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Chatterjee A, Kruskopf M, Wundrack S, Hinze P, Pierz K, Stosch R, Scherer H. Impact of Polymer-Assisted Epitaxial Graphene Growth on Various Types of SiC Substrates. ACS APPLIED ELECTRONIC MATERIALS 2022; 4:5317-5325. [PMID: 36439398 PMCID: PMC9686134 DOI: 10.1021/acsaelm.2c00989] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 07/29/2022] [Accepted: 10/16/2022] [Indexed: 06/16/2023]
Abstract
The growth parameters for epitaxial growth of graphene on silicon carbide (SiC) have been the focus of research over the past few years. However, besides the standard growth parameters, the influence of the substrate pretreatment and properties of the underlying SiC wafer are critical parameters for optimizing the quality of monolayer graphene on SiC. In this systematic study, we show how the surface properties and the pretreatment determine the quality of monolayer graphene using polymer-assisted sublimation growth (PASG) on SiC. Using the spin-on deposition technique of PASG, several polymer concentrations have been investigated to understand the influence of the polymer content on the final monolayer coverage using wafers of different miscut angles and different polytypes. Confocal laser scanning microscopy (CLSM), atomic force microscopy (AFM), Raman spectroscopy, and scanning electron microscopy (SEM) were used to characterize these films. The results show that, even for SiC substrates with high miscut angles, high-quality graphene is obtained when an appropriate polymer concentration is applied. This is in excellent agreement with the model understanding that an insufficient carbon supply from SiC step edge decomposition can be compensated by additionally providing carbon from a polymer source. The described methods make the PASG spin-on deposition technique more convenient for commercial use.
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2
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Callera Aguila MA, Esmenda JC, Wang JY, Lee TH, Yang CY, Lin KH, Chang-Liao KS, Kafanov S, Pashkin YA, Chen CD. Fabry-Perot interferometric calibration of van der Waals material-based nanomechanical resonators. NANOSCALE ADVANCES 2022; 4:502-509. [PMID: 36132699 PMCID: PMC9416946 DOI: 10.1039/d1na00794g] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 11/09/2021] [Accepted: 11/21/2021] [Indexed: 06/16/2023]
Abstract
One of the challenges in integrating nanomechanical resonators made from van der Waals materials in optoelectromechanical technologies is characterizing their dynamic properties from vibrational displacement. Multiple calibration schemes using optical interferometry have tackled this challenge. However, these techniques are limited only to optically thin resonators with an optimal vacuum gap height and substrate for interferometric detection. Here, we address this limitation by implementing a modeling-based approach via multilayer thin-film interference for in situ, non-invasive determination of the resonator thickness, gap height, and motional amplitude. This method is demonstrated on niobium diselenide drumheads that are electromotively driven in their linear regime of motion. The laser scanning confocal configuration enables a resolution of hundreds of picometers in motional amplitude for circular and elliptical devices. The measured thickness and spacer height, determined to be in the order of tens and hundreds of nanometers, respectively, are in excellent agreement with profilometric measurements. Moreover, the transduction factor estimated from our method agrees with the result of other studies that resolved Brownian motion. This characterization method, which applies to both flexural and acoustic wave nanomechanical resonators, is robust because of its scalability to thickness and gap height, and any form of reflecting substrate.
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Affiliation(s)
- Myrron Albert Callera Aguila
- National Tsing Hua University Hsinchu 30013 Taiwan
- Nano Science and Technology Program, Taiwan International Graduate Program, Academia Sinica and National Tsing Hua University Taiwan
- Institute of Physics, Academia Sinica Nangang 11529 Taiwan
| | - Joshoua Condicion Esmenda
- National Tsing Hua University Hsinchu 30013 Taiwan
- Nano Science and Technology Program, Taiwan International Graduate Program, Academia Sinica and National Tsing Hua University Taiwan
- Institute of Physics, Academia Sinica Nangang 11529 Taiwan
| | - Jyh-Yang Wang
- Institute of Physics, Academia Sinica Nangang 11529 Taiwan
| | - Teik-Hui Lee
- Institute of Physics, Academia Sinica Nangang 11529 Taiwan
| | - Chi-Yuan Yang
- Institute of Physics, Academia Sinica Nangang 11529 Taiwan
| | - Kung-Hsuan Lin
- Institute of Physics, Academia Sinica Nangang 11529 Taiwan
| | | | - Sergey Kafanov
- Department of Physics, Lancaster University Lancaster LA1 4YB UK
| | - Yuri A Pashkin
- Department of Physics, Lancaster University Lancaster LA1 4YB UK
| | - Chii-Dong Chen
- Institute of Physics, Academia Sinica Nangang 11529 Taiwan
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3
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Quality control methods in musculoskeletal tissue engineering: from imaging to biosensors. Bone Res 2021; 9:46. [PMID: 34707086 PMCID: PMC8551153 DOI: 10.1038/s41413-021-00167-9] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/05/2020] [Revised: 04/23/2021] [Accepted: 06/27/2021] [Indexed: 02/06/2023] Open
Abstract
Tissue engineering is rapidly progressing toward clinical application. In the musculoskeletal field, there has been an increasing necessity for bone and cartilage replacement. Despite the promising translational potential of tissue engineering approaches, careful attention should be given to the quality of developed constructs to increase the real applicability to patients. After a general introduction to musculoskeletal tissue engineering, this narrative review aims to offer an overview of methods, starting from classical techniques, such as gene expression analysis and histology, to less common methods, such as Raman spectroscopy, microcomputed tomography, and biosensors, that can be employed to assess the quality of constructs in terms of viability, morphology, or matrix deposition. A particular emphasis is given to standards and good practices (GXP), which can be applicable in different sectors. Moreover, a classification of the methods into destructive, noninvasive, or conservative based on the possible further development of a preimplant quality monitoring system is proposed. Biosensors in musculoskeletal tissue engineering have not yet been used but have been proposed as a novel technology that can be exploited with numerous advantages, including minimal invasiveness, making them suitable for the development of preimplant quality control systems.
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Rathore S, Patel DK, Thakur MK, Haider G, Kalbac M, Kruskopf M, Liu CI, Rigosi AF, Elmquist RE, Liang CT, Hong PD. Highly sensitive broadband binary photoresponse in gateless epitaxial graphene on 4H-SiC. CARBON 2021; 184:10.1016/j.carbon.2021.07.098. [PMID: 37200678 PMCID: PMC10190169 DOI: 10.1016/j.carbon.2021.07.098] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/20/2023]
Abstract
Due to weak light-matter interaction, standard chemical vapor deposition (CVD)/exfoliated single-layer graphene-based photodetectors show low photoresponsivity (on the order of mA/W). However, epitaxial graphene (EG) offers a more viable approach for obtaining devices with good photoresponsivity. EG on 4H-SiC also hosts an interfacial buffer layer (IBL), which is the source of electron carriers applicable to quantum optoelectronic devices. We utilize these properties to demonstrate a gate-free, planar EG/4H-SiC-based device that enables us to observe the positive photoresponse for (405-532) nm and negative photoresponse for (632-980) nm laser excitation. The broadband binary photoresponse mainly originates from the energy band alignment of the IBL/EG interface and the highly sensitive work function of the EG. We find that the photoresponsivity of the device is > 10 A/W under 405 nm of power density 7.96 mW/cm2 at 1 V applied bias, which is three orders of magnitude greater than the obtained values of CVD/exfoliated graphene and higher than the required value for practical applications. These results path the way for selective light-triggered logic devices based on EG and can open a new window for broadband photodetection.
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Affiliation(s)
- Shivi Rathore
- Department of Materials Science and Engineering, National Taiwan University of Science and Technology, Taipei, 106335, Taiwan
| | - Dinesh Kumar Patel
- Department of Physics, National Taiwan University, Taipei, 106319, Taiwan
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg MD, 20899, USA
| | - Mukesh Kumar Thakur
- J. Heyrovsky Institute of Physical Chemistry, Czech Academy of Sciences, Prague 8, Czech Republic
| | - Golam Haider
- J. Heyrovsky Institute of Physical Chemistry, Czech Academy of Sciences, Prague 8, Czech Republic
- Corresponding author. (G. Haider)
| | - Martin Kalbac
- J. Heyrovsky Institute of Physical Chemistry, Czech Academy of Sciences, Prague 8, Czech Republic
| | - Mattias Kruskopf
- Physikalisch-Technische Bundesanstalt (PTB), Bundesallee 100, D-38116, Braunschweig, Germany
| | - Chieh-I Liu
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg MD, 20899, USA
- Department of Chemistry and Biochemistry, University of Maryland, College Park, MD, 20742, USA
| | - Albert F. Rigosi
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg MD, 20899, USA
| | - Randolph E. Elmquist
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg MD, 20899, USA
| | - Chi-Te Liang
- Department of Physics, National Taiwan University, Taipei, 106319, Taiwan
- Corresponding author. (C.-T. Liang)
| | - Po-Da Hong
- Department of Materials Science and Engineering, National Taiwan University of Science and Technology, Taipei, 106335, Taiwan
- Corresponding author. (P.-D. Hong)
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Marie LRS, Liu CI, Hu IF, Hill HM, Saha D, Elmquist RE, Lian CT, Newell DB, Barbara P, Hagmann JA, Rigosi AF. Abrikosov vortex corrections to effective magnetic field enhancement in epitaxial graphene. PHYSICAL REVIEW. B 2021; 104:10.1103/physrevb.104.085435. [PMID: 38883413 PMCID: PMC11177804 DOI: 10.1103/physrevb.104.085435] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/18/2024]
Abstract
Here, we report the effects of enhanced magnetic fields resulting from type-II superconducting NbTiN slabs adjacent to narrow Hall bar devices fabricated from epitaxial graphene. Observed changes in the magnetoresistances were found to have minimal contributions from device inhomogeneities, magnet hysteresis, electron density variations along the devices, and transient phenomena. We hypothesize that Abrikosov vortices, present in type-II superconductors, contribute to these observations. By determining the London penetration depth, coupled with elements of Ginzburg-Landau theory, one can approximate an upper bound on the effect that vortex densities at low fields (< 1T) have on the reported observations. These analyses offer insights into device fabrication and how to utilize the Meissner effect for any low-field and low-temperature applications using superconductors.
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Affiliation(s)
- Luke R. St. Marie
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, USA
- Department of Physics, Georgetown University, Washington, DC 20057, USA
| | - Chieh-I Liu
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, USA
- Department of Chemistry and Biochemistry, University of Maryland, College Park, Maryland 20742, USA
| | - I-Fan Hu
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, USA
- Department of Physics, National Taiwan University, Taipei 10617, Taiwan
| | - Heather M. Hill
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, USA
| | - Dipanjan Saha
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, USA
| | - Randolph E. Elmquist
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, USA
| | - Chi-Te Lian
- Department of Physics, Georgetown University, Washington, DC 20057, USA
| | - David B. Newell
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, USA
| | - Paola Barbara
- Department of Physics, Georgetown University, Washington, DC 20057, USA
| | - Joseph A. Hagmann
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, USA
| | - Albert F. Rigosi
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, USA
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7
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Hu IF, Panna AR, Rigosi AF, Kruskopf M, Patel DK, Liu CI, Saha D, Payagala SU, Newell DB, Jarrett DG, Liang CT, Elmquist RE. Onsager-Casimir frustration from resistance anisotropy in graphene quantum Hall devices. PHYSICAL REVIEW. B 2021; 104:10.1103/physrevb.104.085418. [PMID: 36875776 PMCID: PMC9982844 DOI: 10.1103/physrevb.104.085418] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Indexed: 06/18/2023]
Abstract
We report on nonreciprocity observations in several configurations of graphene-based quantum Hall devices. Two distinct measurement configurations were adopted to verify the universality of the observations (i.e., two-terminal arrays and four-terminal devices). Our findings determine the extent to which epitaxial graphene anisotropies contribute to the observed asymmetric Hall responses. The presence of backscattering induces a device-dependent asymmetry rendering the Onsager-Casimir relations limited in their capacity to describe the behavior of such devices, except in the low-field classical regime and the fully quantized Hall state. The improved understanding of this quantum electrical process broadly limits the applicability of the reciprocity principle in the presence of quantum phase transitions and for anisotropic two-dimensional materials.
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Affiliation(s)
- I-Fan Hu
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, USA
- Department of Physics, National Taiwan University, Taipei 10617, Taiwan
| | - Alireza R. Panna
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, USA
| | - Albert F. Rigosi
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, USA
| | - Mattias Kruskopf
- Physikalisch-Technische Bundesanstalt, Bundesallee 100, 38116 Braunschweig, Germany
| | - Dinesh K. Patel
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, USA
- Department of Physics, National Taiwan University, Taipei 10617, Taiwan
| | - Chieh-I Liu
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, USA
- Department of Chemistry and Biochemistry, University of Maryland, College Park, Maryland 20742, USA
| | - Dipanjan Saha
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, USA
| | - Shamith U. Payagala
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, USA
| | - David B. Newell
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, USA
| | - Dean G. Jarrett
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, USA
| | - Chi-Te Liang
- Department of Physics, National Taiwan University, Taipei 10617, Taiwan
| | - Randolph E. Elmquist
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, Maryland 20899, USA
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8
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Towards standardisation of contact and contactless electrical measurements of CVD graphene at the macro-, micro- and nano-scale. Sci Rep 2020; 10:3223. [PMID: 32081982 PMCID: PMC7035257 DOI: 10.1038/s41598-020-59851-1] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/01/2019] [Accepted: 12/05/2019] [Indexed: 11/16/2022] Open
Abstract
Graphene has become the focus of extensive research efforts and it can now be produced in wafer-scale. For the development of next generation graphene-based electronic components, electrical characterization of graphene is imperative and requires the measurement of work function, sheet resistance, carrier concentration and mobility in both macro-, micro- and nano-scale. Moreover, commercial applications of graphene require fast and large-area mapping of electrical properties, rather than obtaining a single point value, which should be ideally achieved by a contactless measurement technique. We demonstrate a comprehensive methodology for measurements of the electrical properties of graphene that ranges from nano- to macro- scales, while balancing the acquisition time and maintaining the robust quality control and reproducibility between contact and contactless methods. The electrical characterisation is achieved by using a combination of techniques, including magneto-transport in the van der Pauw geometry, THz time-domain spectroscopy mapping and calibrated Kelvin probe force microscopy. The results exhibit excellent agreement between the different techniques. Moreover, we highlight the need for standardized electrical measurements in highly controlled environmental conditions and the application of appropriate weighting functions.
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9
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Marzano M, Kruskopf M, Panna AR, Rigosi AF, Patel DK, Jin H, Cular S, Callegaro L, Elmquist RE, Ortolano M. Implementation of a graphene quantum Hall Kelvin bridge-on-a-chip for resistance calibrations. METROLOGIA 2020; 57:10.1088/1681-7575/ab581e. [PMID: 32127725 PMCID: PMC7053649 DOI: 10.1088/1681-7575/ab581e] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
The unique properties of the quantum Hall effect allow one to revisit traditional measurement circuits with a new flavour. In this paper we present the first realization of a quantum Hall Kelvin bridge for the calibration of standard resistors directly against the quantum Hall resistance. The bridge design is particularly simple and requires a minimal number of instruments. The implementation here proposed is based on the bridge-on-a-chip, an integrated circuit composed of three graphene quantum Hall elements and superconducting wiring. The accuracy achieved in the calibration of a 12 906Ω standard resistor is of a few parts in 108, at present mainly limited by the prototype device and the interferences in the current implementation, with the potential to achieve few parts in 109, which is the level of the systematic uncertainty of the quantum Hall Kelvin bridge itself.
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Affiliation(s)
- Martina Marzano
- Politecnico di Torino, Corso Duca degli Abruzzi 24, 10129 Torino, Italy
- INRIM - Istituto Nazionale di Ricerca Metrologica, Strada delle Cacce, 91, 10135 Torino, Italy
| | - Mattias Kruskopf
- University of Maryland, College Park, MD 20742, USA
- NIST - National Institute of Standards and Technology, Gaithersburg, MD 20899, USA
| | - Alireza R Panna
- NIST - National Institute of Standards and Technology, Gaithersburg, MD 20899, USA
| | - Albert F Rigosi
- NIST - National Institute of Standards and Technology, Gaithersburg, MD 20899, USA
| | | | - Hanbyul Jin
- University of Maryland, College Park, MD 20742, USA
| | - Stefan Cular
- NIST - National Institute of Standards and Technology, Gaithersburg, MD 20899, USA
| | - Luca Callegaro
- INRIM - Istituto Nazionale di Ricerca Metrologica, Strada delle Cacce, 91, 10135 Torino, Italy
| | - Randolph E Elmquist
- NIST - National Institute of Standards and Technology, Gaithersburg, MD 20899, USA
| | - Massimo Ortolano
- Politecnico di Torino, Corso Duca degli Abruzzi 24, 10129 Torino, Italy
- INRIM - Istituto Nazionale di Ricerca Metrologica, Strada delle Cacce, 91, 10135 Torino, Italy
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10
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Rigosi AF, Kruskopf M, Panna AR, Payagala SU, Jarrett DG, Newell DB, Elmquist RE. Metrological Suitability of Functionalized Epitaxial Graphene. IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT 2020; 1:10.1109/CPEM49742.2020.9191783. [PMID: 33335332 PMCID: PMC7739545 DOI: 10.1109/cpem49742.2020.9191783] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/12/2023]
Abstract
This work presents one solution for long-term storage of epitaxial graphene (EG) in air, namely through the functionalization of millimeter-scale devices with chromium tricarbonyl - Cr(CO)3. The carrier density may be tuned reproducibly by annealing below 400 K due to the presence of Cr(CO)3. All tuning is easily reversible with exposure to air, with the idle, in-air, carrier density always being close to the Dirac point. Precision measurements in the quantum Hall regime indicate no detrimental effects from the treatment, validating the pursuit of developing air-stable EG-based QHR devices.
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Affiliation(s)
- Albert F Rigosi
- National Institute of Standards and Technology, 100 Bureau Drive, Stop 8171, Gaithersburg, MD, 20899, USA
| | - Mattias Kruskopf
- National Institute of Standards and Technology, 100 Bureau Drive, Stop 8171, Gaithersburg, MD, 20899, USA
- University of Maryland, Joint Quantum Institute, College Park, MD, 20742, USA
- Physikalisch-Technische Bundesanstalt, Department of Electrical Quantum Metrology, Braunschweig 38116
| | - Alireza R Panna
- National Institute of Standards and Technology, 100 Bureau Drive, Stop 8171, Gaithersburg, MD, 20899, USA
| | - Shamith U Payagala
- National Institute of Standards and Technology, 100 Bureau Drive, Stop 8171, Gaithersburg, MD, 20899, USA
| | - Dean G Jarrett
- National Institute of Standards and Technology, 100 Bureau Drive, Stop 8171, Gaithersburg, MD, 20899, USA
| | - David B Newell
- National Institute of Standards and Technology, 100 Bureau Drive, Stop 8171, Gaithersburg, MD, 20899, USA
| | - Randolph E Elmquist
- National Institute of Standards and Technology, 100 Bureau Drive, Stop 8171, Gaithersburg, MD, 20899, USA
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11
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Liu CI, Scaletta DS, Patel DK, Kruskopf M, Levy A, Hill HM, Rigosi AF. Analysing quantized resistance behaviour in graphene Corbino p-n junction devices. JOURNAL OF PHYSICS D: APPLIED PHYSICS 2020; 53:10.1088/1361-6463/ab83bb. [PMID: 32831402 PMCID: PMC7431976 DOI: 10.1088/1361-6463/ab83bb] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
Just a few of the promising applications of graphene Corbino pnJ devices include two-dimensional Dirac fermion microscopes, custom programmable quantized resistors, and mesoscopic valley filters. In some cases, device scalability is crucial, as seen in fields like resistance metrology, where graphene devices are required to accommodate currents of the order 100 μA to be compatible with existing infrastructure. However, fabrication of these devices still poses many difficulties. In this work, unusual quantized resistances are observed in epitaxial graphene Corbino p-n junction devices held at the ν = 2 plateau (R H ≈ 12906 Ω) and agree with numerical simulations performed with the LTspice circuit simulator. The formulae describing experimental and simulated data are empirically derived for generalized placement of up to three current terminals and accurately reflects observed partial edge channel cancellation. These results support the use of ultraviolet lithography as a way to scale up graphene-based devices with suitably narrow junctions that could be applied in a variety of subfields.
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Affiliation(s)
- Chieh-I Liu
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, United States
- Department of Chemistry and Biochemistry, University of Maryland, College Park, MD 20742, United States
| | - Dominick S Scaletta
- Department of Physics, Mount San Jacinto College, Menifee, CA 92584, United States
| | - Dinesh K Patel
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, United States
- Department of Physics, National Taiwan University, Taipei 10617, Taiwan
| | - Mattias Kruskopf
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, United States
- Joint Quantum Institute, University of Maryland, College Park, MD 20742, United States
- Electricity Division, Physikalisch-Technische Bundesanstalt, Braunschweig 38116, Germany
| | - Antonio Levy
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, United States
| | - Heather M Hill
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, United States
| | - Albert F Rigosi
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, United States
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12
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Kruskopf M, Rigosi AF, Panna AR, Marzano M, Patel D, Jin H, Newell DB, Elmquist RE. Next-generation crossover-free quantum Hall arrays with superconducting interconnections. METROLOGIA 2019; 56:10.1088/1681-7575/ab3ba3. [PMID: 32116392 PMCID: PMC7047890 DOI: 10.1088/1681-7575/ab3ba3] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/29/2023]
Abstract
This work presents precision measurements of quantized Hall array resistance devices using superconducting, crossover-free, multiple interconnections as well as graphene split contacts. These new techniques successfully eliminate the accumulation of internal resistances and leakage currents that typically occur at interconnections and crossing leads between interconnected devices. As a result, a scalable quantized Hall resistance array is obtained with a nominal value that is as precise and stable as that from single-element quantized Hall resistance standards.
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Affiliation(s)
- Mattias Kruskopf
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
- Joint Quantum Institute, University of Maryland, College Park, MD 20742, USA
| | - Albert F Rigosi
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
| | - Alireza R Panna
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
| | - Martina Marzano
- Politecnico di Torino, Istituto Nazionale di Ricerca Metrologica, Turin, Italy
| | - Dinesh Patel
- Department of Physics, National Taiwan University, Taipei 10617, Taiwan
| | - Hanbyul Jin
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
- Joint Quantum Institute, University of Maryland, College Park, MD 20742, USA
| | - David B Newell
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
| | - Randolph E Elmquist
- National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, USA
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13
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Whelan PR, Panchal V, Petersen DH, Mackenzie DMA, Melios C, Pasternak I, Gallop J, Østerberg FW, U Jepsen P, Strupinski W, Kazakova O, Bøggild P. Electrical Homogeneity Mapping of Epitaxial Graphene on Silicon Carbide. ACS APPLIED MATERIALS & INTERFACES 2018; 10:31641-31647. [PMID: 30130090 DOI: 10.1021/acsami.8b11428] [Citation(s) in RCA: 8] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
Epitaxial graphene is a promising route to wafer-scale production of electronic graphene devices. Chemical vapor deposition of graphene on silicon carbide offers epitaxial growth with layer control but is subject to significant spatial and wafer-to-wafer variability. We use terahertz time-domain spectroscopy and micro four-point probes to analyze the spatial variations of quasi-freestanding bilayer graphene grown on 4 in. silicon carbide (SiC) wafers and find significant variations in electrical properties across large regions, which are even reproduced across graphene on different SiC wafers cut from the same ingot. The dc sheet conductivity of epitaxial graphene was found to vary more than 1 order of magnitude across a 4 in. SiC wafer. To determine the origin of the variations, we compare different optical and scanning probe microscopies with the electrical measurements from nano- to millimeter scale and identify three distinct qualities of graphene, which can be attributed to the microstructure of the SiC surface.
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Affiliation(s)
- Patrick R Whelan
- DTU Fotonik , Technical University of Denmark , Ørsteds Plads 343 , DK-2800 Kongens Lyngby , Denmark
| | - Vishal Panchal
- National Physical Laboratory , Hampton Road , Teddington TW11 0LW , U.K
| | | | | | - Christos Melios
- National Physical Laboratory , Hampton Road , Teddington TW11 0LW , U.K
| | - Iwona Pasternak
- Faculty of Physics , Warsaw University of Technology , Koszykowa 75 , 00-662 Warsaw , Poland
| | - John Gallop
- National Physical Laboratory , Hampton Road , Teddington TW11 0LW , U.K
| | | | - Peter U Jepsen
- DTU Fotonik , Technical University of Denmark , Ørsteds Plads 343 , DK-2800 Kongens Lyngby , Denmark
| | - Wlodek Strupinski
- Faculty of Physics , Warsaw University of Technology , Koszykowa 75 , 00-662 Warsaw , Poland
| | - Olga Kazakova
- National Physical Laboratory , Hampton Road , Teddington TW11 0LW , U.K
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