1
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Yu JY, Landis S, Fontaine P, Daillant J, Guenoun P. Oriented thick films of block copolymer made by multiple successive coatings: perforated lamellae versus oriented lamellae. SOFT MATTER 2020; 16:8179-8186. [PMID: 32761014 DOI: 10.1039/d0sm00603c] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
Building 3D ordered nanostructures by copolymer deposition on a substrate implies a full control beyond the thin film regime. We have used here block copolymers (BCPs) forming bulk lamellar phases to form thick, i.e. much thicker than the lamellar period, structured films on a substrate. Films are formed by a simple method of multiple successive coatings. The film structure is controlled using the combined action of surface templating and annealing time. Sections of the thick layers were characterized by scanning electron microscopy (SEM) after etching of one of the BCP moieties. We show that perfect hexagonally perforated films (HPL) with lamellae parallel to the substrate are formed for a wide thickness range up to 300 nm. Grazing incidence small angle X-ray scattering (GISAXS) confirms such an organization by revealing that perforations sit on a hexagonal lattice. A lamellar organization perpendicular to the substrate is shown to take over for thicker films. A scenario consistent with our observations is proposed, where the sequence of phases results from the balance between surface and stretching energy effects.
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Affiliation(s)
- Jian-Yuan Yu
- Université Paris-Saclay, CEA, CNRS, NIMBE, Lions, 91191, Gif-sur-Yvette, France. and R&D division, Niching Industrial Corp., Chupei City, Hsinchu County, Taiwan
| | - Stefan Landis
- CEA, LETI, Minatec, 17 Rue des Martyrs, F-38054, Grenoble Cedex 9, France
| | - Philippe Fontaine
- Synchrotron SOLEIL, L'Orme des Merisiers, Saint-Aubin, BP 48, F-91192 Gif-sur-Yvette Cedex, France
| | - Jean Daillant
- Synchrotron SOLEIL, L'Orme des Merisiers, Saint-Aubin, BP 48, F-91192 Gif-sur-Yvette Cedex, France
| | - Patrick Guenoun
- Université Paris-Saclay, CEA, CNRS, NIMBE, Lions, 91191, Gif-sur-Yvette, France.
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2
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Rahman A, Majewski PW, Doerk G, Black CT, Yager KG. Non-native three-dimensional block copolymer morphologies. Nat Commun 2016; 7:13988. [PMID: 28004774 PMCID: PMC5196037 DOI: 10.1038/ncomms13988] [Citation(s) in RCA: 55] [Impact Index Per Article: 6.9] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/03/2016] [Accepted: 11/18/2016] [Indexed: 12/21/2022] Open
Abstract
Self-assembly is a powerful paradigm, wherein molecules spontaneously form ordered phases exhibiting well-defined nanoscale periodicity and shapes. However, the inherent energy-minimization aspect of self-assembly yields a very limited set of morphologies, such as lamellae or hexagonally packed cylinders. Here, we show how soft self-assembling materials-block copolymer thin films-can be manipulated to form a diverse library of previously unreported morphologies. In this iterative assembly process, each polymer layer acts as both a structural component of the final morphology and a template for directing the order of subsequent layers. Specifically, block copolymer films are immobilized on surfaces, and template successive layers through subtle surface topography. This strategy generates an enormous variety of three-dimensional morphologies that are absent in the native block copolymer phase diagram.
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Affiliation(s)
- Atikur Rahman
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, USA
| | - Pawel W. Majewski
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, USA
| | - Gregory Doerk
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, USA
| | - Charles T. Black
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, USA
| | - Kevin G. Yager
- Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, USA
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3
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Fabrication of chemical patterns from graphoepitaxially assembled block copolymer films by molecular transfer printing. POLYMER 2014. [DOI: 10.1016/j.polymer.2014.05.040] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/22/2022]
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4
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Janes DW, Thode CJ, Willson CG, Nealey PF, Ellison CJ. Light-Activated Replication of Block Copolymer Fingerprint Patterns. Macromolecules 2013. [DOI: 10.1021/ma400065t] [Citation(s) in RCA: 14] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/19/2023]
Affiliation(s)
- Dustin W. Janes
- McKetta Department of Chemical
Engineering, The University of Texas at Austin, Austin, Texas 78712, United States
| | - Christopher J. Thode
- Department of Chemical Engineering, The University of Wisconsin—Madison, Madison,
Wisconsin 53706, United States
| | - C. Grant Willson
- McKetta Department of Chemical
Engineering, The University of Texas at Austin, Austin, Texas 78712, United States
- Department of Chemistry and Biochemistry, The University of Texas at Austin, Austin, Texas 78712,
United States
| | - Paul F. Nealey
- Institute
for Molecular Engineering, University of Chicago, Chicago, Illinois 60637, United
States
| | - Christopher J. Ellison
- McKetta Department of Chemical
Engineering, The University of Texas at Austin, Austin, Texas 78712, United States
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5
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Liu Z, Huang H, He T. Large-area 2D gold nanorod arrays assembled on block copolymer templates. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2013; 9:505-510. [PMID: 23042712 DOI: 10.1002/smll.201201503] [Citation(s) in RCA: 29] [Impact Index Per Article: 2.6] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/30/2012] [Revised: 09/13/2012] [Indexed: 06/01/2023]
Abstract
Various large-area 2D gold nanorod arrays are achieved on plasma-etched block copolymer templates. With the help of capillary forces, aqueous gold nanorods assembled on the templates show good position selectivity and high coverage of the grooves. Furthermore, these nanorod arrays can transform into gold nanowires by a post-etching process.
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Affiliation(s)
- Zhicheng Liu
- State Key Laboratory of Polymer, Physics and Chemistry, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, Changchun, People's Republic of China
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6
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Saxton MJ. Wanted: a positive control for anomalous subdiffusion. Biophys J 2012; 103:2411-22. [PMID: 23260043 DOI: 10.1016/j.bpj.2012.10.038] [Citation(s) in RCA: 94] [Impact Index Per Article: 7.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 07/02/2012] [Revised: 09/23/2012] [Accepted: 10/10/2012] [Indexed: 11/25/2022] Open
Abstract
Anomalous subdiffusion in cells and model systems is an active area of research. The main questions are whether diffusion is anomalous or normal, and if it is anomalous, its mechanism. The subject is controversial, especially the hypothesis that crowding causes anomalous subdiffusion. Anomalous subdiffusion measurements would be strengthened by an experimental standard, particularly one able to cross-calibrate the different types of measurements. Criteria for a calibration standard are proposed. First, diffusion must be anomalous over the length and timescales of the different measurements. The length-scale is fundamental; the time scale can be adjusted through the viscosity of the medium. Second, the standard must be theoretically well understood, with a known anomalous subdiffusion exponent, ideally readily tunable. Third, the standard must be simple, reproducible, and independently characterizable (by, for example, electron microscopy for nanostructures). Candidate experimental standards are evaluated, including obstructed lipid bilayers; aqueous systems obstructed by nanopillars; a continuum percolation system in which a prescribed fraction of randomly chosen obstacles in a regular array is ablated; single-file diffusion in pores; transient anomalous subdiffusion due to binding of particles in arrays such as transcription factors in randomized DNA arrays; and computer-generated physical trajectories.
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Affiliation(s)
- Michael J Saxton
- Department of Biochemistry and Molecular Medicine, University of California at Davis, Davis, California, USA.
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7
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Yang YB, Jeon YM, Kim JU, Cho J. Diblock and triblock copolymer thin films on a substrate with controlled selectivity. THE EUROPEAN PHYSICAL JOURNAL. E, SOFT MATTER 2012; 35:86. [PMID: 22972228 DOI: 10.1140/epje/i2012-12086-9] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/02/2012] [Revised: 08/01/2012] [Accepted: 08/02/2012] [Indexed: 06/01/2023]
Abstract
Using self-consistent field theory (SCFT), morphology development in symmetric linear ABC triblock copolymer films on neutral and selective substrates has been studied, and it is compared with the triblock copolymer morphologies in bulk. In particular, the effects of the substrate preferable to B (interior) block on nanopattern formation of the copolymer films are of our central interest. Here, we report various nanopatterns with tunable square morphologies. The domain patterns are much more diverse than those parallel to the substrate with substrate selectivity for end-block or those vertical to the substrate without substrate selectivity. Furthermore, in order to figure out an economical and efficient way to fabricate useful passive pattern transfer layers, which have potential applications in microelectronic processes and ultrahigh density storage media, we propose a two-step strategy and scrutinize the conditions for generating square symmetries using cylinder-forming or lamella-forming AB diblock copolymers deposited on substrates created from ABC triblock copolymer films. It is found that a thinner film with weak incompatibility can produce square patterns.
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Affiliation(s)
- Y-B Yang
- School of Mechanical and Advanced Materials Engineering, UNIST, Ulsan, Korea
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8
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Fang L, Wei M, Shang Y, Kazmer D, Barry C, Mead J. Precise pattern replication of polymer blends into nonuniform geometries via reducing interfacial tension between two polymers. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2012; 28:10238-10245. [PMID: 22651098 DOI: 10.1021/la3008409] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/01/2023]
Abstract
Patterned polymer structures with different functionalities have many potential applications. Directed assembly of polymer blends using chemically functionalized patterns during spin-coating has been used to fabricate the patterned polymer structures. For bridging the gap between laboratorial experiments and manufacturing of nanodevices, the polymer blends structures are required to be precisely patterned into nonuniform geometries in a high-rate process, which still is a challenge. In this Article, we demonstrated for the first time that by decreasing the interfacial tension between two polymers polystyrene and poly(acrylic acid) via adding a compatibilizer (polystyrene-b-poly(acrylic acid) ), a polystyrene/poly(acrylic acid) blend was precisely patterned into nonuniform geometries in a high-rate fashion. The patterned nonuniform geometries included angled lines with angles varied from 30° to 150°, T-junctions, square arrays, circle arrays, and arbitrary letter-shaped geometries. The reduction in the interfacial tension improved the line edge roughness and the patterning efficiency of the patterned polymer blends. In addition, the commensurability between characteristic length and pattern periodicity for well-ordered morphologies was also expanded with decreasing interfacial tension. This approach can be easily extended to other functional polymers in a blend and facilitate the applications of patterned polymer structures in biosensors, organic thin-film electronics, and polymer solar cells.
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Affiliation(s)
- Liang Fang
- NSF Center for High-rate Nanomanufacturing, Department of Plastics Engineering, University of Massachusetts Lowell, Lowell, Massachusetts 01854, United States
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9
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Ji S, Nagpal U, Liu G, Delcambre SP, Müller M, de Pablo JJ, Nealey PF. Directed assembly of non-equilibrium ABA triblock copolymer morphologies on nanopatterned substrates. ACS NANO 2012; 6:5440-5448. [PMID: 22559146 DOI: 10.1021/nn301306v] [Citation(s) in RCA: 29] [Impact Index Per Article: 2.4] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/31/2023]
Abstract
The majority of past work on directed assembly of block copolymers on chemically nanopatterned surfaces (or chemical patterns) has focused on AB diblock copolymers, and the resulting morphologies have generally corresponded to equilibrium states. Here we report a study on directed assembly of ABA triblock copolymers. Directed assembly of thin films of symmetric poly(methyl methacrylate-b-styrene-b-methyl methacrylate) (PMMA-b-PS-b-PMMA) triblock copolymers is shown to be capable of achieving a high degree of perfection, registration, and accuracy on striped patterns having periods, L(s), commensurate with the bulk period of the copolymer, L(o). When L(s) is incommensurate with L(o), the triblock copolymer domains can reach dimensions up to 55% larger or 13% smaller than L(o). The range over which triblock copolymers tolerate departures from a commensurate L(s) is significantly larger than that accessible with the corresponding diblock copolymer material on analogous directed assembly systems. The assembly kinetics of the triblock copolymer is approximately 3 orders of magnitude slower than observed in the diblock system. Theoretically informed simulations are used to interpret our experimental observations; a thermodynamic analysis reveals that triblocks can form highly ordered, non-equilibrium metastable structures that do not arise in the diblock.
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Affiliation(s)
- Shengxiang Ji
- Key Laboratory of Polymer Ecomaterials, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences, 5625 Renmin Street, Changchun 130022, China.
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10
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Daga VK, Schwartz EL, Chandler CM, Lee JK, Lin Y, Ober CK, Watkins JJ. Photoinduced ordering of block copolymers. NANO LETTERS 2011; 11:1153-1160. [PMID: 21280663 DOI: 10.1021/nl104080v] [Citation(s) in RCA: 15] [Impact Index Per Article: 1.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/30/2023]
Abstract
Photoinduced ordering of disordered block copolymers (BCPs) would provide an on-demand, nonintrusive route for formation of well-ordered nanostructures in arbitrarily defined regions of an otherwise disordered material. Here we achieve this objective using a rapid and simple approach in which photoconversion of an additive blended with the BCP introduces strong interactions between the additive and one of the chain segments and induces strong order in the BCP blend. The strategy is generally applicable to block copolymers containing chain segments capable of hydrogen bonding with the additive.
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Affiliation(s)
- Vikram K Daga
- Department of Chemical Engineering, University of Massachusetts , Amherst, Massachusetts 01003, United States
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11
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Son JG, Hannon AF, Gotrik KW, Alexander-Katz A, Ross CA. Hierarchical nanostructures by sequential self-assembly of styrene-dimethylsiloxane block copolymers of different periods. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2011; 23:634-639. [PMID: 21274911 DOI: 10.1002/adma.201002999] [Citation(s) in RCA: 64] [Impact Index Per Article: 4.9] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Received: 08/18/2010] [Revised: 10/10/2010] [Indexed: 05/30/2023]
Abstract
Poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) block copolymers with a period as low as 13 nm have been self-assembled on a template formed from PS-b-PDMS of a 34–40 nm period, which is itself templated by micron-scale substrate features prepared using conventional lithography. This hierarchical process provides a simple method for directing the self-assembly of sub-10 nm features and registering them on the substrate.
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Affiliation(s)
- Jeong Gon Son
- Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139, USA
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12
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Rose F, Bosworth JK, Dobisz EA, Ruiz R. Three-dimensional mesoporous structures fabricated by independent stacking of self-assembled films on suspended membranes. NANOTECHNOLOGY 2011; 22:035603. [PMID: 21149954 DOI: 10.1088/0957-4484/22/3/035603] [Citation(s) in RCA: 14] [Impact Index Per Article: 1.1] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/30/2023]
Abstract
We report an original iterative method for fabricating three-dimensional mesoporous structures by independently stacking multiple self-assembled block copolymer films supported by Si membranes. A first layer is formed on the substrate by a self-assembled PS-b-PMMA (polystyrene-block-poly(methyl methacrylate)) film. A porous, permeable Si membrane deposited on top of the first block copolymer film provides mechanical support, preventing pattern collapse during the wet developing used to selectively remove the PMMA component of the PS-b-PMMA film. A second, dense Si membrane is deposited to seal the porous membrane, resulting in an impermeable coating suspended atop the self-assembled mesoporous polystyrene structures. The process can then be iterated using the sealed membrane as the new substrate to support a subsequent self-assembled block copolymer film. This multilayer approach provides a flexible three-dimensional fabrication technique where, in each layer, pattern morphology, domain orientation and degree of ordering can be designed independently. Furthermore, the process is compatible with electron-beam directed assembly, used to achieve regular patterns with feature density multiplication at any level in the stack.
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Affiliation(s)
- F Rose
- Hitachi Global Storage Technologies Incorporated, San Jose Research Center, San Jose, CA 95135, USA.
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13
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Xia G, Wang S, Jeong SJ. A universal approach for template-directed assembly of ultrahigh density magnetic nanodot arrays. NANOTECHNOLOGY 2010; 21:485302. [PMID: 21051798 DOI: 10.1088/0957-4484/21/48/485302] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/30/2023]
Abstract
L1(0) ordered alloys, such as FePt, CoPt and FePd alloys with high magnetocrystalline anisotropy, have attracted much attention due to their potential applications in ultrahigh density data storage. The assembly or organization of nanoparticle arrays is necessary for device application. A facile and general method to fabricate highly ordered ferromagnetic nanostructure arrays was demonstrated. It is found that simple oxygen plasma can make a hydrophilic polymer template, which would easily integrate with the widely used spin-coating process. With simple block copolymer lithography and spin-coating process, uniform ferromagnetic nanoparticle arrays can be easily fabricated over a large area. It is also significant that a very high coercivity up to 10 kOe was obtained in CoPt nanodot arrays. This method can find attractive applications in ultrahigh density storage media.
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Affiliation(s)
- Guodong Xia
- Department of Materials Science and Engineering, KAIST, Yuseong-gu, Daejeon 305-701, Korea.
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14
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Fang L, Wei M, Barry C, Mead J. Effect of Spin Speed and Solution Concentration on the Directed Assembly of Polymer Blends. Macromolecules 2010. [DOI: 10.1021/ma1017082] [Citation(s) in RCA: 26] [Impact Index Per Article: 1.9] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/30/2022]
Affiliation(s)
- Liang Fang
- NSF Nanoscale Science and Engineering Center for High-Rate Nanomanufactuing, Department of Plastics Engineering, University of Massachusetts Lowell, One University Avenue, Lowell, Massachusetts 01854, United States
| | - Ming Wei
- NSF Nanoscale Science and Engineering Center for High-Rate Nanomanufactuing, Department of Plastics Engineering, University of Massachusetts Lowell, One University Avenue, Lowell, Massachusetts 01854, United States
| | - Carol Barry
- NSF Nanoscale Science and Engineering Center for High-Rate Nanomanufactuing, Department of Plastics Engineering, University of Massachusetts Lowell, One University Avenue, Lowell, Massachusetts 01854, United States
| | - Joey Mead
- NSF Nanoscale Science and Engineering Center for High-Rate Nanomanufactuing, Department of Plastics Engineering, University of Massachusetts Lowell, One University Avenue, Lowell, Massachusetts 01854, United States
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15
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Jeong SJ, Moon HS, Kim BH, Kim JY, Yu J, Lee S, Lee MG, Choi H, Kim SO. Ultralarge-area block copolymer lithography enabled by disposable photoresist prepatterning. ACS NANO 2010; 4:5181-5186. [PMID: 20722433 DOI: 10.1021/nn101212q] [Citation(s) in RCA: 60] [Impact Index Per Article: 4.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/29/2023]
Abstract
We accomplished truly scalable, low cost, arbitrarily large-area block copolymer lithography, synergistically integrating the two principles of graphoepitaxy and epitaxial self-assembly. Graphoepitaxy morphology composed of highly aligned lamellar block copolymer film that self-assembled within a disposable photoresist trench pattern was prepared by conventional I-line lithography and utilized as a chemical nanopatterning mask for the underlying substrate. After the block copolymer film and disposable photoresist layer were removed, the same lamellar block copolymer film was epitaxially assembled on the exposed chemically patterned substrate. Highly oriented lamellar morphology was attained without any trace of structure directing the photoresist pattern over an arbitrarily large area.
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Affiliation(s)
- Seong-Jun Jeong
- Department of Materials Science and Engineering, KI for the Nanocentury, KAIST, Daejeon 305-701, Republic of Korea
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16
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Ji S, Liu CC, Liu G, Nealey PF. Molecular transfer printing using block copolymers. ACS NANO 2010; 4:599-609. [PMID: 20041629 DOI: 10.1021/nn901342j] [Citation(s) in RCA: 39] [Impact Index Per Article: 2.8] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/28/2023]
Abstract
Soft lithographic techniques augment or enhance the capabilities of traditional patterning processes and expand the diversity of materials that can be patterned. Realization of robust parallel techniques for creating chemical patterns at the nanoscale has been challenging. Here we present a method for creating and replicating chemical patterns that uses functionalized homopolymer inks that are preferentially segregated into the nanodomains of phase-separated diblock copolymer films. The inks are transferred by reaction to substrates that are brought into contact with block copolymer films, creating chemical patterns on the substrate that mirror the domain structure present at the film surface with high fidelity and resolution. In addition to printing from self-assembled domain structures, we can also direct the assembly of the block copolymer films from which transfer occurs using lithographically defined masters so as to replicate and transfer patterns of inks with controlled and well-defined geometries. The transferred patterns may be at higher resolution than the lithographically defined master, and the process can be repeated to create multiple copies of identical replicas. Transfer of one ink from one block of the copolymer is also possible, and filling the interspatial regions of the pattern with a second ink provides a pathway toward creating patterns with diverse chemical functionalities.
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Affiliation(s)
- Shengxiang Ji
- Department of Chemical and Biological Engineering, University of Wisconsin, Madison, WI 53706, USA
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17
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Liu G, Kang H, Craig GSW, Detcheverry F, de Pablo JJ, Nealey PF, Tada Y, Yoshida H. Cross-sectional Imaging of Block Copolymer Thin Films on Chemically Patterned Surfaces. J PHOTOPOLYM SCI TEC 2010. [DOI: 10.2494/photopolymer.23.149] [Citation(s) in RCA: 13] [Impact Index Per Article: 0.9] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
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18
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Bang J, Jeong U, Ryu DY, Russell TP, Hawker CJ. Block copolymer nanolithography: translation of molecular level control to nanoscale patterns. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2009; 21:4769-92. [PMID: 21049495 DOI: 10.1002/adma.200803302] [Citation(s) in RCA: 491] [Impact Index Per Article: 32.7] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/25/2023]
Abstract
The self-asembly of block copolymers is a promising platform for the "bottom-up" fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use.
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Affiliation(s)
- Joona Bang
- Department of Chemical and Biological Engineering, Korea University, 136-713 Seoul, Korea
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19
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Chiota J, Shearer J, Wei M, Barry C, Mead J. Multiscale directed assembly of polymer blends using chemically functionalized nanoscale-patterned templates. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2009; 5:2788-2791. [PMID: 19924739 DOI: 10.1002/smll.200901530] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/28/2023]
Affiliation(s)
- Jason Chiota
- NSF Nanoscale Science and Engineering Center for High-Rate Nanomanufacturing, Department of Plastics Engineering, University of Massachusetts Lowell, One University Avenue, Lowell, MA 01854, USA
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20
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Park SM, Craig GSW, Liu CC, La YH, Ferrier NJ, Nealey PF. Characterization of Cylinder-Forming Block Copolymers Directed to Assemble on Spotted Chemical Patterns. Macromolecules 2008. [DOI: 10.1021/ma8009917] [Citation(s) in RCA: 36] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Affiliation(s)
- Sang-Min Park
- Department of Chemical and Biological Engineering and Department of Mechanical Engineering, University of Wisconsin—Madison, Madison, Wisconsin 53706
| | - Gordon S. W. Craig
- Department of Chemical and Biological Engineering and Department of Mechanical Engineering, University of Wisconsin—Madison, Madison, Wisconsin 53706
| | - Chi-Chun Liu
- Department of Chemical and Biological Engineering and Department of Mechanical Engineering, University of Wisconsin—Madison, Madison, Wisconsin 53706
| | - Young-Hye La
- Department of Chemical and Biological Engineering and Department of Mechanical Engineering, University of Wisconsin—Madison, Madison, Wisconsin 53706
| | - Nicola J. Ferrier
- Department of Chemical and Biological Engineering and Department of Mechanical Engineering, University of Wisconsin—Madison, Madison, Wisconsin 53706
| | - Paul F. Nealey
- Department of Chemical and Biological Engineering and Department of Mechanical Engineering, University of Wisconsin—Madison, Madison, Wisconsin 53706
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