Orientation Change of Diblock Copolymer Thin Films by the Addition of Amphiphilic Surfactants: Effect of Film Thickness and Surfactant Concentration

Universal Interfacial Control through Polymeric Nanomosaic Coating for Block Copolymer Nanopatterning

The employment of self-assembly of soft materials has been accepted as an inexpensive, robust, and reliable patterning method. As their self-assembly relies on the delicate molecular interactions near the substrate, a precise prediction/control of the interface structure and dynamics is critical to achieve desired nanostructures. Herein, a polymeric nanomosaic (PNM) pattern is created from the air/water interfacial self-assembly of a block copolymer (BCP) and introduced as an effective interfacial energy control for substrates. As a demonstration, the PNM coating is employed to control the BCP film structures. The perpendicular orientation of BCP self-assembly, which requires neutral wetting conditions for both blocks, is difficult to achieve but can readily be obtained with the PNM coating upon a fine resolution of the pattern quality. The universal applicability of the PNM coating as an interfacial control has been confirmed on curved, flexible, and three-dimensional substrates. In addition, the PNM is introduced as an etching-free and reusable topcoat imparting free surface neutralization even for the high-χ BCP nanopatterning.

Quantifying the Interface Energy of Block Copolymer Top Coats

Block copolymers (BCPs) have the potential to play a key role in templating materials for nanoscale synthesis. BCP lithography likely will be one of the first examples of BCP-based nanomanufacturing implemented in a production setting. One of the challenges in implementing BCP lithography is that the lamella need to be oriented perpendicular to the substrate. For many systems, this requires control over interfacial energies for both components at the substrate and interface. Top coats can be designed to provide a neutral interface for both blocks on the BCP surface. The preferentiality of the top coat as a function of composition has been determined qualitatively by examining the orientation of a BCP after annealing with a top coat. Measurements of the interfacial width between the top coat and homopolymers allows the interface energy to be quantitatively determined. Resonant soft X-ray reflectivity measurements on top coat/homopolymer pairs were used to extract the Flory-Huggins parameter (χ) and interface energy (γ) as a function of top coat composition. The difference between χ and γ for each top coat/homopolymer pair was minimized at compositions that resulted in the top coat promoting perpendicular orientation. As the composition moved away from the neutral point the difference between χ and γ for each pair grew larger.

Block copolymers: controlling nanostructure to generate functional materials - synthesis, characterization, and engineering

In this perspective, we survey recent advances in the synthesis and characterization of block copolymers, discuss several key materials opportunities enabled by block copolymers, and highlight some of the challenges that currently limit further realization of block copolymers in promising nanoscale applications. One significant challenge, especially as the complexity and functionality of designer macromolecules increases, is the requirement of multiple complementary techniques to fully characterize the resultant polymers and nanoscale materials. Thus, we highlight select characterization and theoretical methods and discuss how future advances can improve understanding of block copolymer systems. In particular, we consider the application of theoretical/simulation methods to the rationalization, and prediction, of observed experimental self-assembly phenomena. Finally, we explore several next steps for the field and emphasize some general areas of emerging research that could unlock additional opportunities for nanostructure-forming block copolymers in functional materials.

Orientation Control in Thin Films of a High-χ Block Copolymer with a Surface Active Embedded Neutral Layer

Directed self-assembly (DSA) of block copolymers (BCPs) is an attractive advanced patterning technology being considered for future integrated circuit manufacturing. By controlling interfacial interactions, self-assembled microdomains in thin films of polystyrene-block-poly(methyl methacrylate), PS-b-PMMA, can be oriented perpendicular to surfaces to form line/space or hole patterns. However, its relatively weak Flory interaction parameter, χ, limits its capability to pattern sub-10 nm features. Many BCPs with higher interaction parameters are capable of forming smaller features, but these "high-χ" BCPs typically have an imbalance in surface energy between the respective blocks that make it difficult to achieve the required perpendicular orientation. To address this challenge, we devised a polymeric surface active additive mixed into the BCP solution, referred to as an embedded neutral layer (ENL), which segregates to the top of the BCP film during casting and annealing and balances the surface tensions at the top of the thin film. The additive comprises a second BCP with a "neutral block" designed to provide matched surface tensions with the respective polymers of the main BCP and a "surface anchoring block" with very low surface energy that drives the material to the air interface during spin-casting and annealing. The surface anchoring block allows the film to be annealed above the glass transition temperature of the two materials without intermixing of the two components. DSA was also demonstrated with this embedded neutral top layer formulation on a chemical patterned template using a single step coat and simple thermal annealing. This ENL technology holds promise to enable the use of high-χ BCPs in advanced patterning applications.