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Hu XH, Xiong S. Fabrication of Nanodevices Through Block Copolymer Self-Assembly. FRONTIERS IN NANOTECHNOLOGY 2022. [DOI: 10.3389/fnano.2022.762996] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/13/2022] Open
Abstract
Block copolymer (BCP) self-assembly, as a novel bottom-up patterning technique, has received increasing attention in the manufacture of nanodevices because of its significant advantages of high resolution, high throughput, low cost, and simple processing. BCP self-assembly provides a very powerful approach to constructing diverse nanoscale templates and patterns that meet large-scale manufacturing practices. For the past 20 years, the self-assembly of BCPs has been extensively employed to produce a range of nanodevices, such as nonvolatile memory, bit-patterned media (BPM), fin field-effect transistors (FinFETs), photonic nanodevices, solar cells, biological and chemical sensors, and ultrafiltration membranes, providing a variety of configurations for high-density integration and cost-efficient manufacturing. In this review, we summarize the recent progress in the fabrication of nanodevices using the templates of BCP self-assembly, and present current challenges and future opportunities.
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Michman E, Langenberg M, Stenger R, Oded M, Schvartzman M, Müller M, Shenhar R. Controlled Spacing between Nanopatterned Regions in Block Copolymer Films Obtained by Utilizing Substrate Topography for Local Film Thickness Differentiation. ACS APPLIED MATERIALS & INTERFACES 2019; 11:35247-35254. [PMID: 31482698 DOI: 10.1021/acsami.9b12817] [Citation(s) in RCA: 8] [Impact Index Per Article: 1.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Various types of devices require hierarchically nanopatterned substrates, where the spacing between patterned domains is controlled. Ultraconfined films exhibit extreme morphological sensitivity to slight variations in film thickness when the substrate is highly selective toward one of the blocks. Here, it is shown that using the substrate's topography as a thickness differentiating tool enables the creation of domains with different surface patterns in a fully controlled fashion from a single, unblended block copolymer. This approach is applicable to block copolymers of different compositions and to different topographical patterns and thus opens numerous possibilities for the hierarchical construction of multifunctional devices.
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Affiliation(s)
- Elisheva Michman
- The Institute of Chemistry and the Center for Nanoscience and Nanotechnology , The Hebrew University of Jerusalem , Jerusalem 9190401 , Israel
| | - Marcel Langenberg
- Institute for Theoretical Physics , Georg-August-University Göttingen , Friedrich-Hund-Platz 1 , 37077 Göttingen , Germany
| | - Roland Stenger
- Institute for Theoretical Physics , Georg-August-University Göttingen , Friedrich-Hund-Platz 1 , 37077 Göttingen , Germany
| | - Meirav Oded
- The Institute of Chemistry and the Center for Nanoscience and Nanotechnology , The Hebrew University of Jerusalem , Jerusalem 9190401 , Israel
| | - Mark Schvartzman
- Department of Materials Engineering and Ilse Katz Institute for Nanoscale Science and Technology , Ben Gurion University of the Negev , Beer Sheva 8410501 , Israel
| | - Marcus Müller
- Institute for Theoretical Physics , Georg-August-University Göttingen , Friedrich-Hund-Platz 1 , 37077 Göttingen , Germany
| | - Roy Shenhar
- The Institute of Chemistry and the Center for Nanoscience and Nanotechnology , The Hebrew University of Jerusalem , Jerusalem 9190401 , Israel
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3
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Zhao W, Duan C, Li W. Hybrid line-dot nanopatterns from directed self-assembly of diblock copolymers by trenches. Phys Chem Chem Phys 2019; 21:10011-10021. [PMID: 31041947 DOI: 10.1039/c9cp00949c] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
Abstract
We demonstrate that the directed self-assembly of AB diblock copolymers by periodic trenches can be used to fabricate large-scale ordered hybrid line-dot nanopatterns in addition to a defect-free dot nanopattern. The formation of line or dot nanopatterns in thin films with proper surface affinities is controlled by the film thickness, which is modulated by a topographic pattern consisting of steps and trenches. Two kinds of line-dot nanopatterns are achieved with cylinder-forming and sphere-forming copolymers, respectively. One kind of hybrid nanopatterns is composed of perpendicularly standing cylinders (dots) on the steps and parallel monolayer cylinders (lines) within the trenches, while the dots of the other kind are replaced by monolayer spheres on the steps. The thermodynamic stability region of target hybrid nanopatterns is identified by constructing two-dimensional phase diagrams with respect to two control parameters of step height and film thickness using self-consistent field theory. Furthermore, a process window of the line-dot nanopatterns is estimated using cell dynamics simulations based on time-dependent Ginzburg-Landau theory, confirming their feasibility in kinetics.
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Affiliation(s)
- Wenfeng Zhao
- State Key Laboratory of Molecular Engineering of Polymers, Key Laboratory of Computational Physical Sciences, Department of Macromolecular Science, Fudan University, Shanghai 200433, China.
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Zhang Y, Shen Y, Hou J, Zhang Y, Fam W, Liu J, Bennett TD, Chen V. Ultraselective Pebax Membranes Enabled by Templated Microphase Separation. ACS APPLIED MATERIALS & INTERFACES 2018; 10:20006-20013. [PMID: 29786417 DOI: 10.1021/acsami.8b03787] [Citation(s) in RCA: 27] [Impact Index Per Article: 4.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
Block copolymer materials have been considered as promising candidates to fabricate gas separation membranes. This microphase separation affects the polymer chain packing density and molecular separation efficiency. Here, we demonstrate a method to template microphase separation within a thin composite Pebax membrane, through the controllable self-assembly of one-dimensional halloysite nanotubes (HNTs) within the thin film via the solution-casting technique. Crystallization of the polyamide component is induced at the HNT surface, guiding subsequent crystal growth around the tubular structure. The resultant composite membrane possesses an ultrahigh selectivity (up to 290) for the CO2/N2 gas pair, together with a moderate CO2 permeability (80.4 barrer), being the highest selectivity recorded for Pebax-based membranes, and it easily surpasses the Robeson upper bound. The templated microphase separation concept is further demonstrated with the nanocomposite hollow fiber gas separation membranes, showing its effectiveness of promoting gas selectivity.
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Affiliation(s)
- Yatao Zhang
- School of Chemical Engineering and Energy , Zhengzhou University , Zhengzhou 450001 , P. R. China
| | - Yijia Shen
- School of Chemical Engineering and Energy , Zhengzhou University , Zhengzhou 450001 , P. R. China
| | - Jingwei Hou
- UNESCO Centre for Membrane Science and Technology, School of Chemical Engineering , University of New South Wales , Sydney 2052 , Australia
- Department of Materials Science and Metallurgy , University of Cambridge , Cambridge CB3 0FS , U.K
| | - Yiming Zhang
- School of Chemical Engineering and Energy , Zhengzhou University , Zhengzhou 450001 , P. R. China
| | - Winny Fam
- UNESCO Centre for Membrane Science and Technology, School of Chemical Engineering , University of New South Wales , Sydney 2052 , Australia
| | - Jindun Liu
- School of Chemical Engineering and Energy , Zhengzhou University , Zhengzhou 450001 , P. R. China
| | - Thomas Douglas Bennett
- Department of Materials Science and Metallurgy , University of Cambridge , Cambridge CB3 0FS , U.K
| | - Vicki Chen
- UNESCO Centre for Membrane Science and Technology, School of Chemical Engineering , University of New South Wales , Sydney 2052 , Australia
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5
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Choi J, Gunkel I, Li Y, Sun Z, Liu F, Kim H, Carter KR, Russell TP. Macroscopically ordered hexagonal arrays by directed self-assembly of block copolymers with minimal topographic patterns. NANOSCALE 2017; 9:14888-14896. [PMID: 28949359 DOI: 10.1039/c7nr05394k] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
A simple and robust method has been developed for the generation of macroscopically ordered hexagonal arrays from the directed self-assembly (DSA) of cylinder-forming block copolymers (BCPs) based on minimal trench patterns with solvent vapor annealing. The use of minimal trench patterns allows us to probe the guided hexagonal arrays of cylindrical microdomains using grazing incidence small angle X-ray scattering (GISAXS), where the sample stage is rotated on the basis of the six-fold symmetry of a hexagonal system. It is found that the (10) planes of hexagonal arrays of cylindrical microdomains are oriented parallel to the underlying trench direction over macroscopic length scales (∼1 × 1 cm2). However, there are misorientations of the hexagonal arrays with short-range ordering. GISAXS patterns show that the hexagonal arrays on the minimal trench pattern are distorted, deviating from a perfect hexagonal lattice. This distortion has been attributed to the absence of topographic constraints in the unconfined direction on the 1-D minimal trench pattern. Also, the frustration of BCP microdomains, arising from the incommensurability between the trench pitch and natural period of the BCP at the base of the trench, influences the distortion of the hexagonal arrays.
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Affiliation(s)
- Jaewon Choi
- Department of Polymer Science and Engineering, University of Massachusetts Amherst, 120 Governors Drive, Amherst, MA 01003, USA.
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Sunday DF, Ren J, Liman CD, Williamson LD, Gronheid R, Nealey PF, Kline RJ. Characterizing Patterned Block Copolymer Thin Films with Soft X-rays. ACS APPLIED MATERIALS & INTERFACES 2017; 9:31325-31334. [PMID: 28541658 DOI: 10.1021/acsami.7b02791] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/14/2023]
Abstract
The directed self-assembly (DSA) of block copolymers (BCPs) is a potential solution for patterning critical features for integrated circuits at future technology nodes. For this process to be implemented, there needs to be a better understanding of how the template guides the assembly and induces subsurface changes in the lamellar structure. Using a rotational transmission X-ray scattering measurement coupled with soft X-rays to improve contrast between polymer components, the impact of the ratio of the guiding stripe width (W) to the BCP pitch (L0) was investigated. For W/L0 < 1, continuous vertical lamella were observed, with some fluctuations in the interface profile near the template that smoothed out further up the structure. Near W/L0 ≈ 1.5, the arrangement of the lamella shifted, moving from polystyrene centered on the guiding stripe to poly(methyl methacrylate) centered on the guiding stripe.
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Affiliation(s)
- Daniel F Sunday
- National Institute of Standards and Technology , Gaithersburg, Maryland 20899, United States
| | - Jiaxing Ren
- Institute for Molecular Engineering, University of Chicago , Chicago, Illinois 60637, United States
| | - Christopher D Liman
- National Institute of Standards and Technology , Gaithersburg, Maryland 20899, United States
| | - Lance D Williamson
- Institute for Molecular Engineering, University of Chicago , Chicago, Illinois 60637, United States
| | | | - Paul F Nealey
- Institute for Molecular Engineering, University of Chicago , Chicago, Illinois 60637, United States
| | - R Joseph Kline
- National Institute of Standards and Technology , Gaithersburg, Maryland 20899, United States
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Jiang J, Jacobs AG, Wenning B, Liedel C, Thompson MO, Ober CK. Ultrafast Self-Assembly of Sub-10 nm Block Copolymer Nanostructures by Solvent-Free High-Temperature Laser Annealing. ACS APPLIED MATERIALS & INTERFACES 2017; 9:31317-31324. [PMID: 28598156 DOI: 10.1021/acsami.7b00774] [Citation(s) in RCA: 13] [Impact Index Per Article: 1.9] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/23/2023]
Abstract
Laser spike annealing was applied to PS-b-PDMS diblock copolymers to induce short-time (millisecond time scale), high-temperature (300 to 700 °C) microphase segregation and directed self-assembly of sub-10 nm features. Conditions were identified that enabled uniform microphase separation in the time frame of tens of milliseconds. Microphase ordering improved with increased temperature and annealing time, whereas phase separation contrast was lost for very short annealing times at high temperature. PMMA brush underlayers aided ordering under otherwise identical laser annealing conditions. Good long-range order for sub-10 nm cylinder morphology was achieved using graphoepitaxy coupled with a 20 ms dwell laser spike anneal above 440 °C.
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Affiliation(s)
- Jing Jiang
- Department of Chemical and Biomolecular Engineering, ‡Department of Materials Science and Engineering, and §Department of Chemistry and Chemical Biology, Cornell University , Ithaca, New York 14853, United States
| | - Alan G Jacobs
- Department of Chemical and Biomolecular Engineering, ‡Department of Materials Science and Engineering, and §Department of Chemistry and Chemical Biology, Cornell University , Ithaca, New York 14853, United States
| | - Brandon Wenning
- Department of Chemical and Biomolecular Engineering, ‡Department of Materials Science and Engineering, and §Department of Chemistry and Chemical Biology, Cornell University , Ithaca, New York 14853, United States
| | - Clemens Liedel
- Department of Chemical and Biomolecular Engineering, ‡Department of Materials Science and Engineering, and §Department of Chemistry and Chemical Biology, Cornell University , Ithaca, New York 14853, United States
| | - Michael O Thompson
- Department of Chemical and Biomolecular Engineering, ‡Department of Materials Science and Engineering, and §Department of Chemistry and Chemical Biology, Cornell University , Ithaca, New York 14853, United States
| | - Christopher K Ober
- Department of Chemical and Biomolecular Engineering, ‡Department of Materials Science and Engineering, and §Department of Chemistry and Chemical Biology, Cornell University , Ithaca, New York 14853, United States
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Cummins C, Borah D, Rasappa S, Senthamaraikannan R, Simao C, Francone A, Kehagias N, Sotomayor-Torres CM, Morris MA. Self-Assembled Nanofeatures in Complex Three-Dimensional Topographies via Nanoimprint and Block Copolymer Lithography Methods. ACS OMEGA 2017; 2:4417-4423. [PMID: 31457733 PMCID: PMC6641768 DOI: 10.1021/acsomega.7b00781] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 06/13/2017] [Accepted: 07/18/2017] [Indexed: 06/10/2023]
Abstract
Achieving ultrasmall dimensions of materials and retaining high throughput are critical fabrication considerations for nanotechnology use. This article demonstrates an integrated approach for developing isolated sub-20 nm silicon oxide features through combined "top-down" and "bottom-up" methods: nanoimprint lithography (NIL) and block copolymer (BCP) lithography. Although techniques like those demonstrated here have been developed for nanolithographic application in the microelectronics processing industry, similar approaches could be utilized for sensor, fluidic, and optical-based devices. Thus, this article centers on looking at the possibility of generating isolated silica structures on substrates. NIL was used to create intriguing three-dimensional (3-D) polyhedral oligomeric silsesquioxane (POSS) topographical arrays that guided and confined polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) BCP nanofeatures in isolated regions. A cylinder forming PS-b-PDMS BCP system was successfully etched using a one-step etching process to create line-space arrays with a period of 35 nm in confined POSS arrays. We highlight large-area (>6 μm) coverage of line-space arrays in 3-D topographies that could potentially be utilized, for example, in nanofluidic systems. Aligned features for directed self-assembly application are also demonstrated. The high-density, confined silicon oxide nanofeatures in soft lithographic templates over macroscopic areas illustrate the advantages of integrating distinct lithographic methods for attaining discrete features in the deep nanoscale regime.
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Affiliation(s)
- Cian Cummins
- AMBER
Centre and CRANN, Trinity College Dublin, Dublin 2, Ireland
| | - Dipu Borah
- AMBER
Centre and CRANN, Trinity College Dublin, Dublin 2, Ireland
| | - Sozaraj Rasappa
- Optoelectronics
Research Center, Tampere University of Technology, P.O. Box 692, FI-33101 Tampere, Finland
| | | | - Claudia Simao
- Catalan
Institute of Nanoscience and Nanotechnology (ICN2), CSIC and The Barcelona Institute of Science and Technology, Campus UAB, Bellaterra, 08193 Barcelona, Spain
| | - Achille Francone
- Catalan
Institute of Nanoscience and Nanotechnology (ICN2), CSIC and The Barcelona Institute of Science and Technology, Campus UAB, Bellaterra, 08193 Barcelona, Spain
| | - Nikolaos Kehagias
- Catalan
Institute of Nanoscience and Nanotechnology (ICN2), CSIC and The Barcelona Institute of Science and Technology, Campus UAB, Bellaterra, 08193 Barcelona, Spain
| | - Clivia M. Sotomayor-Torres
- Catalan
Institute of Nanoscience and Nanotechnology (ICN2), CSIC and The Barcelona Institute of Science and Technology, Campus UAB, Bellaterra, 08193 Barcelona, Spain
- ICREA, Pg. Lluís
Companys 23, 08010 Barcelona, Spain
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9
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Lane AP, Yang X, Maher MJ, Blachut G, Asano Y, Someya Y, Mallavarapu A, Sirard SM, Ellison CJ, Willson CG. Directed Self-Assembly and Pattern Transfer of Five Nanometer Block Copolymer Lamellae. ACS NANO 2017; 11:7656-7665. [PMID: 28700207 DOI: 10.1021/acsnano.7b02698] [Citation(s) in RCA: 67] [Impact Index Per Article: 9.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
The directed self-assembly (DSA) and pattern transfer of poly(5-vinyl-1,3-benzodioxole-block-pentamethyldisilylstyrene) (PVBD-b-PDSS) is reported. Lamellae-forming PVBD-b-PDSS can form well resolved 5 nm (half-pitch) features in thin films with high etch selectivity. Reactive ion etching was used to selectively remove the PVBD block, and fingerprint patterns were subsequently transferred into an underlying chromium hard mask and carbon layer. DSA of the block copolymer (BCP) features resulted from orienting PVBD-b-PDSS on guidelines patterned by nanoimprint lithography. A density multiplication factor of 4× was achieved through a hybrid chemo-/grapho-epitaxy process. Cross-sectional scanning tunneling electron microscopy/electron energy loss spectroscopy (STEM/EELS) was used to analyze the BCP profile in the DSA samples. Wetting layers of parallel orientation were observed to form unless the bottom and top surface were neutralized with a surface treatment and top coat, respectively.
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Affiliation(s)
| | - XiaoMin Yang
- Media Research Center, Seagate Technology , 47488 Kato Road, Fremont, California 94538, United States
| | | | - Gregory Blachut
- Lam Research Corporation , 4400 Cushing Parkway, Fremont, California 94538, United States
| | | | | | | | - Stephen M Sirard
- Lam Research Corporation , 4400 Cushing Parkway, Fremont, California 94538, United States
| | - Christopher J Ellison
- Department of Chemical Engineering and Materials Science, University of Minnesota , Minneapolis, Minnesota 55455, United States
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11
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Jin C, Olsen BC, Luber EJ, Buriak JM. Preferential Alignment of Incommensurate Block Copolymer Dot Arrays Forming Moiré Superstructures. ACS NANO 2017; 11:3237-3246. [PMID: 28225584 DOI: 10.1021/acsnano.7b00322] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
Block copolymer (BCP) self-assembly is of great interest as a cost-effective method for large-scale, high-resolution nanopattern fabrication. Directed self-assembly can induce long-range order and registration, reduce defect density, and enable access to patterns of higher complexity. Here we demonstrate preferential orientation of two incommensurate BCP dot arrays. A bottom layer of hexagonal silica dots is prepared via typical self-assembly from a PS-b-PDMS block copolymer. Self-assembly of a second, or top, layer of a different PS-b-PDMS block copolymer that forms a hexagonal dot pattern with different periodicity results in a predictable moiré superstructure. Four distinct moiré superstructures were demonstrated through a combination of different BCPs and different order of annealing. The registration force of the bottom layer of hexagonal dots is sufficient to direct the self-assembly of the top layer to adopt a preferred relative angle of rotation. Large-area helium ion microscopy imaging enabled quantification of the distributions of relative rotations between the two lattices in the moiré superstructures, yielding statistically meaningful results for each combination. It was also found that if the bottom layer dots were too large, the resulting moiré pattern was lost. A small reduction in the bottom layer dot size, however, resulted in large-area moiré superstructures, suggesting a specific size regime where interlayer registration forces can induce long-range preferential alignment of incommensurate BCP dot arrays.
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Affiliation(s)
- Cong Jin
- Department of Chemistry, University of Alberta , 11227 Saskatchewan Drive, Edmonton, Alberta T6G 2G2, Canada
- National Institute for Nanotechnology, National Research Council Canada , 11421 Saskatchewan Drive, Edmonton, Alberta T6G 2M9, Canada
| | - Brian C Olsen
- Department of Chemistry, University of Alberta , 11227 Saskatchewan Drive, Edmonton, Alberta T6G 2G2, Canada
- National Institute for Nanotechnology, National Research Council Canada , 11421 Saskatchewan Drive, Edmonton, Alberta T6G 2M9, Canada
| | - Erik J Luber
- Department of Chemistry, University of Alberta , 11227 Saskatchewan Drive, Edmonton, Alberta T6G 2G2, Canada
- National Institute for Nanotechnology, National Research Council Canada , 11421 Saskatchewan Drive, Edmonton, Alberta T6G 2M9, Canada
| | - Jillian M Buriak
- Department of Chemistry, University of Alberta , 11227 Saskatchewan Drive, Edmonton, Alberta T6G 2G2, Canada
- National Institute for Nanotechnology, National Research Council Canada , 11421 Saskatchewan Drive, Edmonton, Alberta T6G 2M9, Canada
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Choi J, Huh J, Carter KR, Russell TP. Directed Self-Assembly of Block Copolymer Thin Films Using Minimal Topographic Patterns. ACS NANO 2016; 10:7915-7925. [PMID: 27391372 DOI: 10.1021/acsnano.6b03857] [Citation(s) in RCA: 21] [Impact Index Per Article: 2.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
We demonstrate that a minimal topographic pattern with a confinement depth (D) much less than the domain spacing of block copolymers (L0) can be used to achieve highly ordered hexagonal arrays or unidirectionally aligned line patterns over large areas. Cylinder-forming poly(styrene-b-ethylene oxide) (PS-b-PEO) thin films were prepared on a series of minimal single trench patterns with different widths (W) and D. Upon thermal annealing, hexagonal arrays of cylindrical microdomains propagated away from the edges of a single trench, providing insight into the minimum pitch (P) of the trench necessary to fully order hexagonal arrays. The confinement trench D of 0.30L0, the W in the range of 1.26L0 to 2.16L0, and the P as long as 18.84L0 were found to be effective for the generation of laterally ordered hexagonal arrays with the density amplification up by a factor of 17, within the minimally patterned trench surfaces of 100 μm by 100 μm. Furthermore, we produced line patterns of cylindrical microdomains by using solvent vapor annealing on the minimally patterned trench surfaces. However, highly aligned line patterns could be achieved only on the patterned surface with P = 5.75L0, W = 1.26L0, and D = 0.30L0 because the influence of the minimally patterned trench surface on the lateral ordering decreased as the P and W increase at the fixed D, resulting in poor ordering. These findings suggest that the minimal topographic pattern is more effective in guiding hexagonal arrays than in guiding line patterns.
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Affiliation(s)
- Jaewon Choi
- Department of Polymer Science and Engineering, University of Massachusetts Amherst , 120 Governors Drive, Amherst, Massachusetts 01003, United States
| | - June Huh
- Department of Chemical and Biological Engineering, Korea University , 145 Anam-ro, Seongbuk-gu, Seoul 02841, Republic of Korea
| | - Kenneth R Carter
- Department of Polymer Science and Engineering, University of Massachusetts Amherst , 120 Governors Drive, Amherst, Massachusetts 01003, United States
| | - Thomas P Russell
- Department of Polymer Science and Engineering, University of Massachusetts Amherst , 120 Governors Drive, Amherst, Massachusetts 01003, United States
- Materials Sciences Division, Lawrence Berkeley National Laboratory , Berkeley, California 94720, United States
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Jin C, Olsen BC, Wu NLY, Luber EJ, Buriak JM. Sequential Nanopatterned Block Copolymer Self-Assembly on Surfaces. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2016; 32:5890-5898. [PMID: 27189878 DOI: 10.1021/acs.langmuir.6b01365] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/05/2023]
Abstract
Bottom-up self-assembly of high-density block-copolymer nanopatterns is of significant interest for a range of technologies, including memory storage and low-cost lithography for on-chip applications. The intrinsic or native spacing of a given block copolymer is dependent upon its size (N, degree of polymerization), composition, and the conditions of self-assembly. Polystyrene-block-polydimethylsiloxane (PS-b-PDMS) block copolymers, which are well-established for the production of strongly segregated single-layer hexagonal nanopatterns of silica dots, can be layered sequentially to produce density-doubled and -tripled nanopatterns. The center-to-center spacing and diameter of the resulting silica dots are critical with respect to the resulting double- and triple-layer assemblies because dot overlap reduces the quality of the resulting pattern. The addition of polystyrene (PS) homopolymer to PS-b-PDMS reduces the size of the resulting silica dots but leads to increased disorder at higher concentrations. The quality of these density-multiplied patterns can be calculated and predicted using parameters easily derived from SEM micrographs of corresponding single and multilayer patterns; simple geometric considerations underlie the degree of overlap of dots and layer-to-layer registration, two important factors for regular ordered patterns, and clearly defined dot borders. Because the higher-molecular-weight block copolymers tend to yield more regular patterns than smaller block copolymers, as defined by order and dot circularity, this sequential patterning approach may provide a route toward harnessing these materials, thus surpassing their native feature density.
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Affiliation(s)
- Cong Jin
- Department of Chemistry, University of Alberta , 11227 Saskatchewan Drive, Edmonton, AB T6G 2G2, Canada
- National Institute for Nanotechnology, National Research Council Canada , 11421 Saskatchewan Drive, Edmonton, AB T6G 2M9, Canada
| | - Brian C Olsen
- Department of Chemistry, University of Alberta , 11227 Saskatchewan Drive, Edmonton, AB T6G 2G2, Canada
- National Institute for Nanotechnology, National Research Council Canada , 11421 Saskatchewan Drive, Edmonton, AB T6G 2M9, Canada
| | - Nathanael L Y Wu
- National Institute for Nanotechnology, National Research Council Canada , 11421 Saskatchewan Drive, Edmonton, AB T6G 2M9, Canada
- Department of Electrical and Computer Engineering, University of Alberta , Edmonton, Alberta T6G 2G8, Canada
| | - Erik J Luber
- Department of Chemistry, University of Alberta , 11227 Saskatchewan Drive, Edmonton, AB T6G 2G2, Canada
- National Institute for Nanotechnology, National Research Council Canada , 11421 Saskatchewan Drive, Edmonton, AB T6G 2M9, Canada
| | - Jillian M Buriak
- Department of Chemistry, University of Alberta , 11227 Saskatchewan Drive, Edmonton, AB T6G 2G2, Canada
- National Institute for Nanotechnology, National Research Council Canada , 11421 Saskatchewan Drive, Edmonton, AB T6G 2M9, Canada
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Sun Z, Chen Z, Zhang W, Choi J, Huang C, Jeong G, Coughlin EB, Hsu Y, Yang X, Lee KY, Kuo DS, Xiao S, Russell TP. Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2015; 27:4364-4370. [PMID: 26088198 DOI: 10.1002/adma.201501585] [Citation(s) in RCA: 32] [Impact Index Per Article: 3.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/02/2015] [Revised: 04/24/2015] [Indexed: 06/04/2023]
Abstract
Low molecular weight P2VP-b-PS-b-P2VP triblock copolymer (poly(2-vinlypyridine)-block-polystyrene-block-poly(2-vinylpyridine)] is doped with copper chloride and microphase separated into lamellar line patterns with ultrahigh area density. Salt-doped P2VP-b-PS-b-P2VP triblock copolymer is self-assembled on the top of the nanoimprinted photoresist template, and metallic nanowires with long-range ordering are prepared with platinum-salt infiltration and plasma etching.
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Affiliation(s)
- Zhiwei Sun
- Department of Polymer Science and Engineering, University of Massachusetts Amherst, 120 Governors Drive, Amherst, MA, 01003, USA
| | - Zhenbin Chen
- College of Materials Science and Engineering, Lanzhou University of Technology, Lanzhou, 730050, Gansu, China
| | - Wenxu Zhang
- Department of Polymer Science and Engineering, University of Massachusetts Amherst, 120 Governors Drive, Amherst, MA, 01003, USA
| | - Jaewon Choi
- Department of Polymer Science and Engineering, University of Massachusetts Amherst, 120 Governors Drive, Amherst, MA, 01003, USA
| | - Caili Huang
- Department of Polymer Science and Engineering, University of Massachusetts Amherst, 120 Governors Drive, Amherst, MA, 01003, USA
| | - Gajin Jeong
- Department of Polymer Science and Engineering, University of Massachusetts Amherst, 120 Governors Drive, Amherst, MA, 01003, USA
| | - E Bryan Coughlin
- Department of Polymer Science and Engineering, University of Massachusetts Amherst, 120 Governors Drive, Amherst, MA, 01003, USA
| | - Yautzong Hsu
- Seagate Technology, LLD, 47010 Kato Road, Fremont, CA, 94538, USA
| | - XiaoMin Yang
- Seagate Technology, LLD, 47010 Kato Road, Fremont, CA, 94538, USA
| | - Kim Y Lee
- Seagate Technology, LLD, 47010 Kato Road, Fremont, CA, 94538, USA
| | - David S Kuo
- Seagate Technology, LLD, 47010 Kato Road, Fremont, CA, 94538, USA
| | - Shuaigang Xiao
- Seagate Technology, LLD, 47010 Kato Road, Fremont, CA, 94538, USA
| | - Thomas P Russell
- Department of Polymer Science and Engineering, University of Massachusetts Amherst, 120 Governors Drive, Amherst, MA, 01003, USA
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