Hole, Convex, and Silver Nanoparticle Patterning on Polystyrene Nanosheets by Colloidal Photolithography at Air-Water Interfaces

Colloidal photolithography is a versatile advanced technique for fabricating periodic nanopatterned arrays, with patterns carved exclusively on photoresist films deposited on solid substrates in a typical photolithographic process. In this study, we apply colloidal photolithography to polystyrene (PS) films half-covered with poly(methyl methacrylate) (PMMA) colloids at the air-water interface and demonstrate that periodic hole structures can be carved in PS films by two processes: photodecomposing PS films with ultraviolet (UV) light and removing PMMA colloids with a fluorinated solvent. Nonspherical holes, such as C-shaped and chiral comma-shaped holes, are also fabricated by regulating the UV illumination conditions. Furthermore, in addition to holes, convex patterns on PS films are realized by combining weak UV illumination with solvent treatment. We also demonstrate that actively using the water surface as the UV illumination field enables periodic silver nanoparticle spots to be deposited on PS films simply by dissolving silver ions in the water phase.

Nanosphere Lithography: A Versatile Approach to Develop Transparent Conductive Films for Optoelectronic Applications

Transparent conductive films (TCFs) are irreplaceable components in most optoelectronic applications such as solar cells, organic light-emitting diodes, sensors, smart windows, and bioelectronics. The shortcomings of existing traditional transparent conductors demand the development of new material systems that are both transparent and electrically conductive, with variable functionality to meet the requirements of new generation optoelectronic devices. In this respect, TCFs with periodic or irregular nanomesh structures have recently emerged as promising candidates, which possess superior mechanical properties in comparison with conventional metal oxide TCFs. Among the methods for nanomesh TCFs fabrication, nanosphere lithography (NSL) has proven to be a versatile platform, with which a wide range of morphologically distinct nanomesh TCFs have been demonstrated. These materials are not only functionally diverse, but also have advantages in terms of device compatibility. This review provides a comprehensive description of the NSL process and its most relevant derivatives to fabricate nanomesh TCFs. The structure-property relationships of these materials are elaborated and an overview of their application in different technologies across disciplines related to optoelectronics is given. It is concluded with a perspective on current shortcomings and future directions to further advance the field.

Multiple Linear Regression Modeling of Nanosphere Self-Assembly via Spin Coating

Nanosphere lithography employs single- or multilayer self-assembled nanospheres as a template for bottom-up nanoscale patterning. The ability to produce self-assembled nanospheres with minimal packing defects over large areas is critical to advancing applications of nanosphere lithography. Spin coating is a simple-to-execute, high-throughput method of nanosphere self-assembly. The wide range of possible process parameters for nanosphere spin coating, however-and the sensitivity of nanosphere self-assembly to these parameters-can lead to highly variable outcomes in nanosphere configuration by this method. Finding the optimum process parameters for nanosphere spin coating remains challenging. This work adopts a design-of-experiments approach to investigate the effects of seven factors-nanosphere wt%, methanol/water ratio, solution volume, wetting time, spin time, maximum revolutions per minute, and ramp rate-on two response variables-percentage hexagonal close packing and macroscale coverage of nanospheres. Single-response and multiple-response linear regression models identify main and two-way interaction effects of statistical significance to the outcomes of both response variables and enable prediction of optimized settings. The results indicate a tradeoff between the high ramp rates required for large macroscale coverage and the need to minimize high shear forces and evaporation rates to ensure that nanospheres properly self-assemble into hexagonally packed arrays.

From colloidal particles to photonic crystals: advances in self-assembly and their emerging applications

Over the last three decades, photonic crystals (PhCs) have attracted intense interests thanks to their broad potential applications in optics and photonics. Generally, these structures can be fabricated via either "top-down" lithographic or "bottom-up" self-assembly approaches. The self-assembly approaches have attracted particular attention due to their low cost, simple fabrication processes, relative convenience of scaling up, and the ease of creating complex structures with nanometer precision. The self-assembled colloidal crystals (CCs), which are good candidates for PhCs, have offered unprecedented opportunities for photonics, optics, optoelectronics, sensing, energy harvesting, environmental remediation, pigments, and many other applications. The creation of high-quality CCs and their mass fabrication over large areas are the critical limiting factors for real-world applications. This paper reviews the state-of-the-art techniques in the self-assembly of colloidal particles for the fabrication of large-area high-quality CCs and CCs with unique symmetries. The first part of this review summarizes the types of defects commonly encountered in the fabrication process and their effects on the optical properties of the resultant CCs. Next, the mechanisms of the formation of cracks/defects are discussed, and a range of versatile fabrication methods to create large-area crack/defect-free two-dimensional and three-dimensional CCs are described. Meanwhile, we also shed light on both the advantages and limitations of these advanced approaches developed to fabricate high-quality CCs. The self-assembly routes and achievements in the fabrication of CCs with the ability to open a complete photonic bandgap, such as cubic diamond and pyrochlore structure CCs, are discussed as well. Then emerging applications of large-area high-quality CCs and unique photonic structures enabled by the advanced self-assembly methods are illustrated. At the end of this review, we outlook the future approaches in the fabrication of perfect CCs and highlight their novel real-world applications.

Palladium-Decorated Silicon Nanomesh Fabricated by Nanosphere Lithography for High Performance, Room Temperature Hydrogen Sensing

A hydrogen (H₂ ) gas sensor based on a silicon (Si) nanomesh structure decorated with palladium (Pd) nanoparticles is fabricated via polystyrene nanosphere lithography and top-down fabrication processes. The gas sensor shows dramatically improved H₂ gas sensitivity compared with an Si thin film sensor without nanopatterns. Furthermore, a buffered oxide etchant treatment of the Si nanomesh structure results in an additional performance improvement. The final sensor device shows fast H₂ response and high selectivity to H₂ gas among other gases. The sensing performance is stable and shows repeatable responses in both dry and high humidity ambient environments. The sensor also shows high stability without noticeable performance degradation after one month. This approach allows the facile fabrication of high performance H₂ sensors via a cost-effective, complementary metal-oxide-semiconductor (CMOS) compatible, and scalable nanopatterning method.

Enhancement of light output power from LEDs based on monolayer colloidal crystal

One of the major challenges for the application of GaN-based light emitting diodes (LEDs) in solid-state lighting lies in the low light output power (LOP). Embedding nanostructures in LEDs has attracted considerable interest because they may improve the LOP of GaN-based LEDs efficiently. Recent advances in nanostructures derived from monolayer colloidal crystal (MCC) have made remarkable progress in enhancing the performance of GaN-based LEDs. In this review, the current state of the art in this field is highlighted with an emphasis on the fabrication of ordered nanostructures using large-area, high-quality MCCs and their demonstrated applications in enhancement of LOP from GaN-based LEDs. We describe the remarkable achievements that have improved the internal quantum efficiency, the light extraction efficiency, or both from LEDs by taking advantages of diverse functions that the nanostructures provided. Finally, a perspective on the future development of enhancement of LOP by using the nanostructures derived from MCC is presented.

Wafer-scale fabrication of plasmonic crystals from patterned silicon templates prepared by nanosphere lithography

By combining nanosphere lithography with template stripping, silicon wafers were patterned with hexagonal arrays of nanowells or pillars. These silicon masters were then replicated in gold by metal evaporation, resulting in wafer-scale hexagonal gratings for plasmonic applications. In the nanosphere lithography step, two-dimensional colloidal crystals of 510 nm diameter polystyrene spheres were assembled at the air-water interface and transferred to silicon wafers. The spheres were etched in oxygen plasma in order to define their size for masking of the silicon wafer. For fabrication of metallic nanopillar arrays, an alumina film was grown over the nanosphere layer and the spheres were then removed by bath sonication. The well pattern was defined in the silicon wafer by reactive ion etching in a chlorine plasma. For fabrication of metal nanowell arrays, the nanosphere monolayer was used directly as a mask and exposed areas of the silicon wafer were plasma-etched anisotropically in SF6/Ar. Both techniques could be used to produce subwavelength metal replica structures with controlled pillar or well diameter, depth, and profile, on the wafer scale, without the use of direct writing techniques to fabricate masks or masters.

Shape-controllable microlens arrays via direct transfer of photocurable polymer droplets

A simple method is presented to form an array of shape-controllable microlenses by partial photocuring of an UV-curable polymer and direct transfer. Using the transferred lens array, nanoscale metal patterns as small as 130-nm gaps are detected under an optical microscope with a distinguishable resolution.

Recent progress on surface pattern fabrications based on monolayer colloidal crystal templates and related applications

This review summarizes the recent progress toward the fabrication of surface patterns depending on the monolayer colloidal crystal templates. Based on the structural differences of the acquired surface patterns, various synthesis routes are introduced in detail. The diverse device applications of the synthesized surface patterns are also summarized, including sensors, energy-related devices, field emissions, wettability control, and so on. Future research should focus on surface patterns composed of multiple-layered structures and hybrid materials, and the widening of their application explorations.