1
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Jaafar AH, Al Habsi SKS, Braben T, Venables C, Francesconi MG, Stasiuk GJ, Kemp NT. Unique Coexistence of Two Resistive Switching Modes in a Memristor Device Enables Multifunctional Neuromorphic Computing Properties. ACS APPLIED MATERIALS & INTERFACES 2024; 16:43816-43826. [PMID: 39129500 PMCID: PMC11345731 DOI: 10.1021/acsami.4c07820] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/13/2024] [Revised: 08/02/2024] [Accepted: 08/04/2024] [Indexed: 08/13/2024]
Abstract
We report on hybrid memristor devices consisting of germanium dioxide nanoparticles (GeO2 NP) embedded within a poly(methyl methacrylate) (PMMA) thin film. Besides exhibiting forming-free resistive switching and an uncommon "ON" state in pristine conditions, the hybrid (nanocomposite) devices demonstrate a unique form of mixed-mode switching. The observed stopping voltage-dependent switching enables state-of-the-art bifunctional synaptic behavior with short-term (volatile/temporal) and long-term (nonvolatile/nontemporal) modes that are switchable depending on the stopping voltage applied. The short-term memory mode device is demonstrated to further emulate important synaptic functions such as short-term potentiation (STP), short-term depression (STD), paired-pulse facilitation (PPF), post-tetanic potentiation (PTP), spike-voltage-dependent plasticity (SVDP), spike-duration-dependent plasticity (SDDP), and, more importantly, the "learning-forgetting-rehearsal" behavior. The long-term memory mode gives additional long-term potentiation (LTP) and long-term depression (LTD) characteristics for long-term plasticity applications. The work shows a unique coexistence of the two resistive switching modes, providing greater flexibility in device design for future adaptive and reconfigurable neuromorphic computing systems at the hardware level.
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Affiliation(s)
- Ayoub H. Jaafar
- School
of Physics and Astronomy, University of
Nottingham, Nottingham NG7 2RD, U.K.
| | | | - Thomas Braben
- School
of Physics and Astronomy, University of
Nottingham, Nottingham NG7 2RD, U.K.
| | - Craig Venables
- School
of Physics and Astronomy, University of
Nottingham, Nottingham NG7 2RD, U.K.
| | | | - Graeme J. Stasiuk
- Department
of Imaging Chemistry and Biology, School of Biomedical Engineering
and Imaging Sciences, King’s College
London, London SE1 7EH, U.K.
| | - Neil T. Kemp
- School
of Physics and Astronomy, University of
Nottingham, Nottingham NG7 2RD, U.K.
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2
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Yang X, Huang J, Li J, Zhao Y, Li H, Yu Z, Gao S, Cao R. Optically Mediated Nonvolatile Resistive Memory Device Based on Metal-Organic Frameworks. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2024; 36:e2313608. [PMID: 38970535 DOI: 10.1002/adma.202313608] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/13/2023] [Revised: 06/18/2024] [Indexed: 07/08/2024]
Abstract
Metal-organic frameworks (MOFs), characterized by tunable porosity, high surface area, and diverse chemical compositions, offer unique prospects for applications in optoelectronic devices. However, the prevailing research on thin-film devices utilizing MOFs has predominantly focused on aspects such as information storage and photosensitivity, often neglecting the integration of the advantages inherent in both photonics and electronics to enhance optical memory. This work demonstrates a light-mediated resistive memory device based on a highly oriented porphyrin-based MOFs film, in which the resistance state of the memristor is modulated by light, realizing the integration of the perception and storage of optical information. The memristor shows excellent performance with a wide light range of 405-785 nm and a persistent photoconductivity phenomenon up to 8.3 × 103 s. Further mechanistic studies have revealed that the resistive switching effect in the memristor is primarily associated with the reversible formation and annihilation of Ag conductive filaments.
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Affiliation(s)
- Xue Yang
- State Key Laboratory of Structural Chemistry, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou, 350002, China
- School of Life Sciences, Shanghai University, Shanghai, 200444, China
| | - Jian Huang
- State Key Laboratory of Structural Chemistry, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou, 350002, China
- College of Chemistry and Materials Science, Fujian Normal University, Fuzhou, 350007, China
- Fujian College, University of Chinese Academy of Sciences, Fuzhou, 350002, P. R. China
| | - Jingjun Li
- State Key Laboratory of Structural Chemistry, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou, 350002, China
- Fujian College, University of Chinese Academy of Sciences, Fuzhou, 350002, P. R. China
- Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350108, China
| | - Yanqi Zhao
- State Key Laboratory of Structural Chemistry, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou, 350002, China
- Fujian College, University of Chinese Academy of Sciences, Fuzhou, 350002, P. R. China
| | - Hongfang Li
- State Key Laboratory of Structural Chemistry, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou, 350002, China
- Fujian College, University of Chinese Academy of Sciences, Fuzhou, 350002, P. R. China
- Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350108, China
| | - Zhiyang Yu
- State Key Laboratory of Photocatalysis on Energy and Environment, College of Chemistry, Fuzhou University, Fuzhou, 350002, P. R. China
| | - Shuiying Gao
- State Key Laboratory of Structural Chemistry, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou, 350002, China
- Fujian College, University of Chinese Academy of Sciences, Fuzhou, 350002, P. R. China
| | - Rong Cao
- State Key Laboratory of Structural Chemistry, Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences, Fuzhou, 350002, China
- Fujian College, University of Chinese Academy of Sciences, Fuzhou, 350002, P. R. China
- Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou, 350108, China
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3
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Jenderny S, Ochs K, Xue D. A memristive circuit for self-organized network topology formation based on guided axon growth. Sci Rep 2024; 14:16643. [PMID: 39025960 PMCID: PMC11258262 DOI: 10.1038/s41598-024-67400-3] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/31/2023] [Accepted: 07/10/2024] [Indexed: 07/20/2024] Open
Abstract
Circuit implementations of neuronal networks so far have been focusing on synaptic weight changes as network growth principles. Besides these weight changes, however, it is also useful to incorporate additional network growth principles such as guided axon growth and pruning. These allow for dynamical signal delays and a higher degree of self-organization, and can thus lead to novel circuit design principles. In this work we develop an ideal, bio-inspired electrical circuit mimicking growth and pruning controlled by guidance cues. The circuit is based on memristively coupled neuronal oscillators. As coupling element, we use memsensors consisting of a general sensor, two gradient sensors, and two memristors. The oscillators and memsensors are arranged in a grid structure, where oscillators and memsensors realize nodes and edges, respectively. This allows for arbitrary 2D growth scenarios with axon growth controlled by guidance cues. Simulation results show that the circuit successfully mimics a biological example in which two neurons initially grow towards two target neurons, where undesired connections are pruned later on.
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Affiliation(s)
- Sebastian Jenderny
- Chair of Digital Communication Systems, Ruhr-University Bochum, Universitätsstraße 150, 44801, Bochum, Germany.
| | - Karlheinz Ochs
- Chair of Digital Communication Systems, Ruhr-University Bochum, Universitätsstraße 150, 44801, Bochum, Germany
| | - Daniel Xue
- Department of Electrical and Computer Engineering, University of Virginia, Main Office: Room C210 Thornton Hall, 351 McCormick Road, PO Box 400743, Charlottesville, 22904, USA
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4
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Jetty P, Mohanan KU, Jammalamadaka SN. α-Fe 2O 3-based artificial synaptic RRAM device for pattern recognition using artificial neural networks. NANOTECHNOLOGY 2023; 34:265703. [PMID: 36975196 DOI: 10.1088/1361-6528/acc811] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/07/2022] [Accepted: 03/28/2023] [Indexed: 06/18/2023]
Abstract
We report on theα-Fe2O3-based artificial synaptic resistive random access memory device, which is a promising candidate for artificial neural networks (ANN) to recognize the images. The device consists of a structure Ag/α-Fe2O3/FTO and exhibits non-volatility with analog resistive switching characteristics. We successfully demonstrated synaptic learning rules such as long-term potentiation, long-term depression, and spike time-dependent plasticity. In addition, we also presented off-chip training to obtain good accuracy by backpropagation algorithm considering the synaptic weights obtained fromα-Fe2O3based artificial synaptic device. The proposedα-Fe2O3-based device was tested with the FMNIST and MNIST datasets and obtained a high pattern recognition accuracy of 88.06% and 97.6% test accuracy respectively. Such a high pattern recognition accuracy is attributed to the combination of the synaptic device performance as well as the novel weight mapping strategy used in the present work. Therefore, the ideal device characteristics and high ANN performance showed that the fabricated device can be useful for practical ANN implementation.
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Affiliation(s)
- Prabana Jetty
- Magnetic Materials and Device Physics Laboratory, Department of Physics, Indian Institute of Technology Hyderabad, Hyderabad, 502 284, India
| | - Kannan Udaya Mohanan
- Department of Electronic Engineering, Gachon University, Seongnam-si, Gyeonggi-do, 13120, Republic of Korea
| | - S Narayana Jammalamadaka
- Magnetic Materials and Device Physics Laboratory, Department of Physics, Indian Institute of Technology Hyderabad, Hyderabad, 502 284, India
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5
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Kim D, Lee HJ, Yang TJ, Choi WS, Kim C, Choi SJ, Bae JH, Kim DM, Kim S, Kim DH. Compact SPICE Model of Memristor with Barrier Modulated Considering Short- and Long-Term Memory Characteristics by IGZO Oxygen Content. MICROMACHINES 2022; 13:1630. [PMID: 36295983 PMCID: PMC9610060 DOI: 10.3390/mi13101630] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 09/09/2022] [Revised: 09/20/2022] [Accepted: 09/26/2022] [Indexed: 06/16/2023]
Abstract
This paper introduces a compact SPICE model of a two-terminal memory with a Pd/Ti/IGZO/p+-Si structure. In this paper, short- and long-term components are systematically separated and applied in each model. Such separations are conducted by the applied bias and oxygen flow rate (OFR) during indium gallium zinc oxide (IGZO) deposition. The short- and long-term components in the potentiation and depression curves are modeled by considering the process (OFR of IGZO) and bias conditions. The compact SPICE model with the physical mechanism of SiO2 modulation is introduced, which can be useful for optimizing the specification of memristor devices.
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Affiliation(s)
- Donguk Kim
- School of Electrical Engineering, Kookmin University, Seoul 02707, Korea
| | - Hee Jun Lee
- School of Electrical Engineering, Kookmin University, Seoul 02707, Korea
| | - Tae Jun Yang
- School of Electrical Engineering, Kookmin University, Seoul 02707, Korea
| | - Woo Sik Choi
- School of Electrical Engineering, Kookmin University, Seoul 02707, Korea
| | - Changwook Kim
- School of Electrical Engineering, Kookmin University, Seoul 02707, Korea
| | - Sung-Jin Choi
- School of Electrical Engineering, Kookmin University, Seoul 02707, Korea
| | - Jong-Ho Bae
- School of Electrical Engineering, Kookmin University, Seoul 02707, Korea
| | - Dong Myong Kim
- School of Electrical Engineering, Kookmin University, Seoul 02707, Korea
| | - Sungjun Kim
- Division of Electronics and Electrical Engineering, Dongguk University, Seoul 04620, Korea
| | - Dae Hwan Kim
- School of Electrical Engineering, Kookmin University, Seoul 02707, Korea
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6
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Review on the Basic Circuit Elements and Memristor Interpretation: Analysis, Technology and Applications. JOURNAL OF LOW POWER ELECTRONICS AND APPLICATIONS 2022. [DOI: 10.3390/jlpea12030044] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 12/10/2022]
Abstract
Circuit or electronic components are useful elements allowing the realization of different circuit functionalities. The resistor, capacitor and inductor represent the three commonly known basic passive circuit elements owing to their fundamental nature relating them to the four circuit variables, namely voltage, magnetic flux, current and electric charge. The memory resistor (or memristor) was claimed to be the fourth basic passive circuit element, complementing the resistor, capacitor and inductor. This paper presents a review on the four basic passive circuit elements. After a brief recall on the first three known basic passive circuit elements, a thorough description of the memristor follows. Memristor sparks interest in the scientific community due to its interesting features, for example nano-scalability, memory capability, conductance modulation, connection flexibility and compatibility with CMOS technology, etc. These features among many others are currently in high demand on an industrial scale. For this reason, thousands of memristor-based applications are reported. Hence, the paper presents an in-depth overview of the philosophical argumentations of memristor, technologies and applications.
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7
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Bian H, Goh YY, Liu Y, Ling H, Xie L, Liu X. Stimuli-Responsive Memristive Materials for Artificial Synapses and Neuromorphic Computing. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2021; 33:e2006469. [PMID: 33837601 DOI: 10.1002/adma.202006469] [Citation(s) in RCA: 31] [Impact Index Per Article: 10.3] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Received: 09/22/2020] [Revised: 12/03/2020] [Indexed: 06/12/2023]
Abstract
Neuromorphic computing holds promise for building next-generation intelligent systems in a more energy-efficient way than the conventional von Neumann computing architecture. Memristive hardware, which mimics biological neurons and synapses, offers high-speed operation and low power consumption, enabling energy- and area-efficient, brain-inspired computing. Here, recent advances in memristive materials and strategies that emulate synaptic functions for neuromorphic computing are highlighted. The working principles and characteristics of biological neurons and synapses, which can be mimicked by memristive devices, are presented. Besides device structures and operation with different external stimuli such as electric, magnetic, and optical fields, how memristive materials with a rich variety of underlying physical mechanisms can allow fast, reliable, and low-power neuromorphic applications is also discussed. Finally, device requirements are examined and a perspective on challenges in developing memristive materials for device engineering and computing science is given.
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Affiliation(s)
- Hongyu Bian
- Department of Chemistry, National University of Singapore, Singapore, 117543, Singapore
| | - Yi Yiing Goh
- Department of Chemistry, National University of Singapore, Singapore, 117543, Singapore
- NUS Graduate School for Integrative Sciences and Engineering, National University of Singapore, Singapore, 119077, Singapore
| | - Yuxia Liu
- Department of Chemistry, National University of Singapore, Singapore, 117543, Singapore
- Center for Functional Materials, National University of Singapore Suzhou Research Institute, Suzhou, 215123, China
| | - Haifeng Ling
- Key Laboratory for Organic Electronics and Information Displays and Institute of Advanced Materials (IAM), Jiangsu National Synergetic Innovation Center for Advanced Materials (SICAM), Nanjing University of Posts and Telecommunications, Nanjing, 210023, China
| | - Linghai Xie
- Key Laboratory for Organic Electronics and Information Displays and Institute of Advanced Materials (IAM), Jiangsu National Synergetic Innovation Center for Advanced Materials (SICAM), Nanjing University of Posts and Telecommunications, Nanjing, 210023, China
| | - Xiaogang Liu
- Department of Chemistry, National University of Singapore, Singapore, 117543, Singapore
- Center for Functional Materials, National University of Singapore Suzhou Research Institute, Suzhou, 215123, China
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8
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Zhao Y, Tsai TY, Wu G, Ó Coileáin C, Zhao YF, Zhang D, Hung KM, Chang CR, Wu YR, Wu HC. Graphene/SnS 2 van der Waals Photodetector with High Photoresponsivity and High Photodetectivity for Broadband 365-2240 nm Detection. ACS APPLIED MATERIALS & INTERFACES 2021; 13:47198-47207. [PMID: 34546715 DOI: 10.1021/acsami.1c11534] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
Abstract
The fabrication of graphene/SnS2 van der Waals photodetectors and their photoelectrical properties are systematically investigated. It was found that a dry transferred graphene/SnS2 van der Waals heterostructure had a broadband sensing range from ultraviolet (365 nm) to near-infrared (2.24 μm) and respective improved responsivities and photodetectivities of 7.7 × 103 A/W and 8.9 × 1013 jones at 470 nm and 2 A/W and 1.8 × 1010 jones at 1064 nm. Moreover, positive and negative photoconductance effects were observed when the photodetectors were illuminated by photon sources with energies greater and smaller than the bandgap of SnS2, respectively. The photoresponsivity (R) versus incident power density (P) follows the empirical law R ∝ Pinβ, with β > -1 for positive photoconductance effects and β < -1 for negative photoconductance effects. On the basis of the Fowler-Nordheim tunneling model and a Poisson and drift-diffusion simulation, we show quantitatively that the barrier height and barrier width of the heterostructure photodetector could be controlled by a laser and an external electrical field through a photogating effect generated by carriers trapped at the interface, which could be used to tune the separation and transport of photogenerated carriers. Our results may be useful for the design of high performance van der Waals heterojunction photodetectors.
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Affiliation(s)
- Yue Zhao
- School of Physics, Beijing Institute of Technology, Beijing 100081, P. R. China
| | - Tsung-Yin Tsai
- Graduate Institute of Photonics and Optoelectronics and Department of Electrical Engineering, National Taiwan University, Taipei 10617, Taiwan
| | - Gang Wu
- School of Physics, Beijing Institute of Technology, Beijing 100081, P. R. China
| | - Cormac Ó Coileáin
- Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN) and Advanced Materials and Bioengineering Research (AMBER), School Chemistry, Trinity College, Dublin, Ireland
| | - Yan-Feng Zhao
- School of Physics, Beijing Institute of Technology, Beijing 100081, P. R. China
| | - Duan Zhang
- Elementary Educational College, Beijing key Laboratory for Nano-Photonics and Nano-Structure, Capital Normal University, Beijing 100048, P. R. China
| | - Kuan-Ming Hung
- Department of Electronics Engineering, National Kaohsiung University of Science and Technology, Kaohsiung 807, Taiwan
| | - Ching-Ray Chang
- Department of Physics, National Taiwan University, Taipei 106, Taiwan
| | - Yuh-Renn Wu
- Graduate Institute of Photonics and Optoelectronics and Department of Electrical Engineering, National Taiwan University, Taipei 10617, Taiwan
| | - Han-Chun Wu
- School of Physics, Beijing Institute of Technology, Beijing 100081, P. R. China
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9
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Wang L, Zhu H, Wen D. Bioresistive Random-Access Memory with Gold Nanoparticles that Generate the Coulomb Blocking Effect Can Realize Multilevel Data Storage and Synapse Simulation. J Phys Chem Lett 2021; 12:8956-8962. [PMID: 34505773 DOI: 10.1021/acs.jpclett.1c02815] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
Abstract
Gold nanoparticles (Au NPs) have good biocompatibility and special quantum effects. In this Letter, we embedded Au NPs into silkworm hemolymph (SH) to improve the performance of the device and fabricated Al/SH:Au NPs/indium tin oxide (ITO)/glass resistive random access memory. The device exhibits a bipolar switching behavior with a retention time of 104 s. Compared with the Al/SH/ITO device without Au NPs, the device has a higher ON/OFF current ratio (>105) and a smaller Vreset. The improvement in device performance is attributed to the fact that Au NPs act as the electron-trapping center in the device; a Coulomb blockade occurs after electrons are trapped, thereby increasing the resistance of the device in the high-resistance state. Using optimized devices can realize multilevel data storage and can also simulate synaptic characteristics such as potentiation and depression. The device is expected to be applied to high-density, low-cost, degradable, and biocompatible storage devices and neuromorphic computing in the future.
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Affiliation(s)
- Lu Wang
- School of Electronic Engineering, HLJ Province Key Laboratory of Senior-Education for Electronic Engineering, Heilongjiang University, Harbin 150080, China
| | - Hongyu Zhu
- School of Electronic Engineering, HLJ Province Key Laboratory of Senior-Education for Electronic Engineering, Heilongjiang University, Harbin 150080, China
| | - Dianzhong Wen
- School of Electronic Engineering, HLJ Province Key Laboratory of Senior-Education for Electronic Engineering, Heilongjiang University, Harbin 150080, China
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10
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Nonideal resistive and synaptic characteristics in Ag/ZnO/TiN device for neuromorphic system. Sci Rep 2021; 11:16601. [PMID: 34400734 PMCID: PMC8367949 DOI: 10.1038/s41598-021-96197-8] [Citation(s) in RCA: 10] [Impact Index Per Article: 3.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/30/2021] [Accepted: 08/05/2021] [Indexed: 11/14/2022] Open
Abstract
Ideal resistive switching in resistive random-access memory (RRAM) should be ensured for synaptic devices in neuromorphic systems. We used an Ag/ZnO/TiN RRAM structure to investigate the effects of nonideal resistive switching, such as an unstable high-resistance state (HRS), negative set (N-set), and temporal disconnection, during the set process and the conductance saturation feature for synaptic applications. The device shows an I–V curve based on the positive set in the bipolar resistive switching mode. In 1000 endurance tests, we investigated the changes in the HRS, which displays large fluctuations compared with the stable low-resistance state, and the negative effect on the performance of the device resulting from such an instability. The impact of the N-set, which originates from the negative voltage on the top electrode, was studied through the process of intentional N-set through the repetition of 10 ON/OFF cycles. The Ag/ZnO/TiN device showed saturation characteristics in conductance modulation according to the magnitude of the applied pulse. Therefore, potentiation or depression was performed via consecutive pulses with diverse amplitudes. We also studied the spontaneous conductance decay in the saturation feature required to emulate short-term plasticity.
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11
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Palhares JHQ, Beilliard Y, Alibart F, Bonturim E, de Florio DZ, Fonseca FC, Drouin D, Ferlauto AS. Oxygen vacancy engineering of TaO x-based resistive memories by Zr doping for improved variability and synaptic behavior. NANOTECHNOLOGY 2021; 32:405202. [PMID: 34167106 DOI: 10.1088/1361-6528/ac0e67] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/21/2021] [Accepted: 06/23/2021] [Indexed: 06/13/2023]
Abstract
Resistive switching (RS) devices are promising forms of non-volatile memory. However, one of the biggest challenges for RS memory applications is the device-to-device (D2D) variability, which is related to the intrinsic stochastic formation and configuration of oxygen vacancy (VO) conductive filaments (CFs). In order to reduce the D2D variability, control over the formation and configuration of oxygen vacancies is paramount. In this study, we report on the Zr doping of TaOx-based RS devices prepared by pulsed-laser deposition as an efficient means of reducing the VOformation energy and increasing the confinement of CFs, thus reducing D2D variability. Our findings were supported by XPS, spectroscopic ellipsometry and electronic transport analysis. Zr-doped films showed increased VOconcentration and more localized VOs, due to the interaction with Zr. DC and pulse mode electrical characterization showed that the D2D variability was decreased by a factor of seven, the resistance window was doubled, and a more gradual and monotonic long-term potentiation/depression in pulse switching was achieved in forming-free Zr:TaOxdevices, thus displaying promising performance for artificial synapse applications.
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Affiliation(s)
- João H Quintino Palhares
- CECS, Federal University of ABC, Santo André 09210-580, SP, Brazil
- Institut Interdisciplinaire d'Innovation Technologique (3IT), Université de Sherbrooke, Sherbrooke J1K 0A5, Canada
| | - Yann Beilliard
- Institut Interdisciplinaire d'Innovation Technologique (3IT), Université de Sherbrooke, Sherbrooke J1K 0A5, Canada
- Laboratoire Nanotechnologies Nanosystèmes (LN2)-CNRS UMI-3463-3IT, CNRS, Sherbrooke J1K 0A5, Canada
- Institut Quantique (IQ), Université de Sherbrooke, Sherbrooke J1K 2R1, Canada
| | - Fabien Alibart
- Institut Interdisciplinaire d'Innovation Technologique (3IT), Université de Sherbrooke, Sherbrooke J1K 0A5, Canada
- Laboratoire Nanotechnologies Nanosystèmes (LN2)-CNRS UMI-3463-3IT, CNRS, Sherbrooke J1K 0A5, Canada
- Institute of Electronics, Microelectronics and Nanotechnology (IEMN), Université de Lille, F-59650, Villeneuve d'Ascq, France
| | - Everton Bonturim
- Department of Chemistry, School of Engineering, Mackenzie Presbyterian University, 01302907, São Paulo, SP, Brazil
| | | | - Fabio C Fonseca
- Nuclear and Energy Research Institute, IPEN-CNEN, São Paulo, 05508-000, Brazil
| | - Dominique Drouin
- Institut Interdisciplinaire d'Innovation Technologique (3IT), Université de Sherbrooke, Sherbrooke J1K 0A5, Canada
- Laboratoire Nanotechnologies Nanosystèmes (LN2)-CNRS UMI-3463-3IT, CNRS, Sherbrooke J1K 0A5, Canada
- Institut Quantique (IQ), Université de Sherbrooke, Sherbrooke J1K 2R1, Canada
| | - Andre S Ferlauto
- CECS, Federal University of ABC, Santo André 09210-580, SP, Brazil
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12
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He N, Tao L, Zhang Q, Liu X, Lian X, Hu ET, Sheng Y, Xu F, Tong Y. Fabrication and investigation of quaternary Ag-In-Zn-S quantum dots-based memristors with ultralow power and multiple resistive switching behaviors. NANOTECHNOLOGY 2021; 32:195205. [PMID: 33540395 DOI: 10.1088/1361-6528/abe32e] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/12/2023]
Abstract
Quaternary Ag-In-Zn-S (AIZS) quantum dots (QDs) play critical roles in various applications since they have advantages of combining superior optical and electrical features, such as tunable fluorescence emission and high carrier mobilities. However, the application of semiconductor AIZS QDs in brain-inspired devices (e.g. memristor) has been rarely reported. In this work, the tunable volatile threshold switching (TS) and non-volatile memory switching (MS) behaviors have been obtained in a memristor composed of AIZS QDs by regulating the magnitude of compliance current. Additionally, the innovative Ag/AIZS structure devices without traditional oxide layer exhibit low operation voltage (∼0.25 V) and programming current (100 nA) under the TS mode. Moreover, the devices achieve reproducible bipolar resistive switching (RS) behaviors with large ON/OFF ratio of ∼105, ultralow power consumption of ∼10-10 W, and good device-to-device uniformity under the MS mode. Furthermore, the charge transport mechanisms of the high- and low-resistance states under the positive and negative bias have been analyzed with space-charge-limited-current and filament conduction models, respectively. This work not only validates the potential of AIZS QDs acting as dielectric layer in RS devices but also provides a new guideline for designing ultralow power and multiple RS characteristics devices.
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Affiliation(s)
- Nan He
- College of Electronic and Optical Engineering & College of Microelectronics, Nanjing University of Posts and Telecommunications, Nanjing 210023, People's Republic of China
| | - Langyi Tao
- College of Electronic and Optical Engineering & College of Microelectronics, Nanjing University of Posts and Telecommunications, Nanjing 210023, People's Republic of China
| | - Qiangqiang Zhang
- College of Electronic and Optical Engineering & College of Microelectronics, Nanjing University of Posts and Telecommunications, Nanjing 210023, People's Republic of China
| | - Xiaoyan Liu
- College of Electronic and Optical Engineering & College of Microelectronics, Nanjing University of Posts and Telecommunications, Nanjing 210023, People's Republic of China
| | - Xiaojuan Lian
- College of Electronic and Optical Engineering & College of Microelectronics, Nanjing University of Posts and Telecommunications, Nanjing 210023, People's Republic of China
| | - Er-Tao Hu
- College of Electronic and Optical Engineering & College of Microelectronics, Nanjing University of Posts and Telecommunications, Nanjing 210023, People's Republic of China
| | - Yang Sheng
- Jiangsu Key Laboratory of Environmentally Friendly Polymeric Materials, School of Materials Science and Engineering, Changzhou University, Changzhou 213164, People's Republic of China
| | - Feng Xu
- College of Electronic and Optical Engineering & College of Microelectronics, Nanjing University of Posts and Telecommunications, Nanjing 210023, People's Republic of China
| | - Yi Tong
- College of Electronic and Optical Engineering & College of Microelectronics, Nanjing University of Posts and Telecommunications, Nanjing 210023, People's Republic of China
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13
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Sahu DP, Jetty P, Jammalamadaka SN. Graphene oxide based synaptic memristor device for neuromorphic computing. NANOTECHNOLOGY 2021; 32:155701. [PMID: 33412536 DOI: 10.1088/1361-6528/abd978] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.7] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/12/2023]
Abstract
Brain-inspired neuromorphic computing which consist neurons and synapses, with an ability to perform complex information processing has unfolded a new paradigm of computing to overcome the von Neumann bottleneck. Electronic synaptic memristor devices which can compete with the biological synapses are indeed significant for neuromorphic computing. In this work, we demonstrate our efforts to develop and realize the graphene oxide (GO) based memristor device as a synaptic device, which mimic as a biological synapse. Indeed, this device exhibits the essential synaptic learning behavior including analog memory characteristics, potentiation and depression. Furthermore, spike-timing-dependent-plasticity learning rule is mimicked by engineering the pre- and post-synaptic spikes. In addition, non-volatile properties such as endurance, retentivity, multilevel switching of the device are explored. These results suggest that Ag/GO/fluorine-doped tin oxide memristor device would indeed be a potential candidate for future neuromorphic computing applications.
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Affiliation(s)
- Dwipak Prasad Sahu
- Magnetic Materials and Device Physics Laboratory, Department of Physics, Indian Institute of Technology Hyderabad, Hyderabad-502 285, India
| | - Prabana Jetty
- Magnetic Materials and Device Physics Laboratory, Department of Physics, Indian Institute of Technology Hyderabad, Hyderabad-502 285, India
| | - S Narayana Jammalamadaka
- Magnetic Materials and Device Physics Laboratory, Department of Physics, Indian Institute of Technology Hyderabad, Hyderabad-502 285, India
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14
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Wang Y, Wu S, Tian L, Shi L. SSM: a high-performance scheme for in situ training of imprecise memristor neural networks. Neurocomputing 2020. [DOI: 10.1016/j.neucom.2020.04.130] [Citation(s) in RCA: 8] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/30/2022]
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15
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Improving the Recognition Accuracy of Memristive Neural Networks via Homogenized Analog Type Conductance Quantization. MICROMACHINES 2020; 11:mi11040427. [PMID: 32325690 PMCID: PMC7231361 DOI: 10.3390/mi11040427] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 03/26/2020] [Revised: 04/16/2020] [Accepted: 04/17/2020] [Indexed: 11/17/2022]
Abstract
Conductance quantization (QC) phenomena occurring in metal oxide based memristors demonstrate great potential for high-density data storage through multilevel switching, and analog synaptic weight update for effective training of the artificial neural networks. Continuous, linear and symmetrical modulation of the device conductance is a critical issue in QC behavior of memristors. In this contribution, we employ the scanning probe microscope (SPM) assisted electrode engineering strategy to control the ion migration process to construct single conductive filaments in Pt/HfOx/Pt devices. Upon deliberate tuning and evolution of the filament, 32 half integer quantized conductance states in the 16 G0 to 0.5 G0 range with enhanced distribution uniformity was achieved. Simulation results revealed that the numbers of the available QC states and fluctuation of the conductance at each state play an important role in determining the overall performance of the neural networks. The 32-state QC behavior of the hafnium oxide device shows improved recognition accuracy approaching 90% for handwritten digits, based on analog type operation of the multilayer perception (MLP) neural network.
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16
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Roy S, Niu G, Wang Q, Wang Y, Zhang Y, Wu H, Zhai S, Shi P, Song S, Song Z, Ye ZG, Wenger C, Schroeder T, Xie YH, Meng X, Luo W, Ren W. Toward a Reliable Synaptic Simulation Using Al-Doped HfO 2 RRAM. ACS APPLIED MATERIALS & INTERFACES 2020; 12:10648-10656. [PMID: 32043352 DOI: 10.1021/acsami.9b21530] [Citation(s) in RCA: 26] [Impact Index Per Article: 6.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
The potential in a synaptic simulation for neuromorphic computation has revived the research interest of resistive random access memory (RRAM). However, novel applications require reliable multilevel resistive switching (RS), which still represents a challenge. We demonstrate in this work the achievement of reliable HfO2-based RRAM devices for synaptic simulation by performing the Al doping and the postdeposition annealing (PDA). Transmission electron microscopy and operando hard X-ray photoelectron spectroscopy results reveal the positive impact of Al doping on the formation of oxygen vacancies. Detailed I-V characterizations demonstrate that the 16.5% Al doping concentration leads to better RS properties of the device. In comparison with the other reported results based on HfO2 RRAM, our devices with 16.5% Al-doping and PDA at 450 °C show better reliable multilevel RS (∼20 levels) performance and an increased on/off ratio. The 16.5% Al:HfO2 sample with PDA at 450 °C shows good potentiation/depression characteristics with low pulse width (10 μs) along with a good On/Off ratio (>1000), good data retention at room temperature, and high temperature and good program/erase endurance characteristics with a pulse width of 50 ns. The synapse features including potentiation, depression, and spike time-dependent plasticity were successfully achieved using optimized Al-HfO2 RRAM devices. Our results demonstrate the beneficial effects of Al doping and PDA on the enhancement of the performances of RRAM devices for the synaptic simulation in neuromorphic computing applications.
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Affiliation(s)
- Sourav Roy
- Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, School of Electronic Science and Engineering, Xi'an Jiaotong University, Xi'an 710049, China
| | - Gang Niu
- Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, School of Electronic Science and Engineering, Xi'an Jiaotong University, Xi'an 710049, China
| | - Qiang Wang
- Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, School of Electronic Science and Engineering, Xi'an Jiaotong University, Xi'an 710049, China
| | - Yankun Wang
- Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, School of Electronic Science and Engineering, Xi'an Jiaotong University, Xi'an 710049, China
| | - Yijun Zhang
- Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, School of Electronic Science and Engineering, Xi'an Jiaotong University, Xi'an 710049, China
| | - Heping Wu
- Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, School of Electronic Science and Engineering, Xi'an Jiaotong University, Xi'an 710049, China
| | - Shijie Zhai
- Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, School of Electronic Science and Engineering, Xi'an Jiaotong University, Xi'an 710049, China
| | - Peng Shi
- Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, School of Electronic Science and Engineering, Xi'an Jiaotong University, Xi'an 710049, China
| | - Sannian Song
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 865 Changning Road, Shanghai 20050, China
| | - Zhitang Song
- State Key Laboratory of Functional Materials for Informatics, Shanghai Institute of Microsystem and Information Technology, Chinese Academy of Sciences, 865 Changning Road, Shanghai 20050, China
| | - Zuo-Guang Ye
- Department of Chemistry and 4D LABS, Simon Fraser University, Burnaby, British Columbia V5A 1S6, Canada
| | - Christian Wenger
- IHP-Leibniz-Institut für Innovative Mikroelektronik, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany
| | - Thomas Schroeder
- Department of Materials Science and Engineering, University of California, Los Angeles, Los Angeles, California 90095, United States
| | - Ya-Hong Xie
- Department of Materials Science and Engineering, University of California, Los Angeles, Los Angeles, California 90095, United States
| | - Xiangjian Meng
- National Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China
| | - Wenbo Luo
- State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu 611731 China
| | - Wei Ren
- Electronic Materials Research Laboratory, Key Laboratory of the Ministry of Education & International Center for Dielectric Research, School of Electronic Science and Engineering, Xi'an Jiaotong University, Xi'an 710049, China
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17
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Wang Y, Zhang Z, Xu M, Yang Y, Ma M, Li H, Pei J, Shi L. Self-Doping Memristors with Equivalently Synaptic Ion Dynamics for Neuromorphic Computing. ACS APPLIED MATERIALS & INTERFACES 2019; 11:24230-24240. [PMID: 31119929 DOI: 10.1021/acsami.9b04901] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
The accumulation and extrusion of Ca2+ ions in the pre- and post-synaptic terminals play crucial roles in initiating short- and long-term plasticity (STP and LTP) in biological synapses, respectively. Mimicking these synaptic behaviors by electronic devices represents a vital step toward realization of neuromorphic computing. However, the majority of reported synaptic devices usually focus on the emulation of qualitatively synaptic behaviors; devices that can truly emulate the physical behavior of the synaptic Ca2+ ion dynamics in STP and LTP are rarely reported. In this work, Ag/Ag:Ta2O5/Pt self-doping memristors were developed to equivalently emulate the Ca2+ ion dynamics of biological synapses. With conductive filaments from double sources, these memristors produced unique double-switching behavior under voltage sweeps and demonstrated several essential synaptic behaviors under pulse stimuli, including STP, LTP, STP to LTP transition, and spike-rate-dependent plasticity. Experimental results and nanoparticle dynamic simulations both showed that Ag atoms from double sources could mimic Ca2+ dynamics in the pre- and post-synaptic terminals under stimuli. A perceptron network with an STP to LTP transition layer based on the self-doping memristors was also introduced and evaluated; simulations showed that this network could solve noisy figure recognition tasks efficiently. All of these results indicate that the self-doping memristors are promising components for future hardware creation of neuromorphic systems and emulate the characteristics of the brain.
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18
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Xu R, Jang H, Lee MH, Amanov D, Cho Y, Kim H, Park S, Shin HJ, Ham D. Vertical MoS 2 Double-Layer Memristor with Electrochemical Metallization as an Atomic-Scale Synapse with Switching Thresholds Approaching 100 mV. NANO LETTERS 2019; 19:2411-2417. [PMID: 30896171 DOI: 10.1021/acs.nanolett.8b05140] [Citation(s) in RCA: 125] [Impact Index Per Article: 25.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
Atomically thin two-dimensional (2D) materials-such as transition metal dichalcogenide (TMD) monolayers and hexagonal boron nitride (hBN)-and their van der Waals layered preparations have been actively researched to build electronic devices such as field-effect transistors, junction diodes, tunneling devices, and, more recently, memristors. Two-dimensional material memristors built in lateral form, with horizontal placement of electrodes and the 2D material layers, have provided an intriguing window into the motions of ions along the atomically thin layers. On the other hand, 2D material memristors built in vertical form with top and bottom electrodes sandwiching 2D material layers may provide opportunities to explore the extreme of the memristive performance with the atomic-scale interelectrode distance. In particular, they may help push the switching voltages to a lower limit, which is an important pursuit in memristor research in general, given their roles in neuromorphic computing. In fact, recently Akinwande et al. performed a pioneering work to demonstrate a vertical memristor that sandwiches a single MoS2 monolayer between two inert Au electrodes, but it could neither attain switching voltages below 1 V nor control the switching polarity, obtaining both unipolar and bipolar switching devices. Here, we report a vertical memristor that sandwiches two MoS2 monolayers between an active Cu top electrode and an inert Au bottom electrode. Cu ions diffuse through the MoS2 double layers to form atomic-scale filaments. The atomic-scale thickness, combined with the electrochemical metallization, lowers switching voltages down to 0.1-0.2 V, on par with the state of the art. Furthermore, our memristor achieves consistent bipolar and analogue switching, and thus exhibits the synapse-like learning behavior such as the spike-timing dependent plasticity (STDP), the very first STDP demonstration among all 2D-material-based vertical memristors. The demonstrated STDP with low switching voltages is promising not only for low-power neuromorphic computing, but also from the point of view that the voltage range approaches the biological action potentials, opening up a possibility for direct interfacing with mammalian neuronal networks.
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Affiliation(s)
- Renjing Xu
- School of Engineering and Applied Sciences , Harvard University , Cambridge , Massachusetts 02138 , United States
| | - Houk Jang
- School of Engineering and Applied Sciences , Harvard University , Cambridge , Massachusetts 02138 , United States
| | - Min-Hyun Lee
- Samsung Advanced Institute of Technology , Samsung Electronics , Suwon 443-803 , South Korea
| | - Dovran Amanov
- School of Engineering and Applied Sciences , Harvard University , Cambridge , Massachusetts 02138 , United States
| | - Yeonchoo Cho
- Samsung Advanced Institute of Technology , Samsung Electronics , Suwon 443-803 , South Korea
| | - Haeryong Kim
- Samsung Advanced Institute of Technology , Samsung Electronics , Suwon 443-803 , South Korea
| | - Seongjun Park
- Samsung Advanced Institute of Technology , Samsung Electronics , Suwon 443-803 , South Korea
| | - Hyeon-Jin Shin
- Samsung Advanced Institute of Technology , Samsung Electronics , Suwon 443-803 , South Korea
| | - Donhee Ham
- School of Engineering and Applied Sciences , Harvard University , Cambridge , Massachusetts 02138 , United States
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19
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Yang M, Zhao X, Tang Q, Cui N, Wang Z, Tong Y, Liu Y. Stretchable and conformable synapse memristors for wearable and implantable electronics. NANOSCALE 2018; 10:18135-18144. [PMID: 30152837 DOI: 10.1039/c8nr05336g] [Citation(s) in RCA: 28] [Impact Index Per Article: 4.7] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
Stretchable and conformable synapse memristors that can emulate the behaviour of the biological neural system and well adhere onto the curved surfaces simultaneously are desirable for the development of imperceptible wearable and implantable neuromorphic computing systems. Previous synapse memristors have been mainly limited to rigid substrates. Herein, a stretchable and conformable memristor with fundamental synaptic functions including potentiation/depression characteristics, long/short-term plasticity (STP and LTP), "learning-forgetting-relearning" behaviour, and spike-rate-dependent and spike-amplitude-dependent plasticity is demonstrated based on highly elastic Ag nanoparticle-doped thermoplastic polyurethanes (TPU : Ag NPs) and polydimethylsiloxane (PDMS). The memristor can be well operated even at 60% strain and can be well conformed onto the curved surfaces. The formed conductive filament (CF) obtained from the movement of Ag nanoparticle clusters under the locally enhanced electric field gives rise to resistance switching of our memristor. These results indicate a feasible strategy to realize stretchable and conformable synaptic devices for the development of new-generation artificial intelligence computers.
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Affiliation(s)
- Mihua Yang
- Key Laboratory of UV Light Emitting Materials and Technology under Ministry of Education, Northeast Normal University, Changchun 130024, P. R. China.
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20
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Feali MS, Ahmadi A, Hayati M. Implementation of adaptive neuron based on memristor and memcapacitor emulators. Neurocomputing 2018. [DOI: 10.1016/j.neucom.2018.05.006] [Citation(s) in RCA: 23] [Impact Index Per Article: 3.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/16/2022]
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21
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Zhou X, Hu X, Jin B, Yu J, Liu K, Li H, Zhai T. Highly Anisotropic GeSe Nanosheets for Phototransistors with Ultrahigh Photoresponsivity. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2018; 5:1800478. [PMID: 30128256 PMCID: PMC6096999 DOI: 10.1002/advs.201800478] [Citation(s) in RCA: 69] [Impact Index Per Article: 11.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/27/2018] [Revised: 05/11/2018] [Indexed: 05/19/2023]
Abstract
2D GeSe possesses black phosphorous-analog-layered structure and shows excellent environmental stability, as well as highly anisotropic in-plane properties. Additionally, its high absorption efficiency in the visible range and high charge carrier mobility render it promising for applications in optoelectronics. However, most reported GeSe-based photodetectors show frustrating performance especially in photoresponsivity. Herein, a 2D GeSe-based phototransistor with an ultrahigh photoresponsivity is demonstrated. Its optimized photoresponsivity can be up to ≈1.6 × 105 A W-1. This high responsivity can be attributed to the highly efficient light absorption and the enhanced photoconductive gain due to the existence of trap states. The exfoliated GeSe nanosheet is confirmed to be along the [001] (armchair direction) and [010] (zigzag direction) using transmission electron microscopy and anisotropic Raman characterizations. The angle-dependent electric and photoresponsive performance is systematically explored. Notably, the GeSe-based phototransistor shows strong polarization-dependent photoresponse with a peak/valley ratio of 1.3. Furthermore, the charge carrier mobility along the armchair direction is measured to be 1.85 times larger than that along the zigzag direction.
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Affiliation(s)
- Xing Zhou
- State Key Laboratory of Material Processing and Die & Mould TechnologySchool of Materials Science and EngineeringHuazhong University of Science and Technology (HUST)Wuhan430074P. R. China
| | - Xiaozong Hu
- State Key Laboratory of Material Processing and Die & Mould TechnologySchool of Materials Science and EngineeringHuazhong University of Science and Technology (HUST)Wuhan430074P. R. China
| | - Bao Jin
- State Key Laboratory of Material Processing and Die & Mould TechnologySchool of Materials Science and EngineeringHuazhong University of Science and Technology (HUST)Wuhan430074P. R. China
| | - Jing Yu
- State Key Laboratory of Material Processing and Die & Mould TechnologySchool of Materials Science and EngineeringHuazhong University of Science and Technology (HUST)Wuhan430074P. R. China
| | - Kailang Liu
- State Key Laboratory of Material Processing and Die & Mould TechnologySchool of Materials Science and EngineeringHuazhong University of Science and Technology (HUST)Wuhan430074P. R. China
| | - Huiqiao Li
- State Key Laboratory of Material Processing and Die & Mould TechnologySchool of Materials Science and EngineeringHuazhong University of Science and Technology (HUST)Wuhan430074P. R. China
| | - Tianyou Zhai
- State Key Laboratory of Material Processing and Die & Mould TechnologySchool of Materials Science and EngineeringHuazhong University of Science and Technology (HUST)Wuhan430074P. R. China
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22
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Sanchez Esqueda I, Yan X, Rutherglen C, Kane A, Cain T, Marsh P, Liu Q, Galatsis K, Wang H, Zhou C. Aligned Carbon Nanotube Synaptic Transistors for Large-Scale Neuromorphic Computing. ACS NANO 2018; 12:7352-7361. [PMID: 29944826 DOI: 10.1021/acsnano.8b03831] [Citation(s) in RCA: 18] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/17/2023]
Abstract
This paper presents aligned carbon nanotube (CNT) synaptic transistors for large-scale neuromorphic computing systems. The synaptic behavior of these devices is achieved via charge-trapping effects, commonly observed in carbon-based nanoelectronics. In this work, charge trapping in the high- k dielectric layer of top-gated CNT field-effect transistors (FETs) enables the gradual analog programmability of the CNT channel conductance with a large dynamic range ( i. e., large on/off ratio). Aligned CNT synaptic devices present significant improvements over conventional memristor technologies ( e. g., RRAM), which suffer from abrupt transitions in the conductance modulation and/or a small dynamic range. Here, we demonstrate exceptional uniformity of aligned CNT FET synaptic behavior, as well as significant robustness and nonvolatility via pulsed experiments, establishing their suitability for neural network implementations. Additionally, this technology is based on a wafer-level technique for constructing highly aligned arrays of CNTs with high semiconducting purity and is fully CMOS compatible, ensuring the practicality of large-scale CNT+CMOS neuromorphic systems. We also demonstrate fine-tunability of the aligned CNT synaptic behavior and discuss its application to adaptive online learning schemes and to homeostatic regulation of artificial neuron firing rates. We simulate the implementation of unsupervised learning for pattern recognition using a spike-timing-dependent-plasticity scheme, indicate system-level performance (as indicated by the recognition accuracy), and demonstrate improvements in the learning rate resulting from tuning the synaptic characteristics of aligned CNT devices.
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Affiliation(s)
- Ivan Sanchez Esqueda
- Information Sciences Institute , University of Southern California , Marina del Rey , California 90292 , United States
| | - Xiaodong Yan
- Ming Hsieh Department of Electrical Engineering , University of Southern California , Los Angeles , California 90089 , United States
| | | | - Alex Kane
- Carbonics Inc. , Culver City , California 90230 , United States
| | - Tyler Cain
- Carbonics Inc. , Culver City , California 90230 , United States
| | - Phil Marsh
- Carbonics Inc. , Culver City , California 90230 , United States
| | - Qingzhou Liu
- Ming Hsieh Department of Electrical Engineering , University of Southern California , Los Angeles , California 90089 , United States
| | - Kosmas Galatsis
- Carbonics Inc. , Culver City , California 90230 , United States
| | - Han Wang
- Ming Hsieh Department of Electrical Engineering , University of Southern California , Los Angeles , California 90089 , United States
| | - Chongwu Zhou
- Ming Hsieh Department of Electrical Engineering , University of Southern California , Los Angeles , California 90089 , United States
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Wu Q, Wang H, Luo Q, Banerjee W, Cao J, Zhang X, Wu F, Liu Q, Li L, Liu M. Full imitation of synaptic metaplasticity based on memristor devices. NANOSCALE 2018; 10:5875-5881. [PMID: 29508884 DOI: 10.1039/c8nr00222c] [Citation(s) in RCA: 31] [Impact Index Per Article: 5.2] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
Neuromorphic engineering is a promising technology for developing new computing systems owing to the low-power operation and the massive parallelism similarity to the human brain. Optimal function of neuronal networks requires interplay between rapid forms of Hebbian plasticity and homeostatic mechanisms that adjust the threshold for plasticity, termed metaplasticity. Metaplasticity has important implications in synapses and is barely addressed in neuromorphic devices. An understanding of metaplasticity might yield new insights into how the modification of synapses is regulated and how information is stored by synapses in the brain. Here, we propose a method to imitate the metaplasticity inhibition of long-term potentiation (MILTP) for the first time based on memristors. In addition, the metaplasticity facilitation of long-term potentiation (MFLTP) and the metaplasticity facilitation of long-term depression (MFLTD) are also achieved. Moreover, the mechanisms of metaplasticity in memristors are discussed. Additionally, the proposed method to mimic the metaplasticity is verified by three different memristor devices including oxide-based resistive memory (OxRAM), interface switching random access memory, and conductive bridging random access memory (CBRAM). This is a further step toward developing fully bio-realistic artificial synapses using memristors. The findings in this study will deepen our understanding of metaplasticity, as well as provide new insight into bio-realistic neuromorphic engineering.
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Affiliation(s)
- Quantan Wu
- Key Laboratory of Microelectronic Devices & Integrated Technology, Institute of Microelectronics of Chinese Academy of Sciences, Beijing, 100029, China.
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24
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Wang L, Wen D. Nonvolatile Bio-Memristor Based on Silkworm Hemolymph Proteins. Sci Rep 2017; 7:17418. [PMID: 29234084 PMCID: PMC5727189 DOI: 10.1038/s41598-017-17748-6] [Citation(s) in RCA: 9] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 06/05/2017] [Accepted: 11/29/2017] [Indexed: 12/01/2022] Open
Abstract
This paper reports the first successful fabrication of an ITO/silkworm hemolymph/Al bio-memristor using silkworm hemolymph as the active layer. Experiments demonstrate that the silkworm hemolymph bio-memristor is a nonvolatile rewritable bipolar memory device with a current switching ratio exceeding 103. The state of the bio-memristor can be retained for more than 104 seconds and remains stable for at least 500 cycles. Tests of 1/f noise have shown that the resistance switching characteristics of the silkworm hemolymph bio-memristor are related to the formation and breaking of conductive filaments, which result from the migration of oxygen ions and the oxidation and reduction of metal cations in the silkworm hemolymph film. The naturally non-toxic silkworm hemolymph offers advantages for human health, environmental protection, and biocompatibility. The proposed nonvolatile rewritable bio-memristor based on silkworm hemolymph possesses great application potential.
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Affiliation(s)
- Lu Wang
- HLJ Province Key Laboratory of Senior-education for Electronic Engineering, Heilongjiang University, Harbin, Heilongjiang, 150080, China
| | - Dianzhong Wen
- HLJ Province Key Laboratory of Senior-education for Electronic Engineering, Heilongjiang University, Harbin, Heilongjiang, 150080, China.
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25
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Wang C, He W, Tong Y, Zhang Y, Huang K, Song L, Zhong S, Ganeshkumar R, Zhao R. Memristive Devices with Highly Repeatable Analog States Boosted by Graphene Quantum Dots. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2017; 13:1603435. [PMID: 28296020 DOI: 10.1002/smll.201603435] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/13/2016] [Revised: 01/30/2017] [Indexed: 06/06/2023]
Abstract
Memristive devices, having a huge potential as artificial synapses for low-power neural networks, have received tremendous attention recently. Despite great achievements in demonstration of plasticity and learning functions, little progress has been made in the repeatable analog resistance states of memristive devices, which is, however, crucial for achieving controllable synaptic behavior. The controllable behavior of synapse is highly desired in building neural networks as it helps reduce training epochs and diminish error probability. Fundamentally, the poor repeatability of analog resistance states is closely associated with the random formation of conductive filaments, which consists of oxygen vacancies. In this work, graphene quantum dots (GQDs) are introduced into memristive devices. By virtue of the abundant oxygen anions released from GQDs, the GQDs can serve as nano oxygen-reservoirs and enhance the localization of filament formation. As a result, analog resistance states with highly tight distribution are achieved with nearly 85% reduction in variations. In addition the insertion of GQDs can alter the energy band alignment and boost the tunneling current, which leads to significant reduction in both switching voltages and their distribution variations. This work may pave the way for achieving artificial neural networks with accurate and efficient learning capability.
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Affiliation(s)
- Changhong Wang
- Engineering Product Development, Singapore University of Technology and Design (SUTD), 8 Somapah Road, 487372, Singapore
| | - Wei He
- Engineering Product Development, Singapore University of Technology and Design (SUTD), 8 Somapah Road, 487372, Singapore
| | - Yi Tong
- Engineering Product Development, Singapore University of Technology and Design (SUTD), 8 Somapah Road, 487372, Singapore
| | - Yishu Zhang
- Engineering Product Development, Singapore University of Technology and Design (SUTD), 8 Somapah Road, 487372, Singapore
| | - Kejie Huang
- Engineering Product Development, Singapore University of Technology and Design (SUTD), 8 Somapah Road, 487372, Singapore
| | - Li Song
- Engineering Product Development, Singapore University of Technology and Design (SUTD), 8 Somapah Road, 487372, Singapore
| | - Shuai Zhong
- Engineering Product Development, Singapore University of Technology and Design (SUTD), 8 Somapah Road, 487372, Singapore
| | - Rajasekaran Ganeshkumar
- Engineering Product Development, Singapore University of Technology and Design (SUTD), 8 Somapah Road, 487372, Singapore
| | - Rong Zhao
- Engineering Product Development, Singapore University of Technology and Design (SUTD), 8 Somapah Road, 487372, Singapore
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26
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Doan MH, Jin Y, Adhikari S, Lee S, Zhao J, Lim SC, Lee YH. Charge Transport in MoS 2/WSe 2 van der Waals Heterostructure with Tunable Inversion Layer. ACS NANO 2017; 11:3832-3840. [PMID: 28291323 DOI: 10.1021/acsnano.7b00021] [Citation(s) in RCA: 81] [Impact Index Per Article: 11.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/21/2023]
Abstract
Despite numerous studies on two-dimensional van der Waals heterostructures, a full understanding of the charge transport and photoinduced current mechanisms in these structures, in particular, associated with charge depletion/inversion layers at the interface remains elusive. Here, we investigate transport properties of a prototype multilayer MoS2/WSe2 heterojunction via a tunable charge inversion/depletion layer. A charge inversion layer was constructed at the surface of WSe2 due to its relatively low doping concentration compared to that of MoS2, which can be tuned by the back-gate bias. The depletion region was limited within a few nanometers in the MoS2 side, while charges are fully depleted on the whole WSe2 side, which are determined by Raman spectroscopy and transport measurements. Charge transport through the heterojunction was influenced by the presence of the inversion layer and involves two regimes of tunneling and recombination. Furthermore, photocurrent measurements clearly revealed recombination and space-charge-limited behaviors, similar to those of the heterostructures built from organic semiconductors. This contributes to research of various other types of heterostructures and can be further applied for electronic and optoelectronic devices.
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Affiliation(s)
- Manh-Ha Doan
- Center for Integrated Nanostructure Physics, Institute for Basic Science (IBS) , Suwon 16419, Republic of Korea
| | - Youngjo Jin
- Center for Integrated Nanostructure Physics, Institute for Basic Science (IBS) , Suwon 16419, Republic of Korea
| | - Subash Adhikari
- Center for Integrated Nanostructure Physics, Institute for Basic Science (IBS) , Suwon 16419, Republic of Korea
| | - Sanghyub Lee
- Center for Integrated Nanostructure Physics, Institute for Basic Science (IBS) , Suwon 16419, Republic of Korea
| | - Jiong Zhao
- Center for Integrated Nanostructure Physics, Institute for Basic Science (IBS) , Suwon 16419, Republic of Korea
| | - Seong Chu Lim
- Center for Integrated Nanostructure Physics, Institute for Basic Science (IBS) , Suwon 16419, Republic of Korea
| | - Young Hee Lee
- Center for Integrated Nanostructure Physics, Institute for Basic Science (IBS) , Suwon 16419, Republic of Korea
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Shao F, Wan X, Yang Y, Du P, Feng P. Optimization of chitosan gated electric double layer transistors by combining nanoparticle incorporation and acid doping. RSC Adv 2016. [DOI: 10.1039/c6ra23220e] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022] Open
Abstract
Electric double layer transistors gated by bio-polyelectrolyte chitosan could be optimized by combining nanoparticle incorporation and acid doping.
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Affiliation(s)
- Feng Shao
- School of Electronic Science & Engineering
- Nanjing University
- Nanjing 210093
- China
| | - Xiang Wan
- School of Electronic Science & Engineering
- Nanjing University
- Nanjing 210093
- China
| | - Yi Yang
- School of Electronic Science & Engineering
- Nanjing University
- Nanjing 210093
- China
| | - Peifu Du
- School of Electronic Science & Engineering
- Nanjing University
- Nanjing 210093
- China
| | - Ping Feng
- School of Electronic Science & Engineering
- Nanjing University
- Nanjing 210093
- China
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