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Joo W, Chen CH, Moerdyk JP, Deschner RP, Bielawski CW, Willson CG. Photoinitiated ring‐opening metathesis polymerization. ACTA ACUST UNITED AC 2019. [DOI: 10.1002/pola.29449] [Citation(s) in RCA: 10] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/12/2022]
Affiliation(s)
- Wontae Joo
- Department of Chemistry University of Texas at Austin Austin Texas 78712
| | | | | | - Ryan P. Deschner
- Department of Chemical Engineering University of Texas at Austin Austin Texas 78712
| | - Christopher W. Bielawski
- Center for Multidimensional Carbon Materials (CMCM) Institute for Basic Science (IBS) Ulsan 44919 Republic of Korea
- Department of Chemistry and Department of Energy Engineering Ulsan National Institute of Science and Technology (UNIST Ulsan 44919 Republic of Korea
| | - Carlton Grant Willson
- Department of Chemistry University of Texas at Austin Austin Texas 78712
- Department of Chemical Engineering University of Texas at Austin Austin Texas 78712
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2
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Sugita H, Miyashita Y, Suzuki H, Takasugi S, Matsumura N, Yoshizawa M. Positive-tone photoresist consisting of a multifunctional acrylate resin that can be patterned after photo-crosslinking. J Appl Polym Sci 2018. [DOI: 10.1002/app.45871] [Citation(s) in RCA: 6] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/27/2022]
Affiliation(s)
- Hikaru Sugita
- Yokkaichi Research Center, JSR Corporation; 100 Kawajiri-cho, Yokkaichi Mie 510-8552 Japan
| | - Yuka Miyashita
- Yokkaichi Research Center, JSR Corporation; 100 Kawajiri-cho, Yokkaichi Mie 510-8552 Japan
| | - Hiroyuki Suzuki
- Yokkaichi Research Center, JSR Corporation; 100 Kawajiri-cho, Yokkaichi Mie 510-8552 Japan
| | - Shingo Takasugi
- Yokkaichi Research Center, JSR Corporation; 100 Kawajiri-cho, Yokkaichi Mie 510-8552 Japan
| | - Nobuji Matsumura
- Yokkaichi Research Center, JSR Corporation; 100 Kawajiri-cho, Yokkaichi Mie 510-8552 Japan
| | - Mitsuyo Yoshizawa
- Yokkaichi Research Center, JSR Corporation; 100 Kawajiri-cho, Yokkaichi Mie 510-8552 Japan
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Sohn HS, Kim DG, Lee A, Cha SH, Lee JC. Preparation of well-defined acid-cleavable branched polymers composed of methacrylates and acrylates. J IND ENG CHEM 2015. [DOI: 10.1016/j.jiec.2014.05.020] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/25/2022]
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5
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Tsujii A, Lou L, Nagashima M, Okamura H, Matsumoto A. Synthesis of Degradable Thermosetting Resin Using MaleicAnhydride/Diene Copolymers and Difunctional Crosslinkers. ACTA ACUST UNITED AC 2015. [DOI: 10.11618/adhesion.51.336] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/01/2022]
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6
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Tsujii A, Namba M, Okamura H, Matsumoto A. Radical Alternating Copolymerization of Twisted 1,3-Butadienes with Maleic Anhydride as a New Approach for Degradable Thermosetting Resin. Macromolecules 2014. [DOI: 10.1021/ma501555n] [Citation(s) in RCA: 29] [Impact Index Per Article: 2.9] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/30/2022]
Affiliation(s)
- Asuka Tsujii
- Department
of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai-shi, Osaka 599-8531, Japan
| | - Mami Namba
- Department
of Applied Chemistry and Bioengineering, Graduate School of Engineering, Osaka City University, 3-3-138 Sugimoto, Sumiyoshi-ku,
Osaka 558-8585, Japan
| | - Haruyuki Okamura
- Department
of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai-shi, Osaka 599-8531, Japan
| | - Akikazu Matsumoto
- Department
of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University, 1-1 Gakuen-cho, Naka-ku, Sakai-shi, Osaka 599-8531, Japan
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7
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Chen K, Xu J, Luft JC, Tian S, Raval JS, DeSimone JM. Design of asymmetric particles containing a charged interior and a neutral surface charge: comparative study on in vivo circulation of polyelectrolyte microgels. J Am Chem Soc 2014; 136:9947-52. [PMID: 24941029 PMCID: PMC4227716 DOI: 10.1021/ja503939n] [Citation(s) in RCA: 40] [Impact Index Per Article: 4.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/18/2023]
Abstract
![]()
Lowering
the modulus of hydrogel particles could enable them to
bypass in vivo physical barriers that would otherwise
filter particles with similar size but higher modulus. Incorporation
of electrolyte moieties into the polymer network of hydrogel particles
to increase the swelling ratio is a straightforward and quite efficient
way to decrease the modulus. In addition, charged groups in hydrogel
particles can also help secure cargoes. However, the distribution
of charged groups on the surface of a particle can accelerate the
clearance of particles. Herein, we developed a method to synthesize
highly swollen microgels of precise size with near-neutral surface
charge while retaining interior charged groups. A strategy was employed
to enable a particle to be highly cross-linked with very small mesh
size, and subsequently PEGylated to quench the exterior amines only
without affecting the internal amines. Acidic degradation of the cross-linker
allows for swelling of the particles to microgels with a desired size
and deformability. The microgels fabricated demonstrated extended
circulation in vivo compared to their counterparts
with a charged surface, and could potentially be utilized in in vivo applications including as oxygen carriers or nucleic
acid scavengers.
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Affiliation(s)
- Kai Chen
- Department of Chemistry, ‡Lineberger Comprehensive Cancer Center, §Institute for Nanomedicine, ∥School of Pharmacy, ⊥Department of Pathology and Laboratory Medicine, #Institute for Advanced Materials, University of North Carolina , Chapel Hill, North Carolina 27599, United States
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8
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Gallagher JJ, Hillmyer MA, Reineke TM. Degradable Thermosets from Sugar-Derived Dilactones. Macromolecules 2014. [DOI: 10.1021/ma401904x] [Citation(s) in RCA: 34] [Impact Index Per Article: 3.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/17/2023]
Affiliation(s)
- James J. Gallagher
- Department of Chemistry, University of Minnesota, 207 Pleasant
St SE, Minneapolis, Minnesota 55455-0431, United States
| | - Marc A. Hillmyer
- Department of Chemistry, University of Minnesota, 207 Pleasant
St SE, Minneapolis, Minnesota 55455-0431, United States
| | - Theresa M. Reineke
- Department of Chemistry, University of Minnesota, 207 Pleasant
St SE, Minneapolis, Minnesota 55455-0431, United States
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9
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Dinachali SS, Dumond J, Saifullah MSM, Ansah-Antwi KK, Ganesan R, Thian ES, He C. Large area, facile oxide nanofabrication via step-and-flash imprint lithography of metal-organic hybrid resins. ACS APPLIED MATERIALS & INTERFACES 2013; 5:13113-13123. [PMID: 24281700 DOI: 10.1021/am404136p] [Citation(s) in RCA: 7] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/02/2023]
Abstract
Step-and-flash imprint lithography (S-FIL) is a wafer-scale, high-resolution nanoimprint technique capable of expansion of nanoscale patterns via serial patterning of imprint fields. While S-FIL patterning of organic resins is well known, patterning of metal-organic resins followed by calcination to form structured oxide films remains relatively unexplored. However, with calcination shrinkage, there is tremendous potential utility in easing accessibility of arbitrary nanostructures at 20 nm resolution and below. However, barriers to commercial adoption exist due to difficulties in formulating polymerizable oxide precursors with good dispensability, long shelf life, and resistance to auto-homopolymerization. Here we propose a solution to these issues in the form of a versatile resin formulation scheme that is applicable to a host of functional oxides (Al2O3, HfO2, TiO2, ZrO2, Ta2O5, and Nb2O5). This scheme utilizes a reaction of metal alkoxides with 2-(methacryloyloxy)ethyl acetoacetate (MAEAA), a polymerizable chelating agent. Formation of these inorganic coordination complexes enables remarkable resistance to auto-homopolymerization, greatly improving dispensability and shelf life, thus enabling full scale-up of this facile nanofabrication approach. Results include successively imprinted fields consisting of 100 nm linewidth gratings. Isothermal calcination of these structures resulted in corresponding shrinkage of 75-80% without loss of mechanical integrity or aspect ratio, resulting in 20 nm linewidth oxide nanostructures.
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Affiliation(s)
- Saman Safari Dinachali
- Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology and Research), 3 Research Link, Singapore 117602, Republic of Singapore
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10
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Lou Q, Shipp DA. Imprint lithography with degradable elastomeric polyanhydrides. ACS APPLIED MATERIALS & INTERFACES 2012; 4:4457-4460. [PMID: 22905986 DOI: 10.1021/am301312n] [Citation(s) in RCA: 6] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/01/2023]
Abstract
A photocurable, degradable polyanhydride cross-linked elastomer that can be used as a stamp in imprint lithography applications has been developed. The degradable stamp materials are based on polyanhydrides synthesized using thiol-ene polymerization. In this study, curing the monomers 4-pentenoic anhydride and pentaerythritol tetrakis(3-mercaptopropionate) on a master mold yields low modulus, elastomeric, degradable polyanhydride polymer stamps that are a negative of the master. These stamps can be then used as a sacrificial template during the fabrication of a replica of the master, and can be readily degraded away from the replica using water. The resultant imprinted materials exhibited excellent uniformity over a large area. Compared with other conventional imprint lithography stamp materials, the thiol-ene polymerized polyanhydrides are degradable, master mold safe, show great release properties, have fast cure rates, are relatively low cost, and can be fabricated onto variety of substrates and materials.
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Affiliation(s)
- Qin Lou
- Department of Chemistry and Biomolecular Science and Center for Advanced Materials Processing, Clarkson University, Potsdam, New York 13699-5810, USA
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11
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Chauhan NP. Facile synthesis of environmental friendly halogen-free microporous terpolymer from renewable source with enhanced physical properties. Des Monomers Polym 2012. [DOI: 10.1080/15685551.2012.705501] [Citation(s) in RCA: 7] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/28/2022] Open
Affiliation(s)
- Narendra P.S. Chauhan
- a Department of Polymer Science , University College of Science, Mohan Lal Sukhadia University , Udaipur , 313 001 , Rajasthan , India
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12
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Zhang J, Hu X, Zhang J, Cui Y, Yuan C, Ge H, Chen Y, Wu W, Xia Q. A fast thermal-curing nanoimprint resist based on cationic polymerizable epoxysiloxane. NANOSCALE RESEARCH LETTERS 2012; 7:380. [PMID: 22775987 PMCID: PMC3496635 DOI: 10.1186/1556-276x-7-380] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/09/2012] [Accepted: 06/25/2012] [Indexed: 05/29/2023]
Abstract
We synthesized a series of epoxysiloxane oligomers with controllable viscosity and polarity and developed upon them a thermal-curable nanoimprint resist that was cross-linked in air at 110°C within 30 s if preexposed to UV light. The oligomers were designed and synthesized via hydrosilylation of 4-vinyl-cyclohexane-1,2-epoxide with poly(methylhydrosiloxane) with tunable viscosity, polarity, and cross-linking density. The resist exhibits excellent chemical and physical properties such as insensitivity toward oxygen, strong mechanical strength, and high etching resistance. Using this resist, nanoscale patterns of different geometries with feature sizes as small as 30 nm were fabricated via a nanoimprint process based on UV-assisted thermal curing. The curing time for the resist was on the order of 10 s at a moderate temperature with the help of UV light preexposure. This fast thermal curing speed was attributed to the large number of active cations generated upon UV exposure that facilitated the thermal polymerization process.
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Affiliation(s)
- Jizong Zhang
- Department of Materials Science and Engineering, College of Engineering and Applied Sciences, National Laboratory of Solid State Microstructures, Nanjing University, Nanjing, 210093, People's Republic of China
| | - Xin Hu
- Department of Materials Science and Engineering, College of Engineering and Applied Sciences, National Laboratory of Solid State Microstructures, Nanjing University, Nanjing, 210093, People's Republic of China
| | - Jian Zhang
- Department of Materials Science and Engineering, College of Engineering and Applied Sciences, National Laboratory of Solid State Microstructures, Nanjing University, Nanjing, 210093, People's Republic of China
| | - Yushang Cui
- Department of Materials Science and Engineering, College of Engineering and Applied Sciences, National Laboratory of Solid State Microstructures, Nanjing University, Nanjing, 210093, People's Republic of China
| | - Changsheng Yuan
- Department of Materials Science and Engineering, College of Engineering and Applied Sciences, National Laboratory of Solid State Microstructures, Nanjing University, Nanjing, 210093, People's Republic of China
| | - Haixiong Ge
- Department of Materials Science and Engineering, College of Engineering and Applied Sciences, National Laboratory of Solid State Microstructures, Nanjing University, Nanjing, 210093, People's Republic of China
| | - Yanfeng Chen
- Department of Materials Science and Engineering, College of Engineering and Applied Sciences, National Laboratory of Solid State Microstructures, Nanjing University, Nanjing, 210093, People's Republic of China
| | - Wei Wu
- Hewlett-Packard Laboratories, 1501 Page Mill Road, Palo Alto, CA, 94304, USA
| | - Qiangfei Xia
- Department of Electrical and Computer Engineering, University of Massachusetts, Amherst, MA, 01003, USA
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Ganesan R, Dumond J, Saifullah MSM, Lim SH, Hussain H, Low HY. Direct patterning of TiO₂ using step-and-flash imprint lithography. ACS NANO 2012; 6:1494-1502. [PMID: 22229254 DOI: 10.1021/nn204405k] [Citation(s) in RCA: 14] [Impact Index Per Article: 1.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/31/2023]
Abstract
Although step-and-flash imprint lithography, or S-FIL, has brought about tremendous advancement in wafer-scale fabrication of sub-100 nm features of photopolymerizable organic and organo-silicon-based resists, it has not been successful in direct patterning of inorganic materials such as oxides because of the difficulties associated with resist formulation and its dispensing. In this paper, we demonstrate the proof-of-concept S-FIL of titanium dioxide (TiO(2)) carried by an acrylate-based formulation containing an allyl-functionalized titanium complex. The prepolymer formulation contains 48 wt % metal precursor, but it exhibits low enough viscosity (∼5 mPa·s) to be dispensed by an automatic dispensing system, adheres and spreads well on the substrate, is insensitive to pattern density variations, and rapidly polymerizes when exposed to broadband UV radiation to give a yield close to 95%. Five fields, each measuring 1 cm × 1 cm, consisting of 100 nm gratings were successively imprinted. Heat-treatment of the patterned structures at 450 °C resulted in the loss of organics and their subsequent shrinkage without the loss of integrity or aspect ratio and converted them to TiO(2) anatase nanostructures as small as 30 nm wide. With this approach, wafer-scale direct patterning of functional oxides on a sub-100 nm scale using S-FIL can become a distinct possibility.
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Affiliation(s)
- Ramakrishnan Ganesan
- Institute of Materials Research and Engineering, A STAR (Agency for Science, Technology and Research), 3 Research Link, Singapore 117602, Republic of Singapore.
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Lee BK, Park KS, Kim DP, Ryu JH, Park J, Jeong YS, Baek KH, Do LM. Siliconized silsesquioxane-based nonstick molds for ultrahigh-resolution lithography. ACTA ACUST UNITED AC 2012. [DOI: 10.1039/c2jm32386a] [Citation(s) in RCA: 8] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022]
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Lee BK, Kawai T, Chung BH. Direct Nanopatterning of Silsesquioxane/Poly(ethylene glycol) Blends with High Stability and Nonfouling Properties. Macromol Biosci 2010; 11:600-6. [PMID: 21188687 DOI: 10.1002/mabi.201000362] [Citation(s) in RCA: 8] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [MESH Headings] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 09/06/2010] [Revised: 09/20/2010] [Indexed: 11/10/2022]
Affiliation(s)
- Bong Kuk Lee
- BioNanotechnology Research Center, Korea Research Institute of Bioscience & Biotechnology, Yuseong-gu, Daejeon, Korea
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Lee BK, Cha NG, Hong LY, Kim DP, Tanaka H, Lee HY, Kawai T. Photocurable silsesquioxane-based formulations as versatile resins for nanoimprint lithography. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2010; 26:14915-14922. [PMID: 20731343 DOI: 10.1021/la1025119] [Citation(s) in RCA: 13] [Impact Index Per Article: 0.9] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/29/2023]
Abstract
Methacrylate octafunctionalized silsesquioxane (SSQMA) was shown to be an ideal material with high performance for ultraviolet (UV)-based nanoimprint lithography (NIL). The total viscosity of SSQMA-based formulations was adjusted to between 0.8 and 50 cP by incorporating low-viscosity acrylic additives, making the formulations suitable for UV-based NIL. The cured SSQMA-based formulations showed numerous desirable characteristics, including low volumetric shrinkage (4%), high Young's modulus (2.445-4.272 GPa), high resistance to oxygen plasma, high transparency to UV light, and high resistance to organic/aqueous media, as a functional imprint material for UV-based NIL and step-and-flash imprint lithography (SFIL). Using both techniques, the SSQMA-based formulations were easily transferred to relief structures with excellent imprint fidelity and minimal residual thickness. Formulations containing 50% SSQMA (wt %) were able to reproduce high-aspect-ratio nanostructures with aspect ratios as high as 4.5 using bilayer SFIL. Transparent rigiflex molds and hard replica molds with sub-50-nm size features were reproducibly duplicated by using UV-NIL with the SSQMA-based resin. Nanostructures with feature sizes down to 50 nm were successfully reproduced using these molds in both UV- and thermal-NIL processes. After repeating 20 imprinting cycles at relatively high temperature and pressure, no detectable collapse or contamination on the replica surface was observed. These properties of the SSQMA-based resins make them suitable as inexpensive and convenient components in all NIL processes that are based on physical contact.
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Affiliation(s)
- Bong Kuk Lee
- The Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
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Matsukawa D, Okamura H, Shirai M. Novel reworkable resins: thermo- and photo-curable di(meth)acrylates. POLYM INT 2009. [DOI: 10.1002/pi.2719] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/10/2022]
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Simon YC, Moran IW, Carter KR, Coughlin EB. Silylcarborane acrylate nanoimprint lithography resists. ACS APPLIED MATERIALS & INTERFACES 2009; 1:1887-1892. [PMID: 20355810 DOI: 10.1021/am9002292] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/29/2023]
Abstract
The synthesis of a novel silylcarborane acrylate monomer is reported as well as its application as an etch-resistant component for the formulation of imprint layers for UV nanoimprint lithography (NIL). By introduction of 10% by weight of the silylcarborane acrylate monomer into NIL resist formulations, the oxygen plasma etch rate of the resulting film was reduced by nearly a factor of 2. When used in NIL, the patterned resist layer had excellent oxygen plasma etch resistance, leading to effective image transfer to the underlying poly(hydroxyethyl methacrylate) lift-off layer. The latter allowed for the fabrication of metallic interdigitated electrode patterns via a NIL/lift-off process. This work demonstrates the robustness of silylcarborane-containing resists and paves the way for the investigation of new, high-resolution patterning methods.
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Affiliation(s)
- Yoan C Simon
- Department of Polymer Science and Engineering, University of Massachusetts, Amherst, Massachusetts 01003, USA
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