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Nurzal N, Hsu TY, Susanto I, Yu IS. Droplet epitaxy of InGaN quantum dots on Si (111) by plasma-assisted molecular beam epitaxy. DISCOVER NANO 2023; 18:60. [PMID: 37382746 PMCID: PMC10409935 DOI: 10.1186/s11671-023-03844-2] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/09/2023] [Accepted: 03/31/2023] [Indexed: 06/30/2023]
Abstract
The droplet epitaxy of indium gallium nitride quantum dots (InGaN QDs), the formation of In-Ga alloy droplets in ultra-high vacuum and then surface nitridation by plasma treatment, is firstly investigated by using plasma-assisted molecular beam epitaxy. During the droplet epitaxy process, in-situ reflection high energy electron diffraction patterns performs the amorphous In-Ga alloy droplets transform to polycrystalline InGaN QDs, which are also confirmed by the characterizations of transmission electron microscopy and X-ray photoelectron spectroscopy. The substrate temperature, In-Ga droplet deposition time, and duration of nitridation are set as parameters to study the growth mechanism of InGaN QDs on Si. Self-assembled InGaN QDs with a density of 1.33 × 1011 cm-2 and an average size of 13.3 ± 3 nm can be obtained at the growth temperature of 350 °C. The photoluminescence emissions of uncapped InGaN QDs in wavelength of the visible red (715 nm) and infrared region (795 and 857 nm) are observed. The formation of high-indium composition of InGaN QDs via droplet epitaxy technique could be applied in long wavelength optoelectronic devices.
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Affiliation(s)
- Nurzal Nurzal
- Department of Materials Science and Engineering, National Dong Hwa University, Hualien, 97401, Taiwan
- Department of Mechanical Engineering, Institut Teknologi Padang, Kp Olo Padang, 25143, Indonesia
| | - Ting-Yu Hsu
- Department of Materials Science and Engineering, National Dong Hwa University, Hualien, 97401, Taiwan
| | - Iwan Susanto
- Department of Materials Science and Engineering, National Dong Hwa University, Hualien, 97401, Taiwan
- Department of Mechanical Engineering, Politeknik Negri Jakarta, Depok, 16424, Indonesia
| | - Ing-Song Yu
- Department of Materials Science and Engineering, National Dong Hwa University, Hualien, 97401, Taiwan.
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2
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Miyazaki M, Sugawara Y, Li YJ. Direct measurement of surface photovoltage by AC bias Kelvin probe force microscopy. BEILSTEIN JOURNAL OF NANOTECHNOLOGY 2022; 13:712-720. [PMID: 35957676 PMCID: PMC9344549 DOI: 10.3762/bjnano.13.63] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 05/17/2022] [Accepted: 07/13/2022] [Indexed: 06/15/2023]
Abstract
Surface photovoltage (SPV) measurements are a crucial way of investigating optoelectronic and photocatalytic semiconductors. The local SPV is generally measured consecutively by Kelvin probe force microscopy (KPFM) in darkness and under illumination, in which thermal drift degrades spatial and energy resolutions. In this study, we propose the method of AC bias Kelvin probe force microscopy (AC-KPFM), which controls the AC bias to nullify the modulated signal. We succeeded in directly measuring the local SPV by AC-KPFM with higher resolution, thanks to the exclusion of the thermal drift. We found that AC-KPFM can achieve a SPV response faster by about one to eight orders of magnitude than classical KPFM. Moreover, AC-KPFM is applicable in both amplitude modulation and frequency modulation mode. Thus, it contributes to advancing SPV measurements in various environments, such as vacuum, air, and liquids. This method can be utilized for direct measurements of changes in surface potential induced by modulated external disturbances.
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Affiliation(s)
- Masato Miyazaki
- Department of Applied Physics, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
| | - Yasuhiro Sugawara
- Department of Applied Physics, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
| | - Yan Jun Li
- Department of Applied Physics, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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3
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Xie L, Chen Y, Zhao Y, Zhou G, Nötzel R. InN/InGaN Quantum Dot Abiotic One-Compartment Glucose Photofuel Cell: Power Supply and Sensing. ACS OMEGA 2022; 7:1437-1443. [PMID: 35036805 PMCID: PMC8756593 DOI: 10.1021/acsomega.1c06138] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 11/02/2021] [Accepted: 12/17/2021] [Indexed: 06/14/2023]
Abstract
InN/InGaN quantum dots (QDs) are introduced as an efficient photoanode for a novel abiotic one-compartment photofuel cell (PFC) with a Pt cathode and glucose as a biofuel. Due to the high catalytic activity and selectivity of the InN/InGaN QDs toward oxidation reactions, the PFC operates without a membrane under physiologically mild conditions at medium to low glucose concentrations with a noble-metal-free photoanode. A relatively high short-circuit photocurrent density of 0.56 mA/cm2 and a peak output power density of 0.22 mW/cm2 are achieved under 1 sun illumination for a 0.1 M glucose concentration with optimized InN/InGaN QDs of the right size. The super-linear dependence of the short-circuit photocurrent density and the output power density as a function of the logarithmic glucose concentration makes the PFC well suited for sensing, covering the 4-6 mM range of glucose concentration in blood under normal conditions with good selectivity. No degradation of the PFC operation over time is observed.
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Affiliation(s)
- Lingyun Xie
- Guangdong
Provincial Key Laboratory of Optical Information Materials and Technology,
South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, People’s Republic of China
| | - Yongjie Chen
- Guangdong
Provincial Key Laboratory of Optical Information Materials and Technology,
South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, People’s Republic of China
| | - Yingzhi Zhao
- Guangdong
Provincial Key Laboratory of Optical Information Materials and Technology,
South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, People’s Republic of China
| | - Guofu Zhou
- Guangdong
Provincial Key Laboratory of Optical Information Materials and Technology,
South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, People’s Republic of China
- National
Center for International Research on Green Optoelectronics, South China Normal University, Guangzhou 510006, People’s Republic of China
| | - Richard Nötzel
- Guangdong
Provincial Key Laboratory of Optical Information Materials and Technology,
South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, People’s Republic of China
- National
Center for International Research on Green Optoelectronics, South China Normal University, Guangzhou 510006, People’s Republic of China
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Xing Z, Zhang X, Yang W, Li H, Zhao Y, Wei T, Bian L, Chen G, Qin H, Lu S. Improved photocatalytic activity and stability of InGaN quantum dots/C 3N 4heterojunction photoelectrode for CO 2reduction and hydrogen production. NANOTECHNOLOGY 2021; 32:505705. [PMID: 34492642 DOI: 10.1088/1361-6528/ac2450] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/30/2021] [Accepted: 09/07/2021] [Indexed: 06/13/2023]
Abstract
Photocatalytic conversion of CO2to produce fuel is considered a promising approach to reduce CO2emissions and tackle energy crisis. GaN-based materials have been studied for CO2reduction because of their excellent optical properties and band structure. However, low photocatalytic activity and severe photocorrosion of GaN-based photoelectrode greatly limit their applications. In this work, photocatalytic activity was improved by adopting InGaN quantum dots (QDs) combined with C3N4nano-sheets as photoanode, and thus the efficiency of CO2reduction and the selectivity of hydrogen production were increased significantly. In addition, the photoelectron-chemical corrosion of photoelectrodes has been apparently controlled. InGaN QDs/C3N4has the highest CO and H2productions rates of 14.69μmol mol-1h-1and 140μmol mol-1h-1which were 2.2 times and 14.5 times than that of InGaN film photoelectrode, respectively. The enhancement of photocatalytic activity is attributed to C3N4modification and a large electric dipole forming on the surface of InGaN QDs, which facilitate the separation and transfer of photo-generated carriers and thus promote CO2reduction reaction. This work provides a promising strategy for the development of GaN-based photoanodes with superior stability and efficiency.
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Affiliation(s)
- Zhiwei Xing
- School of Nano-Tech and Nano-Bionics, University of Science and Technology of China, Hefei, Anhui 230026, People's Republic of China
- Key Lab of Nanodevices and Applications, Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences (CAS), Suzhou, Jiangsu 215123, People's Republic of China
| | - Xue Zhang
- School of Nano-Tech and Nano-Bionics, University of Science and Technology of China, Hefei, Anhui 230026, People's Republic of China
- Key Lab of Nanodevices and Applications, Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences (CAS), Suzhou, Jiangsu 215123, People's Republic of China
| | - Wenxian Yang
- Key Lab of Nanodevices and Applications, Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences (CAS), Suzhou, Jiangsu 215123, People's Republic of China
| | - Huan Li
- School of Materials Science and Engineering, Hebei University of Technology, Tianjin 300132, People's Republic of China
| | - Yukun Zhao
- Key Lab of Nanodevices and Applications, Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences (CAS), Suzhou, Jiangsu 215123, People's Republic of China
| | - Tieshi Wei
- School of Nano-Tech and Nano-Bionics, University of Science and Technology of China, Hefei, Anhui 230026, People's Republic of China
- Key Lab of Nanodevices and Applications, Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences (CAS), Suzhou, Jiangsu 215123, People's Republic of China
| | - Lifeng Bian
- Key Lab of Nanodevices and Applications, Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences (CAS), Suzhou, Jiangsu 215123, People's Republic of China
| | - Guifeng Chen
- School of Materials Science and Engineering, Hebei University of Technology, Tianjin 300132, People's Republic of China
| | - Hua Qin
- Key Lab of Nanodevices and Applications, Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences (CAS), Suzhou, Jiangsu 215123, People's Republic of China
| | - Shulong Lu
- Key Lab of Nanodevices and Applications, Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences (CAS), Suzhou, Jiangsu 215123, People's Republic of China
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Lei X, Liu Q, Li S, Zhang Z, Yang X. Effects of fluid shear stress on expression of focal adhesion kinase in MG-63 human osteoblast-like cells on different surface modification of titanium. Bioengineered 2021; 12:4962-4971. [PMID: 34374319 PMCID: PMC8806473 DOI: 10.1080/21655979.2021.1962686] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/22/2022] Open
Abstract
This study aimed to investigate the effect of fluid shear stress (FSS) on cell proliferation and expression of focal adhesion kinase (FAK) in MG-63 cells on different modified titanium surfaces. MG63 cells were cultured on three different surfaces: glass slide, polished treatment (PT) titanium surface and sandblasted/acid-etched surfaces (SLA) titanium surface. The surface topography and roughness were evaluated by scanning electron microscopy (SEM) and atomic force microscopy (AFM), respectively. The cells were subjected to FSS, and the cell appearance before and after the stress was evaluated. MTT assay was applied to estimate cell proliferation. The mRNA and protein levels of FAK were determined by qRT-PCR and western blotting. Titanium plates demonstrated different surface microtopography. Parameter Ra values of SLA group were around 3.4 µm, which was higher than PT group. Exposure to the FSS of 12 dynes/cm2 significantly induced positive upregulation of cellular proliferation and the expression of FAK, which were directly correlated with the duration of exposure and surface. Cells in SLA group were able to endurance the longtime of FSS, especially under the FSS of 16 dynes/cm2. SLA surface had a positive influence on the expression of FAK. Different surface modifications created different microtopography of titanium plates. Cell proliferation and the mRNA and protein expression of FAK were stimulated by FSS and regulated by a marked synergistic effect of surface topography and the level and duration of FSS.
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Affiliation(s)
- Xin Lei
- Department of Stomatology, Shenzhen Longhua District Central Hospital, Shenzhen, China
| | - Qiong Liu
- Stomatological Hospital, Southern Medical University, Guangzhou Guangdong, China
| | - Shiyi Li
- Stomatological Hospital, Southern Medical University, Guangzhou Guangdong, China
| | - Zhaoqiang Zhang
- Stomatological Hospital, Southern Medical University, Guangzhou Guangdong, China
| | - Xiaoyu Yang
- Stomatological Hospital, Southern Medical University, Guangzhou Guangdong, China
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Rao L, Wang P, Qian Y, Zhou G, Nötzel R. Comparison of the Extended Gate Field-Effect Transistor with Direct Potentiometric Sensing for Super-Nernstian InN/InGaN Quantum Dots. ACS OMEGA 2020; 5:32800-32805. [PMID: 33376918 PMCID: PMC7758944 DOI: 10.1021/acsomega.0c05364] [Citation(s) in RCA: 8] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/03/2020] [Accepted: 12/01/2020] [Indexed: 05/22/2023]
Abstract
We systematically study the sensitivity and noise of an InN/InGaN quantum dot (QD) extended gate field-effect transistor (EGFET) with super-Nernstian sensitivity and directly compare the performance with potentiometric sensing. The QD sensor exhibits a sensitivity of -80 mV/decade with excellent linearity over a wide concentration range, assessed for chloride anion detection in 10-4 to 0.1 M KCl aqueous solutions. The sensitivity and linearity are reproduced for the EGFET and direct open-circuit potential (OCP) readout. The EGFET noise in the saturated regime is smaller than the OCP noise, while the EGFET noise in the linear regime is largest. This highlights EGFET operation in the saturated regime for most precise measurements and the lowest limit of detection and the lowest limit of quantification, which is attributed to the low-impedance current measurement at a relatively high bias and the large OCP for the InN/InGaN QDs.
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Affiliation(s)
- Lujia Rao
- Guangdong
Provincial Key Laboratory of Optical Information Materials and Technology,
South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, People’s Republic of China
| | - Peng Wang
- Guangdong
Provincial Key Laboratory of Optical Information Materials and Technology,
South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, People’s Republic of China
| | - Yinping Qian
- Guangdong
Provincial Key Laboratory of Optical Information Materials and Technology,
South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, People’s Republic of China
| | - Guofu Zhou
- Guangdong
Provincial Key Laboratory of Optical Information Materials and Technology,
South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, People’s Republic of China
- National
Center for International Research on Green Optoelectronics, South China Normal University, Guangzhou 510006, People’s Republic of China
- Academy
of Shenzhen Guohua Optoelectronics, Shenzhen 518110, People’s
Republic of China
| | - Richard Nötzel
- Guangdong
Provincial Key Laboratory of Optical Information Materials and Technology,
South China Academy of Advanced Optoelectronics, South China Normal University, Guangzhou 510006, People’s Republic of China
- National
Center for International Research on Green Optoelectronics, South China Normal University, Guangzhou 510006, People’s Republic of China
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7
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Song C, Wang P, Qian Y, Zhou G, Nötzel R. Enhanced terahertz radiation from InAs (100) with an embedded InGaAs hole blocking layer. OPTICS EXPRESS 2020; 28:25750-25756. [PMID: 32906859 DOI: 10.1364/oe.400590] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/22/2020] [Accepted: 08/06/2020] [Indexed: 06/11/2023]
Abstract
We demonstrate enhanced THz radiation from p-InAs (100) by advanced heterostructure design. The THz radiation from InAs (100) under ultra-short pulsed laser excitation is due to the photo-Dember effect. Inserting a thin n-InGaAs layer close to the InAs surface effectively blocks the hole diffusion while the electron diffusion is still efficient due to tunneling. Therefore, enhanced photogenerated electron-hole separation and photo-Dember electric field is achieved to enhance the THz emission. The layer structure and doping profile are confirmed by secondary ion mass spectrometry and X-ray diffraction. The blocking of the hole diffusion is independently verified by the surface photovoltage measured by Kelvin probe force microscopy.
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