significant materials and processing compatibility challenges. We describe here our efforts to address these challenges using top-surface imaging and hybrid photoresist/self-assembled monolayer patterning approaches, in conjunction with selective electroless metal deposition, to develop processes capable of fabricating appropriate submicron and nanoscale metal features useful as electrical interconnects, as well as plasma-etch-resistant masks and metal diffusion barriers. Our efforts focus on the development of cost-effective methods compatible with a manufacturing environment that satisfy materials and process constraints associated with CMOS device production. We demonstrate the fabrication of approximately 50-nm-width features in metal with high fidelity and sufficient control of edge acuity to satisfy current industry design rules using our processes and discuss the challenges and opportunities for fabrication of analogous sub-10-nm metal features.

Regulation of pattern dimension as a function of vacuum pressure: alkyl monolayer lithography

Photopatterning of a hexadecyl (HD) monolayer has been demonstrated using vacuum ultraviolet (VUV; lambda = 172 nm) light under controlled vacuum pressure with the objective of minimizing the pattern dimension. X-ray photoelectron spectroscopy (XPS) and lateral force microscopy (LFM) studies reveal that photodegradation of the HD monolayer not only is limited to the regions exposed to VUV but also spreads under the masked regions. The strong oxidants generated by VUV irradiation to atmospheric oxygen and water vapor diffuse toward the masked regions through the nanoscopic channels and photodissociate the monolayer under the masked area, near the photomask apertures, resulting in broadening of the photopattern. Such broadening decreases with decreased vacuum pressure inside the VUV chamber, associated with a decrease of oxidant concentration and reduction of their diffusion. Gold nanoparticles (AuNPs) were immobilized on the VUV patterned features to probe the dimension of the chemically active pattern. Field emission electron microscopy reveals the construction of 565 nm wide pattern features at a vacuum pressure of 10 Pa. This pattern widens to 1,030 nm at 10 (4) Pa using the same size apertures (500 nm) as printed on the photomask. This study provides insight for fabricating submicron patterns with high reproducibility and its exploitation for different applications, which includes the patterning of nanoparticles, biopolymers, and other nano-objects at submicron dimensions.