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Li S, Wang X, Yang Y, Ni C, Hu J. Divergent Generation of the Difluoroalkyl Radical and Difluorocarbene via Selective Cleavage of C-S Bonds of the Sulfox-CF 2SO 2Ph Reagent. Org Lett 2024; 26:872-876. [PMID: 38236716 DOI: 10.1021/acs.orglett.3c04116] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 02/03/2024]
Abstract
A new difluoroalkylation reagent Sulfox-CF2SO2Ph bearing both sulfoximine and sulfone moieties was prepared from commercially available SulfoxFluor and PhSO2CF2H. On one hand, the Sulfox-CF2SO2Ph reagent could act as a (phenylsulfonyl)difluoromethyl radical source under photoredox catalysis, in which the arylsulfoximidoyl group is selectively removed. On the other hand, under basic conditions, Sulfox-CF2SO2Ph could serve as a difluorocarbene precursor for S- and O-difluoromethylations with S- and O-nucleophiles, respectively, in which the phenylsulfonyl group in Sulfox-CF2SO2Ph is selectively removed (followed by α-elimination of the arylsulfoximidoyl group).
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Affiliation(s)
- Shali Li
- Department of Chemistry, University of Science and Technology of China, 96 Jinzhai Road, Hefei, Anhui 230026, China
- Key Laboratory of Fluorine and Nitrogen Chemistry and Advanced Materials, Shanghai Institute of Organic Chemistry, University of Chinese Academy of Sciences, Chinese Academy of Sciences, 345 Ling-Ling Road, Shanghai 200032, China
| | - Xiu Wang
- Key Laboratory of Fluorine and Nitrogen Chemistry and Advanced Materials, Shanghai Institute of Organic Chemistry, University of Chinese Academy of Sciences, Chinese Academy of Sciences, 345 Ling-Ling Road, Shanghai 200032, China
| | - Yide Yang
- Key Laboratory of Fluorine and Nitrogen Chemistry and Advanced Materials, Shanghai Institute of Organic Chemistry, University of Chinese Academy of Sciences, Chinese Academy of Sciences, 345 Ling-Ling Road, Shanghai 200032, China
| | - Chuanfa Ni
- Key Laboratory of Fluorine and Nitrogen Chemistry and Advanced Materials, Shanghai Institute of Organic Chemistry, University of Chinese Academy of Sciences, Chinese Academy of Sciences, 345 Ling-Ling Road, Shanghai 200032, China
| | - Jinbo Hu
- Department of Chemistry, University of Science and Technology of China, 96 Jinzhai Road, Hefei, Anhui 230026, China
- Key Laboratory of Fluorine and Nitrogen Chemistry and Advanced Materials, Shanghai Institute of Organic Chemistry, University of Chinese Academy of Sciences, Chinese Academy of Sciences, 345 Ling-Ling Road, Shanghai 200032, China
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Larson JT, Latturner SE. Flux Growth of an Intermetallic with Interstitial Fluorides via Decomposition of a Fluorocarbon. Inorg Chem 2023; 62:1508-1512. [PMID: 36634226 DOI: 10.1021/acs.inorgchem.2c03642] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/14/2023]
Abstract
La15(FeC6)4F2 was grown as large crystals by reacting iron in a La/Ni eutectic flux in the presence of decafluorobiphenyl (C12F10) which acts as both a carbon and fluoride source. This mild fluorinating technique enables the isolation of an intermetallic product containing fluoride interstitials, as opposed to forming ionic metal fluorides. The compound adopts a structure in the hexagonal crystal system with space group P6̅ which features FeC6 units composed of a central iron atom coordinated by three ethylenide units in a trigonal planar configuration. The structure is related to the previously reported La15(FeC6)4H, but with fluoride fully occupying the interstitial hydride positions, which induces partial occupancies and site splitting disorder in the adjacent layers of lanthanide ions. No supercell formation is observed.
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Affiliation(s)
- James T Larson
- Department of Chemistry and Biochemistry, Florida State University, Tallahassee, Florida 32306, United States
| | - Susan E Latturner
- Department of Chemistry and Biochemistry, Florida State University, Tallahassee, Florida 32306, United States
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