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Juska VB, Maxwell G, Estrela P, Pemble ME, O'Riordan A. Silicon microfabrication technologies for biology integrated advance devices and interfaces. Biosens Bioelectron 2023; 237:115503. [PMID: 37481868 DOI: 10.1016/j.bios.2023.115503] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 02/12/2023] [Revised: 06/25/2023] [Accepted: 06/26/2023] [Indexed: 07/25/2023]
Abstract
Miniaturization is the trend to manufacture ever smaller devices and this process requires knowledge, experience, understanding of materials, manufacturing techniques and scaling laws. The fabrication techniques used in semiconductor industry deliver an exceptionally high yield of devices and provide a well-established platform. Today, these miniaturized devices are manufactured with high reproducibility, design flexibility, scalability and multiplexed features to be used in several applications including micro-, nano-fluidics, implantable chips, diagnostics/biosensors and neural probes. We here provide a review on the microfabricated devices used for biology driven science. We will describe the ubiquity of the use of micro-nanofabrication techniques in biology and biotechnology through the fabrication of high-aspect-ratio devices for cell sensing applications, intracellular devices, probes developed for neuroscience-neurotechnology and biosensing of the certain biomarkers. Recently, the research on micro and nanodevices for biology has been progressing rapidly. While the understanding of the unknown biological fields -such as human brain- has been requiring more research with advanced materials and devices, the development protocols of desired devices has been advancing in parallel, which finally meets with some of the requirements of biological sciences. This is a very exciting field and we aim to highlight the impact of micro-nanotechnologies that can shed light on complex biological questions and needs.
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Affiliation(s)
- Vuslat B Juska
- Tyndall National Institute, University College Cork, T12R5CP, Ireland.
| | - Graeme Maxwell
- Tyndall National Institute, University College Cork, T12R5CP, Ireland
| | - Pedro Estrela
- Department of Electronic and Electrical Engineering, University of Bath, Bath, BA2 7AY, United Kingdom; Centre for Bioengineering & Biomedical Technologies (CBio), University of Bath, Bath, BA2 7AY, United Kingdom
| | | | - Alan O'Riordan
- Tyndall National Institute, University College Cork, T12R5CP, Ireland
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2
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Ghosh SN, Talukder S. Humidity- tunable liquefaction of Cr thin-film and its application to patterning. NANOTECHNOLOGY 2022; 34:095302. [PMID: 36541503 DOI: 10.1088/1361-6528/aca547] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/12/2022] [Accepted: 11/23/2022] [Indexed: 06/17/2023]
Abstract
Electric field induced liquefaction of chromium (Cr) thin-films, being a surface-based process, is affected by the moisture content in the surroundings. The said process is an electrochemical reaction, which takes place on an electrically stressed Cr thin-film. The reaction results in a liquid region, which appears to flow out radially from the tip of the cathode. A proper understanding of the phenomenon is warranted as it is applied for performing a nanolithography process, electrolithography (ELG). In this study we have focused on the effect of relative humidity (RH) on the material formation and transport on electrically stressed Cr thin-film. Varying the RH over a wide range, the phenomenon is studied using different levels of DC stress. The effect of the applied DC stress coupled with varying levels of RH showed trends which are explained qualitatively and quantitatively. The results indicate that RH could be a pivotal parameter affecting the above-mentioned phenomenon on electrically stressed Cr thin-films and could significantly alter the minimum feature size attainable by ELG. To demonstrate the effect of RH on ELG, lines are drawn at various humidity levels resulting in greater than 100% increase in the attainable line width when RH is increased by about 40%.
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Affiliation(s)
- Swapnendu Narayan Ghosh
- Department of Electrical Engineering & Computer Science, Indian Institute of Science Education & Research Bhopal, Bhopal, India
| | - Santanu Talukder
- Department of Electrical Engineering & Computer Science, Indian Institute of Science Education & Research Bhopal, Bhopal, India
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Grebenko AK, Motovilov KA, Bubis AV, Nasibulin AG. Gentle Patterning Approaches toward Compatibility with Bio-Organic Materials and Their Environmental Aspects. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2022; 18:e2200476. [PMID: 35315215 DOI: 10.1002/smll.202200476] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/21/2022] [Revised: 03/06/2022] [Indexed: 06/14/2023]
Abstract
Advances in material science, bioelectronic, and implantable medicine combined with recent requests for eco-friendly materials and technologies inevitably formulate new challenges for nano- and micropatterning techniques. Overall, the importance of creating micro- and nanostructures is motivated by a large manifold of fundamental and applied properties accessible only at the nanoscale. Lithography is a crucial family of fabrication methods to create prototypes and produce devices on an industrial scale. The pure trend in the miniaturization of critical electronic semiconducting components has been recently enhanced by implementing bio-organic systems in electronics. So far, significant efforts have been made to find novel lithographic approaches and develop old ones to reach compatibility with delicate bio-organic systems and minimize the impact on the environment. Herein, such delicate materials and sophisticated patterning techniques are briefly reviewed.
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Affiliation(s)
- Artem K Grebenko
- Skolkovo Institute of Science and Technology, Nobel str. 3, Moscow, 121205, Russia
- Center for Photonics and 2D Materials, Moscow Institute of Physics and Technology, Institute Lane 9, Dolgoprudny, 141701, Russia
| | - Konstantin A Motovilov
- Center for Photonics and 2D Materials, Moscow Institute of Physics and Technology, Institute Lane 9, Dolgoprudny, 141701, Russia
| | - Anton V Bubis
- Skolkovo Institute of Science and Technology, Nobel str. 3, Moscow, 121205, Russia
- Institute of Solid State Physics, Russian Academy of Sciences, 2 Academician Ossipyan str., Chernogolovka, 142432, Russia
| | - Albert G Nasibulin
- Skolkovo Institute of Science and Technology, Nobel str. 3, Moscow, 121205, Russia
- Department of Chemistry and Materials Science, Aalto University, P.O. Box 16100, Aalto, FI-00076, Finland
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Carthew J, Taylor JBJ, Garcia-Cruz MR, Kiaie N, Voelcker NH, Cadarso VJ, Frith JE. The Bumpy Road to Stem Cell Therapies: Rational Design of Surface Topographies to Dictate Stem Cell Mechanotransduction and Fate. ACS APPLIED MATERIALS & INTERFACES 2022; 14:23066-23101. [PMID: 35192344 DOI: 10.1021/acsami.1c22109] [Citation(s) in RCA: 4] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/14/2023]
Abstract
Cells sense and respond to a variety of physical cues from their surrounding microenvironment, and these are interpreted through mechanotransductive processes to inform their behavior. These mechanisms have particular relevance to stem cells, where control of stem cell proliferation, potency, and differentiation is key to their successful application in regenerative medicine. It is increasingly recognized that surface micro- and nanotopographies influence stem cell behavior and may represent a powerful tool with which to direct the morphology and fate of stem cells. Current progress toward this goal has been driven by combined advances in fabrication technologies and cell biology. Here, the capacity to generate precisely defined micro- and nanoscale topographies has facilitated the studies that provide knowledge of the mechanotransducive processes that govern the cellular response as well as knowledge of the specific features that can drive cells toward a defined differentiation outcome. However, the path forward is not fully defined, and the "bumpy road" that lays ahead must be crossed before the full potential of these approaches can be fully exploited. This review focuses on the challenges and opportunities in applying micro- and nanotopographies to dictate stem cell fate for regenerative medicine. Here, key techniques used to produce topographic features are reviewed, such as photolithography, block copolymer lithography, electron beam lithography, nanoimprint lithography, soft lithography, scanning probe lithography, colloidal lithography, electrospinning, and surface roughening, alongside their advantages and disadvantages. The biological impacts of surface topographies are then discussed, including the current understanding of the mechanotransductive mechanisms by which these cues are interpreted by the cells, as well as the specific effects of surface topographies on cell differentiation and fate. Finally, considerations in translating these technologies and their future prospects are evaluated.
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Affiliation(s)
- James Carthew
- Materials Science and Engineering, Monash University, Clayton, Victoria 3800, Australia
| | - Jason B J Taylor
- Mechanical and Aerospace Engineering, Monash University, Clayton, Victoria 3800, Australia
| | - Maria R Garcia-Cruz
- Materials Science and Engineering, Monash University, Clayton, Victoria 3800, Australia
| | - Nasim Kiaie
- Materials Science and Engineering, Monash University, Clayton, Victoria 3800, Australia
| | - Nicolas H Voelcker
- Materials Science and Engineering, Monash University, Clayton, Victoria 3800, Australia
- Melbourne Centre for Nanofabrication, Victorian Node of the Australian National Fabrication Facility, Clayton, Victoria 3168, Australia
- Monash Institute of Pharmaceutical Sciences, Monash University, 381 Royal Parade, Parkville, Victoria 3052, Australia
- ARC Centre for Cell and Tissue Engineering Technologies, Monash University, Clayton, Victoria 3800, Australia
- CSIRO Manufacturing, Bayview Avenue, Clayton, VIC 3168, Australia
| | - Victor J Cadarso
- Mechanical and Aerospace Engineering, Monash University, Clayton, Victoria 3800, Australia
- Centre to Impact Antimicrobial Resistance, Monash University, Clayton, Victoria 3800, Australia
| | - Jessica E Frith
- Materials Science and Engineering, Monash University, Clayton, Victoria 3800, Australia
- ARC Centre for Cell and Tissue Engineering Technologies, Monash University, Clayton, Victoria 3800, Australia
- Australian Regenerative Medicine Institute, Monash University, Clayton, Victoria 3800, Australia
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Kumar S, Abraham E, Kumar P, Pratap R. Introducing Water Electrolithography. ACS OMEGA 2021; 6:25692-25701. [PMID: 34632225 PMCID: PMC8495873 DOI: 10.1021/acsomega.1c03858] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 07/20/2021] [Accepted: 09/10/2021] [Indexed: 06/13/2023]
Abstract
High-resolution patterning with remarkable customizability has stimulated the invention of numerous scanning probe lithography (SPL) techniques. However, frequent tip damage, substrate-film deterioration, low throughput, and debris amassing in the patterned region are the inherent impediments that have precluded obtaining patterns with high repeatability using SPL. Hence, SPL still has not got wider acceptance for industrial fabrication and technological applications. Here, we introduce a novel SPL technique, named water electrolithography (W-ELG), for patterning at the microscale and potentially at the nanoscale also. The technique operates in the non-contact mode and is based on the selective etching, via an electrochemical process, of a metallic film (e.g., Cr) submerged into water. Here, the working of W-ELG is demonstrated by scribing a pattern into the Cr film by a traversing cathode tip along a preset locus. A numerical analysis establishing the working principles and optimization strategies of W-ELG is also presented. The tip-sample distance and tip-diameter are identified as the critical parameters controlling the pattern creation. W-ELG achieved a throughput of 1.5 × 107 μm2/h, which is the highest among the existing SPL techniques, while drawing 4 μm wide lines, and is also immune to deleterious issues of tip damage, debris amassment, etc. Therefore, the resolution of these inherent impediments of SPL in W-ELG sets the stage for a paradigm shift that may now translate the SPL from academic exploration to industrial fabrications.
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Affiliation(s)
- Sumit Kumar
- Center
for Nano-Science and Engineering, Indian
Institute of Science, Bangalore 560012, India
| | - Ebinesh Abraham
- Center
for Nano-Science and Engineering, Indian
Institute of Science, Bangalore 560012, India
| | - Praveen Kumar
- Department
of Materials Engineering, Indian Institute
of Science, Bangalore 560012, India
| | - Rudra Pratap
- Center
for Nano-Science and Engineering, Indian
Institute of Science, Bangalore 560012, India
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Fruncillo S, Su X, Liu H, Wong LS. Lithographic Processes for the Scalable Fabrication of Micro- and Nanostructures for Biochips and Biosensors. ACS Sens 2021; 6:2002-2024. [PMID: 33829765 PMCID: PMC8240091 DOI: 10.1021/acssensors.0c02704] [Citation(s) in RCA: 25] [Impact Index Per Article: 8.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/14/2022]
Abstract
Since the early 2000s, extensive research has been performed to address numerous challenges in biochip and biosensor fabrication in order to use them for various biomedical applications. These biochips and biosensor devices either integrate biological elements (e.g., DNA, proteins or cells) in the fabrication processes or experience post fabrication of biofunctionalization for different downstream applications, including sensing, diagnostics, drug screening, and therapy. Scalable lithographic techniques that are well established in the semiconductor industry are now being harnessed for large-scale production of such devices, with additional development to meet the demand of precise deposition of various biological elements on device substrates with retained biological activities and precisely specified topography. In this review, the lithographic methods that are capable of large-scale and mass fabrication of biochips and biosensors will be discussed. In particular, those allowing patterning of large areas from 10 cm2 to m2, maintaining cost effectiveness, high throughput (>100 cm2 h-1), high resolution (from micrometer down to nanometer scale), accuracy, and reproducibility. This review will compare various fabrication technologies and comment on their resolution limit and throughput, and how they can be related to the device performance, including sensitivity, detection limit, reproducibility, and robustness.
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Affiliation(s)
- Silvia Fruncillo
- Manchester Institute of Biotechnology, University of Manchester, 131 Princess Street, Manchester, M1 7DN, United Kingdom
- Department of Chemistry, University of Manchester, Oxford Road, Manchester M13 9PL, United Kingdom
- Institute of Materials Research and Engineering, Agency for Science, Technology and Research (A*STAR), 2 Fusionopolis Way, #08-03, Innovis, Singapore 138634, Singapore
| | - Xiaodi Su
- Institute of Materials Research and Engineering, Agency for Science, Technology and Research (A*STAR), 2 Fusionopolis Way, #08-03, Innovis, Singapore 138634, Singapore
- Department of Chemistry, National University of Singapore, Block S8, Level 3, 3 Science Drive, Singapore 117543, Singapore
| | - Hong Liu
- Institute of Materials Research and Engineering, Agency for Science, Technology and Research (A*STAR), 2 Fusionopolis Way, #08-03, Innovis, Singapore 138634, Singapore
| | - Lu Shin Wong
- Manchester Institute of Biotechnology, University of Manchester, 131 Princess Street, Manchester, M1 7DN, United Kingdom
- Department of Chemistry, University of Manchester, Oxford Road, Manchester M13 9PL, United Kingdom
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Ghosh SN, Shastri V, De Sarkar D, Abraham E, Talukder S. Kinematics and kinetics of alternating electric field induced liquid mass transport on chromium thin films. NANOTECHNOLOGY 2021; 32:315304. [PMID: 33851611 DOI: 10.1088/1361-6528/abf779] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/04/2021] [Accepted: 04/13/2021] [Indexed: 06/12/2023]
Abstract
Long range mass transport driven by an electric field has many applications in the fields of nanoscience and technology. Liquid-phase mass transport ranging from the micrometer to the millimeter scale and its application to nanopatterning have been demonstrated on chromium (Cr) thin films using a DC electric field. Under the influence of an electric field, the metal seems to undergo a chemical reaction, and the resulting liquid material flows out radially in all directions. In this study, we have explored the effect of an alternating (AC) electric field on this kind of liquid-phase material transport. Within the scope of this work, mass transport has been studied on Cr films 30 nm thick using an alternating square waveform with frequencies ranging from 100 Hz to 1000 Hz in steps of 50 Hz. The dependence of the material's formation, flow distance, and flow velocity on frequency, for a constant applied root mean square (RMS) voltage, was studied in detail. An analytical model is presented to explain the experimental results. This study, in particular the frequency parameter and the intermittent nature of the applied bias, will help us get a better control over the mass flow process, will lead to better resolutions for the electrolithography process.
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Affiliation(s)
- Swapnendu Narayan Ghosh
- Department of Electrical Engineering & Computer Science, Indian Institute of Science Education & Research Bhopal, Bhopal, India
| | - Vijayendra Shastri
- Centre for Nano Science & Engineering, Indian Institute of Science, Bangalore, India
| | - Debjit De Sarkar
- Department of Electrical Engineering & Computer Science, Indian Institute of Science Education & Research Bhopal, Bhopal, India
| | - Ebinesh Abraham
- Centre for Nano Science & Engineering, Indian Institute of Science, Bangalore, India
| | - Santanu Talukder
- Department of Electrical Engineering & Computer Science, Indian Institute of Science Education & Research Bhopal, Bhopal, India
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Abstract
In recent years, there has been growing demand for wearable chemosensors for their important potential applications in mobile and electronic healthcare, patient self-assessment, human motion monitoring, and so on. Innovations in wearable chemosensors are revolutionizing the modern lifestyle, especially the involvement of both doctors and patients in the modern healthcare system. The facile interaction of wearable chemosensors with the human body makes them favorable and convenient tools for the detection and long-term monitoring of the chemical, biological, and physical status of the human body at a low cost with high performance. In this Minireview, we give a brief overview of the recent advances and developments in the field of wearable chemosensors, summarize the basic types of wearable chemosensors, and discuss their main functions and fabrication methods. At the end of this paper, the future development direction of wearable chemosensors is prospected. With continued interest and attention to this field, new exciting progress is expected in the development of innovative wearable chemosensors.
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Affiliation(s)
- Ruo‐Can Qian
- Key Laboratory for Advanced Materials, School of Chemistry & Molecular EngineeringEast China University of Science and Technology130 Meilong RoadShanghai200237P.R. China
| | - Yi‐Tao Long
- Key Laboratory for Advanced Materials, School of Chemistry & Molecular EngineeringEast China University of Science and Technology130 Meilong RoadShanghai200237P.R. China
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