Noble metal alloy thin films by atomic layer deposition and rapid Joule heating

Upcycling of Waste Plastic into Hybrid Carbon Nanomaterials

Graphitic 1D and hybrid nanomaterials represent a powerful solution in composite and electronic applications due to exceptional properties, but large-scale synthesis of hybrid materials has yet to be realized. Here, a rapid, scalable method to produce graphitic 1D materials from polymers using flash Joule heating (FJH) is reported. This avoids lengthy chemical vapor deposition and uses no solvent or water. The flash 1D materials (F1DM), synthesized using a variety of earth-abundant catalysts, have controllable diameters and morphologies by parameter tuning. Furthermore, the process can be modified to form hybrid materials, with F1DM bonded to turbostratic graphene. In nanocomposites, F1DM outperform commercially available carbon nanotubes. Compared to current 1D material synthetic strategies using life cycle assessment, FJH synthesis represents an 86-92% decrease in cumulative energy demand and 92-94% decrease in global-warming potential. This work suggests that FJH affords a cost-effective and sustainable route to upcycle waste plastic into valuable 1D and hybrid nanomaterials.

Thermionic Emission of Atomic Layer Deposited MoO3/Si UV Photodetectors

Ultrathin MoO₃ semiconductor nanostructures have garnered significant interest as a promising nanomaterial for transparent nano- and optoelectronics, owing to their exceptional reactivity. Due to the shortage of knowledge about the electronic and optoelectronic properties of MoO₃/n-Si via an ALD system of few nanometers, we utilized the preparation of an ultrathin MoO₃ film at temperatures of 100, 150, 200, and 250 °C. The effect of the depositing temperatures on using bis(tbutylimido)bis(dimethylamino)molybdenum (VI) as a molybdenum source for highly stable UV photodetectors were reported. The ON-OFF and the photodetector dynamic behaviors of these samples under different applied voltages of 0, 0.5, 1, 2, 3, 4, and 5 V were collected. This study shows that the ultrasmooth and homogenous films of less than a 0.30 nm roughness deposited at 200 °C were used efficiently for high-performance UV photodetector behaviors with a high sheet carrier concentration of 7.6 × 10¹⁰ cm^-2 and external quantum efficiency of 1.72 × 10¹¹. The electronic parameters were analyzed based on thermionic emission theory, where Cheung and Nord's methods were utilized to determine the photodetector electronic parameters, such as the ideality factor (n), barrier height (Φ₀), and series resistance (R_s). The n-factor values were higher in the low voltage region of the I-V diagram, potentially due to series resistance causing a voltage drop across the interfacial thin film and charge accumulation at the interface states between the MoO₃ and Si surfaces.

Conformal Noble Metal High-Entropy Alloy Nanofilms by Atomic Layer Deposition for an Enhanced Hydrogen Evolution Reaction

The current synthesis methods of high-entropy alloy (HEA) thin-film coatings face huge challenges in facile preparation, precise thickness control, conformal integration, and affordability. These challenges are more specific and noteworthy for noble metal-based HEA thin films where the conventional sputtering methods encounter thickness control and high-cost issues (high-purity noble metal targets required). Herein, for the first time, we report a facile and controllable synthesis process of quinary HEA coatings consisting of noble metals (Rh, Ru, Pt, Pd, and Ir), by sequential atomic layer deposition (ALD) coupled with electrical Joule heating for post-alloying. Furthermore, the resulting quinary HEA thin film with a thickness of ∼50 nm and an atomic ratio of 20:15:21:18:27 shows promising potential as a platform for catalysis, exhibiting enhanced electrocatalytic hydrogen evolution reaction (HER) performances with lower overpotentials (e.g., from 85 to 58 mV in 0.5 M H₂SO₄) and higher stability (by retaining more than 92% of the initial current after 20 h with a current density of 10 mA/cm² in 0.5 M H₂SO₄) than other noble metal-based structure counterparts in this work. The enhanced material properties and device performances are attributed to the efficient electron transfer of HEA with the increased number of active sites. This work not only presents RhRuPtPdIr HEA thin films as promising HER catalysts but also sheds light on controllable fabrication of conformal HEA-coated complex structures toward a broad range of applications.

A Mini Review on Thin Film Superconductors

Thin superconducting films have been a significant part of superconductivity research for more than six decades. They have had a significant impact on the existing consensus on the microscopic and macroscopic nature of the superconducting state. Thin-film superconductors have properties that are very different and superior to bulk material. Amongst the various classification criteria, thin-film superconductors can be classified into Fe based thin-film superconductors, layered titanium compound thin-film superconductors, intercalation compounds of layered and cage-like structures, and other thin-film superconductors that do not fall into these groups. There are various techniques of manufacturing thin films, which include atomic layer deposition (ALD), chemical vapour deposition (CVD), physical vapour deposition (PVD), molecular beam epitaxy (MBE), sputtering, electron beam evaporation, laser ablation, cathodic arc, and pulsed laser deposition (PLD). Thin film technology offers a lucrative scheme of creating engineered surfaces and opens a wide exploration of prospects to modify material properties for specific applications, such as those that depend on surfaces. This review paper reports on the different types and groups of superconductors, fabrication of thin-film superconductors by MBE, PLD, and ALD, their applications, and various challenges faced by superconductor technologies. Amongst all the thin film manufacturing techniques, more focus is put on the fabrication of thin film superconductors by atomic layer deposition because of the growing popularity the process has gained in the past decade.

Development of Core-Shell Rh@Pt and Rh@Ir Nanoparticle Thin Film Using Atomic Layer Deposition for HER Electrocatalysis Applications

The efficiency of hydrogen gas generation via electrochemical water splitting has been mostly limited by the availability of electrocatalyst materials that require lower overpotentials during the redox reaction. Noble metals have been used extensively as electrocatalysts due to their high activity and low overpotentials. However, the use of single noble metal electrocatalyst is limited due to atomic aggregation caused by its inherent high surface energy, which results in poor structural stability, and, hence, poor electrocatalytic performance and long-term stability. In addition, using noble metals as electrocatalysts also causes the cost to be unnecessarily high. These limitations in noble metal electrocatalysts could be enhanced by combining two noble metals in a core-shell structure (e.g., Rh@Ir) as a thin film over a base substrate. This could significantly enhance electrocatalytic activity due to the following: (1) the modification of the electronic structure, which increases electrical conductivity; (2) the optimization of the adsorption energy; and (3) the introduction of new active sites in the core-shell noble metal structure. The current state-of-the-art employs physical vapor deposition (PVD) or other deposition techniques to fabricate core-shell noble metals on flat 2D substrates. This method does not allow 3D substrates with high surface areas to be used. In the present work, atomic layer deposition (ALD) was used to fabricate nanoparticle thin films of Rh@Ir and Rh@Pt in a core-shell structure on glassy carbon electrodes. ALD enables the fabrication of nanoparticle thin film on three-dimensional substrates (a 2D functional film on a 3D substrate), resulting in a significantly increased surface area for a catalytic reaction to take place; hence, improving the performance of electrocatalysis. The Rh@Pt (with an overpotential of 139 mV and a Tafel slope of 84.8 mV/dec) and Rh@Ir (with an overpotential of 169 mV and a Tafel slope of 112 mV/dec) core-shell electrocatalyst exhibited a better electrocatalytic performances compared to the single metal Rh electrocatalyst (with an overpotential of 300 mV and a Tafel slope of 190 mV/dec). These represented a 54% and a 44% improvement in performance, respectively, illustrating the advantages of core-shell thin film nanostructures in enhancing the catalytic performance of an electrocatalyst. Both electrocatalysts also exhibited good long-term stability in the harsh acidic electrolyte conditions when subjected to chronopotentiometry studies.