Hwang YM, Pan CT, Lu YX, Jian SR, Chang HW, Juang JY. Influence of Post-Annealing on the Structural and Nanomechanical Properties of Co Thin Films.
MICROMACHINES 2020;
11:mi11020180. [PMID:
32050539 PMCID:
PMC7074635 DOI:
10.3390/mi11020180]
[Citation(s) in RCA: 2] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 01/24/2020] [Revised: 02/07/2020] [Accepted: 02/07/2020] [Indexed: 11/16/2022]
Abstract
The correlations between the microstructure and nanomechanical properties of a series of thermal annealed Co thin films were investigated. The Co thin films were deposited on glass substrates using a magnetron sputtering system at ambient conditions followed by subsequent annealing conducted at various temperatures ranging from 300 °C to 800 °C. The XRD results indicated that for annealing temperature in the ranged from 300 °C to 500 °C, the Co thin films were of single hexagonal close-packed (hcp) phase. Nevertheless, the coexistence of hcp-Co (002) and face-centered cubic (fcc-Co (111)) phases was evidently observed for films annealed at 600 °C. Further increasing the annealing temperature to 700 °C and 800 °C, the films evidently turned into fcc-Co (111). Moreover, significant variations in the hardness and Young’s modulus are observed by continuous stiffness nanoindentation measurement for films annealed at different temperatures. The correlations between structures and properties are discussed.
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