Substitutional synthesis of sub-nanometer InGaN/GaN quantum wells with high indium content

At the Limit of Interfacial Sharpness in Nanowire Axial Heterostructures

As semiconductor devices approach dimensions at the atomic scale, controlling the compositional grading across heterointerfaces becomes paramount. Particularly in nanowire axial heterostructures, which are promising for a broad spectrum of nanotechnology applications, the achievement of sharp heterointerfaces has been challenging owing to peculiarities of the commonly used vapor-liquid-solid growth mode. Here, the grading of Al across GaAs/AlxGa1-xAs/GaAs heterostructures in self-catalyzed nanowires is studied, aiming at finding the limits of the interfacial sharpness for this technologically versatile material system. A pulsed growth mode ensures precise control of the growth mechanisms even at low temperatures, while a semiempirical thermodynamic model is derived to fit the experimental Al-content profiles and quantitatively describe the dependences of the interfacial sharpness on the growth temperature, the nanowire radius, and the Al content. Finally, symmetrical Al profiles with interfacial widths of 2-3 atomic planes, at the limit of the measurement accuracy, are obtained, outperforming even equivalent thin-film heterostructures. The proposed method enables the development of advanced heterostructure schemes for a more effective utilization of the nanowire platform; moreover, it is considered expandable to other material systems and nanostructure types.

Quantum Spin Hall Effect in Two-Monolayer-Thick InN/InGaN Coupled Multiple Quantum Wells

In this study, we present a theoretical study of the quantum spin Hall effect in InN/InGaN coupled multiple quantum wells with the individual well widths equal to two atomic monolayers. We consider triple and quadruple quantum wells in which the In content in the interwell barriers is greater than or equal to the In content in the external barriers. To calculate the electronic subbands in these nanostructures, we use the eight-band k∙p Hamiltonian, assuming that the effective spin-orbit interaction in InN is negative, which represents the worst-case scenario for achieving a two-dimensional topological insulator. For triple quantum wells, we find that when the In contents of the external and interwell barriers are the same and the widths of the internal barriers are equal to two monolayers, a topological insulator with a bulk energy gap of 0.25 meV can appear. Increasing the In content in the interwell barriers leads to a significant increase in the bulk energy gap of the topological insulator, reaching about 0.8 meV. In these structures, the topological insulator can be achieved when the In content in the external barriers is about 0.64, causing relatively low strain in quantum wells and making the epitaxial growth of these structures within the range of current technology. Using the effective 2D Hamiltonian, we study the edge states in strip structures containing topological triple quantum wells. We demonstrate that the opening of the gap in the spectrum of the edge states caused by decreasing the width of the strip has an oscillatory character regardless of whether the pseudospin-mixing elements of the effective Hamiltonian are omitted or taken into account. The strength of the finite size effect in these structures is several times smaller than that in HgTe/HgCdTe and InAs/GaSb/AlSb topological insulators. Therefore, its influence on the quantum spin Hall effect is negligible in strips with a width larger than 150 nm, unless the temperature at which electron transport is measured is less than 1 mK. In the case of quadruple quantum wells, we find the topological insulator phase only when the In content in the interwell barriers is larger than in the external barriers. We show that in these structures, a topological insulator with a bulk energy gap of 0.038 meV can be achieved when the In content in the external barriers is about 0.75. Since this value of the bulk energy gap is very small, quadruple quantum wells are less useful for realizing a measurable quantum spin Hall system, but they are still attractive for achieving a topological phase transition and a nonlocal topological semimetal phase.

Polarization-Induced Phase Transitions in Ultra-Thin InGaN-Based Double Quantum Wells

We investigate the phase transitions and the properties of the topological insulator in InGaN/GaN and InN/InGaN double quantum wells grown along the [0001] direction. We apply a realistic model based on the nonlinear theory of elasticity and piezoelectricity and the eight-band k·p method with relativistic and nonrelativistic linear-wave-vector terms. In this approach, the effective spin−orbit interaction in InN is negative, which represents the worst-case scenario for obtaining the topological insulator in InGaN-based structures. Despite this rigorous assumption, we demonstrate that the topological insulator can occur in InGaN/GaN and InN/InGaN double quantum wells when the widths of individual quantum wells are two and three monolayers (MLs), and three and three MLs. In these structures, when the interwell barrier is sufficiently thin, we can observe the topological phase transition from the normal insulator to the topological insulator via the Weyl semimetal, and the nontopological phase transition from the topological insulator to the nonlocal topological semimetal. We find that in InGaN/GaN double quantum wells, the bulk energy gap in the topological insulator phase is much smaller for the structures with both quantum well widths of 3 MLs than in the case when the quantum well widths are two and three MLs, whereas in InN/InGaN double quantum wells, the opposite is true. In InN/InGaN structures with both quantum wells being three MLs and a two ML interwell barrier, the bulk energy gap for the topological insulator can reach about 1.2 meV. We also show that the topological insulator phase rapidly deteriorates with increasing width of the interwell barrier due to a decrease in the bulk energy gap and reduction in the window of In content between the normal insulator and the nonlocal topological semimetal. For InN/InGaN double quantum wells with the width of the interwell barrier above five or six MLs, the topological insulator phase does not appear. In these structures, we find two novel phase transitions, namely the nontopological phase transition from the normal insulator to the nonlocal normal semimetal and the topological phase transition from the nonlocal normal semimetal to the nonlocal topological semimetal via the buried Weyl semimetal. These results can guide future investigations towards achieving a topological insulator in InGaN-based nanostructures.