Patterning of polymer brushes. A direct approach to complex, sub-surface structures

Lifting the Concentration Limit of Mass Photometry by PEG Nanopatterning

Mass photometry (MP) is a rapidly growing optical technique for label-free mass measurement of single biomolecules in solution. The underlying measurement principle provides numerous advantages over ensemble-based methods but has been limited to low analyte concentrations due to the need to uniquely and accurately quantify the binding of individual molecules to the measurement surface, which results in diffraction-limited spots. Here, we combine nanoparticle lithography with surface PEGylation to substantially lower surface binding, resulting in a 2 orders of magnitude improvement in the upper concentration limit associated with mass photometry. We demonstrate the facile tunability of degree of passivation, enabling measurements at increased analyte concentrations. These advances provide access to protein-protein interactions in the high nanomolar to low micromolar range, substantially expanding the application space of mass photometry.

Polymer brush hypersurface photolithography

Polymer brush patterns have a central role in established and emerging research disciplines, from microarrays and smart surfaces to tissue engineering. The properties of these patterned surfaces are dependent on monomer composition, polymer height, and brush distribution across the surface. No current lithographic method, however, is capable of adjusting each of these variables independently and with micrometer-scale resolution. Here we report a technique termed Polymer Brush Hypersurface Photolithography, which produces polymeric pixels by combining a digital micromirror device (DMD), an air-free reaction chamber, and microfluidics to independently control monomer composition and polymer height of each pixel. The printer capabilities are demonstrated by preparing patterns from combinatorial polymer and block copolymer brushes. Images from polymeric pixels are created using the light reflected from a DMD to photochemically initiate atom-transfer radical polymerization from initiators immobilized on Si/SiO2 wafers. Patterning is combined with high-throughput analysis of grafted-from polymerization kinetics, accelerating reaction discovery, and optimization of polymer coatings.

Fabrication of PMPC/PTM/PEGDA micropatterns onto polypropylene films behaving with dual functions of antifouling and antimicrobial activities

Polymer materials with high biocompatibility and versatile functions are urgently required in the biomedical field. The hydrophobic surface and inert traits of polymer materials usually encounter severe biofouling and bacterial infection which hinder the potential application of polymers as biomedical materials. Although many antifouling or antimicrobial coatings have been developed for modification of biomedical devices/implants, few can simultaneously fulfill the requirements for antimicrobial and antifouling activities. Herein, we constructed bifunctional micropatterns with antifouling and antimicrobial properties onto polypropylene (PP) films using argon plasma activation treatment, photomask technique and UV-initiated graft polymerization method. Different sizes of PMPC/PTM/PEGDA micropatterns were fabricated on PP films to yield patterned PP-PMPC/PTM/PEGDA as evidenced by infrared (IR) spectroscopy, scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS), where PMPC is poly(2-methacryloyloxyethyl phosphorylcholine) for enhancement of hydrophilicity and biocompatibility, PTM is poly(methacryloyloxyethyltrimethylammonium chloride) for contribution to antimicrobial activity and PEGDA is poly(ethylene glycol diacrylate) as the crosslinker. The surface hydrophilicity of patterned PP-PMPC/PTM/PEGDA was characterized by the static water contact angle test. The results showed that the PP sample with a micropattern with the size of 5 μm exhibited the best hydrophilicity. For biological assays of patterned PP-PMPC/PTM/PEGDA, the micropattern size at 5 μm performed the best for both antiplatelet adhesion and antimicrobial activities. We anticipate that this work could provide a new method for building bifunctional biomedical materials to promote the application of PP in biomedical fields.

Tools for Low-Dimensional Chemistry

Many biological mechanisms can be considered to be low-dimensional systems: their function is determined by molecular objects of reduced dimensionality. Bacterial photosynthesis is a very good example: the photosynthetic pathway is contained within nano-objects (vesicles) whose function is determined by the numbers and nanoscale organization of membrane proteins and by the ratios of the different types of protein that they contain. Systems biology has provided computational models for studying these processes, but there is a need for experimental platforms with which to test their predictions. This Invited Feature Article reviews recent work on the development of tools for the reconstruction of membrane processes on solid surfaces. Photochemical methods provide a powerful, versatile means for the organization of molecules and membranes across length scales from the molecular to the macroscopic. Polymer brushes are highly effective supports for model membranes and versatile functional and structural components in low-dimensional systems. The incorporation of plasmonic elements facilitates enhanced measurement of spectroscopic properties and provides an additional design strategy via the exploitation of quantum optical phenomena. A low-dimensional system that incorporates functional transmembrane proteins and a mechanism for the in situ measurement of proton transport is described.

Substrate-Independent Micropatterning of Polymer Brushes Based on Photolytic Deactivation of Chemical Vapor Deposition Based Surface-Initiated Atom-Transfer Radical Polymerization Initiator Films

Precise microscale arrangement of biomolecules and cells is essential for tissue engineering, microarray development, diagnostic sensors, and fundamental research in the biosciences. Biofunctional polymer brushes have attracted broad interest in these applications. However, patterning approaches to creating microstructured biointerfaces based on polymer brushes often involve tedious, expensive, and complicated procedures that are specifically designed for model substrates. We report a substrate-independent, facile, and scalable technique with which to prepare micropatterned biofunctional brushes with the ability to generate binary chemical patterns. Employing chemical vapor deposition (CVD) polymerization, a functionalized polymer coating decorated with 2-bromoisobutyryl groups that act as atom-transfer radical polymerization (ATRP) initiators was prepared and subsequently modified using UV light. The exposure of 2-bromoisobutyryl groups to UV light with wavelengths between 187 and 254 nm resulted in selective debromination, effectively eliminating the initiation of ATRP. In addition, when coatings incorporating both 2-bromoisobutyryl and primary amine groups were irradiated with UV light, the amines retained their functionality after UV treatment and could be conjugated to activated esters, facilitating binary chemical patterns. In contrast, polymer brushes were selectively grown from areas protected from UV treatment, as confirmed by atomic force microscopy, time-of-flight secondary ion mass spectrometry, and imaging ellipsometry. Furthermore, spatial control over biomolecular adhesion was achieved in three ways: (1) patterned nonfouling brushes resulted in nonspecific protein adsorption to areas not covered with polymer brushes; (2) patterned brushes decorated with active binding sides gave rise to specific protein immobilization on areas presenting polymer brushes; (3) and primary amines were co-patterned along with clickable polymer brushes bearing pendant alkyne groups, leading to bifunctional reactivity. Because this novel technique is independent of the original substrate's physicochemical properties, it can be extended to technologically relevant substrates such as polystyrene, polydimethylsiloxane, polyvinyl chloride, and steel. With further work, the photolytic deactivation of CVD-based initiator coatings promises to advance the utility of patterned biofunctional polymer brushes across a spectrum of biomedical applications.

Stable polymer brushes with effectively varied grafting density synthesized from highly crosslinked random copolymer thin films

Crosslinkable epoxy copolymers enable achieving highly stable P(S-b-MMA) brushes with controlled grafting density for close examination of phase separation behaviors.

Micrometre and nanometre scale patterning of binary polymer brushes, supported lipid bilayers and proteins

Binary polymer brush patterns were fabricated via photodeprotection of an aminosilane with a photo-cleavable nitrophenyl protecting group. UV exposure of the silane film through a mask yields micrometre-scale amine-terminated regions that can be derivatised to incorporate a bromine initiator to facilitate polymer brush growth via atom transfer radical polymerisation (ATRP). Atomic force microscopy (AFM) and imaging secondary ion mass spectrometry (SIMS) confirm that relatively thick brushes can be grown with high spatial confinement. Nanometre-scale patterns were formed by using a Lloyd's mirror interferometer to expose the nitrophenyl-protected aminosilane film. In exposed regions, protein-resistant poly(oligo(ethylene glycol)methyl ether methacrylate) (POEGMEMA) brushes were grown by ATRP and used to define channels as narrow as 141 nm into which proteins could be adsorbed. The contrast in the pattern can be inverted by (i) a simple blocking reaction after UV exposure, (ii) a second deprotection step to expose previously intact protecting groups, and (iii) subsequent brush growth via surface ATRP. Alternatively, two-component brush patterns can be formed. Exposure of a nitrophenyl-protected aminosilane layer either through a mask or to an interferogram, enables growth of an initial POEGMEMA brush. Subsequent UV exposure of the previously intact regions allows attachment of ATRP initiator sites and growth of a second poly(cysteine methacrylate) (PCysMA) brush within photolithographically-defined micrometre or nanometre scale regions. POEGMEMA brushes resist deposition of liposomes, but fluorescence recovery after photobleaching (FRAP) studies confirm that liposomes readily rupture on PCysMA "corrals" defined within POEGMEMA "walls". This leads to the formation of highly mobile supported lipid bilayers that exhibit similar diffusion coefficients to lipid bilayers formed on surfaces such as glass.

Reduced Lateral Confinement and Its Effect on Stability in Patterned Strong Polyelectrolyte Brushes

The stability of strong polyelectrolyte brushes (PEBs) was studied in bulk and in patterned structures. Thick PEBs of poly([(2-methacryloyloxy)ethyl]trimethylammonium chloride) with thicknesses >100 nm were synthesized using single electron transfer living radical polymerization. Brush patterning was identified using deep-ultraviolet photolithography by means of either a top-down (TD) or bottom-up (BU) method, with features as small as 200 nm. The brushes were soaked in water under a range of pH or temperature conditions, and the hydrolysis was monitored through dry-state ellipsometry and atomic force microscopy measurements. BU patterns showed reduced degrafting for smaller patterns, which was attributed to increased stress relaxation at such dimensions. In contrast to the already relaxed BU-patterned brush, a TD-patterned brush possesses perpendicular structures that result from the use of orthogonal lithography. It was found that the TD process induces cross-linking on the sidewall, which subsequently fortifies the sidewall materials. This modification of the polymer brushes hindered the stress relaxation of the patterns, and the degrafting trends became irrelevant to the pattern sizes. With proper tuning, the cross-linking on the sidewall was minimized and the degrafting trends were again relaxation-dependent.

Surface-Initiated Controlled Radical Polymerization: State-of-the-Art, Opportunities, and Challenges in Surface and Interface Engineering with Polymer Brushes

The generation of polymer brushes by surface-initiated controlled radical polymerization (SI-CRP) techniques has become a powerful approach to tailor the chemical and physical properties of interfaces and has given rise to great advances in surface and interface engineering. Polymer brushes are defined as thin polymer films in which the individual polymer chains are tethered by one chain end to a solid interface. Significant advances have been made over the past years in the field of polymer brushes. This includes novel developments in SI-CRP, as well as the emergence of novel applications such as catalysis, electronics, nanomaterial synthesis and biosensing. Additionally, polymer brushes prepared via SI-CRP have been utilized to modify the surface of novel substrates such as natural fibers, polymer nanofibers, mesoporous materials, graphene, viruses and protein nanoparticles. The last years have also seen exciting advances in the chemical and physical characterization of polymer brushes, as well as an ever increasing set of computational and simulation tools that allow understanding and predictions of these surface-grafted polymer architectures. The aim of this contribution is to provide a comprehensive review that critically assesses recent advances in the field and highlights the opportunities and challenges for future work.

Nanotribological Investigation of Polymer Brushes with Lithographically Defined and Systematically Varying Grafting Densities

Following controlled photodeprotection of a 2-nitrophenylpropyloxycarbonyl-protected (aminopropyl)triethoxysilane (NPPOC-APTES) film and subsequent derivatization with a bromoester-based initiator, poly(2-(methacryloyloxy)ethylphosphorylcholine) (PMPC) brushes with various grafting densities were grown from planar silicon substrates using atom transfer radical polymerization (ATRP). The grafting density correlated closely with the extent of deprotection of the NPPOC-APTES. The coefficient of friction for such PMPC brushes was measured by friction force microscopy in water and found to be inversely proportional to the grafting density due to the osmotic pressure that resists deformation. Deprotection of NPPOC-APTES via near-field photolithography using a range of writing rates enabled the fabrication of neighboring nanoscopic polymeric structures with dimensions ranging from 100 to 1000 nm. Slow writing rates enable complete deprotection to occur; hence, polymer brushes are formed with comparable thicknesses to macroscopic brushes grown under the same conditions. However, the extent of deprotection is reduced at higher writing rates, resulting in the concomitant reduction of the brush thickness. The coefficient of friction for such polymer brushes varied smoothly with brush height, with lower coefficients being obtained at slower writing rate (increasing initiator density) because the solvated brush layer confers greater lubricity. However, when ultrasharp probes were used for nanotribological measurements, the coefficient of friction increased with brush thickness. Under such conditions, the radius of curvature of the tip is comparable to the mean spacing between brush chains, allowing the probe to penetrate the brush layer leading to a relatively large contact area.

Nanopatterned polymer brushes: conformation, fabrication and applications

Surfaces with end-grafted, nanopatterned polymer brushes that exhibit well-defined feature dimensions and controlled chemical and physical properties provide versatile platforms not only for investigation of nanoscale phenomena at biointerfaces, but also for the development of advanced devices relevant to biotechnology and electronics applications. In this review, we first give a brief introduction of scaling behavior of nanopatterned polymer brushes and then summarize recent progress in fabrication and application of nanopatterned polymer brushes. Specifically, we highlight applications of nanopatterned stimuli-responsive polymer brushes in the areas of biomedicine and biotechnology.

Construction of 3D polymer brushes by dip-pen nanodisplacement lithography: understanding the molecular displacement for ultrafine and high-speed patterning

Dip-pen nanodisplacement lithography (DNL) is a versatile scanning probe-based technique that can be employed for fabricating ultrafine 3D polymer brushes under ambient conditions. Many fundamental studies and applications require the large-area fabrication of 3D structures. However, the fabrication throughput and uniformity are still far from satisfactory. In this work, the molecular displacement mechanism of DNL is elucidated by systematically investigating the synergistic effect of z extension and contact time. The in-depth understanding of molecular displacement results in the successful achievement of ultrafine control of 3D structures and high-speed patterning at the same time. Remarkably, one can prepare arbitrary 3D polymer brushes on a large area (1.3 mm × 1.3 mm), with <5% vertical and lateral size variations, and a patterning speed as much as 200-fold faster than the current state-of-the-art.

Massively parallel patterning of complex 2D and 3D functional polymer brushes by polymer pen lithography

We report the first demonstration of centimeter-area serial patterning of complex 2D and 3D functional polymer brushes by high-throughput polymer pen lithography. Arbitrary 2D and 3D structures of poly(glycidyl methacrylate) (PGMA) brushes are fabricated over areas as large as 2 cm × 1 cm, with a remarkable throughput being 3 orders of magnitudes higher than the state-of-the-arts. Patterned PGMA brushes are further employed as resist for fabricating Au micro/nanostructures and hard molds for the subsequent replica molding of soft stamps. On the other hand, these 2D and 3D PGMA brushes are also utilized as robust and versatile platforms for the immobilization of bioactive molecules to form 2D and 3D patterned DNA oligonucleotide and protein chips. Therefore, this low-cost, yet high-throughput "bench-top" serial fabrication method can be readily applied to a wide range of fields including micro/nanofabrication, optics and electronics, smart surfaces, and biorelated studies.

Elliptical polymer brush ring array mediated protein patterning and cell adhesion on patterned protein surfaces

This paper presents a novel method to fabricate elliptical ring arrays of proteins. The protein arrays are prepared by covalently grafting proteins to the polymer brush ring arrays which are prepared by the techniques combining colloidal lithography dewetting and surface initiated atom-transfer radical polymerization (SI-ATRP). Through this method, the parameters of protein patterns, such as height, wall thickness, periods, and distances between two elliptical rings, can be finely regulated. In addition, the sample which contains the elliptical protein ring arrays can be prepared over a large area up to 1 cm(2), and the protein on the ring maintains its biological activity. The as-prepared ring and elliptical ring arrays (ERAs) of fibronectin can promote cell adhesion and may have an active effect on the formation of the actin cytoskeleton.

Highly sensitive, patternable organic films at the nanoscale made by bottom-up assembly

Nanoscale patterning of organic thin films is of great interest for next-generation technologies. To keep pace with the demands of state-of-the-art lithography, both the sensitivity and resolution of the patternable thin films need to be improved. Here we report a highly sensitive polyurea film grown by bottom-up assembly via the molecular layer deposition (MLD) technique, which allows for high-resolution patterning at the nanoscale. The MLD process used in this work provides an exceptionally high degree of control over the film thickness and composition and also offers high coating conformality. The polyurea film was formed by urea coupling reactions between 1,4-diisocyanatobutane and 2,2'-(propane-2,2-diyldioxy)diethanamine precursors and deposited in a layer-by-layer fashion. Acid-labile ketal groups were incorporated into the backbone of the polymer chains to ensure chemically amplified cleaving reactions when combined with photoacid, which was generated by electron-beam activation of triphenylsulfonium triflate soaked into the polyurea film. With electron-beam lithography, sub-100 μC/cm(2) sensitivity and sub-100 nm resolution were demonstrated using this new bottom-up assembly approach to resist fabrication.

Characterization of Polymer Brush Membranes via HF Etch Liftoff Technique

Surface modification using end-tethered polymer brushes is an attractive, versatile, and effective method of tailoring the surface properties of a material. However, because the chains are covalently attached, characterization of these films is limited. When polymer brushes are detached in their native state, as opposed to fabricating a cross-linked initiator support, additional analytical techniques can be employed. We report lifting off patterned polymer brush membranes from a silicon oxide surface via a hydrofluoric acid etch. This method allows examination of polymer brushes via TEM and thus provides information regarding the perfection of initiator self-assembled monolayer formation and brush growth, as well as the effect of different cross-linking procedures.

Nanoscopic cylindrical dual concentric and lengthwise block brush terpolymers as covalent preassembled high-resolution and high-sensitivity negative-tone photoresist materials

We describe a high-resolution, high-sensitivity negative-tone photoresist technique that relies on bottom-up preassembly of differential polymer components within cylindrical polymer brush architectures that are designed to align vertically on a substrate and allow for top-down single-molecule line-width imaging. By applying cylindrical diblock brush terpolymers (DBTs) with a high degree of control over the synthetic chemistry, we achieved large areas of vertical alignment of the polymers within thin films without the need for supramolecular assembly processes, as required for linear block copolymer lithography. The specially designed chemical compositions and tuned concentric and lengthwise dimensions of the DBTs enabled high-sensitivity electron-beam lithography of patterns with widths of only a few DBTs (sub-30 nm line-width resolution). The high sensitivity of the brush polymer resists further facilitated the generation of latent images without postexposure baking, providing a practical approach for controlling acid reaction/diffusion processes in photolithography.

Hierarchical polymer brush nanoarrays: a versatile way to prepare multiscale patterns of proteins

This paper presents a versatile way to prepare multiscale and gradient patterns of proteins. The protein patterns are fabricated by conjugating proteins covalently on patterns of polymer brush that are prepared by techniques combining colloidal lithography with photolithography, and two-step colloidal lithography. Taking advantages of this technique, the parameters of protein patterns, such as height, diameters, periods, and distances between two dots, can be arbitrarily tuned. In addition, the protein patterns with varies of architectures, such as microdiscs, microstripes, microrings, microtriangles, microgrids, etc., consisting of protein nanodots, are prepared and the sample size is up to 4 cm(2). The as-prepared patterns of fibronectin can promote the cell adhesion and cell location.

pH-responsive one-dimensional periodic relief grating of polymer brush-gold nanoassemblies on silicon surface

In this work, we focus on the fabrication of the nanoassemblies consisting of the poly(2-dimethylaminoethyl methacrylate) (PDMAEMA) brushes and gold nanoparticles (AuNPs). The employed process involves grafting of the PDMAEMA chains on an underlying substrate in a brush conformation followed by the immobilization of surface functionalized AuNPs by means of physical interaction (electrostatic attraction, entanglement, and hydrogen bonding). Atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), and UV-vis spectroscopy have been employed to characterize the prepared PDMAEMA-AuNP nanoassemblies. Polymer brushes possessing various thicknesses have been found to suppress the nanoparticles' aggregation and, hence, facilitate the surface coverage. Furthermore, we patterned the PDMAEMA-AuNP nanoassemblies as an one-dimensional periodic relief grating (OPRG). The subwavelength structure of OPRG has the optical features including artificial refractive index, form birefringence and resonance and band gap effects. A mean refractive index of the PDMAEMA-AuNP nanoassemblies can be controlled by the filling factors of the OPRG structure, so that a desired distribution of refractive index of the polymer brushes-gold OPRG under various stimuli can be realized. The employed approach is simple and highly versatile for the modification of surfaces with a wide range of NPs.

Chemical patterns from surface grafted resists for directed assembly of block copolymers

We demonstrate a direct e-beam patternable one-component block copolymer (BCP) resist to fabricate a chemical pattern for the directed assembly of a symmetric block copolymer. The resist consists of a low molecular weight poly(styrene-block-methyl methacrylate) with a hydroxyl group at the PMMA chain end (PS-b-PMMA-OH), which anchors the chains to the surface. This short-tethered PMMA block provided sufficient sensitivity to allow scission by e-beam. The length of the untethered PS block was fine-tuned to impart the required contrast between the patterned and the unpatterned region for 1:1 assembly of an overlying BCP blend. Two BCP resists with a PS fraction of 0.25 (16SM) and 0.34 (18SM), with a total molecular weight less than 20K, were synthesized, and the assembly of a ternary BCP blend was studied. 16SM- and 18SM-anchored substrates showed nonpreferential and PS preferential surfaces, respectively. Both 18SM and 16SM could be patterned by e-beam to fabricate a 1:1 chemical pattern with a line pitch of 70 nm for the assembly of a BCP ternary blend. 18SM gave fewer defects than 16SM due to an increased contrast in interfacial energies between adjacent stripes in the chemical surface pattern. Two additional PS-b-PMMA-OH polymers with a molecular weight of 39K (F(PS) = 0.76) and 69K (F(PS) = 0.83) were synthesized to study the effect of PS cross-linking upon exposure to e-beam. As the PS fraction increases, the line pattern becomes blurred and ultimately ineffective in guiding the BCP assembly. The blurring is attributed to cross-linking of adjacent PS chains.

Polymer Brushes as Functional, Patterned Surfaces for Nanobiotechnology

Polymer brushes have many desirable characteristics such as the ability to tether molecules to a substrate or change the properties of a surface. Patterning of polymer films has been an area of great interest due to the broad range of applications including bio-related and medicinal research. Consequently, we have investigated patterning techniques for polymer brushes which allow for two different functionalities on the same surface. This method has been applied to a biosensor device which requires both polymer brushes and a photosensitizer to be polymerized on a patterned gold substrate. Additionally, the nature of patterned polymer brushes as removable thin films was explored. An etching process has enabled us to lift off very thin membranes for further characterization with the potential of using them as Janus membranes for biological applications.