Jia X, Jiang X, Liu R, Yin J. Facile approach to patterned binary polymer brush through photolithography and surface-initiated photopolymerization.
ACS APPLIED MATERIALS & INTERFACES 2010;
2:1200-1205. [PMID:
20361774 DOI:
10.1021/am100035d]
[Citation(s) in RCA: 12] [Impact Index Per Article: 0.9] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/29/2023]
Abstract
Taking advantage of the photobleaching and co-initiating properties of the dendritic thioxanthone (TX) photoinitiator, we developed a general and facile approach to fabricate patterned binary polymer brushes by combining photolithography and surface-initiated photopolymerization (SIPP). The dendritic TX photoinitiator monolayer was immobilized covalently on a silicon slide surface, followed by photobleaching through a mask. The resulting slides could initiate photopolymerization of methyl methacrylate (MMA) to generate a patterned poly (methyl methacrylate) (PMMA) brush, and subsequently initiate styrene (St) in the presence of TX to obtain patterned binary poly (methyl methacrylate)-polystyrene (PMMA-PS) brushes. This general and facile method could be of use in large-scale patterned binary polymer brush fabrication.
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