Polymer phase separation on lattice patterned surfaces

Directed ordering of phase separated domains and dewetting of thin polymer blend films on a topographically patterned substrate

Substrate pattern guided self-organization of ultrathin and confined polymeric films on a topographically patterned substrate is a useful approach for obtaining ordered meso and nano structures over large areas, particularly if the ordering is achieved during film preparation itself, eliminating any post-processing such as thermal or solvent vapor annealing. By casting a dilute solution of two immiscible polymers, polystyrene (PS) and polymethylmethacrylate (PMMA), from a common solvent (toluene) on a topographically patterned substrate with a grating geometry, we show the formation of self-organized meso patterns with various degrees of ordering. The morphology depends on both the concentration of the dispensed solution (C_n) and the blend composition (R_B). Depending on the extent of dewetting during spin coating, the final morphologies can be classified into three distinct categories. At a very low C_n the solution dewets fully, resulting in isolated polymer droplets aligned along substrate grooves (Type 1). Type 2 structures comprising isolated threads with aligned phase separated domains along each substrate groove are observed at intermediate C_n. A continuous film (Type 3) is obtained above a critical concentration (C_n*) that depends on R_B. While the extent of ordering of the domains gradually diminishes with an increase in film thickness for Type 3 patterns, the size of the domains remains much smaller than that on a flat substrate, resulting in significant downsizing of the features due to the lateral confinement imposed on the phase separation process by the topographic patterns. Finally, we show that some of these structures exhibit excellent broadband anti-reflection (AR) properties.

Control of Polymer Phase Separation by Roughness Transfer Printing for 2D Microlens Arrays

Great efforts have been devoted to the control of phase separation between blended polymers in terms of the advantages for engineering functional topologies. A simple and straightforward pathway through roughness transfer printing (RTP) is proposed to realize the control of polymer phase separation. The additional roughness difference, which is introduced by trace agarose transferred from a hydrogel stamp, offers a great effect on the rate of nucleation and coalescence orientation of polymethylmethacrylate (PMMA) protrusions grown from a polydimethylsiloxane (PDMS) network. Using a particular topography of agarose stamp and a proper growth time in toluene atmosphere, a 2D microlens array with high uniformity is obtained that shows great potential for optical applications. Moreover, the control of polymer phase separation was successfully extended to the collection and identification of fingerprints with a high degree of replication.

Critical adsorption of a flexible polymer on a stripe-patterned surface

The adsorption and dynamics of a polymer chain on a stripe-patterned surface composed of periodical attractive and neutral stripes are studied by using Monte Carlo simulation. The critical adsorption temperature Tc and pattern-recognition temperature Tr are estimated from the desorption probability, surface contact number, and bridge number. A phase diagram presenting three polymer states, including a desorbed state above Tc, a multi-stripe adsorbed state at an intermediate temperature Tr < T < Tc, and a single-stripe adsorbed state below Tr, is provided for infinitely long chains. Normal diffusion is always observed for a polymer in the direction parallel to the stripe even at low temperature. But in the direction perpendicular to the stripe, the polymer can freely diffuse above Tc, whereas the polymer is confined to one attractive stripe below Tr. However, the adsorbed polymer can hop from one attractive stripe to another at the intermediate temperature Tr < T < Tc.

Sub-10 nm features obtained from directed self-assembly of semicrystalline polycarbosilane-based block copolymer thin films

Highly-ordered arrays with sub-10 nm features are produced with topographical-directed self-assembly of low-molecular-weight poly(1,1-dimethyl silacyclobutane)-block-poly(methyl methacrylate). This system turns out to be of high interest for lithographic applications since the domain orientation is solely controlled through the polymer layer thickness, while the promotion of the microphase separation is obtained by a short thermal annealing process under mild conditions.

Simultaneous patterning of two different types of nanoparticles into alternating domains of a striped array of a polymer blend in a single spin-casting step

A fast and convenient method is developed for simultaneously patterning inorganic nanoparticles with different optical, electronic or magnetic functionality to specific surface regions, by spin-casting onto microcontact printed substrates blend solutions in which the two nanoparticle types are functionalized with surface polymer brush layers of different surface energies. The process is based on phase separation of different nanoparticles based on their immiscible brush layers during spin-casting, with the underlying surface energy heterogeneity of the patterned substrate directing the different NP types to domains of different surface energies. Here, we specifically demonstrate the simultaneous localization of cadmium sulfide quantum dots (CdS QDs), addressed with a surface layer of polystyrene (PS), and silver nanoparticles (Ag NPs), addressed with a surface layer of poly(methyl methacrylate) (PMMA), onto the non-polar and polar surface domains, respectively, of hydrophilic glass patterned with hydrophobic octadecyltrichlorosilane (OTS) stripe arrays with micron-scale periodicities. In order to prevent gelation of solvent-swollen polymer-brush coated NPs during spin casting, which effects strong kinetic constraints on phase separation and localization, PS, PMMA or PS/PMMA homopolymer blends of sufficiently high Mw were added to the NP blends to increase the free volume between approaching NPs. The process parameters were fine-tuned to obtain control over defects in the obtained patterns.

Polymer Microstructures Self-Assemble on Single-Walled Carbon Nanotube Thin Films

The formation of self-assembled microstructures of anionic polyelectrolyte, poly(acrylic acid) salts, on the surface of single-walled carbon nanotube thin films was studied by a fast phase separation process that filtrated a mixed dispersion composed of single-walled carbon nanotubes and poly(acrylic acid) derivatives on a membrane filter. The resulting microstructures of poly(acrylic acid) self-assembly were characterized by scanning electron microscopy, energy-dispersive X-ray spectroscopy, element mapping, and diffuse reflectance Fourier transform infrared spectroscopy. The influence factors including substrate, ion species, single-walled carbon nanotubes, and different kinds of carbon nanotubes were discussed comprehensively for the formation of microstructures of PAA self-assembly by a liquid-liquid phase separation.

Directed polystyrene/poly(methyl methacrylate) phase separation and nanoparticle ordering on transparent chemically patterned substrates

We investigate the surface-directed phase separation of spin-coated polystyrene/poly(methyl methacrylate) (PS/PMMA) blends on prepatterned octadecyltrichlorosilane (OTS)-glass substrates under various experimental conditions. As a result of tandem processes of spinodal decomposition and selective wetting of polymer components during spin-coating, low-energy OTS stripes and high-energy glass surfaces laterally arrange the phase-separated polymers according to the chemical pattern on the substrate. Optimal pattern replication was achieved when the length scale of phase separation, controlled via the polymer concentration of the spin-coating solution, matched the smallest feature dimension in a striped chemical pattern possessing two alternating distances between stripes. It was also shown that polymer blend patterns were most closely registered with the underlying substrate when the PS/PMMA composition ratio (30/70, w/w) matched the areal fraction of OTS on the glass surface (∼30%). The influence of solvents demonstrated that a solvent with a relatively low volatility, such toluene, was required for patterning so that domain feature sizes were able to coarsen to the size of the patterned features before film vitrification. As well, we showed that the technique and optimized conditions developed in this study could be applied to pattern photoluminescent CdS quantum dots into microscale arrays of parallel lines via spin-coating onto transparent OTS-glass substrates.

Nanostructured material surfaces--preparation, effect on cellular behavior, and potential biomedical applications: a review

Nanostructures play important roles in vivo, where nanoscaled features of extracellular matrix (ECM) components influence cell behavior and resultant tissue formation. This review summarizes some of the recent developments in fostering new concepts and approaches to nanofabrication, such as top-down and bottom-up and combinations of the two. As in vitro investigations demonstrate that man-made nanotopography can be used to control cell reactions to a material surface, its potential application in implant design and tissue engineering becomes increasingly evident. Therefore, we present recent progress in directing cell fate in the field of cell mechanics, which has grown rapidly over the last few years, and in various tissue-engineering applications. The main focus is on the initial responses of cells to nanostructured surfaces and subsequent influences on cellular functions. Specific examples are also given to illustrate the potential nanostructures may have for biomedical applications and regenerative medicine.

Polymer blend lithography: A versatile method to fabricate nanopatterned self-assembled monolayers

A rapid and cost-effective lithographic method, polymer blend lithography (PBL), is reported to produce patterned self-assembled monolayers (SAM) on solid substrates featuring two or three different chemical functionalities. For the pattern generation we use the phase separation of two immiscible polymers in a blend solution during a spin-coating process. By controlling the spin-coating parameters and conditions, including the ambient atmosphere (humidity), the molar mass of the polystyrene (PS) and poly(methyl methacrylate) (PMMA), and the mass ratio between the two polymers in the blend solution, the formation of a purely lateral morphology (PS islands standing on the substrate while isolated in the PMMA matrix) can be reproducibly induced. Either of the formed phases (PS or PMMA) can be selectively dissolved afterwards, and the remaining phase can be used as a lift-off mask for the formation of a nanopatterned functional silane monolayer. This "monolayer copy" of the polymer phase morphology has a topographic contrast of about 1.3 nm. A demonstration of tuning of the PS island diameter is given by changing the molar mass of PS. Moreover, polymer blend lithography can provide the possibility of fabricating a surface with three different chemical components: This is demonstrated by inducing breath figures (evaporated condensed entity) at higher humidity during the spin-coating process. Here we demonstrate the formation of a lateral pattern consisting of regions covered with 1H,1H,2H,2H-perfluorodecyltrichlorosilane (FDTS) and (3-aminopropyl)triethoxysilane (APTES), and at the same time featuring regions of bare SiO(x). The patterning process could be applied even on meter-sized substrates with various functional SAM molecules, making this process suitable for the rapid preparation of quasi two-dimensional nanopatterned functional substrates, e.g., for the template-controlled growth of ZnO nanostructures [1].

A solution concentration dependent transition from self-stratification to lateral phase separation in spin-cast PS:d-PMMA thin films

Thin films with a rich variety of different nano-scale morphologies have been produced by spin casting solutions of various concentrations of PS:d-PMMA blends from toluene solutions. During the spin casting process specular reflectivity and off-specular scattering data were recorded and ex situ optical and atomic force microscopy, neutron reflectivity and ellipsometry have all been used to characterise the film morphologies. We show that it is possible to selectively control the film morphology by altering the solution concentration used. Low polymer concentration solutions favour the formation of flat in-plane phase-separated bi-layers, with a d-PMMA-rich layer underneath a PS-rich layer. At intermediate concentrations the films formed consist of an in-plane phase-separated bi-layer with an undulating interface and also have some secondary phase-separated pockets rich in d-PMMA in the PS-rich layer and vice versa. Using high concentration solutions results in laterally phase-separated regions with sharp interfaces. As with the intermediate concentrations, secondary phase separation was also observed, especially at the top surface.

Generation of surface energy patterns by single pulse laser interference on self-assembled monolayers

Single pulse laser interference lithography is used to structure self-assembled monolayers of thiols on gold. This structuring process is investigated by attenuated total reflection measurements, and a demixing process of a binary polymer blend is used to visualize the produced surface energy pattern. The lithography can be realized with different wavelengths (266, 532, and 1064 nm) which shows that the structuring is a thermal process. As a first demonstration of this process, structures down to 800 nm period and 300 nm width are fabricated.