Structure within Thin Epoxy Films Revealed by Solvent Swelling: A Neutron Reflectivity Study

X-ray and Neutron Reflectometry of Thin Films at Liquid Interfaces

In the 1980s, Helmuth Möhwald studied lipid monolayers at the air/water interface to understand the thermodynamically characterized phases at the molecular level. In collaboration with Jens Als-Nielsen, X-ray reflectometry was used and further developed to determine the electron density profile perpendicular to the water surface. Using a slab model, parameters such as thickness and density of the individual molecular regions, as well as the roughness of the individual interfaces, were determined. Later, X-ray and neutron reflectometry helped to understand the coverage and conformation of anchored and adsorbed polymers. Nowadays, they resolve molecular properties in emerging topics such as liquid metals and ionic liquids. Much is still to be learned about buried interfaces (e.g., liquid/liquid interfaces). In this Article, a historical and theoretical background of X-ray reflectivity is given, recent developments of X-ray and neutron reflectometry for polymers at interfaces and thin layers are highlighted, and emerging research topics involving these techniques are emphasized.

Neutron reflectivity characterization of the photoacid reaction-diffusion latent and developed images of molecular resists for extreme ultraviolet lithography

Lithographic feature size requirements have approached a few radius of gyration of photoresist polymers used in thin-film patterning. Furthermore, the feature dimensions are commensurate with the photoacid diffusion length that defines the underlying latent image. Smaller imaging building blocks may enable reduced feature sizes; however, resolution limits are also dependent upon the spatial extent of the photoacid-catalyzed reaction diffusion front and subsequent dissolution mechanism. The reaction-diffusion front was characterized by neutron reflectivity for ccc stereoisomer-purified, deuterium-labeled tert-butoxycarbonyloxy calix[4]resorcinarene molecular resists. The spatial extent of the reaction front exceeds the size of the molecular resist with an effective diffusion constant of (0.13 ± 0.06) nm(2)/s for reaction times longer than 60 s, with the maximum at shorter times. Comparison to a mean-field reaction-diffusion model shows that a photoacid trapping process provides bounds to the spatial and extent of reaction via a reaction-limited mechanism whereas the ratio of the reaction rate to trapping rate constants recovers the effective diffusion peak. Under the ideal step-exposure conditions, surface roughness was observed after either positive- or negative-tone development. However, negative-tone development follows a surface-restructuring mechanism rather than etch-like dissolution in positive-tone development.

Effect of crosslinking on the elasticity of polyelectrolyte multilayer films measured by colloidal probe AFM

A homemade colloidal probe atomic force microscope was used to perform nanoindentation with a spherical probe of 5 microm in diameter, at different approach velocities in order to extract the Young's modulus, E0, of poly(L-lysine)/hyaluronan (PLL/HA) films. This parameter is of prime importance to control cellular adhesion. The films were either kept in their native form or cross-linked with a mixture of 1-ethyl-3-(3-dimethyl aminopropyl)carbodiimide (EDC) and N-hydrosulfosuccinimide (sulfo-NHS), where the EDC concentration was varied from 1 up to 100 mg mL(-1) (approximately from 5 to 500 mM). A model based on Hertz mechanics was used to account for the interactions between film and probe. It is shown that the Young's modulus varies with the approach velocity for the native (PLL/HA) films, whereas for cross-linked ones, E0 is independent from the velocity over the whole range investigated. It is found that for native films, E0 takes a value of 3 kPa at low approach velocities, a velocity domain that should be relevant in cellular adhesion processes. The Young's modulus increases with the EDC concentration used to cross-link the films and levels off at a value of about 400 kPa for EDC concentrations exceeding 40 mg mL(-1). Thus, it is possible by crosslinking PLL/HA films to control their elastic properties with the aim to alter their behavior as to the cellular adhesion.

Dewetting of thin polystyrene films absorbed on epoxy coated substrates

Various characteristics of dewetting of thin polystyrene (PS) films absorbed on highly cross-linked epoxy-coated and silicon oxide covered substrates are studied as a function of PS film thickness (20<h<1300 A) by optical microscopy, atomic force microscopy, and x-ray and neutron reflectivity. For a silicon oxide covered substrate, the nucleation of holes and growth (NG) mechanism is observed for h>h(c1) whereas the spinodal dewetting (SD) occurs through the growth of surface undulations for h<h(c1), where h(c1) is approximately 4R(g). For an epoxy-coated substrate, the NG mechanism is observed for h>h(c2) while the SD mechanism is observed for h<h(c2), where h(c2) is approximately 6R(g). We demonstrate that the highly cross-linked epoxy-coated silicon substrate leads to retardation of the PS film dewetting in comparison to the silicon oxide covered silicon substrate. Moreover, we confirm that the epoxy-coated substrate leads to a significant decrease in the fraction of dewetted area at the apparent equilibrium stage of dewetting due to the anchoring effect of PS molecules caused from the cross-linked networks of the epoxy layer. In contrast the retardation effect of the epoxy-coated substrate on the rate of dewetting is more remarkable for relatively thinner PS films (h< approximately 800 A) than thicker films ( approximately 800<h<1300 A) since the short-range intermolecular interactions are dominant for relatively thin PS films. Thus the highly cross-linked epoxy-coated substrate has a large influence on the kinetics, morphology, and mechanism of dewetting of thin PS films.

The effects of network structure on the resistance of silane coupling agent layers to water-assisted crack growth

Silane adhesion promoters are commonly used to improve the adhesion, durability, and corrosion resistance of polymer-oxide interfaces. The current study investigates a model interface consisting of the natural oxide of(100) Si and an epoxy cured from diglycidyl ether ofbisphenol A (DGEBA) and triethylenetetraamine (TETA). The thickness of (3-glycidoxypropyl)trimethoxysilane (GPS) films placed between the two materials provided the structural variable. Five surface treatments were investigated: a bare interface, a rough monolayer film, a smooth monolayer film, a 5 nm thick film, and a 10 nm thick film. Previous neutron reflection experiments revealed large extension ratios (>2) when the 5 and 10 nm thick GPS films were exposed to deuterated nitrobenzene vapor. Despite the larger extension ratio for the 5 nm thick film, the epoxy/Si fracture energy (Gc) was equal to that of the 10 nm thick film under ambient conditions. Even the smooth monolayer exhibited the same Gc. Only when the monolayer included a significant number of agglomerates did the Gc drop to levels closer to that of the bare interface. When immersed in water at room temperature for 1 week, the threshold energy release rate (Gth) was nearly equal to Gc for the smooth monolayer, 5 nm thick film, and 10 nm thick film. While the Gth for all three films decreased with increasing water temperature, the Gth of the smooth monolayer decreased more rapidly. The bare interface was similarly sensitive to temperature; however, the Gth of the rough monolayer did not change significantly as the temperature was raised. Despite the influence of pH on hydrolysis, the Gth was insensitive to the pH of the water for all surface treatments.