Suppression of Phase Separation in PC/PMMA Blend Film by Thermoset Oligomer

Structural Evolution of Two-Phase Blends of Polycarbonate and PMMA by Simultaneous Biaxial Stretching

We investigated the structural evolution of the two-phase blends of polycarbonate (PC) and poly(methyl methacrylate) (PMMA) at various blend compositions by simultaneous biaxial stretching, using optical microscopy and SEM observation. The spherical PMMA domains and PC matrix of 30/70 PC/PMMA were enlarged uniformly at the all in-plane direction, while the anisotropic-shaped co-continuous structure in 50/50 PC/PMMA was deformed to a crosshatched structure by the in-plane bimodal orientation. In 70/30 PC/PMMA, the phase inversion was found to occur by simultaneous biaxial stretching; that is, the spherical PMMA domains were changed to a crosshatched matrix by the in-plane bimodal orientation due to coalescence of the PMMA domains during the stretching. Owing to the phase inversion, the surface hardness estimated by the pencil hardness test became harder, from 2B to 2H, increasing the strain from 1.0 to 2.0.

Facile approach to the fabrication of a micropattern possessing nanoscale substructure

On the basis of the combined technologies of photolithography and reaction-induced phase separation (RIPS), a facile approach has been successfully developed for the fabrication of a micropattern possessing nanoscale substructure on the thin film surface. This approach involves three steps. In the first step, a thin film was prepared by spin coating from a solution of a commercial random copolymer, polystyrene-r-poly(methyl methacrylate) (PS-r-PMMA) and a commercial crosslinker, trimethylolpropane triacrylate (TMPTA). In the second step, photolithograph was performed with the thin film using a 250 W high-pressure mercury lamp to produce the micropattern. Finally, the resulting micropattern was annealed at 200 degrees C for a certain time, and reaction-induced phase separation occurred. After soaking in chloroform for 4 h, nanoscale substructure was obtained. The whole processes were traced by atomic force microscopy (AFM), X-ray photoelectron spectrometry (XPS), and Fourier transform infrared (FTIR) spectroscopy, and the results supported the proposed structure.

Phase behavior and dewetting for polymer blend films studied by in situ AFM and XPS: from thin to ultrathin films

In this work, the film thickness (l0) effect on the phase and dewetting behaviors of the blend film of poly(methyl methacrylate)/poly(styrene-ran-acrylonitrile) (PMMA/SAN) has been studied by in situ atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS). The thinner film shows the more compatibility of the blend, and the phase separation of the film occurs at l0>5Rg (radius of gyration). An initially time-independent q*, the characteristic wavenumber of the phase image, which is in good agreement of Cahn's linearized theory for the early stage of spinodal decomposition, has been obtained in real space and discussed in detail. For 5Rg>l0>3Rg, a "pseudo-dewetting/(phase separation+wetting)" behavior occurs, where the pseudo-wetting is driven by the concentration fluctuation mechanism. For l0<3Rg, a "real dewetting/(phase separation+wetting)" behavior occurs.