Designed surface construction by photo-induced vapor-phase assisted surface polymerization of vinyl monomers using immobilized free radical initiators

Nanotopographical control of surfaces using chemical vapor deposition processes

In recent years much work has been conducted in order to create patterned and structured polymer coatings using vapor deposition techniques - not only via post-deposition treatment, but also directly during the deposition process. Two-dimensional and three-dimensional structures can be achieved via various vapor deposition strategies, for instance, using masks, exploiting surface properties that lead to spatially selective deposition, via the use of additional porogens or by employing oblique angle polymerization deposition. Here, we provide a concise review of these studies.

Controllable surface morphology and properties via mist polymerization on a plasma-treated polymethyl methacrylate surface

Surface modification by grafting polymers on solid materials is an important strategy used to improve surface properties. This article reports that under appropriate conditions, very thin layers with desired morphologies may be constructed on a plasma-treated substrate by feeding a small quantity of a monomer with a mist stream carrying droplets produced from monomer solutions. We investigate the effects of process parameters that affect layer morphology, including exposure time to the mist stream, concentration of the monomer solution, and solvent selectivity. For a methyl methacrylate solution in ethanol, nanoparticles are uniformly grown with increasing monomer concentration or exposure time and finally form a porous layer at 3.65 mol L(-1) for 30 min. Decreasing solvent polarity not only affects surface morphology, but also increases hydrophobicity of the resulting surface. With 2,2,3,4,4,4-hexafluorobutyl methacrylate as the monomer, SEM and AFM micrographs indicated that mist polymerization results in numerous microspheres on the activated surface. These experimental results were interpreted by a mechanism in terms of an in situ polymerization accompanied by a phase transformation of the resulting polymer. Specifically, plasma treatment provides highly active cations and radicals to initiate very rapid polymerization, and the resulting polymers are consequently deposited from the liquid onto the surface under phase transition mechanisms.

Chemical vapor deposition of conformal, functional, and responsive polymer films

Chemical vapor deposition (CVD) polymerization utilizes the delivery of vapor-phase monomers to form chemically well-defined polymeric films directly on the surface of a substrate. CVD polymers are desirable as conformal surface modification layers exhibiting strong retention of organic functional groups, and, in some cases, are responsive to external stimuli. Traditional wet-chemical chain- and step-growth mechanisms guide the development of new heterogeneous CVD polymerization techniques. Commonality with inorganic CVD methods facilitates the fabrication of hybrid devices. CVD polymers bridge microfabrication technology with chemical, biological, and nanoparticle systems and assembly. Robust interfaces can be achieved through covalent grafting enabling high-resolution (60 nm) patterning, even on flexible substrates. Utilizing only low-energy input to drive selective chemistry, modest vacuum, and room-temperature substrates, CVD polymerization is compatible with thermally sensitive substrates, such as paper, textiles, and plastics. CVD methods are particularly valuable for insoluble and infusible films, including fluoropolymers, electrically conductive polymers, and controllably crosslinked networks and for the potential to reduce environmental, health, and safety impacts associated with solvents. Quantitative models aid the development of large-area and roll-to-roll CVD polymer reactors. Relevant background, fundamental principles, and selected applications are reviewed.