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Kaur S, Chanda T, Amin KR, Sahani D, Watanabe K, Taniguchi T, Ghorai U, Gefen Y, Sreejith GJ, Bid A. Universality of quantum phase transitions in the integer and fractional quantum Hall regimes. Nat Commun 2024; 15:8535. [PMID: 39358368 PMCID: PMC11447162 DOI: 10.1038/s41467-024-52927-w] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/06/2024] [Accepted: 09/24/2024] [Indexed: 10/04/2024] Open
Abstract
Fractional quantum Hall (FQH) phases emerge due to strong electronic interactions and are characterized by anyonic quasiparticles, each distinguished by unique topological parameters, fractional charge, and statistics. In contrast, the integer quantum Hall (IQH) effects can be understood from the band topology of non-interacting electrons. We report a surprising super-universality of the critical behavior across all FQH and IQH transitions. Contrary to the anticipated state-dependent critical exponents, our findings reveal the same critical scaling exponent κ = 0.41 ± 0.02 and localization length exponent γ = 2.4 ± 0.2 for fractional and integer quantum Hall transitions. From these, we extract the value of the dynamical exponent z ≈ 1. We have achieved this in ultra-high mobility trilayer graphene devices with a metallic screening layer close to the conduction channels. The observation of these global critical exponents across various quantum Hall phase transitions was masked in previous studies by significant sample-to-sample variation in the measured values of κ in conventional semiconductor heterostructures, where long-range correlated disorder dominates. We show that the robust scaling exponents are valid in the limit of short-range disorder correlations.
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Affiliation(s)
- Simrandeep Kaur
- Department of Physics, Indian Institute of Science, Bangalore, 560012, India
| | - Tanima Chanda
- Department of Physics, Indian Institute of Science, Bangalore, 560012, India
| | - Kazi Rafsanjani Amin
- Department of Microtechnology and Nanoscience, Chalmers University of Technology, 412 96, Gothenburg, Sweden
| | - Divya Sahani
- Department of Physics, Indian Institute of Science, Bangalore, 560012, India
| | - Kenji Watanabe
- Research Center for Electronic and Optical Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba, 305-0044, Japan
| | - Takashi Taniguchi
- Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba, 305-0044, Japan
| | - Unmesh Ghorai
- Department of Theoretical Physics, Tata Institute of Fundamental Research, Homi Bhabha Road, Mumbai, 400005, India
| | - Yuval Gefen
- Department of Condensed Matter Physics, Weizmann Institute of Science, Rehovot, 76100, Israel
| | - G J Sreejith
- Indian Institute of Science Education and Research, Pune, 411008, India
| | - Aveek Bid
- Department of Physics, Indian Institute of Science, Bangalore, 560012, India.
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Saha D, Waters D, Yeh CC, Mhatre SM, Tran NTM, Hill HM, Watanabe K, Taniguchi T, Newell DB, Yankowitz M, Rigosi AF. Graphene-Based Analog of Single-Slit Electron Diffraction. PHYSICAL REVIEW. B 2023; 108:10.1103/physrevb.108.125420. [PMID: 37841515 PMCID: PMC10572097 DOI: 10.1103/physrevb.108.125420] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 10/17/2023]
Abstract
This work reports the experimental demonstration of single-slit diffraction exhibited by electrons propagating in encapsulated graphene with an effective de Broglie wavelength corresponding to their attributes as massless Dirac fermions. Nanometer-scale device designs were implemented to fabricate a single-slit followed by five detector paths. Predictive calculations were also utilized to readily understand the observations reported. These calculations required the modeling of wave propagation in ideal case scenarios of the reported device designs to more accurately describe the observed single-slit phenomenon. This experiment was performed at room temperature and 190 K, where data from the latter highlighted the exaggerated asymmetry between electrons and holes, recently ascribed to slightly different Fermi velocities near the K point. This observation and device concept may be used for building diffraction switches with versatile applicability.
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Affiliation(s)
- Dipanjan Saha
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, United States
| | - Dacen Waters
- Intelligence Community Postdoctoral Research Fellowship Program, University of Washington, Seattle, WA 98195, United States
- Department of Physics, University of Washington, Seattle, WA 98195, United States
| | - Ching-Chen Yeh
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, United States
- Department of Physics, National Taiwan University, Taipei 10617, Taiwan
| | - Swapnil M. Mhatre
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, United States
| | - Ngoc Thanh Mai Tran
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, United States
- Joint Quantum Institute, University of Maryland, College Park, Maryland 20742, United States
| | - Heather M. Hill
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, United States
| | - Kenji Watanabe
- Research Center for Functional Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
| | - Takashi Taniguchi
- International Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan
| | - David B. Newell
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, United States
| | - Matthew Yankowitz
- Department of Physics, University of Washington, Seattle, WA 98195, United States
- Department of Materials Science and Engineering, University of Washington, Seattle, WA 98195, United States
| | - Albert F. Rigosi
- Physical Measurement Laboratory, National Institute of Standards and Technology (NIST), Gaithersburg, MD 20899, United States
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Abstract
Graphene has become a material of choice for an increasing number of scientific and industrial applications. It has been used for gas sensing due to its favorable properties, such as a large specific surface area, as well as the sensitivity of its electrical parameters to adsorption processes occurring on its surface. Efforts are ongoing to produce graphene gas sensors by using methods that are compatible with scaling, simple deposition techniques on arbitrary substrates, and ease of use. In this paper, we demonstrate the fabrication of carbon dioxide gas sensors from Langmuir–Blodgett thin films of sulfonated polyaniline-functionalized graphene that was obtained by using electrochemical exfoliation. The sensor was tested within the highly relevant concentration range of 150 to 10,000 ppm and 0% to 100% at room temperature (15 to 35 °C). The results show that the sensor has both high sensitivity to low analyte concentrations and high dynamic range. The sensor response times are approximately 15 s. The fabrication method is simple, scalable, and compatible with arbitrary substrates, which makes it potentially interesting for many practical applications. The sensor is used for real-time carbon dioxide concentration monitoring based on a theoretical model matched to our experimental data. The sensor performance was unchanged over a period of several months.
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Kar S, Mohapatra DR, Sood AK. Tunable terahertz photoconductivity of hydrogen functionalized graphene using optical pump-terahertz probe spectroscopy. NANOSCALE 2018; 10:14321-14330. [PMID: 30020299 DOI: 10.1039/c8nr04154g] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
We show that the terahertz photoconductivity of monolayer graphene following 800 nm femtosecond optical pump excitation can be tuned by different levels of hydrogenation (graphane) and provide a quantitative understanding of the unique spectral dependence of photoconductivity. The real part of terahertz photoconductivity (ΔσRe(ω)), which is negative in doped pristine graphene, becomes positive after hydrogenation. Frequency and electronic temperature Te dependent conductivity σ(ω, Te) is calculated using the Boltzmann transport equation taking into account the energy dependence of different scattering rates of the hot carriers. It is shown that the carrier scattering rate dominated by disorder-induced short-range scattering, though sufficient for pristine graphene, is not able to explain the observed complex Δσ(ω) for graphane. Our results are explained by considering the system to be heterogeneous after hydrogenation where conductivity is a weighted sum of conductivities of two parts: one dominated by Coulomb scattering coming from trapped charge impurities in the underlying substrate and the other dominated by short-range scattering coming from disorder, surface defects, dislocations and ripples in graphene flakes. A finite band gap opening due to hydrogenation is shown to be important in determining Δσ(ω).
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Affiliation(s)
- Srabani Kar
- Department of Physics, Indian Institute of Science, Bangalore 560 012, India. and Center for ultrafast laser application, Indian Institute of Science, Bangalore 560 012, India
| | - Dipti R Mohapatra
- Department of Physics, Indian Institute of Science, Bangalore 560 012, India.
| | - A K Sood
- Department of Physics, Indian Institute of Science, Bangalore 560 012, India. and Center for ultrafast laser application, Indian Institute of Science, Bangalore 560 012, India
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Lee S, Nathan A, Alexander-Webber J, Braeuninger-Weimer P, Sagade AA, Lu H, Hasko D, Robertson J, Hofmann S. Dirac-Point Shift by Carrier Injection Barrier in Graphene Field-Effect Transistor Operation at Room Temperature. ACS APPLIED MATERIALS & INTERFACES 2018; 10:10618-10621. [PMID: 29557636 DOI: 10.1021/acsami.8b02294] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
A positive shift in the Dirac point in graphene field-effect transistors was observed with Hall-effect measurements coupled with Kelvin-probe measurements at room temperature. This shift can be explained by the asymmetrical behavior of the contact resistance by virtue of the electron injection barrier at the source contact. As an outcome, an intrinsic resistance is given to allow a retrieval of an intrinsic carrier mobility found to be decreased with increasing gate bias, suggesting the dominance of short-range scattering in a single-layer graphene field-effect transistor. These results analytically correlate the field-effect parameters with intrinsic graphene properties.
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Affiliation(s)
- Sungsik Lee
- Electrical Engineering Division, Department of Engineering , University of Cambridge , 9 JJ Thomson Avenue , Cambridge , CB3 0FA , United Kingdom
| | - Arokia Nathan
- Electrical Engineering Division, Department of Engineering , University of Cambridge , 9 JJ Thomson Avenue , Cambridge , CB3 0FA , United Kingdom
| | - Jack Alexander-Webber
- Electrical Engineering Division, Department of Engineering , University of Cambridge , 9 JJ Thomson Avenue , Cambridge , CB3 0FA , United Kingdom
| | - Philipp Braeuninger-Weimer
- Electrical Engineering Division, Department of Engineering , University of Cambridge , 9 JJ Thomson Avenue , Cambridge , CB3 0FA , United Kingdom
| | - Abhay A Sagade
- Electrical Engineering Division, Department of Engineering , University of Cambridge , 9 JJ Thomson Avenue , Cambridge , CB3 0FA , United Kingdom
| | - Haichang Lu
- Electrical Engineering Division, Department of Engineering , University of Cambridge , 9 JJ Thomson Avenue , Cambridge , CB3 0FA , United Kingdom
| | - David Hasko
- Electrical Engineering Division, Department of Engineering , University of Cambridge , 9 JJ Thomson Avenue , Cambridge , CB3 0FA , United Kingdom
| | - John Robertson
- Electrical Engineering Division, Department of Engineering , University of Cambridge , 9 JJ Thomson Avenue , Cambridge , CB3 0FA , United Kingdom
| | - Stephan Hofmann
- Electrical Engineering Division, Department of Engineering , University of Cambridge , 9 JJ Thomson Avenue , Cambridge , CB3 0FA , United Kingdom
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Prestigiacomo JC, Nath A, Osofsky MS, Hernández SC, Wheeler VD, Walton SG, Gaskill DK. Determining the nature of the gap in semiconducting graphene. Sci Rep 2017; 7:41713. [PMID: 28181521 PMCID: PMC5299416 DOI: 10.1038/srep41713] [Citation(s) in RCA: 9] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/16/2016] [Accepted: 12/29/2016] [Indexed: 11/11/2022] Open
Abstract
Since its discovery, graphene has held great promise as a two-dimensional (2D) metal with massless carriers and, thus, extremely high-mobility that is due to the character of the band structure that results in the so-called Dirac cone for the ideal, perfectly ordered crystal structure. This promise has led to only limited electronic device applications due to the lack of an energy gap which prevents the formation of conventional device geometries. Thus, several schemes for inducing a semiconductor band gap in graphene have been explored. These methods do result in samples whose resistivity increases with decreasing temperature, similar to the temperature dependence of a semiconductor. However, this temperature dependence can also be caused by highly diffusive transport that, in highly disordered materials, is caused by Anderson-Mott localization and which is not desirable for conventional device applications. In this letter, we demonstrate that in the diffusive case, the conventional description of the insulating state is inadequate and demonstrate a method for determining whether such transport behavior is due to a conventional semiconductor band gap.
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Affiliation(s)
| | - A Nath
- George Mason University, Fairfax, VA, USA
| | - M S Osofsky
- Naval Research Laboratory, Washington, DC, USA
| | | | - V D Wheeler
- Naval Research Laboratory, Washington, DC, USA
| | - S G Walton
- Naval Research Laboratory, Washington, DC, USA
| | - D K Gaskill
- Naval Research Laboratory, Washington, DC, USA
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