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Guo EJ, Liu Y, Sohn C, Desautels RD, Herklotz A, Liao Z, Nichols J, Freeland JW, Fitzsimmons MR, Lee HN. Oxygen Diode Formed in Nickelate Heterostructures by Chemical Potential Mismatch. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2018; 30:e1705904. [PMID: 29512212 DOI: 10.1002/adma.201705904] [Citation(s) in RCA: 8] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/10/2017] [Revised: 12/25/2017] [Indexed: 06/08/2023]
Abstract
Deliberate control of oxygen vacancy formation and migration in perovskite oxide thin films is important for developing novel electronic and iontronic devices. Here, it is found that the concentration of oxygen vacancies (VO ) formed in LaNiO3 (LNO) during pulsed laser deposition is strongly affected by the chemical potential mismatch between the LNO film and its proximal layers. Increasing the VO concentration in LNO significantly modifies the degree of orbital polarization and drives the metal-insulator transition. Changes in the nickel oxidization state and carrier concentration in the films are confirmed by soft X-ray absorption spectroscopy and optical spectroscopy. The ability to unidirectional-control the oxygen flow across the heterointerface, e.g., a so-called "oxygen diode", by exploiting chemical potential mismatch at interfaces provides a new avenue to tune the physical and electrochemical properties of complex oxides.
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Affiliation(s)
- Er-Jia Guo
- Materials Science and Technology Division and Neutron Scattering Division, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA
| | - Yaohua Liu
- Materials Science and Technology Division and Neutron Scattering Division, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA
| | - Changhee Sohn
- Materials Science and Technology Division and Neutron Scattering Division, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA
| | - Ryan D Desautels
- Materials Science and Technology Division and Neutron Scattering Division, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA
| | - Andreas Herklotz
- Materials Science and Technology Division and Neutron Scattering Division, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA
| | - Zhaoliang Liao
- Materials Science and Technology Division and Neutron Scattering Division, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA
| | - John Nichols
- Materials Science and Technology Division and Neutron Scattering Division, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA
| | - John W Freeland
- Advanced Photon Source, Argonne National Laboratory, Argonne, IL, 60439, USA
| | - Michael R Fitzsimmons
- Materials Science and Technology Division and Neutron Scattering Division, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA
- Department of Physics and Astronomy, University of Tennessee, Knoxville, TN, 37996, USA
| | - Ho Nyung Lee
- Materials Science and Technology Division and Neutron Scattering Division, Oak Ridge National Laboratory, Oak Ridge, TN, 37831, USA
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