A Photochemical Approach to Directing Flow and Stabilizing Topography in Polymer Films

Micropattern Fabricated by Acropetal Migration Controlled through Sequential Photo and Thermal Polymerization

Bottom-up patterning technology plays a significant role in both nature and synthetic materials, owing to its inherent advantages such as ease of implementation, spontaneity, and noncontact attributes, etc. However, constrained by the uncontrollability of molecular movement, energy interaction, and stress, obtained micropatterns tend to exhibit an inevitable arched outline, resulting in the limitation of applicability. Herein, inspired by auxin's action mode in apical dominance, a versatile strategy is proposed for fabricating precision self-organizing micropatterns with impressive height based on polymerization-induced acropetal migration. The copolymer containing fluorocarbon chains (low surface energy) and tertiary amine (coinitiator) is designed to self-assemble on the surface of the photo-curing system. The selective exposure under a photomask establishes a photocuring boundary and the radicals would be generated on the surface, which is pivotal in generating a vertical concentration difference of monomer. Subsequent heating treatment activates the material continuously transfers from the unexposed area to the exposed area and is accompanied by the obviously vertical upward mass transfer, resulting in the manufacture of a rectilinear profile micropattern. This strategy significantly broadens the applicability of self-organizing patterns, offering the potential to mitigate the complexity and time-consuming limitations associated with top-down methods.

Micropatterns Fabricated by Photodimerization-Induced Diffusion

Pattern technology plays an important role in the generation of microstructures with different functionalities and morphologies. In this report, a straightforward and versatile strategy is presented for spatially regulating the growth of a microstructure on a surface by the photodimerization of maleimide (MI). Upon exposure of ultraviolet (UV) light, photodimerization of MI in a film comprising furan-grafted polymer and bismaleimide (BMI) produces a chemical gradient, which can drive the diffusion of BMI from the unexposed to the exposed region and from the bottom to the surface, resulting in the growth of micropatterns. Sequential crosslinking induced by the Diels-Alder reaction between MI and furan maintains the stability of pattern shape. Theoretical modeling with reaction-diffusion equations reveal that as photodimerization moves the system far from thermodynamic equilibrium, the formation of a chemical potential gradient requires the redistribution of matter, resulting in the formation of topographies. Directional molecular motion induced by UV light can generate complex morphology, and produce materials with unique optical functions, such as charming-ordered gratings. This straightforward method of fabricating micropatterns by photodimerization-induced diffusion is successfully applied to patterned curved surfaces, microfluidic channels and encapsulation of integrated light emitting diode chips.