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Luo C, Zheng Z, Ding Y, Ren Z, Shi H, Ji H, Zhou X, Chen Y. High-Resolution, Highly Transparent, and Efficient Quantum Dot Light-Emitting Diodes. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2303329. [PMID: 37335765 DOI: 10.1002/adma.202303329] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/10/2023] [Revised: 06/16/2023] [Indexed: 06/21/2023]
Abstract
Aiming at next-generation displays, high-resolution quantum dot light-emitting diodes (QLEDs) with high efficiency and transparency are highly desired. However, there is limited study involving the improvements of QLED pixel resolution, efficiency, and transparency simultaneously, which undoubtedly restricts the practical applications of QLED for next-generation displays. Here, the strategy of electrostatic force-induced deposition (EF-ID) is proposed by introducing alternating polyethyleneimine (PEI) and fluorosilane patterns to synergistically improve the pixel accuracy and transmittance of QD patterns. More importantly, the leakage current induced by the void spaces between pixels that is usually reported for high-resolution QLEDs is greatly suppressed by substrate-assisted insulating fluorosilane patterns. Finally, high-performance QLEDs with high resolution ranging from 1104 to 3031 pixels per inch (PPI) and a high efficiency of 15.6% are achieved, among the best performances of high resolution QLEDs. Notably, the high resolution QD pixels greatly enhance the transmittance of the QD patterns, thus prompting an impressive transmittance of 90.7% for the transparent QLEDs (2116 PPI), which represents the highest transmittance of transparent QLED devices. Consequently, this work contributes an effective and general approach for high-resolution QLEDs with high efficiency and transparency.
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Affiliation(s)
- Chengzhao Luo
- School of Optoelectronic Science and Engineering, Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou, 215006, P. R. China
| | - Zhishuai Zheng
- School of Optoelectronic Science and Engineering, Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou, 215006, P. R. China
| | - Yanhui Ding
- School of Optoelectronic Science and Engineering, Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou, 215006, P. R. China
| | - Zhenwei Ren
- School of Optoelectronic Science and Engineering, Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou, 215006, P. R. China
| | - Hengfei Shi
- School of Optoelectronic Science and Engineering, Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou, 215006, P. R. China
| | - Huifeng Ji
- School of Optoelectronic Science and Engineering, Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou, 215006, P. R. China
| | - Xin Zhou
- School of Optoelectronic Science and Engineering, Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou, 215006, P. R. China
| | - Yu Chen
- School of Optoelectronic Science and Engineering, Collaborative Innovation Center of Suzhou Nano Science and Technology, Soochow University, Suzhou, 215006, P. R. China
- National University of Singapore Suzhou Research Institute, Dushu Lake Science and Education Innovation District, Suzhou, 215123, P. R. China
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Michman E, Oded M, Shenhar R. Dual Block Copolymer Morphologies in Ultrathin Films on Topographic Substrates: The Effect of Film Curvature. Polymers (Basel) 2022; 14:polym14122377. [PMID: 35745955 PMCID: PMC9231016 DOI: 10.3390/polym14122377] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/15/2022] [Revised: 06/04/2022] [Accepted: 06/07/2022] [Indexed: 02/01/2023] Open
Abstract
The ability to create mixed morphologies using easily controlled parameters is crucial for the integration of block copolymers in advanced technologies. We have previously shown that casting an ultrathin block copolymer film on a topographically patterned substrate results in different deposited thicknesses on the plateaus and in the trenches, which leads to the co-existence of two patterns. In this work, we highlight the dependence of the dual patterns on the film profile. We suggest that the steepness of the film profile formed across the plateau edge affects the nucleation of microphase-separated domains near the plateau edges, which influences the morphology that develops on the plateau regions. An analysis of the local film thicknesses in multiple samples exhibiting various combinations of plateau and trench widths for different trench depths enabled the construction of phase diagrams, which unraveled the intricate dependence of the formed patterns not only on the curvature of the film profile but also on the fraction of the film that resides in the trenches. Our analysis facilitates the prediction of the patterns that would develop in the trenches and on the plateaus for a given block copolymer film of known thickness from the dimensions of the topographic features.
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Bayomi RAH, Aoki T, Sasaki S, Sakurai S. Regular ordering of spherical microdomains in dewetted monolayer islands induced by thermal annealing of spin-coated ultrathin films of a triblock copolymer. SOFT MATTER 2021; 17:7396-7407. [PMID: 34318868 DOI: 10.1039/d1sm00699a] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
Abstract
We report here spontaneous dewetting of a spin-coated, ultra-thin film of a sphere-forming block copolymer (BCP) upon thermal annealing, and that the dewetting resulted in the formation of plateau-shaped islands with a constant thickness consistent with the thickness of a monolayer, in which the spherical microdomains are regularly ordered two-dimensionally in a deformed hexagonal lattice. Thus, the spontaneous dewetting was ascribed to a mismatch between the initial spin-coated film thickness with respect to the monolayer thickness. Such dewetting of sphere-forming BCPs is considered to be deterministic compared to the cases of lamella- and cylinder-forming BCPs, as incommensuration in thickness is avoided by attaining perpendicular orientation without dewetting. We further quantitatively examined the ordering regularity of spherical microdomains in the dewetted monolayer islands to clarify the effect of confinement on sphere ordering. The degree of deformation of the hexagonal lattice was found to have an increasing tendency as a function of the degree of the deformation of the dewetted islands (the island shape), irrespective of the size of the island. Namely, islands with almost round shapes exhibit a well-ordered arrangement of the spherical microdomains in a perfect hexagonal lattice. Another notable finding is that the regular ordering of the spherical microdomains was found to be spoiled in the vicinity of the edge of the island. In other words, the spherical microdomains were well-ordered in a hexagonal lattice far from the edge of the island, while they were not regularly ordered in the vicinity of the edge, which may be due to mismatch between the curvature of the island's perimeter and the polygonal shape of ordered sphere grains.
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Affiliation(s)
- Rasha Ahmed Hanafy Bayomi
- Department of Biobased Materials Science, Graduate School of Science and Technology, Kyoto Institute of Technology, Matsugasaki, Sakyo-ku, Kyoto 606-8585, Japan. and Department of Apparel Design and Technology, Faculty of Applied Arts, Helwan University, Orman, Giza 12111, Egypt
| | - Takashi Aoki
- Department of Biobased Materials Science, Graduate School of Science and Technology, Kyoto Institute of Technology, Matsugasaki, Sakyo-ku, Kyoto 606-8585, Japan.
| | - Sono Sasaki
- Department of Biobased Materials Science, Graduate School of Science and Technology, Kyoto Institute of Technology, Matsugasaki, Sakyo-ku, Kyoto 606-8585, Japan.
| | - Shinichi Sakurai
- Department of Biobased Materials Science, Graduate School of Science and Technology, Kyoto Institute of Technology, Matsugasaki, Sakyo-ku, Kyoto 606-8585, Japan. and Department of Chemical Engineering, Indian Institute of Technology Guwahati, Kamrup, Assam 781-039, India
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4
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Synthesis of Poly(3-vinylpyridine)- Block-Polystyrene Diblock Copolymers via Surfactant-Free RAFT Emulsion Polymerization. MATERIALS 2019; 12:ma12193145. [PMID: 31561543 PMCID: PMC6803976 DOI: 10.3390/ma12193145] [Citation(s) in RCA: 12] [Impact Index Per Article: 2.4] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 09/04/2019] [Revised: 09/20/2019] [Accepted: 09/23/2019] [Indexed: 02/07/2023]
Abstract
In this work, we present a novel synthetic route to diblock copolymers based on styrene and 3-vinylpyridine monomers. Surfactant-free water-based reversible addition-fragmentation chain transfer (RAFT) emulsion polymerization of styrene in the presence of the macroRAFT agent poly(3-vinylpyridine) (P3VP) is used to synthesize diblock copolymers with molecular weights of around 60 kDa. The proposed mechanism for the poly(3-vinylpyridine)-block-poly(styrene) (P3VP-b-PS) synthesis is the polymerization-induced self-assembly (PISA) which involves the in situ formation of well-defined micellar nanoscale objects consisting of a PS core and a stabilizing P3VP macroRAFT agent corona. The presented approach shows a well-controlled RAFT polymerization, allowing for the synthesis of diblock copolymers with high monomer conversion. The obtained diblock copolymers display microphase-separated structures according to their composition.
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Hara S, Hirota K, Tabe Y, Wada H, Shimojima A, Kuroda K. Formation of Concentric Silica Nanogrooves Guided by the Curved Surface of Silica Particles. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2018; 34:1733-1741. [PMID: 29272588 DOI: 10.1021/acs.langmuir.7b03777] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
The flexible control of nanopatterns by a bottom-up process at the nanometer scale is essential for nanofabrication with a finer pitch. We have previously reported that for the fabrication of linear nanopatterns with sub-5 nm periodicity on Si substrates the outermost surfaces of assembled micelles facing the substrates can be replicated with soluble silicate species generated from the Si substrates under basic conditions. In this study, concentrically arranged nanogrooves with a sub-5 nm periodicity were prepared on Si substrates by replicating the outermost surfaces of bent micelles guided by silica particles. The Si substrates, where silica particles and surfactants films were deposited, were exposed to an NH3-water vapor mixture. During the vapor treatment, cylindrical micelles became arranged in concentric patterns centered on the silica particles, and their outermost surfaces facing the substrates were replicated by soluble silicate species on the Si substrates. The thinness of the surfactant film on the substrate is crucial for the formation of concentric silica nanogrooves because the out-of-plane orientations of the micelles are suppressed at the interface. Surprisingly, the domains of the concentric silica nanogrooves spread to much larger areas than the maximum cross-sectional areas of the particles, and the size of the domains increased linearly with the radii of the particles. The extension of concentric nanogrooves is discussed on the basis of the orientational elastic energies of the micelles around one silica particle. This study of the formation of bent nanogrooves guided by the outlines of readily deposited nanoscale objects provides a new nanostructure-guiding process.
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Affiliation(s)
| | | | - Yuka Tabe
- Kagami Memorial Research Institute for Materials Science and Technology, Waseda University , 2-8-26 Nishiwaseda, Shinjuku-ku, Tokyo 169-0051, Japan
| | | | | | - Kazuyuki Kuroda
- Kagami Memorial Research Institute for Materials Science and Technology, Waseda University , 2-8-26 Nishiwaseda, Shinjuku-ku, Tokyo 169-0051, Japan
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Choi J, Gunkel I, Li Y, Sun Z, Liu F, Kim H, Carter KR, Russell TP. Macroscopically ordered hexagonal arrays by directed self-assembly of block copolymers with minimal topographic patterns. NANOSCALE 2017; 9:14888-14896. [PMID: 28949359 DOI: 10.1039/c7nr05394k] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
A simple and robust method has been developed for the generation of macroscopically ordered hexagonal arrays from the directed self-assembly (DSA) of cylinder-forming block copolymers (BCPs) based on minimal trench patterns with solvent vapor annealing. The use of minimal trench patterns allows us to probe the guided hexagonal arrays of cylindrical microdomains using grazing incidence small angle X-ray scattering (GISAXS), where the sample stage is rotated on the basis of the six-fold symmetry of a hexagonal system. It is found that the (10) planes of hexagonal arrays of cylindrical microdomains are oriented parallel to the underlying trench direction over macroscopic length scales (∼1 × 1 cm2). However, there are misorientations of the hexagonal arrays with short-range ordering. GISAXS patterns show that the hexagonal arrays on the minimal trench pattern are distorted, deviating from a perfect hexagonal lattice. This distortion has been attributed to the absence of topographic constraints in the unconfined direction on the 1-D minimal trench pattern. Also, the frustration of BCP microdomains, arising from the incommensurability between the trench pitch and natural period of the BCP at the base of the trench, influences the distortion of the hexagonal arrays.
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Affiliation(s)
- Jaewon Choi
- Department of Polymer Science and Engineering, University of Massachusetts Amherst, 120 Governors Drive, Amherst, MA 01003, USA.
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7
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Irregular polystyrene peroxides – a promising macroinitiators synthesized by radical polymerization under oxygen inflow. Eur Polym J 2017. [DOI: 10.1016/j.eurpolymj.2017.02.010] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/22/2022]
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8
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Jin C, Olsen BC, Luber EJ, Buriak JM. Preferential Alignment of Incommensurate Block Copolymer Dot Arrays Forming Moiré Superstructures. ACS NANO 2017; 11:3237-3246. [PMID: 28225584 DOI: 10.1021/acsnano.7b00322] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
Block copolymer (BCP) self-assembly is of great interest as a cost-effective method for large-scale, high-resolution nanopattern fabrication. Directed self-assembly can induce long-range order and registration, reduce defect density, and enable access to patterns of higher complexity. Here we demonstrate preferential orientation of two incommensurate BCP dot arrays. A bottom layer of hexagonal silica dots is prepared via typical self-assembly from a PS-b-PDMS block copolymer. Self-assembly of a second, or top, layer of a different PS-b-PDMS block copolymer that forms a hexagonal dot pattern with different periodicity results in a predictable moiré superstructure. Four distinct moiré superstructures were demonstrated through a combination of different BCPs and different order of annealing. The registration force of the bottom layer of hexagonal dots is sufficient to direct the self-assembly of the top layer to adopt a preferred relative angle of rotation. Large-area helium ion microscopy imaging enabled quantification of the distributions of relative rotations between the two lattices in the moiré superstructures, yielding statistically meaningful results for each combination. It was also found that if the bottom layer dots were too large, the resulting moiré pattern was lost. A small reduction in the bottom layer dot size, however, resulted in large-area moiré superstructures, suggesting a specific size regime where interlayer registration forces can induce long-range preferential alignment of incommensurate BCP dot arrays.
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Affiliation(s)
- Cong Jin
- Department of Chemistry, University of Alberta , 11227 Saskatchewan Drive, Edmonton, Alberta T6G 2G2, Canada
- National Institute for Nanotechnology, National Research Council Canada , 11421 Saskatchewan Drive, Edmonton, Alberta T6G 2M9, Canada
| | - Brian C Olsen
- Department of Chemistry, University of Alberta , 11227 Saskatchewan Drive, Edmonton, Alberta T6G 2G2, Canada
- National Institute for Nanotechnology, National Research Council Canada , 11421 Saskatchewan Drive, Edmonton, Alberta T6G 2M9, Canada
| | - Erik J Luber
- Department of Chemistry, University of Alberta , 11227 Saskatchewan Drive, Edmonton, Alberta T6G 2G2, Canada
- National Institute for Nanotechnology, National Research Council Canada , 11421 Saskatchewan Drive, Edmonton, Alberta T6G 2M9, Canada
| | - Jillian M Buriak
- Department of Chemistry, University of Alberta , 11227 Saskatchewan Drive, Edmonton, Alberta T6G 2G2, Canada
- National Institute for Nanotechnology, National Research Council Canada , 11421 Saskatchewan Drive, Edmonton, Alberta T6G 2M9, Canada
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9
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Choi J, Huh J, Carter KR, Russell TP. Directed Self-Assembly of Block Copolymer Thin Films Using Minimal Topographic Patterns. ACS NANO 2016; 10:7915-7925. [PMID: 27391372 DOI: 10.1021/acsnano.6b03857] [Citation(s) in RCA: 21] [Impact Index Per Article: 2.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
We demonstrate that a minimal topographic pattern with a confinement depth (D) much less than the domain spacing of block copolymers (L0) can be used to achieve highly ordered hexagonal arrays or unidirectionally aligned line patterns over large areas. Cylinder-forming poly(styrene-b-ethylene oxide) (PS-b-PEO) thin films were prepared on a series of minimal single trench patterns with different widths (W) and D. Upon thermal annealing, hexagonal arrays of cylindrical microdomains propagated away from the edges of a single trench, providing insight into the minimum pitch (P) of the trench necessary to fully order hexagonal arrays. The confinement trench D of 0.30L0, the W in the range of 1.26L0 to 2.16L0, and the P as long as 18.84L0 were found to be effective for the generation of laterally ordered hexagonal arrays with the density amplification up by a factor of 17, within the minimally patterned trench surfaces of 100 μm by 100 μm. Furthermore, we produced line patterns of cylindrical microdomains by using solvent vapor annealing on the minimally patterned trench surfaces. However, highly aligned line patterns could be achieved only on the patterned surface with P = 5.75L0, W = 1.26L0, and D = 0.30L0 because the influence of the minimally patterned trench surface on the lateral ordering decreased as the P and W increase at the fixed D, resulting in poor ordering. These findings suggest that the minimal topographic pattern is more effective in guiding hexagonal arrays than in guiding line patterns.
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Affiliation(s)
- Jaewon Choi
- Department of Polymer Science and Engineering, University of Massachusetts Amherst , 120 Governors Drive, Amherst, Massachusetts 01003, United States
| | - June Huh
- Department of Chemical and Biological Engineering, Korea University , 145 Anam-ro, Seongbuk-gu, Seoul 02841, Republic of Korea
| | - Kenneth R Carter
- Department of Polymer Science and Engineering, University of Massachusetts Amherst , 120 Governors Drive, Amherst, Massachusetts 01003, United States
| | - Thomas P Russell
- Department of Polymer Science and Engineering, University of Massachusetts Amherst , 120 Governors Drive, Amherst, Massachusetts 01003, United States
- Materials Sciences Division, Lawrence Berkeley National Laboratory , Berkeley, California 94720, United States
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10
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Gu X, Gunkel I, Hexemer A, Russell TP. Controlling Domain Spacing and Grain Size in Cylindrical Block Copolymer Thin Films by Means of Thermal and Solvent Vapor Annealing. Macromolecules 2016. [DOI: 10.1021/acs.macromol.6b00429] [Citation(s) in RCA: 59] [Impact Index Per Article: 7.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/29/2023]
Affiliation(s)
- Xiaodan Gu
- Polymer
Science and Engineering Department, University of Massachusetts at Amherst, 120 Governors Drive, Amherst, Massachusetts 01003, United States
| | - Ilja Gunkel
- Polymer
Science and Engineering Department, University of Massachusetts at Amherst, 120 Governors Drive, Amherst, Massachusetts 01003, United States
| | | | - Thomas P. Russell
- Polymer
Science and Engineering Department, University of Massachusetts at Amherst, 120 Governors Drive, Amherst, Massachusetts 01003, United States
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Wan L, Ji S, Liu CC, Craig GSW, Nealey PF. Directed self-assembly of solvent-vapor-induced non-bulk block copolymer morphologies on nanopatterned substrates. SOFT MATTER 2016; 12:2914-2922. [PMID: 26891026 DOI: 10.1039/c5sm02829a] [Citation(s) in RCA: 12] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/05/2023]
Abstract
We report a study on directed self-assembly (DSA) with solvent annealing to induce the formation of non-bulk block copolymer microdomains on chemical patterns. Ultrathin films of symmetric polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) display morphologies of PMMA dots, stripes, and PS hexagons with increasing exposure time to acetone vapor, a PMMA-selective solvent. All three nanostructures form long-range-ordered and registered arrays on striped chemical patterns with periods (LS) commensurate to the solvated PS-b-PMMA microdomain period (L0,s). Solvent annealing is shown to facilitate DSA on non-regular chemical patterns, on which the local periods are incommensurate to L0,s. DSA with feature density multiplication, via solvent annealing, is also demonstrated.
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Affiliation(s)
- Lei Wan
- HGST, a Western Digital Company, San Jose Research Center, 3403 Yerba Buena Rd., San Jose, CA 95135, USA
| | - Shengxiang Ji
- Key Laboratory of Polymer Ecomaterials, Changchun Institute of Applied Chemistry, Chinese Academy of Science, 5625 Renmin Street, Changchun, 130022 China
| | - Chi-Chun Liu
- IBM Albany NanoTech, 257 Fuller Road, Albany, NY 12203, USA
| | - Gordon S W Craig
- Institute for Molecular Engineering, University of Chicago, 5747 South Ellis Avenue, Chicago, IL 60637, USA.
| | - Paul F Nealey
- Institute for Molecular Engineering, University of Chicago, 5747 South Ellis Avenue, Chicago, IL 60637, USA.
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12
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Pitet LM, Alexander-Moonen E, Peeters E, Druzhinina TS, Wuister SF, Lynd NA, Meijer EW. Probing the Effect of Molecular Nonuniformity in Directed Self-Assembly of Diblock Copolymers in Nanoconfined Space. ACS NANO 2015; 9:9594-9602. [PMID: 26503195 DOI: 10.1021/nn505886z] [Citation(s) in RCA: 6] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/05/2023]
Abstract
Various complex self-assembled morphologies of lamellar- and cylinder-forming block copolymers comprising poly(dimethylsiloxane)-b-polylactide (PDMS-b-PLA) confined in cylindrical channels were generated. Combining top-down lithography with bottom-up block copolymer self-assembly grants access to morphologies that are otherwise inaccessible with the bulk materials. Channel diameter (D) was systematically varied with four diblock copolymers having different compositions and bulk domain spacing (L0), corresponding to a range of frustration ratios (D/L0 from 2 to 4). Excessive packing frustration imposed by the channels leads to contorted domains. The resulting morphologies depend strongly on both D/L0 and copolymer composition. Under several circumstances, mixtures of complex morphologies were observed, which hypothetically arise from the severe sensitivity to D/L0 combined with the inherent compositional/molar mass dispersities associated with the nonuniform synthetic materials and silicon templates. Stochastic calculations offer compelling support for the hypothesis, and tractable pathways toward solving this apparent conundrum are proposed. The materials hold great promise for next-generation nanofabrication to address several emerging technologies, offering significantly enhanced versatility to basic diblock copolymers as templates for fabricating complex nanoscale objects.
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Affiliation(s)
- Louis M Pitet
- Institute for Complex Molecular Systems and Laboratory for Macromolecular and Organic Chemistry, Eindhoven University of Technology , P.O. Box 513, 5600 MB Eindhoven, The Netherlands
| | - Els Alexander-Moonen
- Philips Group Innovation, Research , High Tech Campus 7, 5656 AE Eindhoven, The Netherlands
| | - Emiel Peeters
- Philips Group Innovation, Research , High Tech Campus 7, 5656 AE Eindhoven, The Netherlands
| | | | | | - Nathaniel A Lynd
- McKetta Department of Chemical Engineering, University of Texas at Austin , Austin, Texas 78712, United States
| | - E W Meijer
- Institute for Complex Molecular Systems and Laboratory for Macromolecular and Organic Chemistry, Eindhoven University of Technology , P.O. Box 513, 5600 MB Eindhoven, The Netherlands
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13
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Xiao S, Yang X, Steiner P, Hsu Y, Lee K, Wago K, Kuo D. Servo-integrated patterned media by hybrid directed self-assembly. ACS NANO 2014; 8:11854-11859. [PMID: 25380228 DOI: 10.1021/nn505630t] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/04/2023]
Abstract
A hybrid directed self-assembly approach is developed to fabricate unprecedented servo-integrated bit-patterned media templates, by combining sphere-forming block copolymers with 5 teradot/in.(2) resolution capability, nanoimprint and optical lithography with overlay control. Nanoimprint generates prepatterns with different dimensions in the data field and servo field, respectively, and optical lithography controls the selective self-assembly process in either field. Two distinct directed self-assembly techniques, low-topography graphoepitaxy and high-topography graphoepitaxy, are elegantly integrated to create bit-patterned templates with flexible embedded servo information. Spinstand magnetic test at 1 teradot/in.(2) shows a low bit error rate of 10(-2.43), indicating fully functioning bit-patterned media and great potential of this approach for fabricating future ultra-high-density magnetic storage media.
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Affiliation(s)
- Shuaigang Xiao
- Media Research Center, Seagate Technology , 47010 Kato Road, Fremont, California 94538, United States
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14
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Xiao S, Yang X, Hwu JJ, Lee KY, Kuo D. A facile route to regular and nonregular dot arrays by integrating nanoimprint lithography with sphere-forming block copolymer directed self-assembly. ACTA ACUST UNITED AC 2013. [DOI: 10.1002/polb.23433] [Citation(s) in RCA: 10] [Impact Index Per Article: 0.9] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/06/2022]
Affiliation(s)
- Shuaigang Xiao
- Media Research Center, Seagate Technology; 47010 Kato Road Fremont California 94538
| | - XiaoMin Yang
- Media Research Center, Seagate Technology; 47010 Kato Road Fremont California 94538
| | - Justin J. Hwu
- Media Research Center, Seagate Technology; 47010 Kato Road Fremont California 94538
| | - Kim Y. Lee
- Media Research Center, Seagate Technology; 47010 Kato Road Fremont California 94538
| | - David Kuo
- Media Research Center, Seagate Technology; 47010 Kato Road Fremont California 94538
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15
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Gu X, Gunkel I, Russell TP. Pattern transfer using block copolymers. PHILOSOPHICAL TRANSACTIONS. SERIES A, MATHEMATICAL, PHYSICAL, AND ENGINEERING SCIENCES 2013; 371:20120306. [PMID: 24000358 DOI: 10.1098/rsta.2012.0306] [Citation(s) in RCA: 29] [Impact Index Per Article: 2.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/02/2023]
Abstract
To meet the increasing demand for patterning smaller feature sizes, a lithography technique is required with the ability to pattern sub-20 nm features. While top-down photolithography is approaching its limit in the continued drive to meet Moore's law, the use of directed self-assembly (DSA) of block copolymers (BCPs) offers a promising route to meet this challenge in achieving nanometre feature sizes. Recent developments in BCP lithography and in the DSA of BCPs are reviewed. While tremendous advances have been made in this field, there are still hurdles that need to be overcome to realize the full potential of BCPs and their actual use.
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Affiliation(s)
- Xiaodan Gu
- Polymer Science and Engineering Department, University of Massachusetts at Amherst, 120 Governors Drive, Amherst, MA 01003, USA
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16
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Chen X, Chen L, Yao K, Chen Y. Self-assembly of diblock polythiophenes with discotic liquid crystals on side chains for the formation of a highly ordered nanowire morphology. ACS APPLIED MATERIALS & INTERFACES 2013; 5:8321-8328. [PMID: 23919656 DOI: 10.1021/am402031v] [Citation(s) in RCA: 12] [Impact Index Per Article: 1.1] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/02/2023]
Abstract
Diblock copolymers bearing a triphenylene (TP) discotic liquid crystals moiety, poly(3-hexylthiophene)-block-poly[3-(10-(2,3,6,7,10-pentakis(hexyloxy)triphenylen)-decyloxy)thiophene] (P3HT-b-P3TPT), was successfully synthesized by Grignard metathesis polymerization. The self-assembled nanowire structures of these diblock copolymers have been investigated by atomic force microscopy and transmission electron microscopy. The domain size and crystallinity of the nanostructures can be easily controlled by tuning the P3HT/P3TPT block ratio and by employing different annealing processes such as thermal and solvent annealing. The results of X-ray diffraction indicate that both intermolecular interactions and mesogen packing are essential for the formation of nanostructures in the diblock copolymers. Although the block ratio of P3HT and P3TPT comes to 9:1 and the copolymer undergoes solvent annealing followed by thermal treatment, an optimal crystalline nanowire with a size of 16.9 nm is formed. In addition, solar cells based on these copolymers as electron donors in combination with [6,6]-phenyl-C61-butyric acid methyl ester (PC61BM) or N,N'-di(2-ethylhexyl)perylene-3,4,9,10-tetracarboxylbisimide (PDI) as electron acceptors have been constructed, and the effect of the nanomorphology on device performance has been investigated.
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Affiliation(s)
- Xun Chen
- Institute of Polymers/Department of Chemistry, Nanchang University , 999 Xuefu Avenue, Nanchang 330031, China
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Gu W, Xu J, Kim JK, Hong SW, Wei X, Yang X, Lee KY, Kuo DS, Xiao S, Russell TP. Solvent-assisted directed self-assembly of spherical microdomain block copolymers to high areal density arrays. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2013; 25:3677-3682. [PMID: 23666897 DOI: 10.1002/adma.201300899] [Citation(s) in RCA: 10] [Impact Index Per Article: 0.9] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/26/2013] [Revised: 04/01/2013] [Indexed: 06/02/2023]
Abstract
The fabrication process for 5 Tb/in(2) bit patterns using solvent-assisted directed self-assembly is investigated. The N-methyl-2-pyrrolidone solvent vapor-annealing method was used to achieve good long-range lateral ordering of low-molecular-weight polystyrene-block-polydimethylsiloxane with a lattice spacing of 11 nm on flat Si substrates, PS modified substrates and lithographically patterned substrates, respectively.
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Affiliation(s)
- Weiyin Gu
- Department of Polymer Science and Engineering, 120 Governors Drive, University of Massachusetts, Amherst, MA 01003, USA
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Minegishi S, Naruoka T, Nagai T. Directed Self Assembly Materials for Semiconductor Lithography. J PHOTOPOLYM SCI TEC 2013. [DOI: 10.2494/photopolymer.26.793] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
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Gu W, Hong SW, Russell TP. Orienting block copolymer microdomains with block copolymer brushes. ACS NANO 2012; 6:10250-10257. [PMID: 23092357 DOI: 10.1021/nn304049w] [Citation(s) in RCA: 13] [Impact Index Per Article: 1.1] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/01/2023]
Abstract
A simple, rapid, and robust technique for controlling the self-assembly of block copolymers (BCPs) with a large segmental interaction parameter, χ, is described using a surface modified with anchored BCP brushes. End-functionalized poly(styrene-b-ethylene oxide)s (PS-b-PEOs), where the fraction of PS (f(PS)) was varied, end-functionalized neat PS, and end-functionalized neat PEO were end-grafted onto Si substrates modifying the surface with polymer brushes. Thin films of cylinder-forming PS-b-PEO were prepared on modified Si substrates and thermally annealed. When neat PS and PEO were used as the anchored brushes, the microdomains of the PS-b-PEO oriented parallel to the substrate upon thermal annealing due to the preferential interactions of one block to the anchored brushes. However, when end-functionalized PS-b-PEOs were used to modify the substrate, hexagonally packed cylindrical PEO microdomains oriented normal to the substrate, having long-range lateral ordering, were obtained over a very wide range of f(PS) (0.32 to 0.77).
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Affiliation(s)
- Weiyin Gu
- Department of Polymer Science & Engineering, University of Massachusetts, 120 Governors Drive, Amherst, Massachusetts 01003-4530, United States
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Ordering evolution of block copolymer thin films upon solvent-annealing process. J Colloid Interface Sci 2012; 383:118-23. [DOI: 10.1016/j.jcis.2012.06.030] [Citation(s) in RCA: 19] [Impact Index Per Article: 1.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 04/11/2012] [Revised: 06/11/2012] [Accepted: 06/13/2012] [Indexed: 11/30/2022]
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Surface relief terraces and self-assembled nanostructures in thin block copolymer films with solvent annealing. POLYMER 2012. [DOI: 10.1016/j.polymer.2012.08.051] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/23/2022]
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Hong SW, Voronov DL, Lee DH, Hexemer A, Padmore HA, Xu T, Russell TP. Controlled orientation of block copolymers on defect-free faceted surfaces. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2012; 24:4278-4283. [PMID: 22761040 DOI: 10.1002/adma.201201279] [Citation(s) in RCA: 11] [Impact Index Per Article: 0.9] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/28/2012] [Revised: 04/19/2012] [Indexed: 06/01/2023]
Abstract
The effect of a faceted surface geometry on controlling the direction of well-defined line patterns of block copolymer (BCP) microdomains over macroscopic areas is reported. Facets with asymmetric base angles can control the direction of BCP microdomains oriented either parallel or perpendicular to the facets depending on BCP film thickness.
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Affiliation(s)
- Sung Woo Hong
- Department of Polymer Science and Engineering, 120 Governors Drive, University of Massachusetts Amherst, Amherst, MA 01003, USA
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Schacher FH, Rupar PA, Manners I. Funktionale Blockcopolymere: nanostrukturierte Materialien mit neuen Anwendungsmöglichkeiten. Angew Chem Int Ed Engl 2012. [DOI: 10.1002/ange.201200310] [Citation(s) in RCA: 54] [Impact Index Per Article: 4.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/23/2023]
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Schacher FH, Rupar PA, Manners I. Functional Block Copolymers: Nanostructured Materials with Emerging Applications. Angew Chem Int Ed Engl 2012; 51:7898-921. [DOI: 10.1002/anie.201200310] [Citation(s) in RCA: 564] [Impact Index Per Article: 47.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 01/12/2012] [Indexed: 01/07/2023]
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