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Titova E, Mylnikov D, Kashchenko M, Safonov I, Zhukov S, Dzhikirba K, Novoselov KS, Bandurin DA, Alymov G, Svintsov D. Ultralow-noise Terahertz Detection by p-n Junctions in Gapped Bilayer Graphene. ACS NANO 2023; 17:8223-8232. [PMID: 37094175 DOI: 10.1021/acsnano.2c12285] [Citation(s) in RCA: 2] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/03/2023]
Abstract
Graphene shows strong promise for the detection of terahertz (THz) radiation due to its high carrier mobility, compatibility with on-chip waveguides and transistors, and small heat capacitance. At the same time, weak reaction of graphene's physical properties on the detected radiation can be traced down to the absence of a band gap. Here, we study the effect of electrically induced band gap on THz detection in graphene bilayer with split-gate p-n junction. We show that gap induction leads to a simultaneous increase in current and voltage responsivities. At operating temperatures of ∼25 K, the responsivity at a 20 meV band gap is from 3 to 20 times larger than that in the gapless state. The maximum voltage responsivity of our devices at 0.13 THz illumination exceeds 50 kV/W, while the noise equivalent power falls down to 36 fW/Hz1/2.
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Affiliation(s)
- Elena Titova
- Center for Photonics and 2D Materials, Moscow Institute of Physics and Technology, Dolgoprudny 141700, Russian Federation
- Programmable Functional Materials Lab, Brain and Consciousness Research Center, Moscow 121205, Russia
| | - Dmitry Mylnikov
- Center for Photonics and 2D Materials, Moscow Institute of Physics and Technology, Dolgoprudny 141700, Russian Federation
| | - Mikhail Kashchenko
- Center for Photonics and 2D Materials, Moscow Institute of Physics and Technology, Dolgoprudny 141700, Russian Federation
- Programmable Functional Materials Lab, Brain and Consciousness Research Center, Moscow 121205, Russia
| | - Ilya Safonov
- Center for Photonics and 2D Materials, Moscow Institute of Physics and Technology, Dolgoprudny 141700, Russian Federation
- Programmable Functional Materials Lab, Brain and Consciousness Research Center, Moscow 121205, Russia
| | - Sergey Zhukov
- Center for Photonics and 2D Materials, Moscow Institute of Physics and Technology, Dolgoprudny 141700, Russian Federation
| | - Kirill Dzhikirba
- Institute of Solid State Physics, Russian Academy of Sciences, Chernogolovka 142432, Russian Federation
| | - Kostya S Novoselov
- Programmable Functional Materials Lab, Brain and Consciousness Research Center, Moscow 121205, Russia
- Institute for Functional Intelligent Materials, National University of Singapore, Singapore 117575, Singapore
| | - Denis A Bandurin
- Department of Materials Science and Engineering, National University of Singapore, Singapore 117575, Singapore
| | - Georgy Alymov
- Center for Photonics and 2D Materials, Moscow Institute of Physics and Technology, Dolgoprudny 141700, Russian Federation
| | - Dmitry Svintsov
- Center for Photonics and 2D Materials, Moscow Institute of Physics and Technology, Dolgoprudny 141700, Russian Federation
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2
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Mylnikov DA, Titova EI, Kashchenko MA, Safonov IV, Zhukov SS, Semkin VA, Novoselov KS, Bandurin DA, Svintsov DA. Terahertz Photoconductivity in Bilayer Graphene Transistors: Evidence for Tunneling at Gate-Induced Junctions. NANO LETTERS 2023; 23:220-226. [PMID: 36546884 DOI: 10.1021/acs.nanolett.2c04119] [Citation(s) in RCA: 3] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/17/2023]
Abstract
Photoconductivity of novel materials is the key property of interest for design of photodetectors, optical modulators, and switches. Despite the photoconductivity of most novel 2d materials having been studied both theoretically and experimentally, the same is not true for 2d p-n junctions that are necessary blocks of most electronic devices. Here, we study the sub-terahertz photocoductivity of gapped bilayer graphene with electrically induced p-n junctions. We find a strong positive contribution from junctions to resistance, temperature resistance coefficient, and photoresistivity at cryogenic temperatures T ∼ 20 K. The contribution to these quantities from junctions exceeds strongly the bulk values at uniform channel doping even at small band gaps of ∼10 meV. We further show that positive junction photoresistance is a hallmark of interband tunneling, and not of intraband thermionic conduction. Our results point to the possibility of creating various interband tunneling devices based on bilayer graphene, including steep-switching transistors and selective sensors.
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Affiliation(s)
- Dmitry A Mylnikov
- Center for Photonics and 2D Materials, Moscow Institute of Physics and Technology, Dolgoprudny141700, Russia
| | - Elena I Titova
- Center for Photonics and 2D Materials, Moscow Institute of Physics and Technology, Dolgoprudny141700, Russia
- Programmable Functional Materials Lab, Brain and Consciousness Research Center, Moscow121205, Russia
| | - Mikhail A Kashchenko
- Center for Photonics and 2D Materials, Moscow Institute of Physics and Technology, Dolgoprudny141700, Russia
- Programmable Functional Materials Lab, Brain and Consciousness Research Center, Moscow121205, Russia
| | - Ilya V Safonov
- Center for Photonics and 2D Materials, Moscow Institute of Physics and Technology, Dolgoprudny141700, Russia
- Programmable Functional Materials Lab, Brain and Consciousness Research Center, Moscow121205, Russia
| | - Sergey S Zhukov
- Center for Photonics and 2D Materials, Moscow Institute of Physics and Technology, Dolgoprudny141700, Russia
| | - Valentin A Semkin
- Center for Photonics and 2D Materials, Moscow Institute of Physics and Technology, Dolgoprudny141700, Russia
| | - Kostya S Novoselov
- Programmable Functional Materials Lab, Brain and Consciousness Research Center, Moscow121205, Russia
- Institute for Functional Intelligent Materials, National University of Singapore, Singapore117575, Singapore
| | - Denis A Bandurin
- Department of Materials Science and Engineering, National University of Singapore, Singapore117575, Singapore
| | - Dmitry A Svintsov
- Center for Photonics and 2D Materials, Moscow Institute of Physics and Technology, Dolgoprudny141700, Russia
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3
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Gayduchenko I, Xu SG, Alymov G, Moskotin M, Tretyakov I, Taniguchi T, Watanabe K, Goltsman G, Geim AK, Fedorov G, Svintsov D, Bandurin DA. Tunnel field-effect transistors for sensitive terahertz detection. Nat Commun 2021; 12:543. [PMID: 33483488 PMCID: PMC7822863 DOI: 10.1038/s41467-020-20721-z] [Citation(s) in RCA: 33] [Impact Index Per Article: 11.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Journal Information] [Subscribe] [Scholar Register] [Received: 09/14/2020] [Accepted: 12/16/2020] [Indexed: 11/09/2022] Open
Abstract
The rectification of electromagnetic waves to direct currents is a crucial process for energy harvesting, beyond-5G wireless communications, ultra-fast science, and observational astronomy. As the radiation frequency is raised to the sub-terahertz (THz) domain, ac-to-dc conversion by conventional electronics becomes challenging and requires alternative rectification protocols. Here, we address this challenge by tunnel field-effect transistors made of bilayer graphene (BLG). Taking advantage of BLG's electrically tunable band structure, we create a lateral tunnel junction and couple it to an antenna exposed to THz radiation. The incoming radiation is then down-converted by the tunnel junction nonlinearity, resulting in high responsivity (>4 kV/W) and low-noise (0.2 pW/[Formula: see text]) detection. We demonstrate how switching from intraband Ohmic to interband tunneling regime can raise detectors' responsivity by few orders of magnitude, in agreement with the developed theory. Our work demonstrates a potential application of tunnel transistors for THz detection and reveals BLG as a promising platform therefor.
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Affiliation(s)
- I Gayduchenko
- Physics Department, Moscow Pedagogical State University, Moscow, 119435, Russia.,Moscow Institute of Physics and Technology (National Research University), Dolgoprudny, 141700, Russia
| | - S G Xu
- School of Physics, University of Manchester, Oxford Road, Manchester, M13 9PL, UK.,National Graphene Institute, University of Manchester, Manchester, M13 9PL, UK
| | - G Alymov
- Moscow Institute of Physics and Technology (National Research University), Dolgoprudny, 141700, Russia
| | - M Moskotin
- Physics Department, Moscow Pedagogical State University, Moscow, 119435, Russia.,Moscow Institute of Physics and Technology (National Research University), Dolgoprudny, 141700, Russia
| | - I Tretyakov
- Astro Space Center, Lebedev Physical Institute of the Russian Academy of Sciences, Moscow, 117997, Russia
| | - T Taniguchi
- International Center for Materials Nanoarchitectonics, National Institute of Material Science, Tsukuba, 305-0044, Japan
| | - K Watanabe
- Research Center for Functional Materials, National Institute of Material Science, Tsukuba, 305-0044, Japan
| | - G Goltsman
- Physics Department, Moscow Pedagogical State University, Moscow, 119435, Russia.,National Research University Higher School of Economics, Moscow, 101000, Russia
| | - A K Geim
- School of Physics, University of Manchester, Oxford Road, Manchester, M13 9PL, UK.,National Graphene Institute, University of Manchester, Manchester, M13 9PL, UK
| | - G Fedorov
- Physics Department, Moscow Pedagogical State University, Moscow, 119435, Russia. .,Moscow Institute of Physics and Technology (National Research University), Dolgoprudny, 141700, Russia.
| | - D Svintsov
- Moscow Institute of Physics and Technology (National Research University), Dolgoprudny, 141700, Russia.
| | - D A Bandurin
- Moscow Institute of Physics and Technology (National Research University), Dolgoprudny, 141700, Russia. .,School of Physics, University of Manchester, Oxford Road, Manchester, M13 9PL, UK. .,Department of Physics, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA.
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4
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Marchenko D, Evtushinsky DV, Golias E, Varykhalov A, Seyller T, Rader O. Extremely flat band in bilayer graphene. SCIENCE ADVANCES 2018; 4:eaau0059. [PMID: 30430134 PMCID: PMC6226281 DOI: 10.1126/sciadv.aau0059] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.2] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/08/2018] [Accepted: 10/04/2018] [Indexed: 05/06/2023]
Abstract
We propose a novel mechanism of flat band formation based on the relative biasing of only one sublattice against other sublattices in a honeycomb lattice bilayer. The mechanism allows modification of the band dispersion from parabolic to "Mexican hat"-like through the formation of a flattened band. The mechanism is well applicable for bilayer graphene-both doped and undoped. By angle-resolved photoemission from bilayer graphene on SiC, we demonstrate the possibility of realizing this extremely flattened band (< 2-meV dispersion), which extends two-dimensionally in a k-space area around the K ¯ point and results in a disk-like constant energy cut. We argue that our two-dimensional flat band model and the experimental results have the potential to contribute to achieving superconductivity of graphene- or graphite-based systems at elevated temperatures.
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Affiliation(s)
- D. Marchenko
- Helmholtz-Zentrum Berlin für Materialien und Energie, Elektronenspeicherring BESSY II, Albert-Einstein-Straße 15, 12489 Berlin, Germany
- Corresponding author.
| | - D. V. Evtushinsky
- Helmholtz-Zentrum Berlin für Materialien und Energie, Elektronenspeicherring BESSY II, Albert-Einstein-Straße 15, 12489 Berlin, Germany
| | - E. Golias
- Helmholtz-Zentrum Berlin für Materialien und Energie, Elektronenspeicherring BESSY II, Albert-Einstein-Straße 15, 12489 Berlin, Germany
| | - A. Varykhalov
- Helmholtz-Zentrum Berlin für Materialien und Energie, Elektronenspeicherring BESSY II, Albert-Einstein-Straße 15, 12489 Berlin, Germany
| | - Th. Seyller
- Institut für Physik, Technische Universität Chemnitz, Reichenhainer Str. 70, 09126 Chemnitz, Germany
| | - O. Rader
- Helmholtz-Zentrum Berlin für Materialien und Energie, Elektronenspeicherring BESSY II, Albert-Einstein-Straße 15, 12489 Berlin, Germany
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5
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Gmitra M, Fabian J. Proximity Effects in Bilayer Graphene on Monolayer WSe_{2}: Field-Effect Spin Valley Locking, Spin-Orbit Valve, and Spin Transistor. PHYSICAL REVIEW LETTERS 2017; 119:146401. [PMID: 29053300 DOI: 10.1103/physrevlett.119.146401] [Citation(s) in RCA: 11] [Impact Index Per Article: 1.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/16/2017] [Indexed: 05/21/2023]
Abstract
Proximity orbital and spin-orbit effects of bilayer graphene on monolayer WSe_{2} are investigated from first principles. We find that the built-in electric field induces an orbital band gap of about 10 meV in bilayer graphene. Remarkably, the proximity spin-orbit splitting for holes is 2 orders of magnitude-the spin-orbit splitting of the valence band at K is about 2 meV-more than for electrons. Effectively, holes experience spin valley locking due to the strong proximity of the lower graphene layer to WSe_{2}. However, applying an external transverse electric field of some 1 V/nm, countering the built-in field of the heterostructure, completely reverses this effect and allows, instead of holes, electrons to be spin valley locked with 2 meV spin-orbit splitting. Such a behavior constitutes a highly efficient field-effect spin-orbit valve, making bilayer graphene on WSe_{2} a potential platform for a field-effect spin transistor.
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Affiliation(s)
- Martin Gmitra
- Institute for Theoretical Physics, University of Regensburg, 93040 Regensburg, Germany
| | - Jaroslav Fabian
- Institute for Theoretical Physics, University of Regensburg, 93040 Regensburg, Germany
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6
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Lan YW, Torres CM, Tsai SH, Zhu X, Shi Y, Li MY, Li LJ, Yeh WK, Wang KL. Atomic-Monolayer MoS 2 Band-to-Band Tunneling Field-Effect Transistor. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2016; 12:5676-5683. [PMID: 27594654 DOI: 10.1002/smll.201601310] [Citation(s) in RCA: 10] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/16/2016] [Revised: 07/20/2016] [Indexed: 06/06/2023]
Abstract
The experimental observation of band-to-band tunneling in novel tunneling field-effect transistors utilizing a monolayer of MoS2 as the conducting channel is demonstrated. Our results indicate that the strong gate-coupling efficiency enabled by two-dimensional materials, such as monolayer MoS2 , results in the direct manifestation of a band-to-band tunneling current and an ambipolar transport.
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Affiliation(s)
- Yann-Wen Lan
- National Nano Device Laboratories (NDL), National Applied Research Laboratories, Hsinchu, 30078, Taiwan.
- Department of Electrical Engineering, University of California at Los Angeles, Los Angeles, CA, 90095, USA.
| | - Carlos M Torres
- Department of Electrical Engineering, University of California at Los Angeles, Los Angeles, CA, 90095, USA.
| | - Shin-Hung Tsai
- Department of Electrical Engineering, University of California at Los Angeles, Los Angeles, CA, 90095, USA
| | - Xiaodan Zhu
- Department of Electrical Engineering, University of California at Los Angeles, Los Angeles, CA, 90095, USA
| | - Yumeng Shi
- Physical Sciences and Engineering Division, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Kingdom of Saudi Arabia
| | - Ming-Yang Li
- Physical Sciences and Engineering Division, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Kingdom of Saudi Arabia
- Research Center for Applied Sciences, Academia Sinica, Taipei, 10617, Taiwan
| | - Lain-Jong Li
- Physical Sciences and Engineering Division, King Abdullah University of Science and Technology (KAUST), Thuwal, 23955-6900, Kingdom of Saudi Arabia
| | - Wen-Kuan Yeh
- National Nano Device Laboratories (NDL), National Applied Research Laboratories, Hsinchu, 30078, Taiwan
- Department of Electrical Engineering, National University of Kaohsiung, Kaohsiung, 811, Taiwan
| | - Kang L Wang
- Department of Electrical Engineering, University of California at Los Angeles, Los Angeles, CA, 90095, USA.
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