Disorder-induced topological phase transitions in two-dimensional spin-orbit coupled superconductors

Structural Amorphization-Induced Topological Order

Electronic properties of crystals are inherently pertained to crystalline symmetry, so that amorphization that lowers and breaks symmetry is detrimental. One important crystalline property is electron band topology which is known to be weakened and destroyed by structural disorder. Here, we report a counterintuitive theoretical discovery that atomic structural disorder by amorphization can in fact induce electronic order of topology in an otherwise topologically trivial crystal. The resulting nontrivial topology is characterized by a nonzero spin Bott index, associated with robust topological edge states and quantized conductance. The underlying topological phase transition (TPT) from a trivial crystal to a topological amorphous is analyzed by mapping out a phase diagram in the degree of structural disorder using an effective medium theory. The atomic disorder is revealed to induce topological order by renormalizing the spectral gap toward nontriviality near the phase boundary. As a concrete example, we further show such TPT in amorphous stanane by first-principles calculations. Our findings point to possible observation of an electronic ordering transition accompanied by a structural disorder transition.

Structural-Disorder-Induced Second-Order Topological Insulators in Three Dimensions

Higher-order topological insulators are established as topological crystalline insulators protected by crystalline symmetries. One celebrated example is the second-order topological insulator in three dimensions that hosts chiral hinge modes protected by crystalline symmetries. Since amorphous solids are ubiquitous, it is important to ask whether such a second-order topological insulator can exist in an amorphous system without any spatial order. Here, we predict the existence of a second-order topological insulating phase in an amorphous system without any crystalline symmetry. Such a topological phase manifests in the winding number of the quadrupole moment, the quantized longitudinal conductance, and the hinge states. Furthermore, in stark contrast to the viewpoint that structural disorder should be detrimental to the higher-order topological phase, we remarkably find that structural disorder can induce a second-order topological insulator from a topologically trivial phase in a regular geometry. We finally demonstrate the existence of a second-order topological phase in amorphous systems with time-reversal symmetry.

Kinetic pathways towards mass production of single crystalline stanene on topological insulator substrates

As a highly appealing new member of the two-dimensional (2D) materials family, stanene was first epitaxially grown on a three-dimensional topological insulator of Bi2Te3; yet, to date, a standing challenge is to drastically improve the overall quality of such stanene overlayers for a wide range of potential applications in next-generation quantum devices. Here we use state-of-the-art first-principles approaches to explore the atomistic growth mechanisms of stanene on different Bi2Te3(111)-based substrates, with intriguing discoveries. We first show that, when grown on experimentally studied Te-terminated Bi2Te3, stanene would follow an unusual partial-layer-by-partial-layer growth mode, characterized by short-range repulsive pairwise interactions of the Sn adatoms; the resultant stanene overlayer is destined to contain undesirable grain boundaries. More importantly, we find that stanene growth on Bi2Te3(111) pre-covered with a Bi bilayer follows a highly desirable nucleation-and-growth mechanism, strongly favoring single crystalline stanene. We further show that both systems exhibit pronounced Rashba spin-orbit couplings, while the latter system also provides new opportunities for the potential realization of topological superconductivity in 2D heterostructures. The novel kinetic pathways revealed here will be instrumental in achieving the mass production of high-quality stanene with emergent physical properties of technological significance.