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Sui X, He Z, Chu D, Cao L. Non-convex optimization for inverse problem solving in computer-generated holography. LIGHT, SCIENCE & APPLICATIONS 2024; 13:158. [PMID: 38982035 PMCID: PMC11233576 DOI: 10.1038/s41377-024-01446-w] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/04/2024] [Revised: 03/27/2024] [Accepted: 04/07/2024] [Indexed: 07/11/2024]
Abstract
Computer-generated holography is a promising technique that modulates user-defined wavefronts with digital holograms. Computing appropriate holograms with faithful reconstructions is not only a problem closely related to the fundamental basis of holography but also a long-standing challenge for researchers in general fields of optics. Finding the exact solution of a desired hologram to reconstruct an accurate target object constitutes an ill-posed inverse problem. The general practice of single-diffraction computation for synthesizing holograms can only provide an approximate answer, which is subject to limitations in numerical implementation. Various non-convex optimization algorithms are thus designed to seek an optimal solution by introducing different constraints, frameworks, and initializations. Herein, we overview the optimization algorithms applied to computer-generated holography, incorporating principles of hologram synthesis based on alternative projections and gradient descent methods. This is aimed to provide an underlying basis for optimized hologram generation, as well as insights into the cutting-edge developments of this rapidly evolving field for potential applications in virtual reality, augmented reality, head-up display, data encryption, laser fabrication, and metasurface design.
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Affiliation(s)
- Xiaomeng Sui
- Department of Precision Instruments, Tsinghua University, Beijing, 100084, China
- Department of Engineering, Centre for Photonic Devices and Sensors, University of Cambridge, 9 JJ Thomson Avenue, Cambridge, CB3 0FA, UK
| | - Zehao He
- Department of Precision Instruments, Tsinghua University, Beijing, 100084, China
| | - Daping Chu
- Department of Engineering, Centre for Photonic Devices and Sensors, University of Cambridge, 9 JJ Thomson Avenue, Cambridge, CB3 0FA, UK.
- Cambridge University Nanjing Centre of Technology and Innovation, 23 Rongyue Road, Jiangbei New Area, Nanjing, 210000, China.
| | - Liangcai Cao
- Department of Precision Instruments, Tsinghua University, Beijing, 100084, China.
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Gu Y, Xu Z, Lin J, Liu S, Xu X, Chen H, Fu B, Xi Y. Design, analysis, and testing of a new asymmetric vibration-assisted stage for roll-type polishing. THE REVIEW OF SCIENTIFIC INSTRUMENTS 2023; 94:125011. [PMID: 38133941 DOI: 10.1063/5.0157230] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/05/2023] [Accepted: 12/02/2023] [Indexed: 12/24/2023]
Abstract
Based on the technological characteristics of roll-type polishing, a new asymmetric vibration-assisted stage is proposed in this paper. This stage is characterized by asymmetric displacement and asymmetric stiffness. With the average particle spacing of roll-type polishing as the constraint, the comprehensive characteristics of structural stiffness, kinematic range, and natural frequency are realized. Thus, to reduce the surface roughness, the removal of simple-directional surface textures generated by roll-type polishing can be achieved. First, the asymmetric structure is designed, modeled, and optimized according to working performance design goals of roll-type polishing. Then, the finite element analysis and actual performance test of the stage are carried out to verify the accuracy of the established model and the effectiveness of the optimization design. The results indicate that the stage can meet the design index. Finally, the asymmetric vibration-assisted polishing experiment is carried out. The results show that the single-directional surface textures of the SiC surface are interrupted and the surface roughness is decreased.
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Affiliation(s)
- Yan Gu
- Jilin Provincial Key Laboratory of Micro-Nano and Ultra-Precision Manufacturing, School of Mechatronic Engineering, Changchun University of Technology, Yan'an Ave. 2055, Changchun, Jilin 130012, People's Republic of China
- Jilin Provincial Key Laboratory of International Science and Technology Cooperation for High Performance Manufacturing and Testing, School of Mechatronic Engineering, Changchun University of Technology, Yan'an Ave. 2055, Changchun, Jilin 130012, People's Republic of China
| | - Zisu Xu
- Jilin Provincial Key Laboratory of Micro-Nano and Ultra-Precision Manufacturing, School of Mechatronic Engineering, Changchun University of Technology, Yan'an Ave. 2055, Changchun, Jilin 130012, People's Republic of China
- Jilin Provincial Key Laboratory of International Science and Technology Cooperation for High Performance Manufacturing and Testing, School of Mechatronic Engineering, Changchun University of Technology, Yan'an Ave. 2055, Changchun, Jilin 130012, People's Republic of China
| | - Jieqiong Lin
- Jilin Provincial Key Laboratory of Micro-Nano and Ultra-Precision Manufacturing, School of Mechatronic Engineering, Changchun University of Technology, Yan'an Ave. 2055, Changchun, Jilin 130012, People's Republic of China
- Jilin Provincial Key Laboratory of International Science and Technology Cooperation for High Performance Manufacturing and Testing, School of Mechatronic Engineering, Changchun University of Technology, Yan'an Ave. 2055, Changchun, Jilin 130012, People's Republic of China
| | - Silin Liu
- Jilin Provincial Key Laboratory of Micro-Nano and Ultra-Precision Manufacturing, School of Mechatronic Engineering, Changchun University of Technology, Yan'an Ave. 2055, Changchun, Jilin 130012, People's Republic of China
- Jilin Provincial Key Laboratory of International Science and Technology Cooperation for High Performance Manufacturing and Testing, School of Mechatronic Engineering, Changchun University of Technology, Yan'an Ave. 2055, Changchun, Jilin 130012, People's Republic of China
| | - Xingwang Xu
- Jilin Provincial Key Laboratory of Micro-Nano and Ultra-Precision Manufacturing, School of Mechatronic Engineering, Changchun University of Technology, Yan'an Ave. 2055, Changchun, Jilin 130012, People's Republic of China
- Jilin Provincial Key Laboratory of International Science and Technology Cooperation for High Performance Manufacturing and Testing, School of Mechatronic Engineering, Changchun University of Technology, Yan'an Ave. 2055, Changchun, Jilin 130012, People's Republic of China
| | - Hongyu Chen
- Jilin Provincial Key Laboratory of Micro-Nano and Ultra-Precision Manufacturing, School of Mechatronic Engineering, Changchun University of Technology, Yan'an Ave. 2055, Changchun, Jilin 130012, People's Republic of China
- Jilin Provincial Key Laboratory of International Science and Technology Cooperation for High Performance Manufacturing and Testing, School of Mechatronic Engineering, Changchun University of Technology, Yan'an Ave. 2055, Changchun, Jilin 130012, People's Republic of China
| | - Bin Fu
- Jilin Provincial Key Laboratory of Micro-Nano and Ultra-Precision Manufacturing, School of Mechatronic Engineering, Changchun University of Technology, Yan'an Ave. 2055, Changchun, Jilin 130012, People's Republic of China
- Jilin Provincial Key Laboratory of International Science and Technology Cooperation for High Performance Manufacturing and Testing, School of Mechatronic Engineering, Changchun University of Technology, Yan'an Ave. 2055, Changchun, Jilin 130012, People's Republic of China
| | - Yuan Xi
- Jilin Provincial Key Laboratory of Micro-Nano and Ultra-Precision Manufacturing, School of Mechatronic Engineering, Changchun University of Technology, Yan'an Ave. 2055, Changchun, Jilin 130012, People's Republic of China
- Jilin Provincial Key Laboratory of International Science and Technology Cooperation for High Performance Manufacturing and Testing, School of Mechatronic Engineering, Changchun University of Technology, Yan'an Ave. 2055, Changchun, Jilin 130012, People's Republic of China
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Hou E, Liang Z, Shi X, Yang F, Dong Y, Wu Z, Dai R, Liu H, Li S. All-dielectric six-foci metalens for infrared polarization detection based on Stokes space. OPTICS EXPRESS 2023; 31:40018-40028. [PMID: 38041312 DOI: 10.1364/oe.504936] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/04/2023] [Accepted: 10/23/2023] [Indexed: 12/03/2023]
Abstract
The detection technology of infrared polarization has gained significant attention due to its ability to provide better identification and obtain more information about the target. In this paper, based on the expression of the full polarization state in Stokes space, we designed micro-nano metasurface functional arrays to calculate the polarization state of the incident light by reading the Stokes parameters (a set of parameters that describe the polarization state). Metalens with linear and circular polarization-dependent functions are designed based on the propagation and geometric phases of the dielectric Si meta-atoms in the infrared band, respectively. The device exhibits a high polarization extinction ratio. The influence of incident angle on polarization-dependent metalens is discussed, and the analysis of incident angle is of great significance for the practical application. An infrared six-foci metalens is proposed, each corresponding to the Poincaré sphere's coordinate component (a graphical polarization state method). By matching the six polarization components of the incident light and the Stokes parameters, the polarization detection function can be realized by calculating the polarization state of the incident light. There is a slight error between the theoretical value and the calculated value of the unit coordinate component of the Stokes parameters. At the same time, the intensity distribution of different incident light polarization azimuth angles and ellipticity angles on the focal plane agrees with the theory. The advantage of the device is that the polarization state of the incident light can be directly calculated without passing through other components. The six-foci metalens have potential applications in polarization detection and imaging, space remote sensing, etc.
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Song J, Liu B, Shan X, Wang F, Zhong X. Multi-functional dual-path self-aligned polarization interference lithography. OPTICS EXPRESS 2023; 31:17629-17644. [PMID: 37381492 DOI: 10.1364/oe.489049] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/06/2023] [Accepted: 03/31/2023] [Indexed: 06/30/2023]
Abstract
Manufacturing sharp features is one of the most desired requirements for lithography. Here, we demonstrate a dual-path self-aligned polarization interference lithography (Dp-SAP IL) for fabricating periodic nanostructures, featuring high-steepness and high-uniformization. Meanwhile, it can manufacture quasicrystals with adjustable rotation symmetry. We reveal the change of the non-orthogonality degree under different polarization states and incident angles. We find that incident light's transverse electric (TE) wave results in high interference contrast at arbitrary incident angles, with a minimum contrast of 0.9328, that is, realizing the self-alignment of the polarization state of incident light and reflected light. We experimentally demonstrate this approach by fabricating a series of diffraction gratings with periods ranging from 238.3 nm to 851.6 nm. The steepness of each grating is greater than 85 degrees. Different from the traditional interference lithography system, Dp-SAP IL realizes a structure color using two mutually perpendicular and non-interference paths. One path is for the photolithography of patterns onto the sample, and the other path is for generating nanostructures on the patterns. Our technique showcases the feasibility of obtaining high contrast interference fringes by simply tuning the polarization, with the potential for cost-effective manufacturing of nanostructures such as quasicrystals and structure color.
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Fan R, Wang B, Li Y, Lai L. Process improvement of high aspect ratio nano-gratings based on synchrotron x-ray. NANOTECHNOLOGY 2022; 33:305303. [PMID: 35413692 DOI: 10.1088/1361-6528/ac667c] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/21/2021] [Accepted: 04/12/2022] [Indexed: 06/14/2023]
Abstract
To achieve better structural accuracy and aspect ratio, nano-gratings with a vertical angle close to 90° and a depth-to-width ratio of about 8 were prepared by synchrotron radiation. The optimal exposure dose and development time were determined to be 0.006 (A·h) and 6 min, respectively, by observing the surface loss and roughness of the gratings with slit widths of 150 nm and 250 nm under different conditions. To obtain the desired rectangular grating structure, the experimental conditions were optimized with the help of controlled variables experimental method. With the mask-to-photoresist pitch and the development and drying temperatures of 20μm and 23 °C, the optimized depth-to-width ratio of the nano-gratings with a slit width of 250 nm can reach 8.28. The cone angle can reach 88.4°. The aspect ratio of the nano-gratings with a slit width of 150 nm is 7.18, and its cone angle is 87.1°.
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Affiliation(s)
- Ruoxin Fan
- School of Science, Shanghai Institute of Technology, Shanghai 201418, People's Republic of China
| | - Baozhi Wang
- School of Electrical and Electronic Engineering, Shanghai Institute of Technology, Shanghai 201418, People's Republic of China
| | - Yigui Li
- School of Science, Shanghai Institute of Technology, Shanghai 201418, People's Republic of China
| | - Liyan Lai
- School of Science, Shanghai Institute of Technology, Shanghai 201418, People's Republic of China
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Wang G, Xue G, Zhai Q, Zhu J, Yu K, Huang G, Wang M, Zhong A, Zhu L, Yan S, Li X. Planar diffractive grating for magneto-optical trap application: fabrication and testing. APPLIED OPTICS 2021; 60:9358-9364. [PMID: 34807072 DOI: 10.1364/ao.429932] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/26/2021] [Accepted: 09/27/2021] [Indexed: 06/13/2023]
Abstract
The design, fabrication, and demonstration of a planar two-dimensional-crossed reflective diffractive grating are proposed to construct a novel optical configuration, to the best of our knowledge, potentially applied for atom cooling and trapping in a magneto-optical trap. Based on the proposed single-beam single-exposure scheme by means of an orthogonal two-axis Lloyd's mirrors interferometer, we rapidly patterned a ∼1µm period grating capable of providing a uniform intensity of the diffracted beams. The key structural parameters of the grating including the array square hole's width and depth were determined, aiming at providing a high energy of the diffracted beams to perform the atom cooling and trapping. To guarantee the diffracted beams to be overlapped possibly, we adopted a polarized beam splitter to guide the optical path of the incident and zero-order diffracted beams. Therefore, one zero-order diffracted beam with a retroreflected mode and four first-order diffracted beams with appropriate optical path constructed a three-dimensional optical configuration of three orthogonal pairs of counterpropagating beams. Finally, three pairs of the counterpropagating cooling laser beams with 9 mm diameter and >10% diffraction efficiencies were achieved, and the circular polarization chirality, purity, and compensation of the desired diffracted beams are further evaluated, which preliminarily validated a high applicability for the magneto-optical trap system.
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Yu K, Zhu J, Yuan W, Zhou Q, Xue G, Wu G, Wang X, Li X. Two-channel six degrees of freedom grating-encoder for precision-positioning of sub-components in synthetic-aperture optics. OPTICS EXPRESS 2021; 29:21113-21128. [PMID: 34265905 DOI: 10.1364/oe.427307] [Citation(s) in RCA: 6] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/08/2021] [Accepted: 06/11/2021] [Indexed: 05/27/2023]
Abstract
We investigate a novel two-channel grating encoder that can perform simultaneous measurements of six-degree-of-freedom (DOF) motions of two adjacent sub-components of synthetic-aperture optics such as pulse-compression gratings(PCGs) and telescope-primary mirrors. The grating encoder consists of a reading head and two separate gratings, which are attached to the back of the sub-components, respectively. The reading head is constructed such that there two identical optical probes can share the same optical components. The two probes are guided to hit each of the two gratings and can detect six-DOF motions simultaneously and independently. For each probe, the incident beam propagates through both a three-axes grating interferometry module and a three-axes diffraction integrated autocollimator-module, which detects translational and rotational movement, respectively. By combining the two modules it is possible to perform six-DOF measurement for a single point. The common-path configuration of the two probes enable identical responses to environmental variation, which ensures high accuracy.
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