Divergence and efficiency optimization in polarization-controlled two-color high-harmonic generation

Highly versatile, two-color setup for high-order harmonic generation using spatial light modulators

We present a novel, interferometric, two-color, high-order harmonic generation setup based on a turn-key Ytterbium-doped femtosecond laser source and its second harmonic. Each interferometer arm contains a spatial light modulator with individual capabilities to manipulate the spatial beam profiles and to stabilize the relative delay between the fundamental and the second harmonic. In addition, separate control of the relative power and focusing geometries of the two color beams is implemented to conveniently perform automated scans of multiple parameters. A live diagnostics system gives continuous information during ongoing measurements.

Toward Complete All-Optical Intensity Modulation of High-Harmonic Generation from Solids

Optical modulation of high-harmonics generation in solids enables the detection of material properties, such as the band structure, and promising new applications, such as super-resolution imaging in semiconductors. Various recent studies have shown optical modulation of high-harmonics generation in solids, in particular, suppression of high-harmonics generation has been observed by synchronized or delayed multipulse sequences. Here we provide an overview of the underlying mechanisms attributed to this suppression and provide a perspective on the challenges and opportunities regarding these mechanisms. All-optical control of high-harmonic generation allows for femtosecond, and in the future possibly subfemtosecond, switching, which has numerous possible applications: These range from super-resolution microscopy to nanoscale controlled chemistry and highly tunable nonlinear light sources.

XUV Absorption Spectroscopy and Photoconversion of a Tin-Oxo Cage Photoresist

Extreme ultraviolet lithography has recently been introduced in high-volume production of integrated circuits for manufacturing the smallest features in high-end computer chips. Hybrid organic/inorganic materials are considered as the next generation of photoresists for this technology, but detailed knowledge about the response of such materials to the ionizing radiation used (13.5 nm, 92 eV) is still scarce. In the present work, we use broadband high-harmonic radiation in the energy range 22-70 eV for absorption spectroscopy and photobleaching (that is, the decrease of absorbance) of thin films of an n-butyltin oxo-cage, a representative of the class of metal-based EUV photoresist. The shape of the absorption spectrum in the range 22-92 eV matches well with the spectrum predicted using tabulated atomic cross sections. The photobleaching results are consistent with loss of the butyl side groups due to the breaking of Sn-C bonds following photoionization. Bleaching is strongest in the low-energy range (<40 eV), where the absorption is largely due to the carbon atoms in the organic groups. At higher energies (42-70 eV), absorption is dominated by the tin atoms, and since these remain in the film after photoconversion, the absorption change in this region is smaller. It is estimated that after prolonged irradiation (up to ∼3 J cm-2 in the range 22-40 eV) about 70% of the hydrocarbon groups are removed from the film. The rate of bleaching is high at the beginning of exposure, but it rapidly decreases with increasing conversion. We rationalize this using density functional theory calculations: the first Sn-C bonds are efficiently cleaved (quantum yield Φ ≈ 0.9), because the highest occupied molecular orbitals (HOMOs) (from which an electron is removed after photoionization) are located on Sn-C sigma bonds. In the photoproducts, the HOMO is localized on tin atoms that have lost their hydrocarbon group (formally reduced to the Sn(II) oxidation state), and holes formed on those tin atoms lead to less efficient cleavage reactions. Our results reveal the primary reaction steps following excitation with ionizing radiation of tin-oxo cages. Our methodology represents a systematic approach of studying and quantitatively assessing the performance of new photoresists and as such enables the development of future EUV photoresists.

Enhancing harmonic brightness near the cutoff region by using laser pulses with a small positive chirp

Efficient enhancement of harmonic brightness near the cutoff region is achieved by employing laser pulses with a small positive chirp in theory, where the laser intensity and frequency near the peak of the laser pulse are almost unchanged relative to the chirp-free field. The improvement of harmonic brightness is achieved under the condition that the ionization probability is almost unchanged. Through the analysis of the harmonics contributed by the rising and falling parts of the laser pulse, we have uncovered a "frequency compensation" mechanism that leads to an enhanced harmonic brightness near the cutoff region. Under appropriate chirp parameters, the harmonics contributed by the rising and falling parts can be constructively interfered in a smaller frequency range with greater intensity, thereby obtaining harmonics with good monochromaticity and high brightness. This study explains the mechanism of harmonic brightness enhancement from a new perspective, and provides a new idea for harmonic regulation without changing the ionization.

High-flux wavelength tunable XUV source in the 12-40.8 eV photon energy range with adjustable energy and time resolution for Tr-ARPES applications

High-order harmonic generation (HHG) has a broad spectrum covering vacuum ultraviolet to extreme ultraviolet (XUV) bands, which is useful for applications involving material analyses at different information depths. Such an HHG light source is perfect for time- and angle-resolved photoemission spectroscopy. Here, we demonstrate a high-photon flux HHG source driven by a two-color field. Applying a fused silica compression stage to reduce the driving pulse width, we obtained a high XUV photon flux of 2 × 10¹² phs/s @21.6 eV on target. We designed a classical diffraction mounted (CDM) grating monochromator that can achieve a wide range of photon energy from 12 to 40.8 eV, while the time resolution is improved by reducing the pulse front tilt after the harmonic selection. We designed a spatial filtering method to adjust the time resolution using the CDM monochromator and significantly reduced the pulse front tilt of the XUV pulses. We also demonstrate a detailed prediction of the energy resolution broadening which is caused by the space charge effect.

High-Intensity Harmonic Generation with Energy Tunability Produced by Robust Two-Color Linearly Polarized Laser Fields

By using the numerical solution of the time-dependent Schrödinger equation, we theoretically explored the high-order harmonic generation process under the interaction of high-intensity two-color ultrashort driving laser pulses with atoms. The symmetry of the electric field of the laser pulse will be broken. The producing electric field was controlled at the subcycle level by an IR laser and its second harmonic, which has the unique characteristic that two sequential half-cycles become distinct, rather than merely opposite in sign. Compared with the case of the atom in the fundamental laser pulse, the harmonic efficiency showed an increase of 1∼2 orders of magnitude at specific harmonic order with this combined pulse action. Through the theoretical analysis with the “three-step model”, it was demonstrated that the enhancement of the harmonic intensity is due to the fast ionization of electrons at the ionization moment and the short time from ionization to recombination of ionized electrons. In addition, effects of the peak field amplitude ratio, the full width at half maximum, the phase delay of the two-color pulses, the laser intensity and ionization probability on the harmonic efficiency enhancement were also investigated.

Extreme-Ultraviolet Excited Scintillation of Methylammonium Lead Bromide Perovskites

Inorganic-Organic lead halide materials have been recognized as potential high-energy X-ray detectors because of their high quantum efficiencies and radiation hardness. Surprisingly little is known about whether the same is true for extreme-ultraviolet (XUV) radiation, despite applications in nuclear fusion research and astrophysics. We used a table-top high-harmonic generation setup in the XUV range between 20 and 45 eV to photoexcite methylammonium lead bromide (MAPbBr₃) and measure its scintillation properties. The strong absorbance combined with multiple carriers being excited per photon yield a very high carrier density at the surface, triggering photobleaching reactions that rapidly reduce the emission intensity. Concurrent to and in spite of this photobleaching, a recovery of the emission intensity as a function of dose was observed. X-ray photoelectron spectroscopy and X-ray diffraction measurements of XUV-exposed and unexposed areas show that this recovery is caused by XUV-induced oxidation of MAPbBr₃, which removes trap states that normally quench emission, thus counteracting the rapid photobleaching caused by the extremely high carrier densities. Furthermore, it was found that preoxidizing the sample with ozone was able to prolong and improve this intensity recovery, highlighting the impact of surface passivation on the scintillation properties of perovskite materials in the XUV range.

Extreme-Ultraviolet Shaping and Imaging by High-Harmonic Generation from Nanostructured Silica

Coherent extreme-ultraviolet pulses from high-harmonic generation have ample applications in attosecond science, lensless imaging, and industrial metrology. However, tailoring complex spatial amplitude, phase, and polarization properties of extreme-ultraviolet pulses is made nontrivial by the lack of efficient optical elements. Here, we have overcome this limitation through nanoengineered solid samples, which enable direct control over amplitude and phase patterns of nonlinearly generated extreme-ultraviolet pulses. We demonstrate experimental configurations and emitting structures that yield spatially patterned beam profiles, increased conversion efficiencies, and tailored polarization states. Furthermore, we use the emitted patterns to reconstruct height profiles, probe the near-field confinement in nanostructures below the diffraction limit of the fundamental radiation, and to image complex structures through coherent diffractive emission from these structures. Our results pave the way for introducing sub-fundamental-wavelength resolution imaging, direct manipulation of beams through nanoengineered samples, and metrology of nanostructures into the extreme-ultraviolet spectral range.