Electron beam lithography on irregular surfaces using an evaporated resist

Highly Stretchable and Oriented Wafer-Scale Semiconductor Films for Organic Phototransistor Arrays

Stretchable organic phototransistor arrays have potential applications in artificial visual systems due to their capacity to perceive ultraweak light across a broad spectrum. Ensuring uniform mechanical and electrical performance of individual devices within these arrays requires semiconductor films with large-area scale, well-defined orientation, and stretchability. However, the progress of stretchable phototransistors is primarily impeded by their limited electrical properties and photodetection capabilities. Herein, wafer-scale and well-oriented semiconductor films were successfully prepared using a solution shearing process. The electrical properties and photodetection capabilities were optimized by improving the polymer chain alignment. Furthermore, a stretchable 10 × 10 transistor array with high device uniformity was fabricated, demonstrating excellent mechanical robustness and photosensitive imaging ability. These arrays based on highly stretchable and well-oriented wafer-scale semiconductor films have great application potential in the field of electronic eye and artificial visual systems.

Electron beam lithography on nonplanar and irregular surfaces

E-beam lithography is a powerful tool for generating nanostructures and fabricating nanodevices with fine features approaching a few nanometers in size. However, alternative approaches to conventional spin coating and development processes are required to optimize the lithography procedure on irregular surfaces. In this review, we summarize the state of the art in nanofabrication on irregular substrates using e-beam lithography. To overcome these challenges, unconventional methods have been developed. For instance, polymeric and nonpolymeric materials can be sprayed or evaporated to form uniform layers of electron-sensitive materials on irregular substrates. Moreover, chemical bonds can be applied to help form polymer brushes or self-assembled monolayers on these surfaces. In addition, thermal oxides can serve as resists, as the etching rate in solution changes after e-beam exposure. Furthermore, e-beam lithography tools can be combined with cryostages, evaporation systems, and metal deposition chambers for sample development and lift-off while maintaining low temperatures. Metallic nanopyramids can be fabricated on an AFM tip by utilizing ice as a positive resistor. Additionally, Ti/Au caps can be patterned around a carbon nanotube. Moreover, 3D nanostructures can be formed on irregular surfaces by exposing layers of anisole on organic ice surfaces with a focused e-beam. These advances in e-beam lithography on irregular substrates, including uniform film coating, instrumentation improvement, and new pattern transferring method development, substantially extend its capabilities in the fabrication and application of nanoscale structures.

Configurable swellability of hydrogel microstructure for structural-color-based imaging concealment/encryption

Optical information concealment/encryption technologies are of great importance to structural color applications. Although a series of responsive materials have been developed for dynamic structural color, the shortcomings of the high-quality synthesis process, the complex controlling method, and the low-resolution capability limit their practical use. Herein, we proposed a novel strategy of humidity-driven structural-color-based imaging concealment/encryption by utilizing metal-hydrogel-metal (MHM) nanocavities with configurable swellablity response to humidity change. With varied exposure doses, multi-stage MHM nanocavities with swellable hydrogel interlayers are achieved, generating dynamic structural color covering the visible spectrum. We revealed that the swelling ratio of hydrogel microstructures can be gradually adjusted between 1.05 and 2.08 by varying the exposure dose. We demonstrated that a hydrogel-based structural color image can be concealed with humidity changes by configurating swellable and non-swellable hydrogel pixels together. Furthermore, we developed the double exposure method in which the first exposure can generate pixel arrays for the deceptive image and the second exposure can locally suppress the swellablity of certain pixels. This method can highlight hidden images in a moist state, demonstrating a powerful strategy for high-density optical information encryption.

Looking into a crystal ball: printing and patterning self-assembled peptide nanostructures

The solution processability of organic semiconductors and conjugated polymers along with the advent of nanomaterials as conducting inks have revolutionized next-generation flexible consumer electronics. Another equally important class of nanomaterials, self-assembled peptides, heralded as next-generation materials for bioelectronics, have a lot of potential in printed technology. In this minireview, we address the self-assembly process in dipeptides, their application in electronics, and recent progress in three-dimensional printing. The prospect of a generalizable path for nanopatterning self-assembled peptides using ice lithography and its challenges are further discussed.

Versatile Approach of Silicon Nanofabrication without Resists: Helium Ion-Bombardment Enhanced Etching

Herein, we report a helium ion-bombardment enhanced etching method for silicon nanofabrication without the use of resists; furthermore, we demonstrate its unique advantages for straightforward fabrication on irregular surfaces and prototyping nano-electro-mechanical system devices, such as self-enclosed Si nanofluidic channels and mechanical nano-resonators. This method employs focused helium ions to selectively irradiate single-crystal Si to disrupt the crystal lattice and transform it into an amorphous phase that can be etched at a rate 200 times higher than that of the non-irradiated Si. Due to the unique raindrop shape of the interaction volumes between helium ions and Si, buried Si nanofluidic channels can be constructed using only one dosing step, followed by one step of conventional chemical etching. Moreover, suspended Si nanobeams can be fabricated without an additional undercut step for release owing to the unique raindrop shape. In addition, we demonstrate nanofabrication directly on 3D micro/nano surfaces, such as an atomic force microscopic probe, which is challenging for conventional nanofabrication due to the requirement of photoresist spin coating. Finally, this approach can also be extended to assist in the etching of other materials that are difficult to etch, such as silicon carbide (SiC).

Spheres-in-Grating Assemblies with Altered Photoluminescence and Wetting Properties

In this work, we report the fabrication of spheres-in-grating assemblies consisting of equally spaced parallel rectangular grooves filled with fluorescent spheres, by employing embossing and convective self-assembly methods. The developed hierarchical assemblies, when compared to spheres spin-cast on glass, exhibited a blueshift in the photoluminescence spectra, as well as changes in wetting properties induced not only by the patterning process, but also by the nature and size of the utilized spheres. While the patterning process led to increased hydrophobicity, the utilization of spheres with larger diameter improved the hydrophilicity of the fabricated assemblies. Finally, by aiming at the future integration of the spheres-in-grating assemblies as critical components in different technological and medical applications, we report a successful encapsulation of the incorporated spheres within the grating with a top layer of a functional polymer.

Multifunctional Structured Platforms: From Patterning of Polymer-Based Films to Their Subsequent Filling with Various Nanomaterials

There is an astonishing number of optoelectronic, photonic, biological, sensing, or storage media devices, just to name a few, that rely on a variety of extraordinary periodic surface relief miniaturized patterns fabricated on polymer-covered rigid or flexible substrates. Even more extraordinary is that these surface relief patterns can be further filled, in a more or less ordered fashion, with various functional nanomaterials and thus can lead to the realization of more complex structured architectures. These architectures can serve as multifunctional platforms for the design and the development of a multitude of novel, better performing nanotechnological applications. In this work, we aim to provide an extensive overview on how multifunctional structured platforms can be fabricated by outlining not only the main polymer patterning methodologies but also by emphasizing various deposition methods that can guide different structures of functional nanomaterials into periodic surface relief patterns. Our aim is to provide the readers with a toolbox of the most suitable patterning and deposition methodologies that could be easily identified and further combined when the fabrication of novel structured platforms exhibiting interesting properties is targeted.

Ultrastable monodisperse polymer glass formed by physical vapour deposition

Stable glasses prepared by vapour deposition are an analogue of glassy materials aged for geological timescales. The ability to prepare such materials allows the study of near-ideal glassy systems. We report the preparation and characterization of stable glasses of polymers prepared by physical vapour deposition. By controlling the substrate temperature, deposition rate and polydispersity, we prepared and characterized a variety of stable polymer glasses. These materials display the kinetic stability, low fictive temperatures and high-density characteristic of stable glasses. Extrapolation of the measured transformation times between the stable and normal glass provides estimates of the relaxation times of the equilibrium supercooled liquid at temperatures as much as 30 K below the glass transition temperature. These results demonstrate that polymer stable glasses are an exciting and powerful tool in the study of ultrastable glass and disordered materials in general.

Polyvinyl alcohol: a high-resolution hydrogel resist for humidity-sensitive micro-/nanostructure

A high-resolution nanopatterning technique is desirable with the present rapid development of hydrogel nanodevices. Here, we demonstrate that polyvinyl alcohol (PVA), a popular polymeric hydrogel, can function as the negative-tone resist for electron beam lithography (EBL) with a resolution capability as narrow as 50 nm half-pitch. Furthermore, the hydrophilic groups of PVA are stable after EBL exposure, and thus the pattern still shows rapid responsivity to humidity change. An aqueous nanopatterning process including dissolution, spin-coating and development is setup, which is friendly for organic device fabrication free of organic solvent. This high-resolution nanopatterning technique with PVA is helpful for the design and realization of hydrogel-related nanodevices in the future.

Electron-Beam Patterning of Vapor-Deposited Solid Anisole

The emerging ice lithography (IL) nanofabrication technology differs from conventional electron-beam lithography by working at cryogenic temperatures and using vapor-deposited organic molecules, such as solid water and alkanes, as e-beam resists. In this paper, we systematically investigate e-beam patterning of frozen anisole and assess its performance as an e-beam resist in IL. Dose curves reveal that anisole has a very low contrast of ∼1, with a very weak dependence on primary beam energy in the investigated range of 5-20 keV. The minimum line width of 60 nm is attainable at 20 keV, limited by stage vibration in our apparatus. Notably, various solid states of anisole have been observed and we can control the deposited anisole from crystalline to amorphous state by decreasing the deposition temperature. The critical temperature for forming an amorphous film is 130 K in the vacuum of a microscope chamber. Smooth patterns with a surface roughness of ∼0.7 nm are achieved in the as-deposited amorphous solid anisole. As a proof of principle of 3D fabrication, we finally fabricate nanoscale patterns on exotic silicon micropillars with a high aspect ratio using this resist.

Ice lithography for 3D nanofabrication

Nanotechnology and nanoscience are enabled by nanofabrication. Electron-beam lithography, which makes 2D patterns down to a few nanometers, is one of the fundamental pillars of nanofabrication. Recently, significant progress in 3D electron-beam-based nanofabrication has been made, such as the emerging ice lithography technology, in which ice thin-films are patterned by a focused electron-beam. Here, we review the history and progress of ice lithography, and focus on its applications in efficient 3D nanofabrication and additive manufacturing or nanoscale 3D printing. The finest linewidth made using frozen octane is below 5 nm, and nanostructures can be fabricated in selected areas on non-planar surfaces such as freely suspended nanotubes or nanowires. As developing custom instruments is required to advance this emerging technology, we discuss the evolution of ice lithography instruments and highlight major instrumentation advances. Finally, we present the perspectives of 3D printing of functional materials using organic ices. We believe that we barely scratched the surface of this new and exciting research area, and we hope that this review will stimulate cutting-edge and interdisciplinary research that exploits the undiscovered potentials of ice lithography for 3D photonics, electronics and 3D nanodevices for biology and medicine.

Plasmonic Au Array SERS Substrate with Optimized Thin Film Oxide Substrate Layer

This work studies the effect of a plasmonic array structure coupled with thin film oxide substrate layers on optical surface enhancement using a finite element method. Previous results have shown that as the nanowire spacing increases in the sub-100 nm range, enhancement decreases; however, this work improves upon previous results by extending the range above 100 nm. It also averages optical enhancement across the entire device surface rather than localized regions, which gives a more practical estimate of the sensor response. A significant finding is that in higher ranges, optical enhancement does not always decrease but instead has additional plasmonic modes at greater nanowire and spacing dimensions resonant with the period of the structure and the incident light wavelength, making it possible to optimize enhancement in more accessibly fabricated nanowire array structures. This work also studies surface enhancement to optimize the geometries of plasmonic wires and oxide substrate thickness. Periodic oscillations of surface enhancement are observed at specific oxide thicknesses. These results will help improve future research by providing optimized geometries for SERS molecular sensors.

Organic Ice Resists

Electron-beam lithography (EBL) is the backbone technology for patterning nanostructures and manufacturing nanodevices. It involves processing and handling synthetic resins in several steps, each requiring optimization and dedicated instrumentation in cleanroom environments. Here, we show that simple organic molecules, e.g. alcohols, condensed to form thin-films at low temperature demonstrate resist-like capabilities for EBL applications and beyond. The entire lithographic process takes place in a single instrument, and avoids exposing  users to chemicals and the need of cleanrooms. Unlike EBL that requires large samples with optically flat surfaces, we patterned on fragile membranes only 5 nm-thin, and 2 × 2 mm² diamond samples. We created patterns on the nanometer to sub-millimeter scale, as well as three-dimensional structures by stacking layers of frozen organic molecules. Finally, using plasma etching, the organic ice resist (OIR) patterns are used to structure the underlying material, and thus enable nanodevice fabrication.

Single Layer Surface-Grafted PMMA as a Negative-Tone e-Beam Resist

One of the important challenges in electron beam lithography is nanofabrication on nonflat or irregular surfaces. Although spin coating is the most popular technique for resist coating, it is not suitable for nonflat, irregular substrates because a uniform film cannot be achieved on those surfaces. Here, it is demonstrated that single layer surface-grafted PMMA can be used as a negative-tone e-beam resist, and it can be applied to nonflat, irregular surfaces as well as flat, conventional surfaces. Although it is well known that heavily exposed PMMA undergoes cross-linking and works as a negative-tone e-beam resist when developed by solvent, solvent does not work as a developer for negative-tone single-layer surface-grafted PMMA. Instead, thermal treatment at 360 °C for 1 min is used to develop PMMA.

Grafted Polystyrene Monolayer Brush as Both Negative and Positive Tone Electron Beam Resist

Although spin coating is the most widely used electron-beam resist coating technique in nanolithography, it cannot typically be applied for nonflat or irregular surfaces. Here, we demonstrate that monolayer polystyrene brush can be grafted on substrates and used as both positive and negative electron-beam resist, which can be applied for such unconventional surfaces. Polystyrene is a popular negative resist when using solvent developer but solvent cannot be used for grafted polystyrene brush that is firmly bonded to the substrate. Instead, we employed two unconventional development methods to lead polystyrene brush to positive or negative tone behavior. Negative tone was achieved by thermal development at 300 °C because exposed thus cross-linked polystyrene brush is more thermally stable against vaporization than unexposed linear one. Surprisingly, positive tone behavior occurred when the brush was grafted onto an aluminum (Al) layer and the film stack was developed using diluted hydrofluoric acid (HF) that etched the underlying Al layer. By transferring the patterns into the silicon (Si) substrates using the thin Al layer as a sacrificial hard mask for dry etch, well-defined structures in Si were obtained in two different electron-beam resist tones as well as in nonflat surfaces.

Stencil Lithography for Scalable Micro- and Nanomanufacturing

In this paper, we review the current development of stencil lithography for scalable micro- and nanomanufacturing as a resistless and reusable patterning technique. We first introduce the motivation and advantages of stencil lithography for large-area micro- and nanopatterning. Then we review the progress of using rigid membranes such as SiNx and Si as stencil masks as well as stacking layers. We also review the current use of flexible membranes including a compliant SiNx membrane with springs, polyimide film, polydimethylsiloxane (PDMS) layer, and photoresist-based membranes as stencil lithography masks to address problems such as blurring and non-planar surface patterning. Moreover, we discuss the dynamic stencil lithography technique, which significantly improves the patterning throughput and speed by moving the stencil over the target substrate during deposition. Lastly, we discuss the future advancement of stencil lithography for a resistless, reusable, scalable, and programmable nanolithography method.

Spun-wrapped aligned nanofiber (SWAN) lithography for fabrication of micro/nano-structures on 3D objects

Fabrication of micro/nano-structures on irregularly shaped substrates and three-dimensional (3D) objects is of significant interest in diverse technological fields. However, it remains a formidable challenge thwarted by limited adaptability of the state-of-the-art nanolithography techniques for nanofabrication on non-planar surfaces. In this work, we introduce Spun-Wrapped Aligned Nanofiber (SWAN) lithography, a versatile, scalable, and cost-effective technique for fabrication of multiscale (nano to microscale) structures on 3D objects without restriction on substrate material and geometry. SWAN lithography combines precise deposition of polymeric nanofiber masks, in aligned single or multilayer configurations, with well-controlled solvent vapor treatment and etching processes to enable high throughput (>10(-7) m(2) s(-1)) and large-area fabrication of sub-50 nm to several micron features with high pattern fidelity. Using this technique, we demonstrate whole-surface nanopatterning of bulk and thin film surfaces of cubes, cylinders, and hyperbola-shaped objects that would be difficult, if not impossible to achieve with existing methods. We demonstrate that the fabricated feature size (b) scales with the fiber mask diameter (D) as b(1.5)∝D. This scaling law is in excellent agreement with theoretical predictions using the Johnson, Kendall, and Roberts (JKR) contact theory, thus providing a rational design framework for fabrication of systems and devices that require precisely designed multiscale features.

Template-Stripped Tunable Plasmonic Devices on Stretchable and Rollable Substrates

We use template stripping to integrate metallic nanostructures onto flexible, stretchable, and rollable substrates. Using this approach, high-quality patterned metals that are replicated from reusable silicon templates can be directly transferred to polydimethylsiloxane (PDMS) substrates. First we produce stretchable gold nanohole arrays and show that their optical transmission spectra can be modulated by mechanical stretching. Next we fabricate stretchable arrays of gold pyramids and demonstrate a modulation of the wavelength of light resonantly scattered from the tip of the pyramid by stretching the underlying PDMS film. The use of a flexible transfer layer also enables template stripping using a cylindrical roller as a substrate. As an example, we demonstrate roller template stripping of metallic nanoholes, nanodisks, wires, and pyramids onto the cylindrical surface of a glass rod lens. These nonplanar metallic structures produced via template stripping with flexible and stretchable films can facilitate many applications in sensing, display, plasmonics, metasurfaces, and roll-to-roll fabrication.

Nanofabrication on unconventional substrates using transferred hard masks

A major challenge in nanofabrication is to pattern unconventional substrates that cannot be processed for a variety of reasons, such as incompatibility with spin coating, electron beam lithography, optical lithography, or wet chemical steps. Here, we present a versatile nanofabrication method based on re-usable silicon membrane hard masks, patterned using standard lithography and mature silicon processing technology. These masks, transferred precisely onto targeted regions, can be in the millimetre scale. They allow for fabrication on a wide range of substrates, including rough, soft, and non-conductive materials, enabling feature linewidths down to 10 nm. Plasma etching, lift-off, and ion implantation are realized without the need for scanning electron/ion beam processing, UV exposure, or wet etching on target substrates.