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Kundale SS, Kamble GU, Patil PP, Patil SL, Rokade KA, Khot AC, Nirmal KA, Kamat RK, Kim KH, An HM, Dongale TD, Kim TG. Review of Electrochemically Synthesized Resistive Switching Devices: Memory Storage, Neuromorphic Computing, and Sensing Applications. NANOMATERIALS (BASEL, SWITZERLAND) 2023; 13:1879. [PMID: 37368309 DOI: 10.3390/nano13121879] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 04/03/2023] [Revised: 06/09/2023] [Accepted: 06/13/2023] [Indexed: 06/28/2023]
Abstract
Resistive-switching-based memory devices meet most of the requirements for use in next-generation information and communication technology applications, including standalone memory devices, neuromorphic hardware, and embedded sensing devices with on-chip storage, due to their low cost, excellent memory retention, compatibility with 3D integration, in-memory computing capabilities, and ease of fabrication. Electrochemical synthesis is the most widespread technique for the fabrication of state-of-the-art memory devices. The present review article summarizes the electrochemical approaches that have been proposed for the fabrication of switching, memristor, and memristive devices for memory storage, neuromorphic computing, and sensing applications, highlighting their various advantages and performance metrics. We also present the challenges and future research directions for this field in the concluding section.
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Affiliation(s)
- Somnath S Kundale
- Computational Electronics and Nanoscience Research Laboratory, School of Nanoscience and Biotechnology, Shivaji University, Kolhapur 416004, India
| | - Girish U Kamble
- Computational Electronics and Nanoscience Research Laboratory, School of Nanoscience and Biotechnology, Shivaji University, Kolhapur 416004, India
| | - Pradnya P Patil
- Computational Electronics and Nanoscience Research Laboratory, School of Nanoscience and Biotechnology, Shivaji University, Kolhapur 416004, India
| | - Snehal L Patil
- Computational Electronics and Nanoscience Research Laboratory, School of Nanoscience and Biotechnology, Shivaji University, Kolhapur 416004, India
| | - Kasturi A Rokade
- Computational Electronics and Nanoscience Research Laboratory, School of Nanoscience and Biotechnology, Shivaji University, Kolhapur 416004, India
| | - Atul C Khot
- School of Electrical Engineering, Korea University, Anam-dong, Seoul 02841, Republic of Korea
| | - Kiran A Nirmal
- School of Electrical Engineering, Korea University, Anam-dong, Seoul 02841, Republic of Korea
| | - Rajanish K Kamat
- Department of Electronics, Shivaji University, Kolhapur 416004, India
- Department of Physics, Dr. Homi Bhabha State University, 15, Madam Cama Road, Mumbai 400032, India
| | - Kyeong Heon Kim
- Department of Convergence Electronic Engineering, Gyeongsang National University, Jinjudae-ro 501, Jinju 52828, Republic of Korea
| | - Ho-Myoung An
- Department of Electronics, Osan University, 45, Cheonghak-ro, Osan-si 18119, Republic of Korea
| | - Tukaram D Dongale
- Computational Electronics and Nanoscience Research Laboratory, School of Nanoscience and Biotechnology, Shivaji University, Kolhapur 416004, India
- School of Electrical Engineering, Korea University, Anam-dong, Seoul 02841, Republic of Korea
| | - Tae Geun Kim
- School of Electrical Engineering, Korea University, Anam-dong, Seoul 02841, Republic of Korea
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Kim KH, Park Y, Kim MK, Lee JS. Voltage-Tunable Ultra-Steep Slope Atomic Switch with Selectivity over 10 10. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2021; 17:e2100401. [PMID: 34106519 DOI: 10.1002/smll.202100401] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/21/2021] [Revised: 05/11/2021] [Indexed: 06/12/2023]
Abstract
Atomic switch-based selectors, which utilize the formation of conductive filaments by the migration of ions, are researched for cross-point array architecture due to their simple structure and high selectivity. However, the difficulty in controlling the formation of filaments causes uniformity and reliability issues. Here, a multilayer selector with Pt/Ag-doped ZnO/ZnO/Ag-doped ZnO/Pt structure by the sputtering process is presented. A multilayer structure enables control of the filament formation by preventing excessive influx of Ag ions. The multilayer selector device exhibits a high on-current density of 2 MA cm-2 , which can provide sufficient current for the operation with the memory device. Also, the device exhibits high selectivity of 1010 and a low off-current of 10-13 A. The threshold voltage of selector devices can be controlled by modulating the thickness of the ZnO layer. By connecting a multilayer selector device to a resistive switching memory, the leakage current of the memory device can be reduced. These results demonstrate that a multilayer structure can be used in a selector device to improve selectivity and reliability for use in high-density memory devices.
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Affiliation(s)
- Kwang-Hyun Kim
- Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673, Korea
| | - Youngjun Park
- Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673, Korea
| | - Min-Kyu Kim
- Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673, Korea
| | - Jang-Sik Lee
- Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 37673, Korea
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Niu W, Shi J, Ju L, Li Z, Orlovskaya N, Liu Y, Yang Y. Understanding Synergism of Cobalt Metal and Copper Oxide toward Highly Efficient Electrocatalytic Oxygen Evolution. ACS Catal 2018. [DOI: 10.1021/acscatal.8b03702] [Citation(s) in RCA: 40] [Impact Index Per Article: 6.7] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
Affiliation(s)
- Wenhan Niu
- NanoScience Technology Center, University of Central Florida, Orlando, Florida 32826, United States
| | - Jianjian Shi
- Texas Materials Institute and Department of Mechanical Engineering, The University of Texas at Austin, Austin, Texas 78712, United States
| | - Licheng Ju
- NanoScience Technology Center, University of Central Florida, Orlando, Florida 32826, United States
- Department of Materials Science and Engineering, University of Central Florida, Orlando, Florida 32826, United States
| | - Zhao Li
- NanoScience Technology Center, University of Central Florida, Orlando, Florida 32826, United States
- Department of Materials Science and Engineering, University of Central Florida, Orlando, Florida 32826, United States
| | - Nina Orlovskaya
- Department of Mechanical and Aerospace Engineering, University of Central Florida, 4000 Central Florida Boulevard, Orlando, Florida 32816, United States
| | - Yuanyue Liu
- Texas Materials Institute and Department of Mechanical Engineering, The University of Texas at Austin, Austin, Texas 78712, United States
| | - Yang Yang
- NanoScience Technology Center, University of Central Florida, Orlando, Florida 32826, United States
- Department of Materials Science and Engineering, University of Central Florida, Orlando, Florida 32826, United States
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Hwang SH, Jeon S, Kim MJ, Choi DG, Choi JH, Jung JY, Kim KS, Lee J, Jeong JH, Youn JR. Covalent bonding-assisted nanotransfer lithography for the fabrication of plasmonic nano-optical elements. NANOSCALE 2017; 9:14335-14346. [PMID: 28725906 DOI: 10.1039/c7nr02666h] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2023]
Abstract
Many high-resolution patterning techniques have been developed to realize nano- and microscale applications of electric devices, sensors, and transistors. However, conventional patterning methods based on photo or e-beam lithography are not employed to fabricate optical elements of high aspect ratio and a sub-100 nm scale due to the limit of resolution, high costs and low throughput. In this study, covalent bonding-assisted nanotransfer lithography (CBNL) was proposed to fabricate various structures of high resolution and high aspect ratio at low cost by a robust and fast chemical reaction. The proposed process is based on the formation of covalent bonds between silicon of adhesive layers on a substrate and oxygen of the deposited material on the polymer stamp. The covalent bond is strong enough to detach multiple layers from the stamp for a large area without defects. The obtained nanostructures can be used for direct application or as a hard mask for etching. Two nano-optical applications were demonstrated in this study, i.e., a meta-surface and a wire-grid polarizer. A perfect absorption meta-surface was generated by transferring subwavelength hole arrays onto a substrate without any post-processing procedures. In addition, a wire-grid polarizer with high aspect ratio (1 : 3) and 50 nm line width was prepared by the nano-transfer of materials, which were used as a hard mask for etching. Therefore, CBNL provides a means of achieving large-area nano-optical elements with a simple roll-to-plate process at low cost.
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Affiliation(s)
- Soon Hyoung Hwang
- Research Institute of Advanced Materials (RIAM), Department of Materials Science and Engineering, Seoul National University, Daehak-Dong, Gwanak-Gu, Seoul 151-744, South Korea.
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Hwang B, Lee JS. A Strategy to Design High-Density Nanoscale Devices utilizing Vapor Deposition of Metal Halide Perovskite Materials. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2017; 29:1701048. [PMID: 28558134 DOI: 10.1002/adma.201701048] [Citation(s) in RCA: 54] [Impact Index Per Article: 7.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/21/2017] [Revised: 03/25/2017] [Indexed: 06/07/2023]
Abstract
The demand for high memory density has increased due to increasing needs of information storage, such as big data processing and the Internet of Things. Organic-inorganic perovskite materials that show nonvolatile resistive switching memory properties have potential applications as the resistive switching layer for next-generation memory devices, but, for practical applications, these materials should be utilized in high-density data-storage devices. Here, nanoscale memory devices are fabricated by sequential vapor deposition of organolead halide perovskite (OHP) CH3 NH3 PbI3 layers on wafers perforated with 250 nm via-holes. These devices have bipolar resistive switching properties, and show low-voltage operation, fast switching speed (200 ns), good endurance, and data-retention time >105 s. Moreover, the use of sequential vapor deposition is extended to deposit CH3 NH3 PbI3 as the memory element in a cross-point array structure. This method to fabricate high-density memory devices could be used for memory cells that occupy large areas, and to overcome the scaling limit of existing methods; it also presents a way to use OHPs to increase memory storage capacity.
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Affiliation(s)
- Bohee Hwang
- Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 790-784, Korea
| | - Jang-Sik Lee
- Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang, 790-784, Korea
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Akbari M, Kim MK, Kim D, Lee JS. Reproducible and reliable resistive switching behaviors of AlOX/HfOX bilayer structures with Al electrode by atomic layer deposition. RSC Adv 2017. [DOI: 10.1039/c6ra26872b] [Citation(s) in RCA: 43] [Impact Index Per Article: 6.1] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/21/2022] Open
Abstract
The resistive switching behaviors of AlOX/HfOX bilayer structures were investigated.
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Affiliation(s)
- Masoud Akbari
- Department of Materials Science and Engineering
- Pohang University of Science and Technology (POSTECH)
- Pohang 790-784
- Republic of Korea
| | - Min-Kyu Kim
- Department of Materials Science and Engineering
- Pohang University of Science and Technology (POSTECH)
- Pohang 790-784
- Republic of Korea
| | - Dongshin Kim
- Department of Materials Science and Engineering
- Pohang University of Science and Technology (POSTECH)
- Pohang 790-784
- Republic of Korea
| | - Jang-Sik Lee
- Department of Materials Science and Engineering
- Pohang University of Science and Technology (POSTECH)
- Pohang 790-784
- Republic of Korea
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Kim MK, Lee JS. Design of Electrodeposited Bilayer Structures for Reliable Resistive Switching with Self-Compliance. ACS APPLIED MATERIALS & INTERFACES 2016; 8:32918-32924. [PMID: 27934194 DOI: 10.1021/acsami.6b08915] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
Programmable memory characteristics of electrodeposited CuOx-based resistive random access memory (ReRAM) can be significantly improved by adopting a bilayer structure with a built-in current limiter. To control the on-current and enhance the device uniformity, the bilayer structure of Pt/CuOx (switching layer)/CuOx (current limiter)/Pt is proposed. This structure is synthesized by controlling solution pH during electrochemical deposition (ECD). The bilayer structure of Pt/CuOx (synthesized at pH 9)/CuOx (synthesized at pH 11.5)/Pt exhibits reliable and uniform self-compliant resistive switching behavior. The origin of resistive switching is attributed to formation and rupture of conductive filaments in the CuOx (pH 9) layer. However, the CuOx (pH 11.5) layer acts as the resistor without resistive switching to control the overall resistance in ReRAM. Reversible "on" and "off" switching occurs with a switching time of 100 ns. Devices based on the bilayer structure showed long data retention and good endurance. This simple use of ECD to improve the memory characteristics of electrodeposited ReRAM offers the opportunity to realize reliable and self-compliant memory devices with low-cost solution processes.
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Affiliation(s)
- Min-Kyu Kim
- Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH) , Pohang 790-784, Korea
| | - Jang-Sik Lee
- Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH) , Pohang 790-784, Korea
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