Making nanoflowerbeds: reaction pathways involved in the selective chemical bath deposition of ZnS on functionalized alkanethiolate self-assembled monolayers

Chemical Bath Deposition of Copper Sulfide on Functionalized SAMs: An Unusual Selectivity Mechanism

We have investigated the chemical bath deposition (CBD) of CuS using thioacetamide on functionalized self-assembled monolayers (SAMs) using scanning electron and optical microscopies, X-ray photoelectron spectroscopy, and time-of-flight secondary ion mass spectrometry. For all SAMs studied, the amount of CuS deposited is strongly dependent on the bath pH and can be attributed to the interaction of the SAM terminal groups with the chalcogenide ions present in solution. For -CH₃-terminated SAMs, there is a steady increase in the amount of CuS deposited with an increase in the bath pH because there is an increase in the concentration of chalcogenide ion. However, for -OH- and -COOH-terminated SAMs, we observe that the maximum amount of CuS is deposited at pH 10. We attribute this behavior to a competition between the repulsion of the chalcogenide ions by the negatively charged SAM terminal groups and an increase in the chalcogenide ion concentration with an increase in the bath pH. Using the interaction of the chalcogenide ions with the different SAM terminal functional groups, we demonstrate that CuS can be selectively deposited on the -CH₃-terminated areas of patterned -OH/-CH₃- and -COOH/-CH₃-terminated SAMs.

One-pot synthesis of multidimensional conducting polymer nanotubes for superior performance field-effect transistor-type carcinoembryonic antigen biosensors

Aptamer FET sensors based on carboxylated polypyrrole multidimensional nanotubes show ultrahigh sensitivity and selectivity toward CEA, and superior lifetimes.

Chemical bath deposition of ZnO on functionalized self-assembled monolayers: selective deposition and control of deposit morphology

We have developed a method by which to selectively and reproducibly deposit ZnO films on functionalized self-assembled monolayers (SAMs) using chemical bath deposition (CBD). The deposition bath is composed of zinc acetate and ethylenediamine. The deposition reaction pathways are shown to be similar to those observed for sulfides and selenides, even though ethylenediamine acts as both an oxygen source and a complexing agent. On -COOH terminated SAMs, Zn-carboxylate surface complexes act as nucleation sites for ion-by-ion growth, leading to the formation of adherent ZnO nanocrystallites. Cluster-by-cluster growth is also observed, which produces weakly adherent micrometer-sized ZnO crystallites. On -CH3 and -OH terminated SAMs, only micrometer-sized ZnO crystallites are observed because Zn(2+) does not complex with the SAM terminal group, preventing nucleation of the nanocrystalline phase. The application of either ultrasound ("sonication-assisted CBD") or stirring promotes ion-by-ion ZnO growth on -COOH terminated SAMs. Stirring produces smoother but less reproducible ZnO films than sonication-assisted CBD.

Morphological control of PbS grown on functionalized self-assembled monolayers by chemical bath deposition

We have investigated the chemical bath deposition (CBD) of PbS on functionalized alkanethiolate self-assembled monolayers (SAMs) using time-of-flight secondary ion mass spectrometry (SIMS), X-ray photoelectron spectroscopy (XPS), and scanning electron microscopy. The deposition mechanism involves both cluster-by-cluster and ion-by-ion growth. The dominant reaction pathway and the chemical composition and morphology of the deposited layer are dependent on both the SAM terminal group and the experimental conditions. On -COOH-terminated SAMs, three types of crystallites are observed: nanocrystals formed by heterogeneous ion-by-ion growth, larger needle-like particles, and ~2 μm particles deposited by homogeneous cluster-by-cluster deposition. The nanocrystals nucleate at Pb(2+)-carboxylate surface complexes, and so strongly adhere to the substrate. On -OH- and -CH3-terminated SAMs, only the micrometer-sized particles are formed by a cluster-by-cluster deposition mechanism. These particles do not adhere strongly to the SAM surface and can be easily removed. SIMS and XPS analyses indicate that the larger needle-like crystals and micrometer-sized particles are composed of oxidized lead sulfide and lead oxides, while the nanocrystals are composed of ≥85% PbS. Using sonication-assisted CBD, we demonstrate that PbS is deposited by ion-by-ion growth alone on -COOH-terminated SAMs. The deposited film is more compact with a smaller grain size and is >90% PbS.

Fabrication and photoelectrochemical characteristics of the patterned CdS microarrays on indium tin oxide substrates

In an effort to investigate the extraordinary photoelectrochemical characteristics of nanostructured CdS thin films in promising photovoltaic device applications, the patterned CdS microarrays with different feature sizes (50, 130, and 250 μm in diameter) were successfully fabricated on indium tin oxide (ITO) glass substrates using the chemical bath deposition method. The ultraviolet lithography process was employed for fabricating patterned octadecyltrichlorosilane (OTS) self-assembled monolayers (SAMs) as the functional organic thin layer template. The results show that the regular and compact patterned CdS microarrays had been deposited onto ITO glass surfaces, with clear edges demarcating the boundaries between the patterned CdS region and substrate under an optimal depositing condition. The microarrays consisted of pure nanocrystalline CdS with average crystallite size of about 10.7 nm. The photocurrent response and the optical adsorption of the patterned CdS microarray thin films increased with the decrease of the feature size, which was due to the increased CdS surface area, as well as the increased optical path length within the patterned CdS thin films, resulting from multiple reflection of incident light. The resistivity values increase with the increase of feature size, due to the increase of the relative amount of gaps between CdS microarrays with increasing the feature size of patterned CdS microarrays.

Building robust and reliable molecular constructs: patterning, metallic contacts, and layer-by-layer assembly

We describe recent progress in our laboratories to build stable complex two- and three-dimensional molecular constructs. We have introduced a simple and robust method for constructing complex molecular devices using top-down and bottom-up techniques based on self-assembled monolayers (SAMs), lithography, and site-selective reactions. It has significant advantages over other methods; it is easily scaled up, affords precise nanoscale placement, and is extensible to many different materials. Several recent developments are discussed including the UV photopatterning and electron beam lithography of SAMs adsorbed on semiconductors, the site-selective deposition of metals using electroless deposition and low-temperature chemical vapor deposition, and layer-by-layer assembly using covalent coupling. Optimization and further development of these techniques requires a detailed understanding of the reaction pathways involved in the lithography of SAMs and of the interaction of SAMs with metals, organometallic compounds, ions, and other compounds.

Comparison of chemical lithography using alkanethiolate self-assembled monolayers on GaAs (001) and Au

We have investigated the efficiency of bifunctional pattern formation in alkanethiolate self-assembled monolayers (SAMs) adsorbed on GaAs (001) and Au, using time-of-flight secondary ion mass spectrometry. Two patterning techniques were employed: electron beam lithography and UV photopatterning. Previous work has always assumed that complete degradation of the SAM was necessary for the formation of well-defined multifunctional patterned surfaces, requiring large electron doses or long UV irradiation times. We demonstrate that well-defined multifunctional patterned surfaces can be produced on GaAs (001) with only partial degradation of the SAM, allowing greatly reduced electron beam doses and UV irradiation times to be used. Using electron beam lithography we observe that sharp well-defined patterns can form after an electron dose as low as 450 microC cm(-2). We also demonstrate that only 50% of the monolayer must be photooxidized in UV photopatterning, reducing the exposure time needed by a factor of 3. In contrast, patterning of alkanethiolate SAMs adsorbed on Au requires much higher electron doses (> or = 1250 microC cm(-2)) and photooxidation times (2 h). The substantial differences observed on these two substrates appear to arise from differences in the SAM structure on GaAs and Au. These results suggest that alkanethiolate SAM resists may be a suitable technology for nanometer scale lithography of GaAs and possibly other semiconductors.